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1. 发明授权

US5199307A Automatic power generation type flowmeter 失效
标题翻译：自动发电型流量计
公开(公告)号：US5199307A
公开(公告)日：1993-04-06
申请号：US641870
申请日：1991-01-16
申请人： Hajime Onoda , Wataru Sato
发明人： Hajime Onoda , Wataru Sato
IPC分类号： G01F1/06 , G01F3/08 , G01F15/06
CPC分类号： G01F15/063 , G01F1/06 , G01F15/066 , G01F3/08
摘要： An automatic power generation type flowmeter generates a measuring signal through measuring of a flow rate of fluid flowing through a passage and transmits it to a receiver at a remote location. The flowmeter includes a power generator coupled to a detection shaft rotated under an action of a fluid flowing through the passage and outputting an electric signal. The power generator includes a permanent magnet having S- and N-poles, an electromagnetic coil having a core around its axis and arranged adjacent to the magnet with the axis of the coil located in a direction substantially perpendicular to a rotation shaft, a first stator magnetically coupled to the core and having its magnetic induction portion arranged opposite to the N-pole of the magnet, and a second stator magnetically connected to the core and having its magnetic induction portion arranged opposite to the S-pole of the magnet.
摘要翻译：自动发电型流量计通过测量流过通道的流体的流量产生测量信号，并将其发送到远程位置的接收器。流量计包括联接到检测轴的发电机，该检测轴在流过通道的流体的作用下旋转并输出电信号。所述发电机包括具有S和N极的永久磁铁，电磁线圈具有围绕其轴线的铁芯并且邻近所述磁体设置，所述线圈的轴线位于基本上垂直于旋转轴的方向上;第一定子磁耦合到磁芯并且其磁感应部分布置成与磁体的N极相对，以及第二定子，磁体连接到磁芯并且具有与磁体的S极相对的磁感应部分。

2. 发明授权

US5516350A Process for producing synthetic quartz glass powder 失效
标题翻译：生产合成石英玻璃粉的工艺
公开(公告)号：US5516350A
公开(公告)日：1996-05-14
申请号：US260453
申请日：1994-06-14
申请人： Hajime Onoda , Hiroshi Ota , Kazumi Kimura , Akira Utsunomiya , Masaru Shimoyama
发明人： Hajime Onoda , Hiroshi Ota , Kazumi Kimura , Akira Utsunomiya , Masaru Shimoyama
IPC分类号： C01B33/152 , C01B33/18 , C03B8/02 , C03B19/01 , C03B19/10 , C03C1/00 , C03C3/06 , C03B8/00
CPC分类号： C03C1/006 , C03B19/01 , C03B19/1065 , C03B19/1095
摘要： Synthetic quartz glass powder is produced by (a) hydrolyzing an alkoxysilane to form a gel, (b) finely dividing the gel and then drying, or drying the gel and then finely dividing, and (c) calcining the obtained powder, the powder being maintained under an atmosphere with an oxygen concentration of not less than 30 vol % during at least a part of the calcining period at a temperature of not lower than 1,000.degree. C.
摘要翻译：通过（a）水解烷氧基硅烷以形成凝胶，（b）将凝胶细分，然后干燥或干燥凝胶然后细分，制备合成石英玻璃粉末，（c）煅烧所得粉末，在不低于1000℃的温度下在至少一部分煅烧期间保持氧气浓度不低于30体积％的气氛。

3. 发明授权

US08758521B2 Apparatus and method for cleaning semiconductor substrate 有权
标题翻译：用于清洁半导体衬底的装置和方法
公开(公告)号：US08758521B2
公开(公告)日：2014-06-24
申请号：US12845371
申请日：2010-07-28
申请人： Yoshihiro Ogawa , Hajime Onoda , Hiroshi Kawamoto
发明人： Yoshihiro Ogawa , Hajime Onoda , Hiroshi Kawamoto
IPC分类号： B08B3/04
CPC分类号： H01L21/67028 , B08B3/022 , C11D11/0047 , H01L21/02057
摘要： A semiconductor substrate cleaning method includes cleaning a semiconductor substrate formed with a line-and-space pattern, rinsing the substrate, supplying the rinse water to rinse the substrate, and drying the substrate. The rinsing includes supplying deionized water and hydrochloric acid into a mixing section to mix the deionized water and the hydrochloric acid into a mixture, heating the mixture in the mixing section by a heater, detecting a pH value and a temperature of the mixture by a pH sensor and a temperature sensor respectively, adjusting an amount of hydrochloric acid supplied into the mixing section so that the rinse water has a predetermined pH value indicative of acidity, and energizing or de-energizing the heater so that the temperature of the mixture detected by the temperature sensor reaches a predetermined temperature, thereby producing the rinse water which has a temperature of not less than 70° C. and is acidic.
摘要翻译：半导体衬底清洁方法包括清洗形成有线间距图案的半导体衬底，漂洗衬底，供应冲洗水以冲洗衬底以及干燥衬底。漂洗包括将去离子水和盐酸加入到混合部分中以将去离子水和盐酸混合成混合物，通过加热器加热混合部分中的混合物，通过pH检测混合物的pH值和温度传感器和温度传感器，调节供应到混合部分中的盐酸的量，使得冲洗水具有指示酸度的预定pH值，以及给加热器通电或断电，使得由温度传感器达到预定温度，从而产生温度不低于70℃并呈酸性的冲洗水。

