专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5439519A Solution applying apparatus 失效
标题翻译：解决方案应用设备
公开(公告)号：US5439519A
公开(公告)日：1995-08-08
申请号：US176204
申请日：1994-01-03
申请人： Hiroyoshi Sago , Hirotsugu Kumazawa , Futoshi Shimai , Shigemi Fujiyama , Hiroki Endo , Hideya Kobari
发明人： Hiroyoshi Sago , Hirotsugu Kumazawa , Futoshi Shimai , Shigemi Fujiyama , Hiroki Endo , Hideya Kobari
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , B05C11/02 , B05C5/00
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162
摘要： A solution applying apparatus has inner and outer cups each having an upper opening, the inner cup being rotatably disposed in the outer cup. The inner cup houses a planar workpiece such as a glass substrate therein which is to be coated with a coating solution such as a resist solution. The solution applying apparatus also has a lid assembly having an outer cup lid for closing the upper opening of the outer cup and an inner cup lid for closing the upper opening of the inner cup, the inner cup lid being rotatable with respect to the outer cup lid. The inner cup has drain holes defined in an outer circumferential portion thereof for providing communication between a space within the inner cup and a space outside of the inner cup to drain an excessive coating solution from the inner cup. The outer cup has an annular collection passage defined therein along the outer circumferential portion of the inner cup, the drain holes opening into the annular collection passage. The lid assembly includes a self-centering valve body that can be vertically movable into and out of snugly fitting relation to a through hole defined in the inner cup lid and a lost motion mechanism for moving the valve body to an open position thereof while the first and second cup lids remain closed and for opening the outer cup lid while the inner cup lid remains closed. After the workpiece has been coated with the coating solution, the valve body is lifted out of the through hole to smoothly eliminate a vacuum developed in the inner cup, and then the inner cup is opened.
摘要翻译：溶液施加装置具有各自具有上开口的内杯和外杯，内杯可旋转地设置在外杯中。内杯容纳有诸如抗蚀剂溶液等涂布溶液的平面状的工件，例如玻璃基板。溶液施加装置还具有盖组件，其具有用于封闭外杯的上开口的外杯盖和用于封闭内杯的上开口的内杯盖，内杯盖可相对于外杯旋转盖。内杯具有限定在其外圆周部分中的排水孔，用于提供内杯内的空间和内杯外部的空间之间的连通，以从内杯排出过量的涂层溶液。外杯具有沿着内杯的外圆周部分限定在其中的环形收集通道，排出孔通向环形收集通道。盖组件包括自定心阀体，其可以垂直移动进入和离开与内杯盖中限定的通孔的紧密配合关系，以及用于将阀体移动到其打开位置的空动机构，而第一并且第二杯盖保持关闭并且在内杯盖保持关闭时打开外杯盖。在工件被涂布溶液之后，将阀体从通孔中提出，以平滑地消除在内杯中显影的真空，然后打开内杯。

