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1. 发明授权

US08621370B2 Batch processing information processing including simultaneously moving a plurality of objects and independently moving an object from the rest of the plurality of objects 有权
标题翻译：批量处理信息处理，包括同时移动多个对象并且独立地从多个对象的其余部分移动对象
公开(公告)号：US08621370B2
公开(公告)日：2013-12-31
申请号：US12581745
申请日：2009-10-19
申请人： Hikaru Ito
发明人： Hikaru Ito
IPC分类号： G06F3/0484
CPC分类号： G06F3/0481 , G06F3/0486 , G06F9/451
摘要： When a plurality of objects are subjected to a batch processing by an object selection unit and a batch processing execution unit, if an input is made to an object included in the plurality of objects, an information processing apparatus controls the processing execution unit so as to execute a processing on the object based on the input, thereby executing a processing of moving all of the selected plurality of objects simultaneously with a processing of moving an arbitrary object separately from other objects among the selected plurality of objects.
摘要翻译：当通过对象选择单元和批处理执行单元对多个对象进行批处理时，如果对包括在多个对象中的对象进行输入，则信息处理设备控制处理执行单元，以便基于输入对对象执行处理，从而执行与所选择的多个对象中的其他对象分开地移动任意对象的处理同时移动所选择的所有多个对象的处理。

2. 发明授权

US08259062B2 Electrophoretic display device 失效
标题翻译：电泳显示装置
公开(公告)号：US08259062B2
公开(公告)日：2012-09-04
申请号：US12180667
申请日：2008-07-28
申请人： Hikaru Ito , Hideki Yoshinaga , Hideo Mori
发明人： Hikaru Ito , Hideki Yoshinaga , Hideo Mori
IPC分类号： G09G3/34
CPC分类号： G02F1/167
摘要： An electrophoretic display device is constituted by a first substrate and a second substrate which are disposed with a spacing therebetween, a partition wall disposed in the spacing, electrophoretic particles sealed in a closed space defined by the first and second substrates and the partition wall, a first electrode disposed at a side surface of the closed space, and a second electrode disposed at a bottom surface of the closed space. In the electrophoretic display device, a distribution state of the electrophoretic particles is changed to effect display, and the first electrode has an area substantially equal to or larger than an area of the second electrode.
摘要翻译：电泳显示装置由隔着间隔配置的第一基板和第二基板构成，间隔配置的隔壁，密封在由第一基板和第二基板以及分隔壁限定的封闭空间内的电泳粒子，设置在所述封闭空间的侧面的第一电极，以及设置在所述封闭空间的底面的第二电极。在电泳显示装置中，改变电泳粒子的分布状态进行显示，第一电极的面积大致等于或大于第二电极的面积。

3. 发明申请

US20080062372A1 Liquid crystal display device 有权
标题翻译：液晶显示装置
公开(公告)号：US20080062372A1
公开(公告)日：2008-03-13
申请号：US11898276
申请日：2007-09-11
申请人： Osamu Nagashima , Kurando Shinba , Eisuke Hatakeyama , Hikaru Ito , Masataka Natori
发明人： Osamu Nagashima , Kurando Shinba , Eisuke Hatakeyama , Hikaru Ito , Masataka Natori
IPC分类号： G02F1/1345
CPC分类号： G02F1/136259 , G02F1/136286 , G02F2001/136263
摘要： A liquid crystal display device is provided to prevent gas bubbles from being generated due to the contact of an inspection probe. An insulating film composed of a gate insulating film and a protection film is formed on a gate wire and wire inspection terminal, and is partially removed from an upper surface of the wire inspection terminal to form a concave portion exposing the top surface of the wire inspection terminal. A transparent conductive film made of ITO is formed on the insulating film, including the concave portion on the wire inspection terminal. The transparent conductive film is electrically connected with the wire inspection terminal at the concave portion, and formed extending onto the gate insulating film and protection film on the opposite side of a scanning wire of the wire inspection terminal. Disconnection inspection is performed using the extending portion as a contact portion with an inspection probe.
摘要翻译：提供一种液晶显示装置，以防止由于检查探针的接触而产生气泡。在栅线和线检查端子上形成由栅极绝缘膜和保护膜构成的绝缘膜，并且从导线检查端子的上表面部分地移除，以形成暴露线检查的顶面的凹部终奌站。在绝缘膜上形成由ITO构成的透明导电膜，包括在线检查端子上的凹部。透明导电膜在凹部处与导线检查端子电连接，并且形成为延伸到栅极绝缘膜和保护膜上，在线检测端子的扫描线的相对侧。使用延伸部作为与检查用探针的接触部进行断线检查。

4. 发明申请

US20060165409A1 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US20060165409A1
公开(公告)日：2006-07-27
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03D5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。成膜单位块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 在形成防反射膜的情况下选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。涂层和显影系统由简单的携带程序和简单的软件控制。

