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1. 发明授权

US06499426B1 System and method for coating non-planar surfaces of objects with diamond film 失效
标题翻译：用金刚石膜涂覆物体的非平面表面的系统和方法
公开(公告)号：US06499426B1
公开(公告)日：2002-12-31
申请号：US09460337
申请日：1999-12-10
申请人： Henry Windischmann , Cecil B. Shepard, Jr. , Donald O. Patten, Jr.
发明人： Henry Windischmann , Cecil B. Shepard, Jr. , Donald O. Patten, Jr.
IPC分类号： C23C410
CPC分类号： C23C16/276 , C23C16/45591 , C23C16/513 , Y02T50/67
摘要： A system and method for depositing a CVD diamond coating on a non-planar surface of an object is provided. The system includes a deflector having a deflecting surface which resists diamond coating by the diamond forming reagents produced by the system and which is adapted to withstand the relatively high deposition temperatures is provided. The deflector is positioned substantially axially with an axis of the distribution head of the CVD engine. The deflector is preferably generally wedge-shaped or conical and coupled to a motor which is adapted to rotate the deflector at a relatively high speed. A mandrel may be positioned about or to one side of the deflector. The deflector is oriented with respect to the distribution head and the mandrel such that a jet exiting the distribution head is deflected by the deflector onto a surface of an object positioned on the mandrel. The object surface may be non-planar.
摘要翻译：提供了一种用于在物体的非平面表面上沉积CVD金刚石涂层的系统和方法。该系统包括具有偏转表面的偏转器，该偏转表面通过由系统产生的金刚石形成试剂抵抗金刚石涂层，并且适于承受相对高的沉积温度。偏转器基本上与CVD发动机的分配头的轴线轴向地定位。偏转器优选地大致为楔形或锥形并且联接到电动机，其适于以相对高的速度旋转偏转器。心轴可以定位在偏转器的大约或一侧。偏转器相对于分配头和心轴定向，使得离开分配头的射流被偏转器偏转到位于心轴上的物体的表面上。物体表面可以是非平面的。

2. 发明授权

US5551983A Method and apparatus for depositing a substance with temperature control 失效
标题翻译：用温度控制沉积物质的方法和装置
公开(公告)号：US5551983A
公开(公告)日：1996-09-03
申请号：US332832
申请日：1994-11-01
申请人： Cecil B. Shepard, Jr. , Michael S. Heuser , Daniel V. Raney , William A. Quirk , Gregory Bak-Boychuk
发明人： Cecil B. Shepard, Jr. , Michael S. Heuser , Daniel V. Raney , William A. Quirk , Gregory Bak-Boychuk
IPC分类号： C23C16/458 , C23C16/00
CPC分类号： C23C16/4584
摘要： An apparatus for depositing a substance with temperature control includes, in one embodiment: a mandrel rotatable on an axis; a spacer mounted on the mandrel; a substance mounted on the spacer; a plasma, containing constituents of the substance being deposited, directed toward the substrate; the spacer having a thermal conductance in its thickness direction that varies with radial dimension.
摘要翻译：一种具有温度控制的物质沉积装置包括在一个实施例中：可在轴上旋转的心轴; 安装在心轴上的间隔件; 安装在间隔物上的物质; 含有被沉积物质的成分的等离子体指向基底; 间隔物的厚度方向上的导热性随径向尺寸而变化。

3. 发明授权

US5435849A Apparatus for plasma deposition 失效
标题翻译：等离子体沉积设备
公开(公告)号：US5435849A
公开(公告)日：1995-07-25
申请号：US3573
申请日：1993-01-13
申请人： Gordon L. Cann , Cecil B. Shepard, Jr. , Frank X. McKevitt
发明人： Gordon L. Cann , Cecil B. Shepard, Jr. , Frank X. McKevitt
IPC分类号： C23C16/27 , C23C16/458 , C23C16/513 , C23C16/50
CPC分类号： C23C16/27 , C23C16/458 , C23C16/4584 , C23C16/513
摘要： The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.
摘要翻译：等离子体喷射沉积系统中的衬底具有有助于有效沉积的结构属性，例如孔和/或凹槽。一组基板相对于等离子体束以一种有利于有效沉积的方式布置。除了增加与衬底表面或表面接触的等离子体束体积的部分之外，有利的是提供有效排出废流体离开衬底，使得包含操作性物质的新鲜等离子体可以容易地和连续地接触衬底表面。

4. 发明授权

US06406760B1 Diamond film deposition on substrate arrays 失效
标题翻译：金刚石膜沉积在衬底阵列上
公开(公告)号：US06406760B1
公开(公告)日：2002-06-18
申请号：US09618225
申请日：2000-07-18
申请人： Cecil B. Shepard, Jr.
发明人： Cecil B. Shepard, Jr.
IPC分类号： C23C1600
CPC分类号： C23C16/463 , C23C16/276 , C23C16/4582
摘要： A method is disclosed for depositing diamond film on a plurality of substrates, which comprises the steps of: providing a plasma beam containing atomic hydrogen and a carbonaceous component; providing a plurality of substrates, each of the substrates having a deposited surface, the substrates being arranged such that the beam impinges successively on a deposition surface of a first substrate and then on a deposition surface of a second substrate, the deposition surfaces of the first and second substrates being oriented with respect to each other at a non-zero angle.
摘要翻译：公开了一种用于在多个衬底上沉积金刚石膜的方法，其包括以下步骤：提供含有原子氢和碳质组分的等离子体束; 提供多个基板，每个基板具有沉积表面，所述基板被布置成使得所述光束依次撞击在第一基板的沉积表面上，然后在第二基板的沉积表面上，所述第一基板的沉积表面并且第二基板相对于彼此以非零角度取向。

