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1. 发明授权

US4515365A Device for measuring swing data of baseball bat 失效
标题翻译：用于测量棒球棒摇摆数据的装置
公开(公告)号：US4515365A
公开(公告)日：1985-05-07
申请号：US592456
申请日：1984-03-22
申请人： Hiroshi Horikoshi , Akio Arai , Sadayuki Tsukagoshi , Junichi Sakamoto
发明人： Hiroshi Horikoshi , Akio Arai , Sadayuki Tsukagoshi , Junichi Sakamoto
IPC分类号： A63B69/00 , A63B71/02
CPC分类号： A63B69/0002
摘要： Apparatus for measuring and analyzing the swing of a baseball player. The apparatus includes devices for emitting a plurality of spaced light beams projected in directions to be intersected by the swing plane of a bat and a corresponding plurality of light receiving elements arranged to receive light beams reflected from the bat. Signals received by the light receiving elements are collected and supplied to a processing apparatus and the results of this processing are displayed on a display unit which provides indication of angle, speed, level, etc. of the swing. The information may also be provided to a printer. The apparatus indicates whether the swing is performed normally and if it deviates from normal indicates the error involved.
摘要翻译：用于测量和分析棒球运动员的摆动的装置。该装置包括用于发射多个间隔开的光束的装置，该多个间隔光束在与蝙蝠的摆动平面相交的方向上投射，以及对应的多个光接收元件，被布置成接收从蝙蝠反射的光束。由光接收元件接收的信号被收集并提供给处理设备，并且该处理的结果被显示在提供挥杆的角度，速度，等级等的指示的显示单元上。该信息也可以提供给打印机。该装置指示摆动是否正常进行，如果它偏离正常指示所涉及的错误。

2. 发明授权

US08492695B2 Solid-state image pickup apparatus having improved spectral balance 有权
标题翻译：具有改善的光谱平衡的固态图像拾取装置
公开(公告)号：US08492695B2
公开(公告)日：2013-07-23
申请号：US12660728
申请日：2010-03-03
申请人： Hiroshi Horikoshi , Koji Kikuchi , Tomohiro Yamazaki
发明人： Hiroshi Horikoshi , Koji Kikuchi , Tomohiro Yamazaki
IPC分类号： H01L27/00 , H01L31/0232
CPC分类号： H01L27/14685 , H01L27/14621 , H01L27/14625 , H01L27/14627 , H01L27/14629 , H01L27/14636 , H01L27/14645
摘要： A solid-state image pickup apparatus includes a substrate, a wiring layer, and a waveguide. The substrate is provided with a pixel array portion constituted of a plurality of pixels each having a photoelectric converter that converts incident light into an electrical signal. The wiring layer includes a plurality of wirings and an insulating layer that covers the plurality of wirings that are laminated above the substrate. The waveguide guides light to each of the photoelectric converters of the plurality of pixels, the waveguide being formed in the wiring layer. The waveguide is formed to have a waveguide exit end from which light exits the waveguide so that a distance between the waveguide exit end and a surface of the photoelectric converter that receives light from the waveguide become shorter, as wavelengths of light guided by the waveguide are longer.
摘要翻译：固体摄像装置包括基板，布线层和波导管。基板设置有由多个像素构成的像素阵列部分，每个像素具有将入射光转换成电信号的光电转换器。布线层包括多个布线和覆盖层叠在基板上方的多个布线的绝缘层。波导将光引导到多个像素中的每个光电转换器，波导形成在布线层中。波导形成为具有波导出口端，光从该波导出口离开波导，使得波导出口端和接收来自波导的光的光电转换器的表面之间的距离变短，因为由波导引导的光的波长为更长