2. 发明授权

US06277441B1 Method of forming coating film on a substrate 失效
标题翻译：在基材上形成涂膜的方法
公开(公告)号：US06277441B1
公开(公告)日：2001-08-21
申请号：US08389119
申请日：1995-02-15
申请人： Hiroki Endo , Hideya Kobari , Koji Ueda , Hiroyoshi Sago
发明人： Hiroki Endo , Hideya Kobari , Koji Ueda , Hiroyoshi Sago
IPC分类号： B05D312
CPC分类号： H01L21/6715 , B05D1/005 , C03C17/001 , C03C2218/116 , H01L21/02126 , H01L21/02282 , H01L21/31051 , H01L21/316
摘要： According to the invention disclosed, application liquid such as spin-on-glass (SOG) is dropped on the surface of a substrate such as a semiconductor wafer having irregularities thereon and is dispersed on the substrate surface using a centrifugal force generated by rotating the substrate. The rotation of the substrate is performed in a first rotational action at a low speed and a second rotational action at a high speed, the first and second rotational actions being separated by a time interval. The second rotation may be at a constant speed. Alternatively, the rotational speed of the second rotational action may comprise rotation at an intermediate speed continuously followed by rotation at a higher speed. The time interval between the first and second rotational actions is ten times the duration of the first rotational action or longer. The duration of the second rotational action is three times that of the first rotational action or longer. Such time interval and relative durations make the application liquid more conformable to the substrate surface and causes the application liquid to be sufficiently dispersed on the substrate to provide a film having the desired thickness on the substrate, even though the substrate has irregularities thereon.
摘要翻译：根据所公开的发明，将诸如旋涂玻璃（SOG）的涂布液滴落在其上具有不规则性的半导体晶片等基板的表面上，并使用通过旋转基板产生的离心力将其分散在基板表面上。基板的旋转以低速的第一旋转动作和高速的第二旋转动作进行，第一和第二旋转动作以时间间隔分开。第二旋转可以是恒定的速度。或者，第二旋转动作的旋转速度可以包括以中间速度连续地以较高速度旋转的旋转。第一和第二旋转动作之间的时间间隔是第一旋转动作的持续时间的十倍或更长。第二旋转动作的持续时间是第一旋转动作的持续时间的3倍以上。这样的时间间隔和相对持续时间使得施加液体更适合于衬底表面，并且使得施加液体充分地分散在衬底上，以在衬底上提供具有期望厚度的膜，即使衬底在其上具有不规则性。

3. 发明授权

US5591262A Rotary chemical treater having stationary cleaning fluid nozzle 失效
标题翻译：旋转化学处理机具有固定的清洁流体喷嘴
公开(公告)号：US5591262A
公开(公告)日：1997-01-07
申请号：US410315
申请日：1995-03-24
申请人： Hiroyoshi Sago , Hideya Kobari , Koji Ueda , Hidenori Miyamoto , Ryuzo Takatsuki
发明人： Hiroyoshi Sago , Hideya Kobari , Koji Ueda , Hidenori Miyamoto , Ryuzo Takatsuki
IPC分类号： G03F7/16 , B05C11/08 , H01L21/00 , H01L21/027 , H01L21/304 , H01L21/306 , H01L21/683 , B05C7/00
CPC分类号： H01L21/67051 , Y10S134/902
摘要： The invention disclosed defined a vertically extending passage through the rotary center of an inner cup or the rotary center of a spinner in a notary chemical treater, disposes a stationary cleaning fluid nozzle in the passage, and injects the cleaning fluid from the nozzle to clean a lid of the rotary chemical treater and the underside of an object treatment within the treater. The underside of the lid and the underside of the objective part are efficiently cleaned, and the need for sealing the movable parts against the cleaning fluid is eliminated because the nozzle is stationary, ensuring the prevention of the cleaning fluid from leaking.
摘要翻译：本发明公开了一种通过内杯的旋转中心或旋转器在公证化学处理器中的旋转中心的垂直延伸的通道，将固定的清洁流体喷嘴置于通道中，并将喷嘴从喷嘴喷射到清洁旋转化学处理器的盖子和处理器内的物体处理的下侧。盖子的下侧和目标部分的下侧被有效地清洁，并且由于喷嘴是静止的，消除了将可动部件密封在清洁流体上的需要，从而确保防止清洗液体泄漏。

