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1. 发明授权

US08207242B2 Process for producing photocurable material, photocurable material and article 失效
标题翻译：制备光固化材料，光固化材料和制品的方法
公开(公告)号：US08207242B2
公开(公告)日：2012-06-26
申请号：US13152740
申请日：2011-06-03
申请人： Hideo Nomoto , Yasuhide Kawaguchi , Hideshi Sasakura
发明人： Hideo Nomoto , Yasuhide Kawaguchi , Hideshi Sasakura
IPC分类号： C08J3/28 , B32B5/16 , B05D3/00 , C08G79/00 , C08F20/06
CPC分类号： C08F2/44 , C08F292/00 , Y10S977/773 , Y10S977/778 , Y10T428/2995 , Y10T428/31678 , Y10T428/31855 , C08F220/26
摘要： To provide a photocurable material which can form a cured product having a high transparency and a high refractive index, a process for producing the material easily, and an article having a high transparency and a high refractive index.The photocurable material is obtained by a production process comprising (i) a step of reacting a polymerizable component (A) comprised of at least one type of a compound (a) having a (meth)acryloyloxy group, and a compound (B) having a mercapto group and a carboxy group to obtain a surface modifier (C) which has the carboxy group derived from the compound (B) at a terminal, (ii) a step of modifying the surface of inorganic fine particles (D) with the surface modifier (C) to obtain surface-modified inorganic fine particles (E), and (iii) a step of obtaining a photocurable material which contains the surface-modified inorganic fine particles (E), a polymerizable component (F) comprised of at least one type of a compound (f) having a (meth)acryloyloxy group, and a photopolymerization initiator (G).
摘要翻译：为了提供可以形成具有高透明度和高折射率的固化产物的光固化材料，容易制造材料的方法和具有高透明度和高折射率的制品。光固化性材料通过以下制造方法得到：（i）使由至少一种具有（甲基）丙烯酰氧基的化合物（a）组成的聚合性组分（A）和具有（甲基）丙烯酰氧基的化合物（B））和巯基和羧基，得到在末端具有来自化合物（B）的羧基的表面改性剂（C），（ii）使表面改性无机微粒（D）的表面的工序，改性剂（C）以获得表面改性的无机细颗粒（E），和（iii）获得含有表面改性无机细颗粒（E）的光固化材料，至少包含可聚合组分（F）的步骤一种具有（甲基）丙烯酰氧基的化合物（f）和光聚合引发剂（G）。

2. 发明申请

US20110237703A1 PROCESS FOR PRODUCING PHOTOCURABLE MATERIAL, PHOTOCURABLE MATERIAL AND ARTICLE 失效
标题翻译：生产光电材料，光电材料和制品的工艺
公开(公告)号：US20110237703A1
公开(公告)日：2011-09-29
申请号：US13152740
申请日：2011-06-03
申请人： Hideo NOMOTO , Yasuhide Kawaguchi , Hideshi Sasakura
发明人： Hideo NOMOTO , Yasuhide Kawaguchi , Hideshi Sasakura
IPC分类号： C08J3/28 , C08F267/06
CPC分类号： C08F2/44 , C08F292/00 , Y10S977/773 , Y10S977/778 , Y10T428/2995 , Y10T428/31678 , Y10T428/31855 , C08F220/26
摘要： To provide a photocurable material which can form a cured product having a high transparency and a high refractive index, a process for producing the material easily, and an article having a high transparency and a high refractive index.The photocurable material is obtained by a production process comprising (i) a step of reacting a polymerizable component (A) comprised of at least one type of a compound (a) having a (meth)acryloyloxy group, and a compound (B) having a mercapto group and a carboxy group to obtain a surface modifier (C) which has the carboxy group derived from the compound (B) at a terminal, (ii) a step of modifying the surface of inorganic fine particles (D) with the surface modifier (C) to obtain surface-modified inorganic fine particles (E), and (iii) a step of obtaining a photocurable material which contains the surface-modified inorganic fine particles (E), a polymerizable component (F) comprised of at least one type of a compound (f) having a (meth)acryloyloxy group, and a photopolymerization initiator (G).
摘要翻译：为了提供可以形成具有高透明度和高折射率的固化产物的光固化材料，容易制造材料的方法和具有高透明度和高折射率的制品。光固化性材料通过以下制造方法得到：（i）使由至少一种具有（甲基）丙烯酰氧基的化合物（a）组成的聚合性组分（A）和具有（甲基）丙烯酰氧基的化合物（B））和巯基和羧基，得到在末端具有来自化合物（B）的羧基的表面改性剂（C），（ii）使表面改性无机微粒（D）的表面的工序，改性剂（C）以获得表面改性的无机细颗粒（E），和（iii）获得含有表面改性无机细颗粒（E）的光固化材料，至少包含可聚合组分（F）的步骤一种具有（甲基）丙烯酰氧基的化合物（f）和光聚合引发剂（G）。