5. 发明授权

US6024552A Metallic mold for manufacturing a connector 有权
标题翻译：用于制造连接器的金属模具
公开(公告)号：US6024552A
公开(公告)日：2000-02-15
申请号：US182309
申请日：1998-10-30
申请人： Yasunori Wada , Hikaru Ito , Shinsuke Tsutsui , Hajime Kawase , Osamu Sasai
发明人： Yasunori Wada , Hikaru Ito , Shinsuke Tsutsui , Hajime Kawase , Osamu Sasai
IPC分类号： B29C45/00 , H01R13/436 , H01R43/18 , B29C45/16
CPC分类号： H01R43/18 , B29C45/006 , H01R13/4361 , Y10S425/01 , Y10S425/058 , Y10T29/49204 , Y10T29/4922 , Y10T29/49222
摘要： Under the condition that the stationary metallic mold and the movable metallic mold are closed, the housing is molded into a shape having the retainer insertion hole by the existence of the sliding mold. At same time, a retainer is also molded in the below portion. First, when only the rear metallic mold is opened, the core pin is withdrawn, and at the same time the sliding mold is withdrawn along the advancing and withdrawing passage in the longitudinal direction by the cam action of the angular pin, so that the molding portion is withdrawn from the retainer insertion hole. Successively, when the metallic mold is opened, the sliding mold is relatively drawn out to the front of the advancing and withdrawing passage together with the stationary metallic mold, and the advancing and withdrawing passage becomes open. Next, the auxiliary sliding mold is advanced, and the retainer held by the auxiliary sliding mold is inserted into the retainer insertion hole and temporarily assembled to the housing. Since the entire width of the retainer is supported by the auxiliary sliding mold, it is possible to insert the retainer straight into the retainer insertion hole. The finished product is protruded to the front of the movable metallic mold by the protruding pin.
摘要翻译：在固定金属模具和可动金属模具关闭的情况下，通过滑动模具的存在，壳体被模制成具有保持器插入孔的形状。同时，也在下面的部分中模制保持器。首先，当只有后金属模具打开时，芯销被拉出，并且同时滑动模具通过角销的凸轮作用沿着前进和后退通道沿纵向方向被拉出，使得模制部分从保持器插入孔中取出。接下来，当金属模具打开时，滑动模具与固定的金属模具一起被相对地拉出到前进和后退通道的前部，并且前进和退出通道打开。接下来，辅助滑动模具前进，并且由辅助滑动模具保持的保持器插入保持器插入孔中并临时组装到壳体。由于保持器的整个宽度由辅助滑动模具支撑，所以可以将保持器直接插入到保持器插入孔中。成品通过突出销突出到可动金属模具的前部。

6. 发明申请

US20100326353A1 COATING AND DEVELOPING APPARATUS 审中-公开
公开(公告)号：US20100326353A1
公开(公告)日：2010-12-30
申请号：US12855524
申请日：2010-08-12
申请人： Masami AKIMOTO , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami AKIMOTO , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C9/12
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

7. 发明授权

US07797855B2 Heating apparatus, and coating and developing apparatus 有权
标题翻译：加热装置和涂装显影装置
公开(公告)号：US07797855B2
公开(公告)日：2010-09-21
申请号：US11505810
申请日：2006-08-18
申请人： Tetsuo Fukuoka , Masami Akimoto , Takahiro Kitano , Yoshio Kimura , Shinichi Hayashi , Hikaru Ito
发明人： Tetsuo Fukuoka , Masami Akimoto , Takahiro Kitano , Yoshio Kimura , Shinichi Hayashi , Hikaru Ito
IPC分类号： F26B21/06
CPC分类号： C30B33/02 , C30B35/00 , H01L21/67098 , H01L21/67748
摘要： A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carrying out the wafer; and a heating plates 44, 45 provided in the heating chamber 4 such that the wafer W can be heated from both above and below. A cooling plate 3 is provided in the housing 20 located in the vicinity of the opening of the heating chamber 4, for cooling the wafer W after being heated by the heating plates 44, 45. Additionally, a carrying means is provided in the housing 20 for carrying the wafer W between an upper position of the cooling plate 3 and the interior of the heating chamber 4 such that a heat treatment for the wafer W can be performed with the wafer W being held in the heating chamber 4.
摘要翻译：加热装置2包括壳体20; 平面加热室4，其设置在壳体2中并且适于加热用作基板的晶片W，加热室4的一侧开口用于承载和执行晶片; 以及设置在加热室4中的加热板44,45，使得晶片W能够从上下两者加热。冷却板3设置在位于加热室4的开口附近的壳体20中，用于在被加热板44,45加热之后冷却晶片W.此外，在壳体20中设置有承载装置用于在冷却板3的上部位置和加热室4的内部之间承载晶片W，使得可以在将晶片W保持在加热室4中的情况下进行晶片W的热处理。

8. 发明授权

US07793609B2 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US07793609B2
公开(公告)日：2010-09-14
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C5/02
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，其包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

9. 发明申请

US20070251613A1 HEAT TREATMENT APPARATUS, HEAT TREATMENT METHOD, AND RECORDING MEDIUM STORING COMPUTER PROGRAM CARRYING OUT THE SAME 有权
标题翻译：热处理设备，热处理方法和记录中继存储计算机程序
公开(公告)号：US20070251613A1
公开(公告)日：2007-11-01
申请号：US11734424
申请日：2007-04-12
申请人： Hikaru Ito , Shinji Okada , Masami Yamashita
发明人： Hikaru Ito , Shinji Okada , Masami Yamashita
IPC分类号： C21D11/00
CPC分类号： C21D9/00 , C21D9/0056 , C21D11/00
摘要： An experiment is conducted in advance, for finding a temperature of a cooling plate attained as a result of balancing between a temperature of a substrate after heat treatment and a temperature of the cooling plate at the time of cooling of the substrate. Then, before heat treatment of a first substrate, the cooling plate is moved to a position above a hot plate, the cooling plate is heated to that temperature, and thereafter heat treatment of the substrate is started.
摘要翻译：预先进行实验，以获得由于热处理后的基板的温度与冷却基板之间的冷却板的温度之间的平衡而获得的冷却板的温度。然后，在热处理第一基板之前，将冷却板移动到加热板上方的位置，将冷却板加热至该温度，然后开始对基板进行热处理。

10. 发明授权

US07281869B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US07281869B2
公开(公告)日：2007-10-16
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂覆和显影系统可以应对形成防反射膜的情况以及没有形成任何抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块中层叠。在形成防反射膜并且不形成抗反射膜的情况下，TCT层，COT层和BCT层被选择性地使用。涂层和显影系统由简单的携带程序控制。

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