4. 发明授权

US06214104B1 Coating solution for forming silica coating and method of forming silica coating 失效
标题翻译：用于形成二氧化硅涂层的涂层溶液和形成二氧化硅涂层的方法
公开(公告)号：US06214104B1
公开(公告)日：2001-04-10
申请号：US08692005
申请日：1996-08-02
申请人： Hiroyuki Iida , Hiroki Endo , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Hiroyuki Iida , Hiroki Endo , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： B05D712
CPC分类号： C09D4/00 , C08G77/04
摘要： A substrate onto which a coating solution is dropped is rotated at a low speed in a first rotational mode and then after an interval of time at a high speed in a second rotational mode. At the end of the first rotational mode, the coating solution is coated to a thickness larger than a given thickness on irregularities on the substrate such as twin patterns and a global pattern, with the coating solution being coated to a thickness smaller than the given thickness between the twin patterns. Subsequently, at the start of the second rotational mode, the coating solution coated on the twin patterns and the global pattern flows into spaces between these patterns. At the end of the second rotational mode, the thickness of the coating solution on the twin patterns is almost nil, and the thickness of the coating solution on the global pattern is small in its entirety though it is somewhat large in the central area of the global pattern.
摘要翻译：在第一旋转模式中以低速旋转涂布溶液滴落到其上的基板，然后在第二旋转模式中以高速度在一段时间之后旋转。在第一旋转模式结束时，将涂布溶液涂覆到基板上的不规则部分上的厚度大于给定厚度，例如双图案和全局图案，涂布溶液的涂布厚度小于给定厚度在双胞胎之间。随后，在第二旋转模式开始时，涂覆在双模式上的涂布溶液和全局图案流入这些图案之间的空间。在第二旋转模式结束时，两个图案上的涂布溶液的厚度几乎为零，并且全局图案上的涂布溶液的厚度整体上小，但是其中心区域全球格局。

5. 发明授权

US07884062B2 Cleaning liquid for lithography and cleaning method using same 有权
标题翻译：用于光刻的清洁液和使用其的清洁方法
公开(公告)号：US07884062B2
公开(公告)日：2011-02-08
申请号：US12224300
申请日：2007-02-14
申请人： Jun Koshiyama , Hideya Kobari
发明人： Jun Koshiyama , Hideya Kobari
IPC分类号： C11D7/50
CPC分类号： G03F7/422 , C11D7/5022 , C11D11/0047 , G03F7/2041 , H01L21/02087
摘要： Disclosed is a cleaning liquid for lithography which is characterized by containing a mixed organic solvent which is obtained by mixing (A) at least one solvent selected from ketone organic solvents and glycol ether organic solvents, (B) at least one solvent selected from lactone organic solvents and (C) at least one solvent selected from alkoxy benzenes and aromatic alcohols. This cleaning liquid is highly safe and does not have adverse effects on the environment or the human body, while having basic characteristics necessary for a cleaning liquid for lithography. In addition, this cleaning liquid can be stably supplied at low cost.
摘要翻译：公开了一种用于光刻的清洗液，其特征在于含有混合的有机溶剂，其通过混合（A）至少一种选自酮有机溶剂和二醇醚有机溶剂的溶剂，（B）至少一种选自内酯有机溶剂的溶剂溶剂和（C）至少一种选自烷氧基苯和芳族醇的溶剂。该清洗液高度安全，对环境或人体没有不利影响，同时具有光刻用清洗液所需的基本特性。此外，可以以低成本稳定地供给该清洗液。

6. 发明授权

US5614271A Method for the formation of a silica-based coating film 失效
标题翻译：形成二氧化硅基涂膜的方法
公开(公告)号：US5614271A
公开(公告)日：1997-03-25
申请号：US692187
申请日：1996-08-05
申请人： Tatsuhiko Shibuya , Susumu Okano , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
发明人： Tatsuhiko Shibuya , Susumu Okano , Hideya Kobari , Yoshio Hagiwara , Toshimasa Nakayama
IPC分类号： B05D3/06 , B05D7/00 , B05D7/24 , C04B41/50 , C09D183/00 , C09D183/16 , C23C18/12 , C23C18/14 , H01L21/316 , B29C71/02
CPC分类号： H01L21/316 , C04B41/5035 , C09D183/16 , C23C18/1212 , C23C18/122 , C23C18/1279 , C23C18/1283 , C23C18/1295 , C23C18/14 , C04B2111/00844
摘要： Proposed is an improved method for the formation of a silica-based coating film on the surface of a substrate such as a silicon wafer in the manufacture of semiconductor devices by coating the substrate surface with a polysilazane-containing coating solution followed by conversion of the coating layer of polysilazane into a silica-based coating film. The method comprises drying the coating layer of the polysilazane according to a heating schedule at a specified heating rate with continuous or stepwise increase of the temperature up to 240.degree. to 350.degree. C. followed by an irradiation treatment with far ultraviolet light at a temperature of 240.degree. to 350.degree. C. and then by a baking treatment at 350.degree. to 800.degree. C.
摘要翻译：提出了在半导体器件的制造中在硅晶片等基板的表面上形成二氧化硅类涂膜的改进方法，其中通过用含聚硅氮烷的涂布溶液涂布基板表面，随后将涂层转化聚硅氮烷层形成二氧化硅基涂膜。该方法包括以规定的加热速度按照加热方案干燥聚硅氮烷的涂层，连续或逐步升高温度至240℃至350℃，然后在远紫外光的温度下进行辐射处理 240℃至350℃，然后在350℃至800℃下进行烘烤处理。