3. 发明申请

US20100038831A1 PHOTOCURABLE COMPOSITION AND METHOD FOR PRODUCING MOLDED PRODUCT WITH FINE PATTERN 有权
标题翻译：用于生产具有精细图案的模制产品的光致抗蚀剂组合物和方法
公开(公告)号：US20100038831A1
公开(公告)日：2010-02-18
申请号：US12542086
申请日：2009-08-17
申请人： Yasuhide Kawaguchi , Kentaro Tsunozaki
发明人： Yasuhide Kawaguchi , Kentaro Tsunozaki
IPC分类号： B29C35/08 , C08F2/46
CPC分类号： C08F220/20 , B82Y10/00 , B82Y40/00 , C08F220/18 , C08F220/22 , G02B5/1852 , G02B5/1857 , G03F7/0002 , G03F7/0046 , G03F7/0048 , G03F7/027 , G03F7/033 , C08F222/1006
摘要： To provide a photocurable composition from which a cured product excellent in mold release characteristics and mechanical strength can be obtained, and a method for producing a molded product excellent in durability, with a fine pattern having a reverse pattern of a mold precisely transferred on its surface.A photocurable composition 20 comprising from 15 to 60 mass % of a compound (A) which is an aromatic compound having at least two rings or an alicyclic compound having at least two rings and which has two (meth)acryloyloxy groups, from 5 to 40 mass % of a compound (B) having a fluorine atom and having at least one carbon-carbon unsaturated double bond (excluding the compound (A)), from 10 to 55 mass % of a compound (C) having one (meth)acryloyloxy group (excluding the compound (B)) and from 1 to 12 mass % of a photopolymerization initiator (D) (provided that (A)+(B)+(C)+(D)=100 mass %) is used.
摘要翻译：为了提供可以得到脱模特性和机械强度优异的固化物的光固化性组合物，以及耐久性优异的模制品的制造方法，具有在其表面上精确转印的模具的反向图案的精细图案。一种光固化性组合物20，其含有15〜60质量％的作为具有至少两个环的芳香族化合物的化合物（A）或至少具有两个环的脂环族化合物，具有两个（甲基）丙烯酰氧基，5〜40个具有氟原子并且具有至少一个碳 - 碳不饱和双键的化合物（B）的质量％（不包括化合物（A）），10至55质量％的具有一个（甲基）丙烯酰氧基（不含化合物（B））和1〜12质量％的光聚合引发剂（D）（条件是（A）+（B）+（C）+（D）= 100质量％）。

4. 发明授权

US07015366B2 Fluorinated compound, fluoropolymer and process for its production 失效
标题翻译：氟化合物，含氟聚合物及其生产工艺
公开(公告)号：US07015366B2
公开(公告)日：2006-03-21
申请号：US11218472
申请日：2005-09-06
申请人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
发明人： Shun-ichi Kodama , Isamu Kaneko , Osamu Yokokoji , Shinji Okada , Yoko Takebe , Yasuhide Kawaguchi
IPC分类号： C07C41/00 , C07C43/00 , C07C407/00 , C07C409/00 , C08F136/16
CPC分类号： C08F36/20 , C08F36/16 , C08F214/18 , C08F2/60
摘要： To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg.A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1): CFR1═CR2—Q—CR3═CHR4 (1) wherein each of R1 to R4 which are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.
摘要翻译：提供具有高浓度官能团的含氟聚合物以提供官能团的足够特性，并且不会降低Tg。具有由式（1）表示的含官能团的氟化二烯的环化聚合形成的单体单元的含氟聚合物：<？in-line-formula description =“In-line formula”end =“lead”→CFR < 1 -CR 2 -Q-CR 3 -RR 4（1）<？在线公式描述=“ 其中独立的R 1〜R 4中的每一个表示氢原子，氟原子，具有至多8个碳原子的烷基或脂环族烃基，并且其中至少一个是脂环族烃基，条件是烷基或脂环族烃基中的氢原子可以被氟原子取代，烷基或氟代烷基; Q表示可以通过酸或能够转化为这种封端的酸性基团的基团而能够形成酸性基团的封端酸性基团的二价有机基团。

