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1. 发明授权

US5116250A Method and apparatus for applying a coating material to a substrate 失效
标题翻译：将涂料施加于基材的方法和装置
公开(公告)号：US5116250A
公开(公告)日：1992-05-26
申请号：US246403
申请日：1988-09-19
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
IPC分类号： B05C11/08 , B05D1/40 , G03F7/16 , H01L21/00 , H01L21/027 , H01L21/30
CPC分类号： H01L21/6715
摘要： A coating apparatus comprises a spinning chuck rotatably supported within an enclosure and securely holding a substrate thereon. A coating material is applied onto the surface of the substrate and distributed over the substrate by centrifugal forces. An annular air duct is disposed in surrounding and spaced relation to the spinning chuck, and a disk is placed between the air duct and the spinning chuck and has a plurality of guide vanes. Fans are provided in the air duct to develop a positive flow of air over the substrate. The flow of air is guided by the guide vanes in a direction identical to the direction of rotation of the substrate so as to eliminate undesirable deposition from the end edges of the substrate.
摘要翻译：涂布装置包括旋转支撑在外壳内的旋转卡盘，并且可靠地保持基板。将涂料施加到基材的表面上并通过离心力分布在基材上。环形空气管道与旋转卡盘相对设置成围绕和间隔的关系，并且盘被放置在空气管道和旋转卡盘之间并具有多个导向叶片。风扇设置在空气管道中以在衬底上形成正的空气流。空气的流动由导向叶片沿与基板的旋转方向相同的方向引导，以消除从基板的端部边缘的不期望的沉积。

2. 发明授权

US4941426A Thin-film coating apparatus 失效
标题翻译：薄膜涂装设备
公开(公告)号：US4941426A
公开(公告)日：1990-07-17
申请号：US245464
申请日：1988-09-16
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
IPC分类号： B05C11/08 , G03F7/16
CPC分类号： B05C11/08 , G03F7/162
摘要： A thin-film coating apparatus rotates a member on which a coating solution is dropped to spread the coating solution over the member. The thin-film coating apparatus comprises a spinner for securely supporting the member, a casing firmly attached to the spinner in surrounding relation to the spinner and the member, and a lid for closing an opening in the casing through which the member can be brought into and out of the casing, thereby defining a closed processing chamber in the casing.
摘要翻译：薄膜涂布装置使涂布溶液滴落的部件旋转，将涂布液涂布在部件上。薄膜涂布装置包括用于牢固地支撑构件的旋转器，围绕旋转器和构件牢固地附接到旋转器的壳体，以及用于封闭壳体中的开口的盖子，通过该盖子可以使构件进入并且从外壳中出来，从而在壳体中限定一个封闭的处理室。

3. 发明授权

US5571324A Rotary-cup coating apparatus 失效
标题翻译：旋转杯涂装置
公开(公告)号：US5571324A
公开(公告)日：1996-11-05
申请号：US277903
申请日：1994-07-20
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo
IPC分类号： B05C11/08 , C23C4/12 , H01L21/00 , H01L21/027 , B05B13/04
CPC分类号： H01L21/6715 , B05C11/08 , C23C4/123
摘要： When a cylinder unit is actuated to extent its rod upwardly, a chuck is lifted above an inner cup to receive a planar workpiece such as a semiconductor wafer or a glass substrate. The chuck is now disengaged from the inner cup, and a stopper locks the chuck against rotation. After the planar workpiece has been supported on the chuck, the cylinder unit is actuated to retract its rod, bringing the chuck into its lowered position. The chuck is now engaged by the inner cup for corotation. Energization of a motor rotates the inner cup, which then rotates the chuck. Since the inner cup, which has a relatively large rotational inertia, is driven by the motor, interengaging portions of the inner cup and the chuck are less susceptible to damage.
摘要翻译：当气缸单元被致动以将其杆向上延伸时，卡盘被提升到内杯上方以接收诸如半导体晶片或玻璃基板的平面工件。卡盘现在与内杯分离，止动器锁定卡盘以防旋转。在平面工件被支撑在卡盘上之后，气缸单元被致动以缩回其杆，使卡盘进入其下降位置。卡盘现在由内杯接合以进行共转化。电动机的通电使内杯旋转，然后旋转卡盘。由于具有相对较大转动惯量的内杯由电动机驱动，所以内杯和卡盘的相互接合部分不易受到损坏。

