专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09209010B2 Substrate cleaning method and substrate cleaning device 有权
标题翻译：基板清洗方法和基板清洗装置
公开(公告)号：US09209010B2
公开(公告)日：2015-12-08
申请号：US13579772
申请日：2011-02-03
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Masaki Narushima
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Masaki Narushima
IPC分类号： B08B5/02 , B08B7/00 , H01L21/02 , H01L21/67
CPC分类号： H01L21/02057 , B08B5/02 , H01L21/02046 , H01L21/67028
摘要： A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material 22 placed in a near-vacuum, producing clusters 21 made up of a multitude of gas molecules 20, and the clusters 21 collide with the wafer W without undergoing ionization.
摘要翻译：基板清洗方法包括除去附着在基板上的异物，同时防止基板和在基板上或上方形成的任何膜的劣化。在0.3MPa和2.0MPa之间的压力下的清洁气体被喷射到具有接近真空的附着异物22的晶片W上，从而产生由多个气体分子20构成的团簇21，并且团簇21与晶片W不经历电离。

2. 发明申请

US20130056033A1 SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE 有权
标题翻译：基板清洗方法和基板清洗装置
公开(公告)号：US20130056033A1
公开(公告)日：2013-03-07
申请号：US13579772
申请日：2011-02-03
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Masaki Narushima
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Masaki Narushima
IPC分类号： B08B5/02
CPC分类号： H01L21/02057 , B08B5/02 , H01L21/02046 , H01L21/67028
摘要： A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material 22 placed in a near-vacuum, producing clusters 21 made up of a multitude of gas molecules 20, and the clusters 21 collide with the wafer W without undergoing ionization.
摘要翻译：基板清洗方法包括除去附着在基板上的异物，同时防止基板和在基板上或上方形成的任何膜的劣化。在0.3MPa和2.0MPa之间的压力下的清洁气体被喷射到具有接近真空的附着异物22的晶片W上，从而产生由多个气体分子20构成的团簇21，并且团簇21与晶片W不经历电离。

3. 发明申请

US20100101608A1 SUBSTRATE CLEANING METHOD AND APPARATUS 有权
标题翻译：基板清洗方法和装置
公开(公告)号：US20100101608A1
公开(公告)日：2010-04-29
申请号：US12604686
申请日：2009-10-23
申请人： Hidefumi MATSUI , Tsuyoshi Moriya
发明人： Hidefumi MATSUI , Tsuyoshi Moriya
IPC分类号： B08B7/00
CPC分类号： B08B7/0071 , B08B7/0064 , B08B7/02 , H01L21/67028 , H01L21/67115
摘要： A substrate cleaning method for cleaning and removing foreign materials adhered to a surface of a substrate includes heating the substrate to peel off the foreign materials from the surface of the substrate by a thermal stress, removing the foreign materials from the surface of the substrate by a temperature gradient created in a proximity of the surface of the substrate, and collecting the foreign materials removed from the surface of the substrate by a collecting unit facing the substrate.
摘要翻译：用于清洁和去除附着在基板表面上的异物的基板清洗方法包括加热基板以通过热应力从基板的表面剥离异物，通过以下步骤从基板的表面除去异物：在衬底表面附近产生的温度梯度，以及通过面向衬底的收集单元收集从衬底表面去除的异物。

4. 发明授权

US08585831B2 Substrate cleaning method 失效
标题翻译：基材清洗方法
公开(公告)号：US08585831B2
公开(公告)日：2013-11-19
申请号：US13255723
申请日：2010-03-10
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
IPC分类号： B08B3/00
CPC分类号： H01L21/02101 , H01L21/02071 , H01L21/67051 , H01L21/67109
摘要： There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.
摘要翻译：提供一种基板清洗方法，其能够以简单的构造在短时间内清洁其上形成微细图案的基板，而不会对微细图案产生有害影响。在该方法中，将基板从用于在基板表面上进行处理的处理室转移到用于清洁基板的清洁室。将基板冷却至清洁室内的温度。将超流体供给到基板的表面，并且当超流体从基板的表面流过时，精细图案中的污染物成分与超流体一起流出。

