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1. 发明授权

US07081511B2 Process for making polyesters 有权
标题翻译：制作聚酯的方法
公开(公告)号：US07081511B2
公开(公告)日：2006-07-25
申请号：US10817987
申请日：2004-04-05
申请人： Hengpeng Wu , Jianhui Shan , Shuji Sue Ding-Lee , Zhong Xhiang , Eleazor B. Gonzalez , Mark O. Neisser
发明人： Hengpeng Wu , Jianhui Shan , Shuji Sue Ding-Lee , Zhong Xhiang , Eleazor B. Gonzalez , Mark O. Neisser
IPC分类号： C08G63/00
CPC分类号： C08J7/047 , C08G63/46 , C08G63/916 , C08J2383/00 , C08J2467/00 , Y10T428/31504 , Y10T428/31786
摘要： The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.
摘要翻译：本发明涉及一种制备其中二酐与二醇反应的聚酯的方法。所得聚酯可以进一步与选自芳族氧化物，脂族氧化物，碳酸亚烷基酯，醇及其混合物的化合物反应。

2. 发明授权

US07824844B2 Solvent mixtures for antireflective coating compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射涂料组合物的溶剂混合物
公开(公告)号：US07824844B2
公开(公告)日：2010-11-02
申请号：US11624744
申请日：2007-01-19
申请人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
发明人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
IPC分类号： G03F7/40 , G03F7/30 , G03F7/11 , C08F8/30 , H01L21/027
CPC分类号： G03F7/091 , C09D7/20 , G03F7/0048
摘要： The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.
摘要翻译：本发明涉及一种抗反射涂料组合物，其能够涂覆在光致抗蚀剂层下面，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少一种主要有机溶剂和至少一种选择的二级有机溶剂其中R 1，R 3和R 4选自H和C 1 -C 6烷基，R 2，R 5，R 6，R 7，R 8和R 9选自C 1 -C 6烷基， n = 1-5。本发明还涉及能够涂覆在光致抗蚀剂层下面的抗反射涂料组合物，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少2种有机溶剂，并且其中抗反射涂料组合物具有在加速老化后，0.2微米的液体颗粒数小于100 / ml。

3. 发明授权

US06800415B2 Negative-acting aqueous photoresist composition 有权
标题翻译：负性水性光致抗蚀剂组合物
公开(公告)号：US06800415B2
公开(公告)日：2004-10-05
申请号：US09966958
申请日：2001-09-28
申请人： Ping-Hung Lu , Mark O. Neisser , Ralph R. Dammel , Hengpeng Wu
发明人： Ping-Hung Lu , Mark O. Neisser , Ralph R. Dammel , Hengpeng Wu
IPC分类号： G03C173
CPC分类号： G03F7/0382 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： The invention relates to a novel negative, aqueous photoresist composition comprising a polyvinylacetal polymer, a water-soluble photoactive compound and a crosslinking agent. The water-soluble photoactive compound is preferably a sulfonium salt. The invention also relates to forming a negative image from the novel photoresist composition.
摘要翻译：本发明涉及包含聚乙烯醇缩醛聚合物，水溶性光敏化合物和交联剂的新型负性水性光致抗蚀剂组合物。水溶性光活性化合物优选为锍盐。本发明还涉及从新型光致抗蚀剂组合物形成负像。

4. 发明授权

US07824837B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US07824837B2
公开(公告)日：2010-11-02
申请号：US11876332
申请日：2007-10-22
申请人： Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Hengpeng Wu , Mark O. Neisser , Shuji S Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/095 , G03F7/039 , G03F7/11
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

5. 发明授权

US08039202B2 Positive-working photoimageable bottom antireflective coating 有权
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US08039202B2
公开(公告)日：2011-10-18
申请号：US11877891
申请日：2007-10-24
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark O. Neisser , Tomohide Katayama , Shuji S. Ding-Lee , Aritaka Hishida , Joseph E. Oberlander , Medhat E. Toukhy
IPC分类号： G03F7/26
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