3. 发明申请

US20100130661A1 RESIN COMPOSITION FOR OPTICAL MEMBER AND OPTICAL MEMBER OBTAINED FROM THE SAME 有权
标题翻译：用于光学部件和从其获得的光学部件的树脂组合物
公开(公告)号：US20100130661A1
公开(公告)日：2010-05-27
申请号：US12529918
申请日：2008-03-11
申请人： Motoharu Takeuchi , Hiroshi Horikoshi , Hiroaki Tanaka , Hirohito Ishizuka
发明人： Motoharu Takeuchi , Hiroshi Horikoshi , Hiroaki Tanaka , Hirohito Ishizuka
IPC分类号： C08K3/30
CPC分类号： C08F12/30 , C08F212/08 , C08F212/14 , C08F212/36 , C08F216/1466 , C08F220/38 , C08F2222/1013 , C08G75/08 , G02B1/04 , C08L81/00
摘要： The present invention can provide a composition for optical members, which contains (a) a compound having one or more of any group selected from the group consisting of an acryloyl group, a methacryloyl group, an allyl group and a vinyl group and one or more β-epithiopropyl groups in a molecule. In a preferable embodiment of the present invention, the composition for optical members further contains at least one compound selected from (b) a compound having one or more β-epithiopropyl groups in a molecule while having no polymerizable unsaturated bond group, (c) an inorganic compound having a sulfur atom and/or a selenium atom, (d) a compound having one or more thiol groups in a molecule, (e) a compound having one or more amino groups in a molecule while having no heterocyclic ring, and (f) a compound having one or more of at least one group selected from the group consisting of a vinyl group, an acryloyl group, a methacryloyl group and an allyl group in a molecule.
摘要翻译：本发明可以提供一种光学部件用组合物，其含有（a）具有选自丙烯酰基，甲基丙烯酰基，烯丙基和乙烯基中的一个或多个的一种或多种的化合物和一种或多种一个分子中的β-二硫丙基。在本发明的优选实施方案中，用于光学部件的组合物还含有至少一种选自（b）分子中具有一个或多个β-伯硫丙基的化合物中的化合物，同时不具有可聚合的不饱和键基，（c）具有硫原子和/或硒原子的无机化合物，（d）分子中具有一个或多个硫醇基的化合物，（e）分子中具有一个或多个氨基但不具有杂环的化合物，以及（f）在分子中具有一个或多个选自乙烯基，丙烯酰基，甲基丙烯酰基和烯丙基中的至少一个基团的化合物。

4. 发明授权

US07446163B2 Polymerization regulator and composition for resin 有权
标题翻译：聚合调节剂和树脂组合物
公开(公告)号：US07446163B2
公开(公告)日：2008-11-04
申请号：US11189859
申请日：2005-07-27
申请人： Masaki Tamura , Takahiro Matsui , Masanori Shimuta , Yuichi Yoshimura , Motoharu Takeuchi , Hiroshi Horikoshi , Hiroyuki Okada
发明人： Masaki Tamura , Takahiro Matsui , Masanori Shimuta , Yuichi Yoshimura , Motoharu Takeuchi , Hiroshi Horikoshi , Hiroyuki Okada
IPC分类号： C08G75/08
CPC分类号： C08G75/08 , C07D331/02
摘要： In the present invention, an episulfide compound having, in one molecule, at least one epithio structure represented by the following Formula 2: wherein R5 is C1-C10 hydrocarbylene or single bond, R6, R7 and R8 are each independently C1-C10 hydrocarbyl or hydrogen, Y is O, S, Se or Te, p is an integer from 1 to 5 and q is an integer from 0 to 5, is polymerized in the presence of a halide of a 13-16 group element of the long periodic table and/or a polymerization regulator represented by the following Formula 1: wherein R1, R2 and R3 are each C1-C10 hydrocarbyl or hydrogen, R4 is C1-C10 hydrocarbylene or single bond, X is F, Cl, Br, I, As, SH, OH, C1-C10 alkoxyl, C1-C10 alkylthio, or C1-C10 mercaptoalkylthio, and m is an integer from 1 to 5, to produce a cured resin suitable as an optical material. By using the polymerization regulator, the polymerization rate of the episulfide compound can be suitably regulated to obtain a cured resin with less defect. By using the halide, the increase in the viscosity of the starting composition during the storage or the casting operation can be prevented.
摘要翻译：在本发明中，在一个分子中具有由下式2表示的至少一个环硫结构的环硫化合物：其中R 5是C 1 -C 10亚烃基或单键，R 6 R 7和R 8各自独立地为C 1 -C 10烃基或氢，Y为O，S，Se或Te，p为1的整数至5和q为0至5的整数，在长周期表的13-16族元素的卤化物和/或由下式1表示的聚合调节剂的存在下聚合：其中R“ R 1，R 2和R 3各自为C 1 -C 10烃基或氢，R 4为C 1 -C 10亚烃基或单键，X为F，Cl，Br，I，As，SH，OH，C1-C10烷氧基，C1-C10烷硫基或C1-C10巯基烷硫基，m为1〜5的整数，作为光学材料。通过使用聚合调节剂，可以适当调节环硫化合物的聚合速度，得到缺陷少的固化树脂。通过使用卤化物，可以防止在储存或铸造操作期间起始组合物的粘度的增加。

