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1. 发明授权

US5238713A Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means 失效
标题翻译：用于将涂料施加到基材上的旋涂方法和装置，包括气流显影和引导步骤/装置
公开(公告)号：US5238713A
公开(公告)日：1993-08-24
申请号：US792635
申请日：1991-11-15
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
IPC分类号： H01L21/00
CPC分类号： H01L21/6715
摘要： A coating apparatus comprises a spinning chuck rotatably supported within an enclosure and securely holding a substrate thereon. A coating material is applied onto the surface of the substrate and distributed over the substrate by centrifugal forces. An annular air duct is disposed in surrounding and spaced relation to the spinning chuck, and a disk is placed between the air duct and the spinning chuck and has a plurality of guide vanes. Fans are provided in the air duct to develop a positive flow of air over the substrate. The flow of air is guided by the guide vanes in a direction identical to the direction of rotation of the substrate so as to eliminate undesirable deposition from the end edges of the substrate.
摘要翻译：涂布装置包括旋转支撑在外壳内的旋转卡盘，并且可靠地保持基板。将涂料施加到基材的表面上并通过离心力分布在基材上。环形空气管道与旋转卡盘相对设置成围绕和间隔的关系，并且盘被放置在空气管道和旋转卡盘之间并具有多个导向叶片。风扇设置在空气管道中以在衬底上形成正的空气流。空气的流动由导向叶片沿与基板的旋转方向相同的方向引导，以消除从基板的端部边缘的不期望的沉积。

2. 发明授权

US5571324A Rotary-cup coating apparatus 失效
标题翻译：旋转杯涂装置
公开(公告)号：US5571324A
公开(公告)日：1996-11-05
申请号：US277903
申请日：1994-07-20
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo
IPC分类号： B05C11/08 , C23C4/12 , H01L21/00 , H01L21/027 , B05B13/04
CPC分类号： H01L21/6715 , B05C11/08 , C23C4/123
摘要： When a cylinder unit is actuated to extent its rod upwardly, a chuck is lifted above an inner cup to receive a planar workpiece such as a semiconductor wafer or a glass substrate. The chuck is now disengaged from the inner cup, and a stopper locks the chuck against rotation. After the planar workpiece has been supported on the chuck, the cylinder unit is actuated to retract its rod, bringing the chuck into its lowered position. The chuck is now engaged by the inner cup for corotation. Energization of a motor rotates the inner cup, which then rotates the chuck. Since the inner cup, which has a relatively large rotational inertia, is driven by the motor, interengaging portions of the inner cup and the chuck are less susceptible to damage.
摘要翻译：当气缸单元被致动以将其杆向上延伸时，卡盘被提升到内杯上方以接收诸如半导体晶片或玻璃基板的平面工件。卡盘现在与内杯分离，止动器锁定卡盘以防旋转。在平面工件被支撑在卡盘上之后，气缸单元被致动以缩回其杆，使卡盘进入其下降位置。卡盘现在由内杯接合以进行共转化。电动机的通电使内杯旋转，然后旋转卡盘。由于具有相对较大转动惯量的内杯由电动机驱动，所以内杯和卡盘的相互接合部分不易受到损坏。

3. 发明授权

US5116250A Method and apparatus for applying a coating material to a substrate 失效
标题翻译：将涂料施加于基材的方法和装置
公开(公告)号：US5116250A
公开(公告)日：1992-05-26
申请号：US246403
申请日：1988-09-19
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
IPC分类号： B05C11/08 , B05D1/40 , G03F7/16 , H01L21/00 , H01L21/027 , H01L21/30
CPC分类号： H01L21/6715
摘要： A coating apparatus comprises a spinning chuck rotatably supported within an enclosure and securely holding a substrate thereon. A coating material is applied onto the surface of the substrate and distributed over the substrate by centrifugal forces. An annular air duct is disposed in surrounding and spaced relation to the spinning chuck, and a disk is placed between the air duct and the spinning chuck and has a plurality of guide vanes. Fans are provided in the air duct to develop a positive flow of air over the substrate. The flow of air is guided by the guide vanes in a direction identical to the direction of rotation of the substrate so as to eliminate undesirable deposition from the end edges of the substrate.
摘要翻译：涂布装置包括旋转支撑在外壳内的旋转卡盘，并且可靠地保持基板。将涂料施加到基材的表面上并通过离心力分布在基材上。环形空气管道与旋转卡盘相对设置成围绕和间隔的关系，并且盘被放置在空气管道和旋转卡盘之间并具有多个导向叶片。风扇设置在空气管道中以在衬底上形成正的空气流。空气的流动由导向叶片沿与基板的旋转方向相同的方向引导，以消除从基板的端部边缘的不期望的沉积。

