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    • 4. 发明授权
    • Pitch changing device for changing pitches of plate-like objects and
method of changing pitches
    • 用于改变板状物体的间距的变桨装置和改变桨距的方法
    • US5007788A
    • 1991-04-16
    • US342345
    • 1989-04-24
    • Takanobu AsanoKenichi YamagaWataru Ohkase
    • Takanobu AsanoKenichi YamagaWataru Ohkase
    • H01L21/677
    • H01L21/67781
    • A pitch changing device of the present invention includes a lift mechanism for unloading a plurality of wafers arranged in a cassette at predetermined pitches from the cassette while the pitches are kept unchanged, and a chuck mechanism for holding the unloaded wafers while the pitches are kept unchanged. The chuck mechanism includes moving pieces mounted to be movable in an arrangement direction of the wafers, for respectively supporting the wafers, elastic members mounted in the movable pieces to be expandible/contractible in the arrangement direction of the wafers, and a driving mechanism for expanding/contracting the elastic members. When the elastic members expand/contract by the driving mechanism, the pitches of the wafers are changed while the wafers are held. The lift mechanism includes a handler for variably moving wafer stands in the arrangement direction of the wafers, and changes the pitches while the wafers are lifted.
    • 本发明的变桨装置包括一个提升机构,用于在间距保持不变的情况下以预定间距从盒子中卸载设置在盒中的多个晶片;以及夹持机构,用于保持未加载的晶片,同时间距保持不变 。 卡盘机构包括安装成能够在晶片的布置方向上移动的移动件,用于分别支撑晶片,安装在可移动片中的弹性构件可在晶片的排列方向上可扩展/收缩;以及驱动机构,用于扩展 /收缩弹性构件。 当弹性构件通过驱动机构膨胀/收缩时,在保持晶片的同时改变晶片的间距。 升降机构包括用于在晶片的排列方向上可变地移动晶片架的处理器,并且在晶片被提升时改变间距。
    • 5. 发明授权
    • Heat processing furnace and vertical-type heat processing apparatus
    • 热加工炉和立式热处理设备
    • US07974525B2
    • 2011-07-05
    • US12071909
    • 2008-02-27
    • Makoto KobayashiTakashi IchikawaKenichi Yamaga
    • Makoto KobayashiTakashi IchikawaKenichi Yamaga
    • A21B2/00F26B19/00
    • F26B23/06F27B17/0025H01L21/67109
    • The present invention is a heat processing furnace comprising: a processing vessel for accommodating an object to be processed and performing thereto a heat process; and a cylindrical heater disposed to surround a circumference of the processing vessel, for heating the object to be processed; wherein: the heater includes a cylindrical heat insulating member, ribbed shelf sections that are axially formed in a tier-like manner on an inner circumference of the heat insulating member, and heating resistance wires of a helical pattern that are placed along the respective shelf sections; and pin members are arranged in the heat insulating member at suitable intervals therebetween, the pin members holding the heating resistance wires such that the heating resistance wires are movable in a radial direction of the heater, while preventing dropout of the heating resistance wires from the shelf sections.
    • 本发明是一种热处理炉,包括:处理容器,用于容纳待加工物体并进行加热处理; 以及设置成围绕处理容器的圆周的圆柱形加热器,用于加热被处理物体; 其特征在于,所述加热器包括圆筒形绝热构件,在所述隔热构件的内周上以层状的方式轴向形成的肋状搁板部,以及沿着各个搁板部放置的螺旋图案的耐热电线 ; 并且销构件以适当的间隔布置在绝热构件中,销构件保持加热电阻线,使得加热电阻线可在加热器的径向方向上移动,同时防止加热电阻丝从搁板 部分。
    • 6. 发明申请
    • THERMAL PROCESSING APPARATUS AND COOLING METHOD
    • 热处理装置和冷却方法
    • US20110076632A1
    • 2011-03-31
    • US12881556
    • 2010-09-14
    • Yoshinori KUSAKABEKenichi Yamaga
    • Yoshinori KUSAKABEKenichi Yamaga
    • F27D15/02F28D15/00
    • H01L21/67109C30B25/10C30B35/00
    • A thermal processing apparatus including: a cylindrical processing vessel; a support unit to be loaded into and unloaded from the vessel; and a heating furnace surrounding an outer periphery of the vessel, with a cooling space therebetween. The furnace is connected to a cooling-gas introduction unit, including a gas introduction passage to which a blowing fan is connected, for introducing a cooling gas into the cooling space during a temperature lowering operation after a thermal process. The furnace is connected to a cooling-gas discharge unit, including a heat exchanger, a suction fan, and a gas discharge passage, for discharging the cooling gas of a raised temperature from the cooling space. Connected to the gas discharge passage at a position upstream of the heat exchanger is a temperature-lowering gas introduction unit for introducing a temperature-lowering gas to the cooling gas of a raised temperature so as to lower its temperature.
    • 一种热处理设备,包括:圆柱形处理容器; 支撑单元,其被装载和卸载; 以及围绕容器的外周的加热炉,其间具有冷却空间。 炉子连接到冷却气体引入单元,该冷却气体引入单元包括连接有吹风扇的气体引入通道,用于在热处理之后的降温操作期间将冷却气体引入冷却空间。 炉子连接到冷却气体排出单元,该冷却气体排出单元包括热交换器,抽吸风扇和气体排出通道,用于将升温的冷却气体从冷却空间排出。 在该热交换器上游的位置与气体排出通路连接的是降温气体引入单元,用于将降温气体导入升温温度降低的气体,降低其温度。
    • 9. 发明授权
    • Piping connection device
    • 管道连接装置
    • US5362229A
    • 1994-11-08
    • US79386
    • 1993-06-21
    • Kenichi Yamaga
    • Kenichi Yamaga
    • H01L21/31F16L27/04F16L27/06F16L49/00F27D7/02H01L21/22F27B9/04
    • F27D7/02F16L27/04F27D2007/023
    • In a semiconductor wafer heat-treating apparatus, there is provided a piping connection device on a gas inlet pipe leading to the heat-treating apparatus and a gas outlet pipe derived from the heat-treating apparatus. The piping connection device has a spherical convex connecting element, and a concave connecting element having a concave spherical surface into which the spherical element is snugly fitted. A pair of presser plates are placed on the outer surfaces of the two connecting elements and clamped by bolts so as to press confronting sealing surfaces of the convex and concave connecting elements against each other. Because the outer surfaces of the two connecting elements to be engaged with the pair of presser plates are spherically fashioned, the connection surfaces can present a satisfactory sealing condition without subjecting the pair of the pipes connected by the piping connection device to excessive biasing forces even though the two pipes are angled to each other.
    • 在半导体晶片热处理装置中,在通向热处理装置的气体导入管和从该热处理装置得到的气体出口管上设置配管连接装置。 管道连接装置具有球形凸形连接元件和具有凹形球形表面的凹形连接元件,球形元件紧密配合到该凹形连接元件中。 一对压板放置在两个连接元件的外表面上,并被螺栓夹紧,以将相互凸起的和凹形的连接元件的相对的密封表面压在一起。 由于与一对压板接合的两个连接元件的外表面是球形的,所以连接表面可以呈现令人满意的密封条件,而不会使由配管连接装置连接的一对管子经受过大的偏压力,即使 两个管道彼此成角度。