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1. 发明申请

US20050151428A1 Linear motor 失效
公开(公告)号：US20050151428A1
公开(公告)日：2005-07-14
申请号：US11059416
申请日：2005-02-17
申请人： Masahiro Miyashita , Atsushi Horikoshi
发明人： Masahiro Miyashita , Atsushi Horikoshi
IPC分类号： H02K41/02 , H02K41/03 , H02K41/00
CPC分类号： H02K41/03
摘要： A linear motor includes a row of permanent magnets fixed at a position above a stator, and a plurality of magnetic pole members fixed at a position below a movable member. The row of permanent magnets is formed from N poles and S poles alternately arranged at given intervals. The plurality of magnetic pole members extend toward the row of permanent magnets and in a vertical direction and have the same height. The extremities of the magnetic pole members oppose the row of permanent magnets via an air gap. The magnetic pole members are coated with insulators, and a former-wound coil is fitted around the insulator. The part of the magnetic pole member coated with the insulator, except for the extremity thereof, is made thin by the amount corresponding to the thickness of the insulator.

2. 发明授权

US07131830B2 Blow molding machine 失效
标题翻译：吹塑机
公开(公告)号：US07131830B2
公开(公告)日：2006-11-07
申请号：US10789930
申请日：2004-02-27
申请人： Hiromitsu Kobayashi , Masahiro Miyashita , Hidetoshi Tatebe , Makoto Kifune
发明人： Hiromitsu Kobayashi , Masahiro Miyashita , Hidetoshi Tatebe , Makoto Kifune
IPC分类号： B29C49/56 , B29C49/12
CPC分类号： B29C49/56 , B29C49/12 , B29C49/58 , B29C2049/5806 , B29C2049/581 , B29C2049/5813
摘要： The present invention provides a blow molding machine comprising a plurality of pillars 5 set up facing on a seat 4 above a base 3 located above a blow mold 2; a stationary platen 6 provided bridging on the top portions of the pillars 5; a moving cylinder 7 set on both side of the stationary platen 6; and a holding plate 9 of blow-core members, which is connected with a piston rod 7a of the moving cylinder 7, and in which the pillars 5 are inserted vertically movable; and a clamp plate 15 projecting at both ends from the holding plate 9 outwardly, and a clamp block 16, which includes internally a pair of hydraulic cylinders 18 to clamp the clamp plate 15 from both sides with rams when the holding plate 9 is in the lower limit position, which is provided on both sides of the seat 4.
摘要翻译：本发明提供一种吹塑机，其包括多个柱5，所述多个柱5面向位于吹塑模具2上方的基部3上方的座部4上; 设置在柱5的顶部上的固定台板6; 设置在固定台板6的两侧的移动气缸7; 以及与活动气缸7的活塞杆7a连接的吹芯体的保持板9，其中柱5可垂直移动; 以及从保持板9的两端向外突出的夹板15和夹持块16，夹持块16内部包括一对液压缸18，以在夹持板9处于夹持板9时从两侧夹持夹板15 下限位置设置在座椅4的两侧。

3. 发明授权

US07042119B2 Linear motor 失效
公开(公告)号：US07042119B2
公开(公告)日：2006-05-09
申请号：US11059416
申请日：2005-02-17
申请人： Masahiro Miyashita , Atsushi Horikoshi
发明人： Masahiro Miyashita , Atsushi Horikoshi
IPC分类号： H02K41/00
CPC分类号： H02K41/03
摘要： A linear motor includes a row of permanent magnets fixed at a position above a stator, and a plurality of magnetic pole members fixed at a position below a movable member. The row of permanent magnets is formed from N poles and S poles alternately arranged at given intervals. The plurality of magnetic pole members extend toward the row of permanent magnets and in a vertical direction and have the same height. The extremities of the magnetic pole members oppose the row of permanent magnets via an air gap. The magnetic pole members are coated with insulators, and a former-wound coil is fitted around the insulator. The part of the magnetic pole member coated with the insulator, except for the extremity thereof, is made thin by the amount corresponding to the thickness of the insulator.

4. 发明授权

US06203268B1 Positioning apparatus for substrates to be processed 失效
标题翻译：待处理基板的定位装置
公开(公告)号：US06203268B1
公开(公告)日：2001-03-20
申请号：US09389069
申请日：1999-09-02
申请人： Masahiro Miyashita
发明人： Masahiro Miyashita
IPC分类号： B65G4724
CPC分类号： H01L21/6875 , H01L21/6732 , H01L21/67373 , H01L21/67772 , H01L21/67781 , H01L21/68 , H01L21/68721 , H01L21/68728 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/141
摘要： An apparatus is provided with a plurality of stages of mounting bases on each of which is disposed upwardly orientated, narrow tapered pins around the periphery of a semiconductor wafer, and a plurality of stages of turntables, one for each of the mounting bases, with the mounting bases being capable of moving independently of the turntables. When a wafer is transferred from a transporter arm to the tapered pins, the peripheral edge of the wafer comes into contact with the inner peripheral surfaces of the tapered pins and the wafer is centered thereby. The turntable then picks up the wafer and aligns the orientation thereof. This makes it possible to position the centers of a plurality of wafers and position the orientations thereof in a simple manner.
摘要翻译：一种装置设置有多个安装基座，每个安装基座上设置有向上定向的，围绕半导体晶片的周边的窄锥形销和多个转台，每个安装基座用于每个安装基座，其中，安装基座能够独立于转盘移动。当晶片从传送臂转移到锥形销时，晶片的周边边缘与锥形销的内周表面接触，并且晶片被中心。然后，转台拾取晶片并对准其取向。这使得可以以简单的方式定位多个晶片的中心并定位其取向。