5. 发明授权

US07141501B2 Polishing method, polishing apparatus, and method of manufacturing semiconductor device 失效
标题翻译：抛光方法，抛光装置和制造半导体器件的方法
公开(公告)号：US07141501B2
公开(公告)日：2006-11-28
申请号：US10512745
申请日：2003-04-14
申请人： Hiroshi Horikoshi , Takeshi Nogami , Shuzo Sato , Shingo Takahashi , Naoki Komai , Kaori Tai , Hiizu Ohtorii
发明人： Hiroshi Horikoshi , Takeshi Nogami , Shuzo Sato , Shingo Takahashi , Naoki Komai , Kaori Tai , Hiizu Ohtorii
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： B24B53/017 , B24B53/001 , C25F3/16
摘要： A polishing method and a polishing apparatus by which excess portions of a metallic film 18 can be removed easily and efficiently in planarizing the metallic film 18 by polishing and which is high in accuracy of polishing, are provided. Also, a method of manufacturing a semiconductor device by use of the polishing method and the polishing apparatus is provided. A substrate 17 provided with the metallic film 18 and a counter electrode 15 are disposed oppositely to each other in an electrolytic solution E, an electric current is passed to the metallic film 18 through the electrolytic solution E, and the surface of the metallic film 18 is polished with a hard pad 14.
摘要翻译：提供了抛光方法和抛光装置，其通过抛光对金属膜18进行平面化并且抛光精度高而容易且有效地除去金属膜18的多余部分。此外，提供了通过使用抛光方法和抛光装置制造半导体器件的方法。设置有金属膜18的基板17和对置电极15在电解液E中相对配置，电流通过电解液E通过金属膜18，金属膜18的表面用硬垫抛光14。

6. 发明申请

US20060105474A1 Method for manufacturing a magnetic memory device, and a magnetic memory device 审中-公开
标题翻译：磁存储装置的制造方法以及磁存储装置
公开(公告)号：US20060105474A1
公开(公告)日：2006-05-18
申请号：US11298195
申请日：2005-12-09
申请人： Hiroshi Horikoshi
发明人： Hiroshi Horikoshi
IPC分类号： H01L21/00
CPC分类号： H01L27/222 , G11C11/16 , H01L21/76852 , H01L21/76865 , H01L21/76885 , H01L43/12
摘要： In bit line cladding structure formation, stability and margin of the process are secured and further shrinking is achieved, and the magnetic memory device is improved in speed, reliability and yield. Method for manufacturing a magnetic memory device, comprising the steps of: forming a word line; forming a magnetoresistance effect memory element comprising a tunnel insulating layer disposed between a ferromagnetic material and being electrically insulated from the word line; forming an insulating film for covering the memory element; and forming a bit line so that it is buried in the insulating film wherein the bit line is electrically connected to the memory element and spatially crosses the word line through the memory element disposed therebetween, wherein the method has steps of removing the insulating film on the bit line side to expose the bit line and forming a soft magnetic material layer selectively only on the bit line surface.
摘要翻译：在位线包层结构形成中，确保了工艺的稳定性和裕度，并且进一步收缩，并且磁存储器件的速度，可靠性和产量都得到了提高。一种用于制造磁存储器件的方法，包括以下步骤：形成字线; 形成磁阻效应存储元件，其包括设置在铁磁材料之间并与所述字线电绝缘的隧道绝缘层; 形成用于覆盖存储元件的绝缘膜; 并且形成位线，使得其被埋在绝缘膜中，其中位线电连接到存储元件并且通过设置在其间的存储元件空间地跨越字线，其中该方法具有以下步骤：去除绝缘膜上的绝缘膜位线侧以暴露位线并且仅在位线表面上选择性地形成软磁性材料层。

