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    • 7. 发明申请
    • Superconducting thin film having columnar pinning centers utilizing nano dots and method of making the same
    • 具有使用纳米点的柱状钉扎中心的超导薄膜及其制造方法
    • US20090048113A1
    • 2009-02-19
    • US12285593
    • 2008-10-09
    • Ioan Adrian CrisanHideo IharaYoshiko IharaHideyo IharaHidetaka IharaGen-ei IharaChiaki Ihara
    • Ioan Adrian CrisanHideo IharaYoshiko IharaHideyo IharaHidetaka IharaGen-ei IharaChiaki Ihara
    • H01L39/02H01L39/24
    • H01L39/2483Y10T428/24612
    • A superconducting thin film is disclosed having columnar pinning centers utilizing nano dots, and comprising nano dots (3) which are formed insularly on a substrate (2) and three-dimensionally in shape and composed of a material other than a superconducting material and also other than a material of which the substrate is formed, columnar defects (4) composed of the superconducting material and grown on the nano dots (3), respectively, a lattice defect (6) formed on a said columnar defect (4), and a thin film of the superconducting material (5) formed in those areas on the substrate which are other than those where said columnar defects are formed. The superconducting thin film (5) is prepared by depositing the material other than the superconducting material on the substrate (2) while controlling the substrate (2) temperature, and the film thickness of the material deposited so to coagulate the deposited material to form the nano dots (3), and then growing a thin film of the superconducting material (5) on the substrate (2). An improved superconducting thin film is thus provided which regardless of its type is at least ten times higher in critical current density than an exiting superconducting thin film, and which can also be manufactured at a low cost. And, being large in critical superconducting current density and critical superconducting magnetic field, it is advantageously applicable to the technical fields of cryogenic electronics and microwaves.
    • 公开了一种使用纳米点的柱状钉扎中心的超导薄膜,并且包括在基片(2)上分别形成并三维形状并由超导材料以外的材料构成的纳米点(3) 除了形成基板的材料之外,分别由超导材料构成并在纳米点(3)上生长的柱状缺陷(4)形成在所述柱状缺陷(4)上的晶格缺陷(6),以及 在基板上形成的那些区域中形成的超导材料(5)的薄膜不同于形成所述柱状缺陷的区域。 超导薄膜(5)通过将超导材料以外的材料沉积在衬底(2)上同时控制衬底(2)的温度和沉积的材料的膜厚度使沉积的材料凝结而形成 纳米点(3),然后在衬底(2)上生长超导材料(5)的薄膜。 因此,提供了一种改进的超导薄膜,其与其离型超导薄膜的临界电流密度相比其类型至少高十倍,并且也可以以低成本制造。 而且,在临界超导电流密度和临界超导磁场范围较大的情况下,它有利于低温电子和微波的技术领域。
    • 10. 发明授权
    • Selective reduction type high temperature superconductor and methods of making the same
    • 选择性还原型高温超导体及其制造方法
    • US06767866B1
    • 2004-07-27
    • US09926228
    • 2001-09-26
    • Hideo Ihara
    • Hideo Ihara
    • C04B10100
    • H01L39/126
    • Proposed are a selective reduction type high temperature superconductor and methods of making the same, the superconductor having a pair of charge supply layers each formed of a Cu1-xMx surface (1, 1), a first superconducting layer formed of a 5-coordination CuO2 surface (2) and a second superconducting layer formed of a 4-coordination CuO2 surface (3). Reducing M ions (e.g., Tl ions) in the charge supply layers by heat treatment in a reducing atmosphere enables the 5-coordination CuO2 surface (2) as the first superconducting layer to be over-doped and the 4-coordination CuO2 surface (3) as the second superconducting layer to be optimum-doped. According to the present invention, a high temperature superconductor is provided that with its critical temperature held high has a reduced superconducting anisotropy &ggr;, and provides a high critical current density Jc and a high c irreversibility field Hirr.
    • 提出了一种选择性还原型高温超导体及其制造方法,该超导体具有由Cu1-xMx表面(1,1)形成的一对电荷供给层,由五配位CuO 2形成的第一超导层 表面(2)和由4-配位CuO 2表面(3)形成的第二超导层。 通过在还原气氛中进行热处理,在电荷供给层中还原M离子(例如,Tl离子)使得能够将作为第一超导层的5-配位CuO 2表面(2)过掺杂,并且将4-配位CuO 2表面(3 )作为最佳掺杂的第二超导层。 根据本发明,提供了一种高温超导体,其临界温度保持较高,具有降低的超导各向异性γ,并提供高临界电流密度Jc和高c不可逆性场Hirr。