4. 发明授权

US4941426A Thin-film coating apparatus 失效
标题翻译：薄膜涂装设备
公开(公告)号：US4941426A
公开(公告)日：1990-07-17
申请号：US245464
申请日：1988-09-16
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
IPC分类号： B05C11/08 , G03F7/16
CPC分类号： B05C11/08 , G03F7/162
摘要： A thin-film coating apparatus rotates a member on which a coating solution is dropped to spread the coating solution over the member. The thin-film coating apparatus comprises a spinner for securely supporting the member, a casing firmly attached to the spinner in surrounding relation to the spinner and the member, and a lid for closing an opening in the casing through which the member can be brought into and out of the casing, thereby defining a closed processing chamber in the casing.
摘要翻译：薄膜涂布装置使涂布溶液滴落的部件旋转，将涂布液涂布在部件上。薄膜涂布装置包括用于牢固地支撑构件的旋转器，围绕旋转器和构件牢固地附接到旋转器的壳体，以及用于封闭壳体中的开口的盖子，通过该盖子可以使构件进入并且从外壳中出来，从而在壳体中限定一个封闭的处理室。

5. 发明授权

US5332557A Heating apparatus 失效
标题翻译：加热装置
公开(公告)号：US5332557A
公开(公告)日：1994-07-26
申请号：US5602
申请日：1993-01-19
申请人： Tsutomu Sahoda , Hideyuki Mizuki , Hidenori Miyamoto , Hisashi Hori , Hiroyoshi Sago
发明人： Tsutomu Sahoda , Hideyuki Mizuki , Hidenori Miyamoto , Hisashi Hori , Hiroyoshi Sago
IPC分类号： B01J19/00 , C03C17/25 , C23C18/12 , G05D23/22 , H01L21/00 , H01L21/324 , H01L21/677 , F28D21/00 , G05D23/19 , H05H1/24
CPC分类号： H01L21/67757 , G05D23/1934 , G05D23/22 , H01L21/67115 , Y10S422/906
摘要： A plurality of workpieces are supported on a workpiece holder disposed over an opening defined in a horizontal base plate and connected to an evacuating device. A reaction chamber, which is supported on an arm of a lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber. A heating device, which is supported on an arm of another lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the heating device surrounds the reaction chamber and a lifted position in which the reaction chamber is exposed out of the heating device.
摘要翻译：多个工件被支撑在设置在水平基板中限定的开口上并连接到抽空装置的工件保持件上。支撑在提升和降低装置的臂上的反应室可在下降位置之间相对于基板垂直移动，其中反应室限定容纳工件的封闭空间和提升位置，工件暴露在反应室外。支撑在另一升降装置的臂上的加热装置可相对于基板垂直移动，该下降位置在加热装置围绕反应室的下降位置和反应室暴露于其中的提升位置之间离开加热装置。

6. 发明授权

US4790262A Thin-film coating apparatus 失效
标题翻译：薄膜涂装设备
公开(公告)号：US4790262A
公开(公告)日：1988-12-13
申请号：US914328
申请日：1986-10-01
申请人： Muneo Nakayama , Akira Uehara , Hiroyoshi Sago , Hideyuki Mizuki
发明人： Muneo Nakayama , Akira Uehara , Hiroyoshi Sago , Hideyuki Mizuki
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/027
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A thin-film coating apparatus for coating a thin film on a material includes a casing, a spinner mounted in the casing for rotating the material, and a pipe disposed upwardly of the spinner and having in a lower end thereof a nozzle for dropping a film-forming coating solution onto the material. The casing comprises an annular upper plate, a cylindrical circumferential wall, and a bottom plate. The annular upper plate has defined therein gas flow passages for passage of an inert gas such as an N.sub.2 gas introduced from an exterior supply source, and gas ejector holes defined in the upper surface of the annular upper plate in communication with the gas flow passages for ejecting the inert gas toward the pipe.
摘要翻译：用于在材料上涂覆薄膜的薄膜涂布装置包括壳体，安装在壳体中用于旋转材料的旋转器和设置在旋转器的上方的管，并且在其下端具有用于滴下薄膜的喷嘴形成涂层溶液。壳体包括环形上板，圆柱形周壁和底板。环形上板限定有用于通过诸如从外部供应源引入的N 2气体的惰性气体的气体流动通道和限定在环形上板的上表面中的与气体流动通道连通的气体排出孔，向管道喷射惰性气体。