7. 发明申请

US20050070110A1 Etching solution, etching method and method for manufacturing semiconductor device 失效
标题翻译：蚀刻溶液，蚀刻方法和制造半导体器件的方法
公开(公告)号：US20050070110A1
公开(公告)日：2005-03-31
申请号：US10919580
申请日：2004-08-17
申请人： Hiizu Ohtorii , Kaori Tai , Hiroshi Horikoshi , Naoki Komai , Shuzo Sato
发明人： Hiizu Ohtorii , Kaori Tai , Hiroshi Horikoshi , Naoki Komai , Shuzo Sato
IPC分类号： H01L21/3205 , C09K13/06 , C09K13/08 , C23F1/26 , H01L21/306 , H01L21/3105 , H01L21/321 , H01L21/768 , H01L21/4763 , H01L21/311
CPC分类号： H01L21/31053 , C09K13/06 , C09K13/08 , C23F1/26 , H01L21/3212 , H01L21/7684
摘要： An etching solution includes an anticorrosive for copper or a benzotriazole based anticorrosive in a hydrofluoric acid aqueous solution. An etching method makes use of the etching solution set out above. Moreover, a method for manufacturing a semiconductor device which should include the step of removing copper by the etching method. The method includes the steps of forming copper through a barrier layer made of a metal or metal compound, which is greater in ionization tendency than copper, so as to bury a wiring groove formed in an insulating film with the copper, followed by polishing additional copper and barrier layer formed on the insulating film, and etching a surface layer of the insulating film by use of the etching solution to remove an insulating defective layer made mainly of the barrier layer on the insulating film along with the surface layer of the insulating film.
摘要翻译：蚀刻溶液包括在氢氟酸水溶液中对铜或苯并三唑类防腐蚀剂的防锈剂。蚀刻方法利用上述蚀刻溶液。此外，一种制造半导体器件的方法，其应包括通过蚀刻方法去除铜的步骤。该方法包括通过由金属或金属化合物制成的阻挡层形成铜的步骤，其电离度比铜更大，以便用铜掩埋形成在绝缘膜中的布线槽，然后抛光附加的铜以及形成在绝缘膜上的阻挡层，并且通过使用蚀刻溶液来蚀刻绝缘膜的表面层，以除去绝缘膜上的主要由绝缘膜上的阻挡层形成的绝缘缺陷层以及绝缘膜的表面层。