5. 发明授权

US08475602B2 Substrate cleaning method and apparatus 有权
标题翻译：基板清洗方法及装置
公开(公告)号：US08475602B2
公开(公告)日：2013-07-02
申请号：US12604686
申请日：2009-10-23
申请人： Hidefumi Matsui , Tsuyoshi Moriya
发明人： Hidefumi Matsui , Tsuyoshi Moriya
IPC分类号： B08B6/00 , B08B11/00
CPC分类号： B08B7/0071 , B08B7/0064 , B08B7/02 , H01L21/67028 , H01L21/67115
摘要： A substrate cleaning method for cleaning and removing foreign materials adhered to a surface of a substrate includes heating the substrate to peel off the foreign materials from the surface of the substrate by a thermal stress, removing the foreign materials from the surface of the substrate by a temperature gradient created in a proximity of the surface of the substrate, and collecting the foreign materials removed from the surface of the substrate by a collecting unit facing the substrate.
摘要翻译：用于清洁和去除附着在基板表面上的异物的基板清洗方法包括加热基板以通过热应力从基板的表面剥离异物，通过以下步骤从基板的表面除去异物：在衬底表面附近产生的温度梯度，以及通过面向衬底的收集单元收集从衬底表面去除的异物。

6. 发明申请

US20120031434A1 SUBSTRATE CLEANING METHOD 失效
标题翻译：基板清洗方法
公开(公告)号：US20120031434A1
公开(公告)日：2012-02-09
申请号：US13255723
申请日：2010-03-10
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
IPC分类号： B08B7/00 , B08B3/08 , H01L21/02
CPC分类号： H01L21/02101 , H01L21/02071 , H01L21/67051 , H01L21/67109
摘要： There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.
摘要翻译：提供一种基板清洗方法，其能够以简单的构造在短时间内清洁其上形成微细图案的基板，而不会对微细图案产生有害影响。在该方法中，将基板从用于在基板表面上进行处理的处理室转移到用于清洁基板的清洁室。将基板冷却至清洁室内的温度。将超流体供给到基板的表面，并且当超流体从基板的表面流过时，精细图案中的污染物成分与超流体一起流出。

7. 发明申请

US20100104760A1 VACUUM EXHAUST METHOD AND A SUBSTRATE PROCESSING APPARATUS THEREFOR 审中-公开
标题翻译：真空排气方法及其基板处理装置
公开(公告)号：US20100104760A1
公开(公告)日：2010-04-29
申请号：US12606569
申请日：2009-10-27
申请人： Hidefumi MATSUI , Tsuyoshi Moriya , Nobuyuki Nagayama
发明人： Hidefumi MATSUI , Tsuyoshi Moriya , Nobuyuki Nagayama
IPC分类号： B05D7/00 , B05C11/00
CPC分类号： B08B7/04 , B08B5/04 , B08B6/00 , B08B7/0035 , C23C16/4401 , C23C16/4412
摘要： A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member.
摘要翻译：基板处理装置的真空排气方法在向大气开放之后，对其中具有用于在其上安装目标基板的安装台的真空处理室进行减压。真空排气方法包括用保护构件覆盖安装台的表面; 密封真空处理室; 真空抽真空处理室; 并且通过所述保护构件吸附至少一种异物和外部气体。