7. 发明授权

US5349978A Cleaning device for cleaning planar workpiece 失效
标题翻译：用于清洁平面工件的清洁装置
公开(公告)号：US5349978A
公开(公告)日：1994-09-27
申请号：US72142
申请日：1993-06-04
申请人： Hiroyoshi Sago , Shigemi Fujiyama , Katsuhiko Kudo , Hirotsugu Kumazawa
发明人： Hiroyoshi Sago , Shigemi Fujiyama , Katsuhiko Kudo , Hirotsugu Kumazawa
IPC分类号： H01L21/304 , B08B3/02 , H01L21/027
CPC分类号： B08B3/02 , Y10S134/902
摘要： A cleaning device has a pair of diametrically opposite nozzles spaced across a rotatable chuck from each other for alternately applying a cleaning solution to the reverse side of a workpiece. The rotatable chuck with the workpiece held thereon is rotated by a reversible motor alternatively in opposite directions such that the cleaning solution is ejected from one of the nozzles while the rotatable chuck is being rotated in one of the opposite directions by the reversible motor, and the cleaning solution is ejected from the other of the nozzles while the rotatable chuck is being rotated in the other of the opposite directions by the reversible motor. The nozzles have respective axes along which the cleaning solution is ejected, the axes extending symmetrically with respect to a line passing through the center of the rotatable chuck perpendicularly to a line connecting the pair of nozzles.
摘要翻译：清洁装置具有一对直径相对的喷嘴，其间隔着可旋转卡盘彼此隔开，以将清洁溶液交替地施加到工件的相反侧。保持其上的工件的可旋转卡盘通过可逆的马达以相反的方向交替地旋转，使得当可旋转卡盘通过可逆马达在相反的方向上旋转时，清洁溶液从其中一个喷嘴喷射，并且清洁溶液从另一个喷嘴喷射，同时可逆卡盘通过可逆马达在相反方向上的另一个旋转。喷嘴具有各自的轴线，清洁溶液沿着该轴线排出，轴线相对于穿过可旋转卡盘的中心的线对称延伸，垂直于连接该对喷嘴的线。

8. 发明授权

US5415691A Solution coating apparatus 失效
标题翻译：溶液涂布装置
公开(公告)号：US5415691A
公开(公告)日：1995-05-16
申请号：US994364
申请日：1992-12-21
申请人： Shigemi Fujiyama , Kazunobu Yamaguchi , Hiroyoshi Sago
发明人： Shigemi Fujiyama , Kazunobu Yamaguchi , Hiroyoshi Sago
IPC分类号： B05C11/08 , G03F7/16 , H01L21/027 , H01L21/30 , B05C5/00 , B05C11/02 , B05C13/02
CPC分类号： G03F7/162 , Y10T279/11
摘要： A glass substrate is supported on a pedestal in a rotatable cup having an upper opening. The pedestal, which is substantially similar in shape to the glass substrate, has a ridge extending along an outer peripheral edge of an upper surface thereof, for engaging an outer peripheral edge of a lower surface of the glass substrate. After a resist solution to be coated on the glass substrate is applied to an upper surface thereof, the upper opening of the rotatable cup is closed by a cover, and then the rotatable cup is rotated to spread the applied resist solution uniformly over the upper surface under centrifugal forces. In one embodiment, the apparatus comprises an inner rotatable cup and an outer rotatable cup, each with its own separate cover. In another embodiment, a pedestal is mounted on the bottom of the inner cup having a vacuum chuck movable therein. In a third embodiment, a flow-rectifying plate is mounted on the lower surface of the cover whereby fluid from nozzles is ejected onto the upper surface of the flow rectifying plate and then into the cup.
摘要翻译：玻璃基板支撑在具有上开口的可旋转杯中的基座上。与玻璃基板基本相似的基座具有沿其上表面的外周缘延伸的脊，用于接合玻璃基板的下表面的外周边缘。将待涂覆在玻璃基板上的抗蚀剂溶液施加到其上表面之后，可旋转杯的上部开口由盖封闭，然后可旋转杯旋转以将涂覆的抗蚀剂溶液均匀地铺展在上表面上在离心力下。在一个实施例中，该装置包括内部可旋转杯和外部可旋转杯，每个具有其独立的罩。在另一个实施例中，底座安装在内杯的底部上，其具有可在其中移动的真空吸盘。在第三实施例中，整流板安装在盖的下表面上，由此将来自喷嘴的流体喷射到整流板的上表面上，然后进入杯中。