8. 发明申请

US20050003654A1 Method of producing semiconductor device 失效
标题翻译：半导体器件的制造方法
公开(公告)号：US20050003654A1
公开(公告)日：2005-01-06
申请号：US10680668
申请日：2003-10-07
申请人： Hiroshi Horikoshi , Yuji Segawa , Takeshi Nogami
发明人： Hiroshi Horikoshi , Yuji Segawa , Takeshi Nogami
IPC分类号： C23C18/18 , C23C18/32 , C23C18/50 , C25D5/50 , C25D7/12 , H01L21/28 , H01L21/288 , H01L21/3205 , H01L21/44 , H01L21/4763 , H01L21/768 , H01L23/52
CPC分类号： H01L21/76877 , H01L21/288 , H01L21/76849 , H01L21/76873
摘要： A method of producing a semiconductor device capable of suppressing damages by corrosion on wiring in a catalyst process performed in electroless plating processing on a Co base material, etc. in producing a semiconductor device having wiring of Cu, etc., having steps of forming metal wiring including an additive on a first insulation film formed in a semiconductor substrate, and forming on the metal wiring a barrier layer for preventing diffusion of constituting elements of the metal wiring, wherein said additive is an element to reduce corrosion of the metal wiring at the time of forming the barrier layer in the step of forming the metal wiring.
摘要翻译：一种制造半导体器件的方法，该半导体器件能够抑制对在Co基材等的无电解电镀处理中进行的催化剂工艺中的布线的腐蚀的损伤，以制造具有Cu等布线的半导体器件，其具有形成金属的步骤在半导体基板上形成的第一绝缘膜上具有添加剂的布线，在金属布线上形成防止金属布线构成元件扩散的阻挡层，其中，所述添加剂是减少金属布线的腐蚀的元素在形成金属布线的步骤中形成阻挡层的时间。

9. 发明授权

US08575293B2 Resin composition for optical material and optical material using the same 有权
标题翻译：用于光学材料的树脂组合物和使用其的光学材料
公开(公告)号：US08575293B2
公开(公告)日：2013-11-05
申请号：US12310474
申请日：2007-09-11
申请人： Hiroshi Horikoshi , Motoharu Takeuchi
发明人： Hiroshi Horikoshi , Motoharu Takeuchi
IPC分类号： C08G18/77 , C08G18/00
CPC分类号： C08G18/3876 , C08G18/7635 , C08G18/7642 , C08G18/765 , G02B1/041 , C08L75/04
摘要： According to the present invention, a resin compound for optical material, comprising (a) an episulfide compound represented by a specific structural formula, (b) a xylylenedithiol compound and (c) a xylylenediisocyanate compound can be provided. In a preferable embodiment of the present invention, a resin compound for optical material having superb optical properties, a high density and a high thermal resistance can be provided. Also according to the present invention, an optical material obtained by curing the above-described resin compound can be provided.
摘要翻译：根据本发明，可以提供一种光学材料用树脂组合物，其包含（a）由具体结构式表示的环硫化合物，（b）亚二硫醚硫醇化合物和（c）亚二甲苯基二异氰酸酯化合物。在本发明的优选实施方案中，可以提供具有极好的光学特性，高密度和高耐热性的光学材料用树脂组合物。另外，根据本发明，可以提供通过固化上述树脂化合物而获得的光学材料。

10. 发明申请

US20130267673A1 COMPOSITION FOR OPTICAL MATERIAL 审中-公开
标题翻译：光学材料组成
公开(公告)号：US20130267673A1
公开(公告)日：2013-10-10
申请号：US13996171
申请日：2011-11-07
申请人： Kouhei Takemura , Hiroshi Horikoshi
发明人： Kouhei Takemura , Hiroshi Horikoshi
IPC分类号： C08G75/00
CPC分类号： C08G75/00 , C08G18/242 , C08G18/3876 , G02B1/04 , C08L75/04 , C08L81/00
摘要： The present invention relates to a composition for an optical material, which is capable of suppressing occurrence of polymerization unevenness called striae, in particular, striae to be caused in high-powered lenses with sharp curves, and more specifically relates to a composition for an optical material including: a polymerization catalyst having a mass ratio of dibutyltin dichloride to monobutyltin trichloride of 97.0/3.0 to 100.0/0.0; a polythiol compound; and a polyiso(thio)cyanate compound.
摘要翻译：本发明涉及一种光学材料用组合物，其能够抑制称为条纹的聚合不均匀性的发生，特别涉及在具有曲线的高功率透镜中引起的条纹，更具体地涉及光学用组合物材料包括：二氯化二丁基锡与三丁基一丁基锡的质量比为97.0 / 3.0〜100.0 / 0.0的聚合催化剂; 多硫醇化合物和多（硫）氰酸酯化合物。

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