5. 发明授权

US08540925B2 Photocurable composition, micropattern-formed product and its production process 有权
标题翻译：可光固化组合物，微图案形成产品及其生产工艺
公开(公告)号：US08540925B2
公开(公告)日：2013-09-24
申请号：US11876182
申请日：2007-10-22
申请人： Yasuhide Kawaguchi , Akihiko Asakawa
发明人： Yasuhide Kawaguchi , Akihiko Asakawa
IPC分类号： B28B1/14 , B29C35/08 , B29C39/00 , B29C41/00 , C07C19/08 , C07C21/18 , C07C23/00 , C08F2/50
CPC分类号： B29C37/0053 , B29C35/0888 , B29C43/003 , B29C43/021 , B29C2035/0833 , B29C2043/3634 , B29C2059/023 , B29K2105/0002 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , C08F220/18 , C08F220/24 , C08F222/1006 , G03F7/0002 , G03F7/0046 , G03F7/027
摘要： A photocurable composition capable of producing a micropattern-formed product efficiently, which is excellent in physical properties such as heat resistance, chemical resistance, releasability and optical characteristics (transmittance and low refractive index), and a process for producing a micropattern-formed product, capable of highly precisely transferring a micropattern of a mold to its surface are provided.A photocurable composition which comprises from 50 to 98 mass % of a monomer containing no fluorine atom and having a viscosity at 25° C. of from 0.1 to 100 mPa·s, from 0.1 to 45 mass % of a fluoromonomer, from more than 0.1 to 20 mass % of a fluorinated surfactant and/or a fluoropolymer and from 1 to 10 mass % of a photopolymerization initiator, and contains substantially no solvent. A process for producing a micropattern-formed product comprising a cured product having a micropattern of a mold transferred on its surface, or such a micropattern-formed product integrated with a substrate, which uses the photocurable composition, a substrate and a mold having a micropattern.
摘要翻译：能够高效率地制造耐热性，耐药品性，脱模性，光学特性（透光率，低折射率）等物理性能的微图案形成品的光固化性组合物以及微图案形成体的制造方法，提供能够将模具的微图案高精度地传递到其表面的能力。一种光固化性组合物，其含有50〜98质量％的不含氟原子的单体，25℃下的粘度为0.1〜100mPa·s，0.1〜45质量％的氟单体，0.1以上至20质量％的氟化表面活性剂和/或含氟聚合物和1至10质量％的光聚合引发剂，并且基本上不含溶剂。一种微图案形成品的制造方法，其特征在于，包括具有在其表面上转移的模具的微图案的固化物，或使用该光固化性组合物的与基板一体化的微图案形成品，具有微图案的基板和模具。

6. 发明申请

US20090302507A1 MOLD, PROCESS FOR ITS PRODUCTION, AND PROCESS FOR PRODUCING BASE MATERIAL HAVING TRANSFERRED MICROPATTERN 审中-公开
标题翻译：模具，其生产工艺和生产具有转移微孔板的基体材料的方法
公开(公告)号：US20090302507A1
公开(公告)日：2009-12-10
申请号：US12542810
申请日：2009-08-18
申请人： Kentaro TSUNOZAKI , Yasuhide Kawaguchi , Yoshihiko Sakane , Shuichi Shoji , Jun Mizuno , Shingo Kataza
发明人： Kentaro TSUNOZAKI , Yasuhide Kawaguchi , Yoshihiko Sakane , Shuichi Shoji , Jun Mizuno , Shingo Kataza
IPC分类号： B29C35/08 , B28B5/00 , B29C33/40
CPC分类号： B29C59/02 , B29C33/40 , B29C33/424 , B29C33/56 , B29C35/0888 , B29C59/005 , B29L2011/00
摘要： To provide a mold having optical transparency, release properties, mechanical strength, dimension stability and a highly precise micropattern, and having less deformation of the micropattern; and a process for producing a base material with a transferred micropattern having less deformation of the transferred micropattern, capable of transferring highly precise micropattern of the mold.A mold 10 comprising a transparent substrate (A) 12 having chemical bonds based on the functional groups (x) on the surface having an interlayer (C) 14 formed, having a difference in linear expansion coefficient (absolute value) of less than 30 ppm/° C. from the linear expansion coefficient of the following fluoropolymer (I), and further having a heat distortion temperature of from 100 to 300° C.; an interlayer (C) 14 made of a fluoropolymer (II) having a fluorinated alicyclic structure in its main chain and further having reactive groups (y) reactive with the functional groups (x); and a surface layer (B) 16 having a micropattern on the surface, made of a fluoropolymer (I) having a fluorinated alicyclic structure in its main chain and having substantially no reactive groups (y).
摘要翻译：提供具有光学透明性，剥离性，机械强度，尺寸稳定性和高精度微图案的模具，并且具有较小的微图案变形; 以及具有转印微图案的转移微图案的基材的制造方法，该转印微图案具有较小的转印微图案的变形，能够转印模具的高精度微图案。一种模具10，其包括基于所述表面上具有中间层（C）14的官能团（x）的具有化学键的透明基板（A）12，所述中间层（C）14的线性膨胀系数（绝对值）小于30ppm /℃，与以下含氟聚合物（I）的线膨胀系数相比，进一步具有100〜300℃的热变形温度。由在其主链中具有氟化脂环结构的含氟聚合物（II）制成的中间层（C）14，并且还具有与官能团（x）反应的反应性基团（y）; 和表面层（B）16，其表面具有微图案，由主链中具有氟化脂环结构的含氟聚合物（I）制成，基本上没有反应性基团（y）。

