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1. 发明授权

US07587811B2 Method for manufacturing a magnetic write head for perpendicular magnetic data recording 失效
标题翻译：用于制造用于垂直磁数据记录的磁写头的方法
公开(公告)号：US07587811B2
公开(公告)日：2009-09-15
申请号：US11411561
申请日：2006-04-25
申请人： Hamid Balamane , Christian Rene Bonhote , Yimin Hsu , Aaron Neuhaus , Aron Pentek , Yi Zheng
发明人： Hamid Balamane , Christian Rene Bonhote , Yimin Hsu , Aaron Neuhaus , Aron Pentek , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49021 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
摘要翻译：一种制造用于垂直磁记录的磁写头的方法，其具有具有非常窄的轨道宽度和良好控制的临界尺寸的写极。写极通过在衬底上沉积导电种子层，然后在种子层上沉积光致抗蚀剂层而形成。光致抗蚀剂层被光刻地曝光和显影以在光致镜层中形成开口或沟槽，该开口限定写入极的图案。然后将磁性材料电镀在光致抗蚀剂层的开口中。然后可以通过化学剥离除去光致抗蚀剂层，并且可以通过离子铣削除去未被写入极覆盖的种子层的部分。

2. 发明申请

US20080002291A1 Plated perpendicular magnetic recording main pole process and enhancements 失效
标题翻译：电镀垂直磁记录主极过程和增强
公开(公告)号：US20080002291A1
公开(公告)日：2008-01-03
申请号：US11411561
申请日：2006-04-25
申请人： Hamid Balamane , Christian Bonhote , Yimin Hsu , Aaron Neuhaus , Aron Pentek , Yi Zheng
发明人： Hamid Balamane , Christian Bonhote , Yimin Hsu , Aaron Neuhaus , Aron Pentek , Yi Zheng
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49021 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
摘要翻译：一种制造用于垂直磁记录的磁写头的方法，其具有具有非常窄的轨道宽度和良好控制的临界尺寸的写极。写极通过在衬底上沉积导电种子层，然后在种子层上沉积光致抗蚀剂层而形成。光致抗蚀剂层被光刻地曝光和显影以在光致镜层中形成开口或沟槽，该开口限定写入极的图案。然后将磁性材料电镀在光致抗蚀剂层的开口中。然后可以通过化学剥离去除光致抗蚀剂层，并且可以通过离子铣削除去未被写入极覆盖的种子层的部分。

3. 发明申请

US20070115584A1 Write head design and method for reducing adjacent track interference in at very narrow track widths 有权
标题翻译：用于在非常窄的轨道宽度上减少相邻轨道干扰的写头设计和方法
公开(公告)号：US20070115584A1
公开(公告)日：2007-05-24
申请号：US11286077
申请日：2005-11-23
申请人： Hamid Balamane , Yimin Hsu , Aron Pentek , Yi Zheng
发明人： Hamid Balamane , Yimin Hsu , Aron Pentek , Yi Zheng
IPC分类号： G11B5/147
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49021
摘要： A perpendicular write head having a wrap around trailing shield for reducing stray field writing and adjacent track interference. A method for constructing such a write head allows for excellent control of side shield gap thickness and trailing shield gap thickness, and allows the ratio of side gap to trailing gap thicknesses to be maintained at about two to one as desired. The method includes depositing forming a write pole by constructing a mask which may include a bi-layer hard mask, and then ion milling to form the write pole. Once the write pole has been formed, a layer of alumina or some other non-magnetic material can be conformally deposited. A reactive ion mill (RIM) can be performed to open up the top of the write pole (remove the horizontally disposed portions of the alumina layer). Then, a second layer of alumina or some other non-magnetic material can be deposited, and the write pole can be plated. The thickness of the side shield gaps is defined by the sum of the final thicknesses of the first and second alumina layers, while the thickness of the first magnetic layer defines the thickness of the trailing shield gap.
摘要翻译：垂直写头，其具有围绕后屏蔽的卷绕，用于减少杂散场写入和相邻轨道干涉。用于构造这样的写头的方法允许对侧屏蔽间隙厚度和后屏蔽间隙厚度的优良控制，并且允许侧间隙与后间隙厚度的比率根据需要保持在大约二对一。该方法包括通过构成可包括双层硬掩模的掩模沉积形成写入极，然后进行离子铣削以形成写入极。一旦形成了写极，就可以共形沉积一层氧化铝或其它非磁性材料。可以执行反应离子磨（RIM）以打开写柱的顶部（去除氧化铝层的水平放置的部分）。然后，可以沉积第二层氧化铝或一些其它非磁性材料，并且可以对写入极进行电镀。侧屏蔽间隙的厚度由第一和第二氧化铝层的最终厚度之和限定，而第一磁性层的厚度限定了后屏蔽间隙的厚度。