8. 发明授权

US09022225B2 Filtration filter and production method therefor 有权
标题翻译：过滤过滤器及其生产方法
公开(公告)号：US09022225B2
公开(公告)日：2015-05-05
申请号：US14006177
申请日：2012-03-13
申请人： Tsuyoshi Moriya , Asao Yamashita
发明人： Tsuyoshi Moriya , Asao Yamashita
IPC分类号： B01D25/00 , B01D29/62 , B01D29/46 , B01D63/08 , B01D39/16 , B01D39/20 , B01D61/02 , B01D61/04 , B01D69/10 , B01D29/00 , B01D61/24 , B01D65/02
CPC分类号： B01D29/62 , A61M2205/7563 , B01D29/46 , B01D39/16 , B01D39/1692 , B01D39/2003 , B01D39/2027 , B01D39/2055 , B01D39/2068 , B01D61/025 , B01D61/04 , B01D61/243 , B01D63/084 , B01D65/02 , B01D69/10 , B01D2311/04 , B01D2311/06 , B01D2313/02 , B01D2313/14 , B01D2321/04 , Y10T29/49826 , B01D2311/2642 , B01D2311/2626 , B01D2311/12 , B01D2311/2692
摘要： Provided is a filtration filer with which a stable opening size during filtration is obtained, and which can be easily regenerated when clogged and used repeatedly. The filtration filter (10) comprises: a substrate stack wherein substrates (11) that have a through hole that penetrates from front to back are stacked; stoppers (15) that define the spacing between the substrates (11); and pillars (16) with a larger thermal expansion coefficient than the stoppers (15). The spacing between the substrates (11) at normal temperature is defined at least by the stoppers (15), and the spacing when heated is defined by the thermally expanded pillars (16). The gaps between the substrates (11) form the filtration surface that traps contaminants contained in the liquid that is being treated A.
摘要翻译：提供了一种过滤器，其在过滤期间具有稳定的开口尺寸，并且可以在被堵塞并重复使用时容易地再生。过滤器（10）包括：基板叠层，其中具有从前到后穿透的通孔的基板（11）被堆叠; 限定基板（11）之间的间隔的止动件（15）; 和具有比止动件（15）更大的热膨胀系数的柱（16）。在正常温度下，基板（11）之间的间隔至少由止挡件（15）限定，加热时的间隔由热膨胀的支柱（16）限定。基板（11）之间的间隙形成了捕获正在处理的液体中的污染物的过滤表面。

9. 发明授权

US08854625B2 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring 有权
标题翻译：包括颗粒监测单元，颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
公开(公告)号：US08854625B2
公开(公告)日：2014-10-07
申请号：US12985099
申请日：2011-01-05
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： G01N21/00 , C23C14/00 , H01J37/32 , B08B9/08 , G01N15/02 , G01N15/06
CPC分类号： H01J37/32935 , B08B9/08 , G01N15/0272 , G01N15/06 , G01N2015/0693 , Y10T428/30 , Y10T428/315 , Y10T428/8305
摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.
摘要翻译：粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层，其中所述表面处理层含有选自钇和氟化钙的一种材料。

10. 发明授权

US08498911B2 Particle generation factor determining system, charging method and storage medium 有权
标题翻译：粒子生成因子决定系统，计费方法和存储介质
公开(公告)号：US08498911B2
公开(公告)日：2013-07-30
申请号：US12820692
申请日：2010-06-22
申请人： Tsuyoshi Moriya
发明人： Tsuyoshi Moriya
IPC分类号： G06Q40/00
CPC分类号： G06Q30/06 , G06Q30/0283 , G06Q30/04 , H01L22/12
摘要： Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device 11 through which a user inputs a particle map and a server 13, the server 13 calculates accuracy of each of multiple particle generation factors based on the particle map; the user interface device 11 displays the calculated accuracy or a title of generation-factor-relevant information 27 on each particle generation factor corresponding to this accuracy; the server 13 provides the generation-factor-relevant information 27 to the user interface device 11; a charged fee for providing particle generation-factor-relevant information 27 is determined based on accuracy of a particle generation factor corresponding to the provided generation-factor-relevant information 27.
摘要翻译：提供了一种能够向用户提供使用粒子生成因子确定系统的激励的计费方法。在包括用户通过其输入粒子映射的用户界面装置11和服务器13的粒子生成因子确定系统中，服务器13基于粒子图计算多个粒子生成因子中的每一个的精度; 用户界面装置11对与该精度对应的每个粒子生成因子显示计算出的生成因子相关信息27的精度或标题; 服务器13向用户接口设备11提供生成因子相关信息27; 基于与所提供的生成因子相关信息27相对应的粒子生成因子的精度，确定用于提供粒子生成因子相关信息27的收费。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式