7. 发明申请

US20090285927A1 IMPRINTING MOLD AND PROCESS FOR ITS PRODUCTION 失效
标题翻译：印刷模具及其生产工艺
公开(公告)号：US20090285927A1
公开(公告)日：2009-11-19
申请号：US12511215
申请日：2009-07-29
申请人： Katsuya Ueno , Yasuhide Kawaguchi
发明人： Katsuya Ueno , Yasuhide Kawaguchi
IPC分类号： B29C59/16 , B28B7/36
CPC分类号： B29C33/62 , B82Y10/00 , B82Y40/00 , G03F7/0002 , Y10T428/31663
摘要： To provide an imprinting mold, of which a coating layer formed on its surface is hardly susceptible to peeling, and a process for its production.An imprinting mold comprising a mold body and a coating layer made of a release agent, formed on the surface of the mold body, wherein the release agent contains a compound of the following formula (1), and a process for its production: wherein R is Rf-X-, both R are the same group, Rf is a perfluoroalkyl group, X is at least one member selected from —(OC3F6)—, —(OC2F4)— and —(OCF2)—, provided that the sum of such units is at least 1, Y is an organic group, is an average of n is from 2 to 10, Z is —Si(R1)m(R2)3-m, R1 is a hydroxyl group or a hydrolysable group, R2 is a hydrogen atom or a hydrocarbon group, and m is from 1 to 3.
摘要翻译：为了提供一种在其表面上形成的涂层几乎不易剥离的压印模及其制造方法。一种压印模具，包括模具体和由脱模剂制成的涂层，其形成在模具体的表面上，其中脱模剂含有下式（1）的化合物及其制备方法：其中R 是Rf-X-，两个R是相同的基团，Rf是全氟烷基，X是至少一个选自 - （OC 3 F 6） - ， - （OC 2 F 4） - 和 - （OCF 2） - ，条件是这些单元至少为1，Y为有机基团，n为2〜10的平均值，Z为-Si（R1）m（R2）3-m，R1为羟基或可水解基团，R2 是氢原子或烃基，m为1〜3。