4. 发明授权

US5238713A Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means 失效
标题翻译：用于将涂料施加到基材上的旋涂方法和装置，包括气流显影和引导步骤/装置
公开(公告)号：US5238713A
公开(公告)日：1993-08-24
申请号：US792635
申请日：1991-11-15
申请人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
发明人： Hiroyoshi Sago , Hideyuki Mizuki , Katsuhiko Kudo , Muneo Nakayama
IPC分类号： H01L21/00
CPC分类号： H01L21/6715
摘要： A coating apparatus comprises a spinning chuck rotatably supported within an enclosure and securely holding a substrate thereon. A coating material is applied onto the surface of the substrate and distributed over the substrate by centrifugal forces. An annular air duct is disposed in surrounding and spaced relation to the spinning chuck, and a disk is placed between the air duct and the spinning chuck and has a plurality of guide vanes. Fans are provided in the air duct to develop a positive flow of air over the substrate. The flow of air is guided by the guide vanes in a direction identical to the direction of rotation of the substrate so as to eliminate undesirable deposition from the end edges of the substrate.
摘要翻译：涂布装置包括旋转支撑在外壳内的旋转卡盘，并且可靠地保持基板。将涂料施加到基材的表面上并通过离心力分布在基材上。环形空气管道与旋转卡盘相对设置成围绕和间隔的关系，并且盘被放置在空气管道和旋转卡盘之间并具有多个导向叶片。风扇设置在空气管道中以在衬底上形成正的空气流。空气的流动由导向叶片沿与基板的旋转方向相同的方向引导，以消除从基板的端部边缘的不期望的沉积。

5. 发明授权

US5332557A Heating apparatus 失效
标题翻译：加热装置
公开(公告)号：US5332557A
公开(公告)日：1994-07-26
申请号：US5602
申请日：1993-01-19
申请人： Tsutomu Sahoda , Hideyuki Mizuki , Hidenori Miyamoto , Hisashi Hori , Hiroyoshi Sago
发明人： Tsutomu Sahoda , Hideyuki Mizuki , Hidenori Miyamoto , Hisashi Hori , Hiroyoshi Sago
IPC分类号： B01J19/00 , C03C17/25 , C23C18/12 , G05D23/22 , H01L21/00 , H01L21/324 , H01L21/677 , F28D21/00 , G05D23/19 , H05H1/24
CPC分类号： H01L21/67757 , G05D23/1934 , G05D23/22 , H01L21/67115 , Y10S422/906
摘要： A plurality of workpieces are supported on a workpiece holder disposed over an opening defined in a horizontal base plate and connected to an evacuating device. A reaction chamber, which is supported on an arm of a lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the reaction chamber defines a closed space which accommodates the workpieces therein and a lifted position in which the workpieces are exposed out of the reaction chamber. A heating device, which is supported on an arm of another lifting and lowering device, is vertically movable with respect to the base plate between a lowered position in which the heating device surrounds the reaction chamber and a lifted position in which the reaction chamber is exposed out of the heating device.
摘要翻译：多个工件被支撑在设置在水平基板中限定的开口上并连接到抽空装置的工件保持件上。支撑在提升和降低装置的臂上的反应室可在下降位置之间相对于基板垂直移动，其中反应室限定容纳工件的封闭空间和提升位置，工件暴露在反应室外。支撑在另一升降装置的臂上的加热装置可相对于基板垂直移动，该下降位置在加热装置围绕反应室的下降位置和反应室暴露于其中的提升位置之间离开加热装置。

6. 发明授权

US4790262A Thin-film coating apparatus 失效
标题翻译：薄膜涂装设备
公开(公告)号：US4790262A
公开(公告)日：1988-12-13
申请号：US914328
申请日：1986-10-01
申请人： Muneo Nakayama , Akira Uehara , Hiroyoshi Sago , Hideyuki Mizuki
发明人： Muneo Nakayama , Akira Uehara , Hiroyoshi Sago , Hideyuki Mizuki
IPC分类号： B05C11/08 , G03F7/16 , H01L21/00 , H01L21/027
CPC分类号： H01L21/6715 , G03F7/162 , Y10S134/902
摘要： A thin-film coating apparatus for coating a thin film on a material includes a casing, a spinner mounted in the casing for rotating the material, and a pipe disposed upwardly of the spinner and having in a lower end thereof a nozzle for dropping a film-forming coating solution onto the material. The casing comprises an annular upper plate, a cylindrical circumferential wall, and a bottom plate. The annular upper plate has defined therein gas flow passages for passage of an inert gas such as an N.sub.2 gas introduced from an exterior supply source, and gas ejector holes defined in the upper surface of the annular upper plate in communication with the gas flow passages for ejecting the inert gas toward the pipe.
摘要翻译：用于在材料上涂覆薄膜的薄膜涂布装置包括壳体，安装在壳体中用于旋转材料的旋转器和设置在旋转器的上方的管，并且在其下端具有用于滴下薄膜的喷嘴形成涂层溶液。壳体包括环形上板，圆柱形周壁和底板。环形上板限定有用于通过诸如从外部供应源引入的N 2气体的惰性气体的气体流动通道和限定在环形上板的上表面中的与气体流动通道连通的气体排出孔，向管道喷射惰性气体。

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