5. 发明授权

US5204711A Projection exposure device 失效
标题翻译：投影曝光装置
公开(公告)号：US5204711A
公开(公告)日：1993-04-20
申请号：US712100
申请日：1991-06-07
申请人： Minoru Takubo , Toshio Fukasawa , Masahiro Miyashita , Yousuke Takagi
发明人： Minoru Takubo , Toshio Fukasawa , Masahiro Miyashita , Yousuke Takagi
IPC分类号： G03F7/20
CPC分类号： G03F7/70058 , G03F7/70241 , G03F7/70716 , G03F7/70975
摘要： In a projection exposure device in which an exposure light from a light source device is transmitted through a mask having a predetermined pattern formed therein and then an image of a mask pattern is focused by a projection lens on an exposure member held by a holding mechanism, an exposure light is emitted from the light source device along a horizontal optical axis. The mask, the projection lens and the exposure member are disposed on the horizontal optical axis and the holding mechanism is formed such that the exposure member is movable at least within a plane perpendicular to the horizontal optical axis. The distortion of the exposure member can be prevented to enable exposure at high accuracy and, also, with high throughput by holding the exposure member vertically, mask alignment is facilitated, the effect of heat from the light source can be minimized, and the size and the cost of the device can be reduced.
摘要翻译：在其中通过具有形成在其中的预定图案的掩模透射来自光源装置的曝光光，然后通过投影透镜将掩模图案的图像聚焦在由保持机构保持的曝光构件上的投影曝光装置中，沿着水平光轴从光源装置发出曝光光。掩模，投影透镜和曝光构件设置在水平光轴上，并且保持机构形成为使得曝光构件至少在垂直于水平光轴的平面内是可移动的。可以防止暴露部件的变形，能够高精度地进行曝光，并且通过垂直地保持曝光部件的高通过率，也能够进行掩模对准，可以将来自光源的热量的效果最小化，可以降低设备的成本。

6. 发明授权

US06876106B2 Linear motor 有权
标题翻译：直线电机
公开(公告)号：US06876106B2
公开(公告)日：2005-04-05
申请号：US10449605
申请日：2003-06-02
申请人： Masahiro Miyashita , Atsushi Horikoshi
发明人： Masahiro Miyashita , Atsushi Horikoshi
IPC分类号： H02K41/02 , H02K41/03 , H02K41/00
CPC分类号： H02K41/03
摘要： A linear motor includes a row of permanent magnets fixed at a position above a stator, and a plurality of magnetic pole members fixed at a position below a movable member. The row of permanent magnets is formed from N poles and S poles alternately arranged at given intervals. The plurality of magnetic pole members extend toward the row of permanent magnets and in a vertical direction and have the same height. The extremities of the magnetic pole members oppose the row of permanent magnets via an air gap. The magnetic pole members are coated with insulators, and a former-wound coil is fitted around the insulator. The part of the magnetic pole member coated with the insulator, except for the extremity thereof, is made thin by the amount corresponding to the thickness of the insulator.
摘要翻译：线性电动机包括固定在定子上方的一排永磁体，以及固定在可动部件下方的多个磁极部件。永久磁铁排由N极和S极组成，以一定间隔交替排列。多个磁极部件朝向永久磁铁列延伸并且在垂直方向上延伸并且具有相同的高度。磁极部件的末端通过气隙与永久磁铁排相对。磁极部件涂有绝缘体，并且缠绕在绕组线圈上。被绝缘体涂覆的磁极部件除了其末端的部分被制成较薄的绝缘体的厚度。

7. 发明授权

US06390754B1 Wafer processing apparatus, method of operating the same and wafer detecting system 失效
公开(公告)号：US06390754B1
公开(公告)日：2002-05-21
申请号：US09080254
申请日：1998-05-18
申请人： Kenichi Yamaga , Yuji Ono , Masahiro Miyashita , Osamu Tanigawa
发明人： Kenichi Yamaga , Yuji Ono , Masahiro Miyashita , Osamu Tanigawa
IPC分类号： B65G4907
摘要： A closed-type cassette is mounted on a cassette stand disposed in a working region at a position corresponding to an opening formed in a wall separating the working region from a loading region. When the cassette is mounted on the cassette stand, a detecting device gives a signal to that effect to a controller. Then, the controller closes a valve to interrupt nitrogen gas supply into the loading region. A lid of the cassette is opened 20 to 30 sec after the interruption of nitrogen gas supply into the loading region and, then, nitrogen gas supply is resumed. The pressure difference between the loading region and the interior of the cassette is decreased by interrupting nitrogen gas supply into the loading region, so that the lid can be easily opened.