4. 发明授权

US08054586B2 Write head design and method for reducing adjacent track interference at very narrow track widths 有权
标题翻译：用于在非常窄的轨道宽度上减少相邻轨道干扰的写头设计和方法
公开(公告)号：US08054586B2
公开(公告)日：2011-11-08
申请号：US11286077
申请日：2005-11-23
申请人： Hamid Balamane , Yimin Hsu , Aron Pentek , Yi Zheng
发明人： Hamid Balamane , Yimin Hsu , Aron Pentek , Yi Zheng
IPC分类号： G11B5/33 , G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/3146 , G11B5/315 , Y10T29/49021
摘要： A perpendicular write head having a wrap around trailing shield for reducing stray field writing and adjacent track interference. A method for constructing such a write head allows for excellent control of side shield gap thickness and trailing shield gap thickness, and allows the ratio of side gap to trailing gap thicknesses to be maintained at about two to one as desired. The method includes depositing forming a write pole by constructing a mask which may include a bi-layer hard mask, and then ion milling to form the write pole. Once the write pole has been formed, a layer of alumina or some other non-magnetic material can be conformally deposited. A reactive ion mill (RIM) can be performed to open up the top of the write pole (remove the horizontally disposed portions of the alumina layer). Then, a second layer of alumina or some other non-magnetic material can be deposited, and the write pole can be plated. The thickness of the side shield gaps is defined by the sum of the final thicknesses of the first and second alumina layers, while the thickness of the first magnetic layer defines the thickness of the trailing shield gap.
摘要翻译：垂直写头，其具有围绕后屏蔽的卷绕，用于减少杂散场写入和相邻轨道干涉。用于构造这样的写头的方法允许对侧屏蔽间隙厚度和后屏蔽间隙厚度的优良控制，并且允许侧间隙与后间隙厚度的比率根据需要保持在大约二对一。该方法包括通过构成可包括双层硬掩模的掩模沉积形成写入极，然后进行离子铣削以形成写入极。一旦形成了写极，就可以共形沉积一层氧化铝或其它非磁性材料。可以执行反应离子磨（RIM）以打开写柱的顶部（去除氧化铝层的水平放置的部分）。然后，可以沉积第二层氧化铝或一些其它非磁性材料，并且可以对写入极进行电镀。侧屏蔽间隙的厚度由第一和第二氧化铝层的最终厚度之和限定，而第一磁性层的厚度限定了后屏蔽间隙的厚度。

5. 发明申请

US20070245557A1 Process to open connection vias on a planarized surface 有权
标题翻译：在平坦化表面上打开连接通孔的过程
公开(公告)号：US20070245557A1
公开(公告)日：2007-10-25
申请号：US11411555
申请日：2006-04-25
申请人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek
IPC分类号： H01K3/10
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49021 , Y10T29/49032 , Y10T29/49044 , Y10T29/49126 , Y10T29/49139 , Y10T29/49153 , Y10T29/49155 , Y10T29/49165 , Y10T29/49169
摘要： A method for forming a via in an alumina protective layer on a structure such as a magnetic write head for use in perpendicular magnetic recording. A substrate such as an alumina fill layer, magnetic shaping layer, etc. is formed with region having a contact pad formed therein. A structure such as a magnetic pole, and or magnetic trailing shield, is formed over the substrate and is covered with a thick layer of alumina. The alumina can be applied by a high deposition rate process that does not form voids or seams in the alumina layer. The alumina layer can then be planarized by a chemical mechanical polishing process (CMP) and then a mask structure, such as a photoresist mask, is formed over the alumina layer. The mask structure is formed with an opening disposed over the contact pad. A reactive ion mill is then performed to remove portions of the alumina layer that are exposed at the opening in the mask, thereby forming a via in the alumina layer. The mask can then be lifted off and an electrically conductive material can be deposited into the via. Forming the via by a subtractive method rather than by a liftoff process allows the alumina to be deposited in a manner that does not result in voids. The use of reactive ion milling allows the via to be well defined and formed with substantially vertical side walls rather than in a conical or outward spreading fashion as would be formed by other material removal processes such as wet etching.
摘要翻译：在用于垂直磁记录的诸如磁写头的结构上的氧化铝保护层中形成通孔的方法。在其中形成有形成有接触垫的区域形成诸如氧化铝填充层，磁性成形层等的基板。诸如磁极和/或磁性后屏蔽的结构形成在衬底之上，并被厚层氧化铝覆盖。可以通过在氧化铝层中不形成空隙或接缝的高沉积速率工艺来施加氧化铝。然后可以通过化学机械抛光工艺（CMP）将氧化铝层平坦化，然后在氧化铝层上形成诸如光致抗蚀剂掩模的掩模结构。掩模结构形成有设置在接触垫上方的开口。然后执行反应离子研磨机以除去在掩模中的开口处暴露的部分氧化铝层，从而在氧化铝层中形成通孔。然后可以将掩模剥离，并且可以将导电材料沉积到通孔中。通过减法法而不是通过剥离工艺形成通孔允许以不会导致空隙的方式沉积氧化铝。使用反应离子研磨允许通孔被良好地限定并且形成有基本垂直的侧壁，而不是以其它材料去除工艺（例如湿蚀刻）形成的锥形或向外扩展方式。

6. 发明授权

US07363698B2 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US07363698B2
公开(公告)日：2008-04-29
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Wayne Bedell , Jyh-Shuey Jerry Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