8. 发明申请

US20070228619A1 MOLD, AND PROCESS FOR PRODUCING BASE MATERIAL HAVING TRANSFERRED MICROPATTERN 失效
标题翻译：模具和生产具有转移微孔板的基体材料的方法
公开(公告)号：US20070228619A1
公开(公告)日：2007-10-04
申请号：US11754526
申请日：2007-05-29
申请人： Yasuhide Kawaguchi , Yoshihiko Sakane , Daisuke Shirakawa
发明人： Yasuhide Kawaguchi , Yoshihiko Sakane , Daisuke Shirakawa
IPC分类号： B29C35/08 , B29C33/56
CPC分类号： G03F7/0002 , B29C33/40 , B29C33/424 , B29C33/56 , B29C35/0888 , B29C59/022 , B29C2059/023 , B29L2011/00 , B82Y10/00 , B82Y40/00
摘要： A mold and a process for producing a base material having a transferred micropattern are provided. A mold having a micropattern for molding a photocurable resin, which comprises a transparent substrate having chemical bonds resulting from functional groups (x) on a surface on which the following interlayer (A) is formed; the interlayer (A) present between said surface of the transparent substrate and the following surface layer (B); and the following surface layer (B) having a micropattern: Interlayer (A): a layer made of a fluoropolymer (1) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has reactive groups (y) reactive with said functional groups (x) Surface layer (B): a layer made of a fluoropolymer (2) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has substantially no reactive groups (y).
摘要翻译：提供了一种用于生产具有转移的微图案的基材的模具和方法。一种具有用于模制光固化树脂的微图案的模具，其包括在其上形成有下述中间层（A）的表面上由官能团（x）产生的具有化学键的透明基板; 存在于所述透明基板的所述表面和所述后表面层（B）之间的中间层（A）; 以及具有微图案的下述表面层（B）：层间（A）：由含氟聚合物（1）制成的层，所述氟聚合物是其主链中具有氟化脂环结构的含氟聚合物，并且具有与所述官能团（x）表面层（B）：由含氟聚合物（2）构成的层，其是在其主链中具有氟化脂环结构的氟聚合物，其基本上不具有反应性基团（y）。

9. 发明授权

US07441745B2 Mold, and process for producing base material having transferred micropattern 失效
标题翻译：模具，以及具有转移的微图案的基材的制造方法
公开(公告)号：US07441745B2
公开(公告)日：2008-10-28
申请号：US11754526
申请日：2007-05-29
申请人： Yasuhide Kawaguchi , Yoshihiko Sakane , Daisuke Shirakawa
发明人： Yasuhide Kawaguchi , Yoshihiko Sakane , Daisuke Shirakawa
IPC分类号： B29C35/08 , B29C33/56
CPC分类号： G03F7/0002 , B29C33/40 , B29C33/424 , B29C33/56 , B29C35/0888 , B29C59/022 , B29C2059/023 , B29L2011/00 , B82Y10/00 , B82Y40/00
摘要： A mold and a process for producing a base material having a transferred micropattem, wherein the mold comprises a transparent substrate having chemical bonds resulting from functional groups (x) on a surface on which an interlayer (A) is formed, the interlayer (A) present between the surface of the transparent substrate and a surface layer (B) which has a micropattem for molding a photocurable resin, wherein interlayer (A) is a layer made of a fluoropolymer (1) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has reactive groups (y) reactive with functional groups (x), and surface layer (B) is a layer made of a fluoropolymer (2) which is a fluoropolymer having a fluorinated alicyclic structure in its main chain and which has substantially no reactive groups (y).
摘要翻译：一种用于生产具有转移的微孔的基材的模具和方法，其中所述模具包括在其上形成有中间层（A）的表面上由官能团（x）产生的化学键的透明基板，所述中间层（A）存在于透明基板的表面和具有用于成型光固化性树脂的微细颗粒的表面层（B）之间，其中，中间层（A）为由具有氟化脂环结构的含氟聚合物的氟聚合物（1）其主链和具有与官能团（x）和表面层（B）反应的反应性基团（y）是由在其主链中具有氟化脂环结构的含氟聚合物的含氟聚合物（2）制成的层，基本上没有反应性基团（y）。

10. 发明授权

US07026416B2 Fluoropolymer 失效
标题翻译：含氟聚合物
公开(公告)号：US07026416B2
公开(公告)日：2006-04-11
申请号：US11124133
申请日：2005-05-09
申请人： Yasuhide Kawaguchi , Shinji Okada , Yoko Takebe , Osamu Yokokoji , Isamu Kaneko
发明人： Yasuhide Kawaguchi , Shinji Okada , Yoko Takebe , Osamu Yokokoji , Isamu Kaneko
IPC分类号： C08F136/16 , C08F236/16 , C08F36/16 , G03F7/039
CPC分类号： C08F214/18 , C08F36/20 , C08F2/60
摘要： To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter.A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2 (3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.
摘要翻译：提供适合作为波长为250nm以下的准分子激光的抗蚀剂材料的基础聚合物的氟聚合物。具有由下式（3）表示的氟化二烯化合物的环化聚合形成的单体单元的含氟聚合物，<？in-line-formula description =“In-Line Formulas”end =“lead”→> CF 2 -CFCF 2 -C（CF 3）（R 5）CH 2 CH- （3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R 5是羟基被封闭或具有羟基的有机基团，R 8为环状饱和烃，例如环烷基其可以具有取代基，或具有环状饱和烃的有机基团。

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