6. 发明授权

US08691925B2 Compositions of neutral layer for directed self assembly block copolymers and processes thereof 有权
标题翻译：用于定向自组装嵌段共聚物的中性层组合物及其工艺
公开(公告)号：US08691925B2
公开(公告)日：2014-04-08
申请号：US13243640
申请日：2011-09-23
申请人： Hengpeng Wu , Yi Cao , SungEun Hong , Jian Yin , Margareta Paunescu , Mark O. Neisser , Guanyang Lin
发明人： Hengpeng Wu , Yi Cao , SungEun Hong , Jian Yin , Margareta Paunescu , Mark O. Neisser , Guanyang Lin
IPC分类号： C08F118/02 , G03F7/20 , C08L33/12
CPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , C08F212/08 , C08F212/32 , C08F220/14 , C08F293/00 , C08L53/00 , C09D125/14 , C09D125/16 , G03F7/0002 , G03F7/2037
摘要： The present invention relates to novel neutral layer compositions and methods for using the compositions. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) where R1 is selected from the group consisting of a C1-C8 alkyl, C1-C8 fluoroalkyl moiety, C1-C8 partially fluorinated alkyl, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl and C1-C8 fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, C1-C8 alkyl and a C1-C8 fluoroalkyl and m ranges from 1 to 3.
摘要翻译：本发明涉及新型中性层组合物和使用该组合物的方法。中性层组合物包含至少一种具有至少一个结构单元（1），至少一个结构单元（2）和至少一个结构单元（3）的无规共聚物，其中R1选自 C 1 -C 8烷基，C 1 -C 8氟烷基部分，C 1 -C 8部分氟化烷基，C 4 -C 8环烷基，C 4 -C 8环氟烷基，C 4 -C 8部分氟化环烷基和C 2 -C 8羟烷基; R2，R3和R5独立地选自H，C1-C4烷基，CF3和F; R 4选自H，C 1 -C 8烷基，C 1 -C 8部分氟化烷基和C 1 -C 8氟代烷基，n为1至5，R 6选自H，F，C 1 -C 8烷基和C 1 -C 8氟烷基，m为1至3。

7. 发明申请

US20080176165A1 Solvent Mixtures for Antireflective Coating Compositions for Photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射涂料组合物的溶剂混合物
公开(公告)号：US20080176165A1
公开(公告)日：2008-07-24
申请号：US11624744
申请日：2007-01-19
申请人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
发明人： Zhong Xiang , Hengpeng Wu , Hong Zhuang , Eleazar Gonzalez , Mark O. Neisser
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , C09D7/20 , G03F7/0048
摘要： The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.
摘要翻译：本发明涉及一种抗反射涂料组合物，其能够涂覆在光致抗蚀剂层下面，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少一种主要有机溶剂和至少一种选择的二级有机溶剂其中R 1，R 3，R 3和R 4中的任一个选自H和C 1， R 1，R 2，R 5，R 6，R 5，R 5，R 6， R 7，R 8和R 9选自C 1 -C 6 - ， - 并且n = 1-5。本发明还涉及能够涂覆在光致抗蚀剂层下面的抗反射涂料组合物，其中抗反射涂料组合物包含聚合物交联剂和溶剂混合物，其中溶剂混合物包含至少2种有机溶剂，并且其中抗反射涂料组合物具有在加速老化后，0.2微米的液体颗粒数小于100 / ml。

8. 发明授权

US07264913B2 Antireflective compositions for photoresists 有权
标题翻译：用于光致抗蚀剂的抗反射组合物
公开(公告)号：US07264913B2
公开(公告)日：2007-09-04
申请号：US10301462
申请日：2002-11-21
申请人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
发明人： Hengpeng Wu , Shuji Ding-Lee , Zhong Xiang , Joseph E. Oberlander , Mark O. Neisser , Eleazar Gonzalez , Jainhui Shan
IPC分类号： G03C1/825 , G03C1/74 , G03F7/20 , G03F7/30 , G03F7/36
CPC分类号： G03F7/091 , G03F7/038 , G03F7/0382 , Y10S430/109 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R1, R′ and R″ are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, —O(CO)Z, —C(CF3)2Z, —C(CF3)2(CO)OZ, —SO2CF3, —(CO)OZ, —SO3Z, —COZ, —OZ, —NZ2, —SZ, —SO2Z, —NHCOZ, —NZCOZ or —SO2NZ2, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1–4, X is O, CO, S, COO, CH2O, CH2COO, SO2, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0–3.
摘要翻译：本发明涉及包含聚合物，交联剂和酸发生剂的新型抗反射涂料组合物。本发明还涉及使用该组合物的方法，特别是在193nm。本发明的聚合物含有至少一种选自结构1,2和3的单元，其中Y是1至约10个碳原子的烃基连接基团，R 1，R 1，R' 和R“独立地为氢，1至约10个碳原子的烃基，卤素，-O（CO）Z，-C（CF 3）2 Z， -C（CF 3）2（CO）OZ，-SO 2 CF 3 - ， - （CO） OZ，-SO 3 Z，-COZ，-OZ，-NZ 2，-SZ，-SO 2 Z，-NHCOZ， - NZCOZ或-SO 2 NZ 2，其中Z为H或1至约10个碳原子的烃基，n = 1-4，X为O，CO， S，COO，CH 2 O，CH 2 COO，SO 2，NH，NL，OWO，OW，W，其中L和 W独立地为1至约10个碳原子的烃基，并且m = 0-3。