9. 发明授权

US06436472B1 Method of applying a coating solution to a substrate surface using a rotary coater 失效
标题翻译：使用旋转涂布机将涂布液涂布在基材表面上的方法
公开(公告)号：US06436472B1
公开(公告)日：2002-08-20
申请号：US08825256
申请日：1997-03-27
申请人： Hiroyoshi Sago , Shigemi Fujiyama , Futoshi Shimai , Akira Uehara
发明人： Hiroyoshi Sago , Shigemi Fujiyama , Futoshi Shimai , Akira Uehara
IPC分类号： B05D312
CPC分类号： H01L21/6715
摘要： A slit nozzle is positioned above an end of a glass substrate placed in an inner cup, and, while a coating solution is being ejected with reduced surface tension from the slit nozzle toward the glass substrate, the slit nozzle is translated parallel to the surface of the glass substrate to roughly coat the coating solution on substantially the entire surface of the glass substrate. Thereafter, the upper opening of the inner cup and the upper opening of an outer cup around the inner cup are closed by respective lids, and then the inner cup is rotated to rotate the glass substrate for thereby spreading the coated solution uniformly over the surface of the glass substrate under centrifugal forces.
摘要翻译：狭缝喷嘴位于放置在内杯中的玻璃基板的端部的上方，并且当从狭缝喷嘴朝向玻璃基板喷射具有降低的表面张力的涂布溶液时，狭缝喷嘴平行于所述玻璃基板在所述玻璃基板的基本上整个表面上大致涂覆所述涂布溶液。此后，内杯的上部开口和内杯周围的外杯的上部开口由相应的盖封闭，然后内杯旋转以旋转玻璃基板，从而将涂覆的溶液均匀地铺展在玻璃基板在离心力下。

10. 发明授权

US5439519A Solution applying apparatus 失效
标题翻译：解决方案应用设备
公开(公告)号：US5439519A
公开(公告)日：1995-08-08
申请号：US176204
申请日：1994-01-03
申请人： Hiroyoshi Sago , Hirotsugu Kumazawa , Futoshi Shimai , Shigemi Fujiyama , Hiroki Endo , Hideya Kobari
发明人： Hiroyoshi Sago , Hirotsugu Kumazawa , Futoshi Shimai , Shigemi Fujiyama , Hiroki Endo , Hideya Kobari
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , B05C11/02 , B05C5/00
CPC分类号： H01L21/6715 , B05C11/08 , G03F7/162
摘要： A solution applying apparatus has inner and outer cups each having an upper opening, the inner cup being rotatably disposed in the outer cup. The inner cup houses a planar workpiece such as a glass substrate therein which is to be coated with a coating solution such as a resist solution. The solution applying apparatus also has a lid assembly having an outer cup lid for closing the upper opening of the outer cup and an inner cup lid for closing the upper opening of the inner cup, the inner cup lid being rotatable with respect to the outer cup lid. The inner cup has drain holes defined in an outer circumferential portion thereof for providing communication between a space within the inner cup and a space outside of the inner cup to drain an excessive coating solution from the inner cup. The outer cup has an annular collection passage defined therein along the outer circumferential portion of the inner cup, the drain holes opening into the annular collection passage. The lid assembly includes a self-centering valve body that can be vertically movable into and out of snugly fitting relation to a through hole defined in the inner cup lid and a lost motion mechanism for moving the valve body to an open position thereof while the first and second cup lids remain closed and for opening the outer cup lid while the inner cup lid remains closed. After the workpiece has been coated with the coating solution, the valve body is lifted out of the through hole to smoothly eliminate a vacuum developed in the inner cup, and then the inner cup is opened.
摘要翻译：溶液施加装置具有各自具有上开口的内杯和外杯，内杯可旋转地设置在外杯中。内杯容纳有诸如抗蚀剂溶液等涂布溶液的平面状的工件，例如玻璃基板。溶液施加装置还具有盖组件，其具有用于封闭外杯的上开口的外杯盖和用于封闭内杯的上开口的内杯盖，内杯盖可相对于外杯旋转盖。内杯具有限定在其外圆周部分中的排水孔，用于提供内杯内的空间和内杯外部的空间之间的连通，以从内杯排出过量的涂层溶液。外杯具有沿着内杯的外圆周部分限定在其中的环形收集通道，排出孔通向环形收集通道。盖组件包括自定心阀体，其可以垂直移动进入和离开与内杯盖中限定的通孔的紧密配合关系，以及用于将阀体移动到其打开位置的空动机构，而第一并且第二杯盖保持关闭并且在内杯盖保持关闭时打开外杯盖。在工件被涂布溶液之后，将阀体从通孔中提出，以平滑地消除在内杯中显影的真空，然后打开内杯。

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