5. 发明授权

US06173672B1 Diamond film deposition on substrate arrays 失效
标题翻译：金刚石膜沉积在衬底阵列上
公开(公告)号：US06173672B1
公开(公告)日：2001-01-16
申请号：US08870604
申请日：1997-06-06
申请人： Cecil B. Shepard, Jr.
发明人： Cecil B. Shepard, Jr.
IPC分类号： C23C1600
CPC分类号： C23C16/463 , C23C16/276 , C23C16/4582
摘要： Apparatus is disclosed for depositing diamond film on a plurality of substrates, and includes: a plasma beam containing atomic hydrogen and a carbonaceous component, and a plurality of substrates, each of the substrates having a deposition surface, the substrates being arranged such that the beam impinges successively on a deposition surface of a first of the substrates and then on a deposition surface of a second of the substrates, the deposition surfaces of the first and second substrates being oriented with respect to each other at a non-zero angle.
摘要翻译：公开了用于在多个基板上沉积金刚石膜的装置，并且包括：含有原子氢和碳质成分的等离子体束，以及多个基板，每个基板具有沉积表面，所述基板被布置成使得所述光束依次在第一基板的沉积表面上撞击，然后在第二基板的沉积表面上，第一和第二基板的沉积表面相对于彼此以非零角定向。

6. 发明授权

US5683759A Method for depositing a substance with temperature control 失效
标题翻译：温度控制物质沉积方法
公开(公告)号：US5683759A
公开(公告)日：1997-11-04
申请号：US674203
申请日：1996-07-01
申请人： Cecil B. Shepard, Jr. , Michael S. Heuser , Daniel V. Raney , William A. Quirk , Gregory Bak-Boychuk
发明人： Cecil B. Shepard, Jr. , Michael S. Heuser , Daniel V. Raney , William A. Quirk , Gregory Bak-Boychuk
IPC分类号： C23C16/458 , B05D3/06 , C23C16/00
CPC分类号： C23C16/4584
摘要： A method for depositing a substance, such as diamond, by plasma deposition on a substrate mounted over a madrel cooled by a heat exchange, comprising the steps of: determining the heat flux at the deposition surface of the substrate; providing, between said mandrel and said substrate, a spacer having a thermal conductance in its thickness direction that varies in accordance with said determined heat flux; and depositing said substance on said substrate by said plasma deposition.
摘要翻译：一种用于通过等离子体沉积将诸如金刚石的物质沉积在安装在通过热交换器冷却的马氏体上的衬底上的方法，包括以下步骤：确定衬底的沉积表面处的热通量; 在所述心轴和所述衬底之间提供在其厚度方向上具有根据所述确定的热通量而变化的热导率的间隔物; 并通过所述等离子体沉积将所述物质沉积在所述衬底上。

7. 发明授权

US5487787A Apparatus and method for plasma deposition 失效
标题翻译：用于等离子体沉积的装置和方法
公开(公告)号：US5487787A
公开(公告)日：1996-01-30
申请号：US369427
申请日：1995-01-06
申请人： Gordon L. Cann , Cecil B. Shepard, Jr. , Frank X. McKevitt
发明人： Gordon L. Cann , Cecil B. Shepard, Jr. , Frank X. McKevitt
IPC分类号： C23C16/27 , C23C16/458 , C23C16/513 , C23C16/00
CPC分类号： C23C16/27 , C23C16/458 , C23C16/4584 , C23C16/513
摘要： The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.
摘要翻译：等离子体喷射沉积系统中的衬底具有有助于有效沉积的结构属性，例如孔和/或凹槽。一组基板相对于等离子体束以一种有利于有效沉积的方式布置。除了增加与衬底表面或表面接触的等离子体束体积的部分之外，有利的是提供有效排出废流体离开衬底，使得包含操作性物质的新鲜等离子体可以容易地和连续地接触衬底表面。

8. 发明授权

US5342660A Method for plasma jet deposition 失效
标题翻译：等离子体喷射沉积方法
公开(公告)号：US5342660A
公开(公告)日：1994-08-30
申请号：US698538
申请日：1991-05-10
申请人： Gordon L. Cann , Cecil B. Shepard, Jr.
发明人： Gordon L. Cann , Cecil B. Shepard, Jr.
IPC分类号： C23C16/27 , C23C16/458 , C23C16/513 , B05D3/06
CPC分类号： C23C16/458 , C23C16/27 , C23C16/4584 , C23C16/513
摘要： The disclosure is directed to a method for depositing a substance, such as synthetic diamond. A plasma beam is produced, and contains the constituents of the substance to be deposited. A substrate is provided, and has a surface in the path of the beam, the area of said surface being substantially larger than the cross-sectional area of the beam impinging on the surface. Repetitive motion is introduced between the substrate and the beam as the substance is deposited on the surface. The substrate, the beam, or both can be moved. Spinning of the substrate, with the beam non-concentric thereon, is one of the disclosed techniques.
摘要翻译：本公开涉及用于沉积诸如人造金刚石的物质的方法。产生等离子体束，并含有待沉积物质的成分。提供基板，并且在光束的路径中具有表面，所述表面的面积基本上大于撞击在表面上的光束的横截面积。当物质沉积在表面上时，在基板和光束之间引入重复运动。可移动基板，光束或两者。衬底的旋转，其中与其不同心的光束是所公开的技术之一。

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