9. 发明申请

US20070298349A1 Antireflective Coating Compositions Comprising Siloxane Polymer 审中-公开
标题翻译：包含硅氧烷聚合物的抗反射涂料组合物
公开(公告)号：US20070298349A1
公开(公告)日：2007-12-27
申请号：US11425813
申请日：2006-06-22
申请人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
发明人： Ruzhi Zhang , Mark O. Neisser , Woo-Kyu Kim , David J. Abdallah , Francis Houlihan , Ping-Hung Lu , Hong Zhuang
IPC分类号： G03C1/00
CPC分类号： C09D183/04 , G03F7/038 , G03F7/0757 , G03F7/091 , H01L21/02126 , H01L21/02216 , H01L21/02282
摘要： The present invention relates to a novel antireflective coating composition for forming an underlayer for a photoresist comprising an acid generator and a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1), where m is 0 or 1, W and W′ are independently a valence bond or a connecting group linking the cyclic ether to the silicon of the polymer and L is selected from hydrogen, W′ and W, or L and W′ are combined to comprise a cycloaliphatic linking group linking the cyclic ether to the silicon of the polymer. The invention also relates to a process for imaging the photoresist coated over the novel antireflective coating composition and provides good lithographic results. The invention further relates to a novel siloxane polymer, where the siloxane polymer comprises at least one absorbing chromophore and at least one self-crosslinking functionality of structure (1).
摘要翻译：本发明涉及一种用于形成光致抗蚀剂底层的新型抗反射涂料组合物，其包含酸产生剂和新型硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团，其中m为0或1，W和W'独立地为价键或连接环状醚与聚合物硅的连接基团，L选自氢，W'和W，或L和W'组合包括将环醚与聚合物的硅连接的脂环族连接基团。本发明还涉及一种用于对涂覆在新型抗反射涂料组合物上的光致抗蚀剂进行成像的方法，并提供良好的光刻结果。本发明还涉及新的硅氧烷聚合物，其中硅氧烷聚合物包含至少一种吸收发色团和至少一种结构（1）的自交联官能团。

10. 发明授权

US5795685A Simple repair method for phase shifting masks 失效
标题翻译：相位掩模的简单修复方法
公开(公告)号：US5795685A
公开(公告)日：1998-08-18
申请号：US783631
申请日：1997-01-14
申请人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
发明人： Lars W. Liebmann , Burn Jeng Lin , Mark O. Neisser
IPC分类号： G03F1/26 , G03F1/72 , H01L21/027 , G03F9/00
CPC分类号： G03F1/26 , G03F1/72
摘要： A method and apparatus for correcting defects in a phase shift mask to be used in photolithography. More specifically, the method of the invention includes creating a second repair mask which contains phase shifters. Regions surrounding the defects on the first mask are made opaque. The design circuitry located in these defective regions is copied onto the second mask. During a second exposure the design circuitry is placed onto the semiconductor wafer. Therefore, this method and apparatus provides an inexpensive solution to a difficult problem.
摘要翻译：一种用于校正用于光刻中的相移掩模中的缺陷的方法和装置。更具体地，本发明的方法包括创建包含移相器的第二修复掩模。围绕第一掩模上的缺陷的区域变得不透明。位于这些缺陷区域中的设计电路被复制到第二掩模上。在第二曝光期间，将设计电路放置在半导体晶片上。因此，该方法和装置为困难的问题提供了便宜的解决方案。

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