7. 发明授权

US07743487B2 Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling 有权
标题翻译：使用CMP和反应离子铣削的组合来平面化垂直写入极的方法
公开(公告)号：US07743487B2
公开(公告)日：2010-06-29
申请号：US11453681
申请日：2006-06-14
申请人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek , Neil Leslie Robertson , Sue Siyang Zhang
发明人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek , Neil Leslie Robertson , Sue Siyang Zhang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/1871 , G11B5/3169 , Y10T29/49032 , Y10T29/49039 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
摘要翻译：垂直写头包括具有限定轨道宽度并且具有平坦化表面并且在其两侧和下方由氧化铝层封装的角的倾斜主极，所述氧化铝层具有抛光表面并且在其两侧的主极上方延伸作为步骤。

8. 发明授权

US07523550B2 Process to open connection vias on a planarized surface 有权
标题翻译：在平坦化表面上打开连接通孔的过程
公开(公告)号：US07523550B2
公开(公告)日：2009-04-28
申请号：US11411555
申请日：2006-04-25
申请人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek
发明人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek
IPC分类号： H01K3/10
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49021 , Y10T29/49032 , Y10T29/49044 , Y10T29/49126 , Y10T29/49139 , Y10T29/49153 , Y10T29/49155 , Y10T29/49165 , Y10T29/49169
摘要： A method for forming a via in an alumina protective layer on a structure such as a magnetic write head for use in perpendicular magnetic recording. A structure such as a magnetic pole, and or magnetic trailing shield, is formed over a substrate and is covered with a thick layer of alumina. The alumina layer can then be planarized by a chemical mechanical polishing process (CMP) and then a mask structure, such as a photoresist mask, is formed over the alumina layer. The mask structure is formed with an opening disposed over the contact pad. A reactive ion mill is then performed to remove portions of the alumina layer that are exposed at the opening in the mask, thereby forming a via in the alumina layer.
摘要翻译：在用于垂直磁记录的诸如磁写头的结构上的氧化铝保护层中形成通孔的方法。诸如磁极和/或磁性后屏蔽的结构形成在衬底上并被厚层氧化铝覆盖。然后可以通过化学机械抛光工艺（CMP）将氧化铝层平坦化，然后在氧化铝层上形成诸如光致抗蚀剂掩模的掩模结构。掩模结构形成有设置在接触垫上方的开口。然后执行反应离子研磨机以除去在掩模中的开口处暴露的部分氧化铝层，从而在氧化铝层中形成通孔。

9. 发明申请

US20060231523A1 Method to planarize perpendicular write poles using a combination of CMP and reactive ion milling 有权
标题翻译：使用CMP和反应离子铣削的组合来平面化垂直写入极的方法
公开(公告)号：US20060231523A1
公开(公告)日：2006-10-19
申请号：US11453681
申请日：2006-06-14
申请人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek , Neil Robertson , Sue Zhang
发明人： Amanda Baer , Hamid Balamane , Michael Feldbaum , Ming Jiang , Aron Pentek , Neil Robertson , Sue Zhang
IPC分类号： B44C1/22 , G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/1871 , G11B5/3169 , Y10T29/49032 , Y10T29/49039 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A perpendicular write head includes a beveled main pole having corners defining a track width and having a planarized surface and encapsulated on either side thereof and below by an alumina layer, the alumina layer having a polished surface and extending above the main pole on either side thereof as steps.
摘要翻译：垂直写头包括具有限定轨道宽度并且具有平坦化表面并且在其两侧和下方由氧化铝层封装的角的倾斜主极，所述氧化铝层具有抛光表面并且在其两侧的主极上方延伸作为步骤。

10. 发明申请

US20060070231A1 Process for creating a write head by forming a bump after the top pole is formed 失效
标题翻译：用于通过在形成顶极之后形成凸起来产生写入头的过程
公开(公告)号：US20060070231A1
公开(公告)日：2006-04-06
申请号：US10956221
申请日：2004-09-30
申请人： Amanda Baer , Hamid Balamane , Daniel Bedell , Jyh-Shuey Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
发明人： Amanda Baer , Hamid Balamane , Daniel Bedell , Jyh-Shuey Lo , Vladimir Nikitin , Aron Pentek , Yvette Winton
IPC分类号： G11B5/187
CPC分类号： G11B5/1871 , G11B5/3163 , Y10T29/49021 , Y10T29/49032 , Y10T29/49034 , Y10T29/49043 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Methods for creating a write head by forming a bump after the top pole is formed are provided. In one embodiment, a bottom pole is created out of a first layer. A non-magnetic gap material is applied to the surface of the wafer. A top pole is created out of a second layer. After creating the top pole, a bump is created. The bump is used to protect at least a portion of the first layer while etching to create a stray flux absorber.
摘要翻译：提供了通过在形成顶极之后形成凸块来创建写入头的方法。在一个实施例中，从第一层产生底极。将非磁隙材料施加到晶片的表面。第二层创建顶杆。创建顶极后，会创建一个凸起。凸块用于在蚀刻时保护第一层的至少一部分以产生杂散通量吸收体。

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