7. 发明授权

US06787412B2 Dielectric element and method for fabricating the same 失效
标题翻译：介电元件及其制造方法
公开(公告)号：US06787412B2
公开(公告)日：2004-09-07
申请号：US10458199
申请日：2003-06-11
申请人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
发明人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
IPC分类号： H01L218242
CPC分类号： H01L28/75 , H01L28/55 , Y10S438/957
摘要： It is disclosed a dielectric element comprising a lower electrode, a dielectric layer, and an upper electrode which are provided on a substrate, in which at least one of the electrodes is a Pt layer, a Ru layer is used as a base layer for the Pt layer. In the fabrication of the dielectric element, the Pt layer is formed by electroplating, a photoresist pattern is used as a plating mask, and an Ru layer is formed as a seed layer. The present invention makes it possible to provide a dielectric element using Pt as an electrode material, that is capable of easily forming a Pt electrode having excellent electrical characteristics without generating voids or seams, that is capable of forming a fine pattern, and that does not occur contamination in a processing chamber, and a method for fabricating a dielectric element of having the characteristics mentioned above.
摘要翻译：公开了一种介电元件，其包括设置在基板上的下电极，电介质层和上电极，其中至少一个电极为Pt层，Ru层用作基极层 Pt层。在电介质元件的制造中，通过电镀形成Pt层，使用光致抗蚀剂图案作为电镀掩模，并且形成Ru层作为籽晶层。本发明使得可以提供使用Pt作为电极材料的电介质元件，其能够容易地形成能够形成精细图案的电气特性优异的Pt电极而不产生空隙或接缝，并且不在处理室中发生污染，以及具有上述特征的制造电介质元件的方法。

8. 发明申请

US20090029893A1 Cleaning Liquid For Lithography and Cleaning Method Using Same 有权
标题翻译：用于平版印刷的清洁液和使用其的清洁方法
公开(公告)号：US20090029893A1
公开(公告)日：2009-01-29
申请号：US12224300
申请日：2007-02-14
申请人： Jun Koshiyama , Hideya Kobari
发明人： Jun Koshiyama , Hideya Kobari
IPC分类号： G03F7/00
CPC分类号： G03F7/422 , C11D7/5022 , C11D11/0047 , G03F7/2041 , H01L21/02087
摘要： Disclosed is a cleaning liquid for lithography which is characterized by containing a mixed organic solvent which is obtained by mixing (A) at least one solvent selected from ketone organic solvents and glycol ether organic solvents, (B) at least one solvent selected from lactone organic solvents and (C) at least one solvent selected from alkoxy benzenes and aromatic alcohols. This cleaning liquid is highly safe and does not have adverse effects on the environment or the human body, while having basic characteristics necessary for a cleaning liquid for lithography. In addition, this cleaning liquid can be stably supplied at low cost.
摘要翻译：公开了一种用于光刻的清洗液，其特征在于含有混合的有机溶剂，其通过混合（A）至少一种选自酮有机溶剂和二醇醚有机溶剂的溶剂，（B）至少一种选自内酯有机溶剂的溶剂溶剂和（C）至少一种选自烷氧基苯和芳族醇的溶剂。该清洗液高度安全，对环境或人体没有不利影响，同时具有光刻用清洗液所需的基本特性。此外，可以以低成本稳定地供给该清洗液。