8. 发明授权

US6158946A Positioning apparatus for substrates to be processed 失效
标题翻译：待处理基板的定位装置
公开(公告)号：US6158946A
公开(公告)日：2000-12-12
申请号：US389070
申请日：1999-09-02
申请人： Masahiro Miyashita
发明人： Masahiro Miyashita
IPC分类号： B65G49/07 , H01L21/673 , H01L21/677 , H01L21/68
CPC分类号： H01L21/6875 , H01L21/6732 , H01L21/67373 , H01L21/67772 , H01L21/67781 , H01L21/68 , H01L21/68721 , H01L21/68728 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/141
摘要： An apparatus is provided with a plurality of stages of mounting bases on each of which is disposed upwardly orientated, narrow tapered pins around the periphery of a semiconductor wafer, and a plurality of stages of turntables, one for each of the mounting bases, with the mounting bases being capable of moving independently of the turntables. When a wafer is transferred from a transporter arm to the tapered pins, the peripheral edge of the wafer comes into contact with the inner peripheral surfaces of the tapered pins and the wafer is centered thereby. The turntable then picks up the wafer and aligns the orientation thereof. This makes it possible to position the centers of a plurality of wafers and position the orientations thereof in a simple manner.
摘要翻译：一种装置设置有多个安装基座，每个安装基座上设置有向上定向的，围绕半导体晶片的周边的窄锥形销和多个转台，每个安装基座用于每个安装基座，其中，安装基座能够独立于转盘移动。当晶片从传送臂转移到锥形销时，晶片的周边边缘与锥形销的内周表面接触，并且晶片被中心。然后，转台拾取晶片并对准其取向。这使得可以以简单的方式定位多个晶片的中心并定位其取向。

9. 发明授权

US5980195A Positioning apparatus for substrates to be processed 失效
公开(公告)号：US5980195A
公开(公告)日：1999-11-09
申请号：US847721
申请日：1997-04-22
申请人： Masahiro Miyashita
发明人： Masahiro Miyashita
IPC分类号： B65G49/07 , H01L21/673 , H01L21/677 , H01L21/68
CPC分类号： H01L21/6875 , H01L21/6732 , H01L21/67373 , H01L21/67772 , H01L21/67781 , H01L21/68 , H01L21/68721 , H01L21/68728 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/141
摘要： An apparatus is provided with a plurality of stages of mounting bases on each of which is disposed upwardly orientated, narrow tapered pins around the periphery of a semiconductor wafer, and a plurality of stages of turntables, one for each of the mounting bases, with the mounting bases being capable of moving independently of the turntables. When a wafer is transferred from a transporter arm to the tapered pins, the peripheral edge of the wafer comes into contact with the inner peripheral surfaces of the tapered pins and the wafer is centered thereby. The turntable then picks up the wafer and aligns the orientation thereof. This makes it possible to position the centers of a plurality of wafers and position the orientations thereof in a simple manner.

10. 发明授权

US5829969A Vertical heat treating apparatus 失效
标题翻译：立式热处理装置
公开(公告)号：US5829969A
公开(公告)日：1998-11-03
申请号：US835820
申请日：1997-04-16
申请人： Masahiro Miyashita , Kenichi Yamaga , Katsuhiko Mihara
发明人： Masahiro Miyashita , Kenichi Yamaga , Katsuhiko Mihara
IPC分类号： C30B35/00 , F27D5/00
CPC分类号： C30B35/005
摘要： A vertical heat treating apparatus includes a first boat elevator for carrying a first wafer boat between a wafer transfer region and a predetermined position in a heat treating furnace, and a second boat elevator for carrying a second wafer boat between the wafer transfer region and the predetermined position in the heat treating furnace. With this construction, it is possible to eliminate the problems of causing the position shift of the wafer boat, so that and it is possible to prevent the wafer boat from overturning. The apparatus also has cutouts formed in the lower end portion of the wafer boat, and guide members formed on the upper surface of a wafer transfer stage so as to be engageable with the cutouts. With this construction, if the positioning is forcibly carried out when the wafer boat is loaded on the wafer transfer stage, it is possible to correct the position shift to prevent the shift from accumulating, so that it is possible to prevent the wafer boat from overturning.
摘要翻译：一种立式热处理装置包括：第一船用电梯，用于在晶片转印区域和热处理炉中的预定位置之间承载第一晶片舟;以及第二舟形升降机，用于将晶片转移区域与预定的在热处理炉中的位置。通过这种结构，可以消除引起晶片舟的位置偏移的问题，从而可以防止晶片舟倒塌。该设备还具有形成在晶片舟皿的下端部分中的切口，以及形成在晶片传送台的上表面上以便与切口接合的引导部件。利用这种结构，当晶片舟装载在晶片传送台上时，如果强制执行定位，则可以校正位置偏移以防止偏移积聚，从而可以防止晶片舟翻倒。

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