9. 发明申请

US20080114115A1 Composition for forming coating and coating formed of composition 审中-公开
标题翻译：用于形成由组合物形成的涂层和涂层的组合物
公开(公告)号：US20080114115A1
公开(公告)日：2008-05-15
申请号：US11979434
申请日：2007-11-02
申请人： Hiroyuki Iida , Hideya Kobari
发明人： Hiroyuki Iida , Hideya Kobari
IPC分类号： C08K3/08 , C08L83/04
CPC分类号： C09D183/04
摘要： A composition for forming a coating in accordance with the present invention includes a siloxane polymer obtained by hydrolyzing and condensing a silane compound containing an alkoxysilane compound represented by general formula (1) below R1nSi(OR2)4-n (1) (where R1 represents an organic group having 1 to 20 carbon atoms, R2 represents an alkyl group having 1 to 4 carbon atoms, and n represents either 1 or 2).A molar fraction of the alkoxysilane compound, represented by general formula (1), in the silane compound is 0.5 or above. The foregoing realizes a composition for forming a coating, which composition allows formation of a silica base coating that is lowered in dielectric constant and improved in mechanical strength and electric properties.
摘要翻译：根据本发明的用于形成涂层的组合物包括通过水解和缩合含有通式（1）表示的烷氧基硅烷化合物的硅烷化合物得到的硅氧烷聚合物，其中<？in-line-formula description =“In-Line Formula “end =”lead“？> 1 n（1） <？in-line-formula description =“In-line Formulas”end =“tail”？>（其中R 1表示具有1至20个碳原子的有机基团，R 2， / SUP>表示具有1至4个碳原子的烷基，n表示1或2）。硅烷化合物中由通式（1）表示的烷氧基硅烷化合物的摩尔分数为0.5以上。上述实现了用于形成涂层的组合物，该组合物允许形成介电常数降低且机械强度和电特性提高的二氧化硅基底涂层。

10. 发明授权

US06597027B1 Dielectric element and method for fabricating the same 失效
标题翻译：介电元件及其制造方法
公开(公告)号：US06597027B1
公开(公告)日：2003-07-22
申请号：US09709423
申请日：2000-11-13
申请人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
发明人： Akira Hashimoto , Yoshimi Sato , Atsushi Kawakami , Hideya Kobari , Tetsuya Nakajima
IPC分类号： H01L2100
CPC分类号： H01L28/75 , H01L28/55 , Y10S438/957
摘要： It is disclosed a dielectric element comprising a lower electrode, a dielectric layer, and an upper electrode which are provided on a substrate, in which at least one of the electrodes is a Pt layer, a Ru layer is used as a base layer for the Pt layer. In the fabrication of the dielectric element, the Pt layer is formed by electroplating, a photoresist pattern is used as a plating mask, and an Ru layer is formed as a seed layer. The present invention makes it possible to provide a dielectric element using Pt as an electrode material, that is capable of easily forming a Pt electrode having excellent electrical characteristics without generating voids or seams, that is capable of forming a fine pattern, and that does not occur contamination in a processing chamber, and a method for fabricating a dielectric element of having the characteristics mentioned above.
摘要翻译：公开了一种介电元件，其包括设置在基板上的下电极，电介质层和上电极，其中至少一个电极为Pt层，Ru层用作基极层 Pt层。在电介质元件的制造中，通过电镀形成Pt层，使用光致抗蚀剂图案作为电镀掩模，并且形成Ru层作为籽晶层。本发明使得可以提供使用Pt作为电极材料的电介质元件，其能够容易地形成能够形成精细图案的电气特性优异的Pt电极而不产生空隙或接缝，并且不在处理室中发生污染，以及具有上述特征的制造电介质元件的方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式