4. 发明授权

US08066020B2 Substrate cleaning apparatus and substrate cleaning method 失效
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US08066020B2
公开(公告)日：2011-11-29
申请号：US11588393
申请日：2006-10-27
申请人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
发明人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , B08B3/08 , B08B3/10
摘要： A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
摘要翻译：一种基板清洗装置，包括保持含有过氧化氢溶液和硫酸的混合物的处理罐，用于清洗浸在所述混合物中的基板; 所述循环管道在所述处理罐的初级侧之间延伸，所述处理罐的所述混合物被注入到所述处理罐中，所述处理罐的二次侧在所述处理罐的二次侧上从所述处理罐排出所述混合物，并且具有用于使所述混合物循环的泵 ; 设置在所述循环管道中的加热器，被配置为将所述混合物加热至预定温度; 化学注入管，被配置为在所述处理罐的初级侧和位于所述加热器的下游侧的次级侧之间的位置处将过氧化氢溶液注入到所述循环管道中; 以及设置在所述循环管道中的过滤器，其构造成去除所述混合物中的颗粒。

5. 发明申请

US20080006295A1 Semiconductor manufacturing apparatus for use in process of cleaning semiconductor substrate and method of manufacturing semiconductor device using the same 审中-公开
标题翻译：用于清洁半导体衬底的半导体制造装置及使用其的制造半导体器件的方法
公开(公告)号：US20080006295A1
公开(公告)日：2008-01-10
申请号：US11542201
申请日：2006-10-04
申请人： Kunihiro Miyazaki , Hiroaki Yamada , Hiroshi Tomita , Hajime Onoda
发明人： Kunihiro Miyazaki , Hiroaki Yamada , Hiroshi Tomita , Hajime Onoda
IPC分类号： C23G1/00 , C23G1/02 , B08B3/00
CPC分类号： H01L21/31133 , G03F7/423
摘要： A processing tank stores heated sulfuric acid, and a semiconductor substrate having resist formed thereon and to be processed is immersed in the heated sulfuric acid. A first introduction unit introduces ozone gas into the sulfuric acid stored in the processing tank. A second introduction unit introduces hydrogen peroxide into the solution containing sulfuric acid and ozone at least before the processing of the semiconductor substrate is completed.
摘要翻译：处理槽储存加热的硫酸，并将其上形成有待加工的抗蚀剂的半导体衬底浸入加热的硫酸中。第一引入单元将臭氧气体引入储存在处理槽中的硫酸中。至少在半导体基板的加工完成之前，第二引入单元将含有硫酸和臭氧的溶液引入到过氧化氢中。

6. 发明授权

US4091668A Diaphragm type gas meter 失效
标题翻译：隔膜式燃气表
公开(公告)号：US4091668A
公开(公告)日：1978-05-30
申请号：US776732
申请日：1977-03-11
申请人： Kosuke Namikawa , Hajime Onoda , Mineo Okamoto , Isamu Fujii , Takaaki Matsuda , Mustuo Uebayashi , Hirosi Suzuki
发明人： Kosuke Namikawa , Hajime Onoda , Mineo Okamoto , Isamu Fujii , Takaaki Matsuda , Mustuo Uebayashi , Hirosi Suzuki
IPC分类号： G01F3/22 , G01F3/20
CPC分类号： G01F3/225 , G01F3/223
摘要： In a diaphragm type gas meter, one crank plate pivotally mounting a pair of diaphragm movement transmission levers and the other crank plate pivotally mounting a pair of valve actuating levers overlap each other rockably around the central axis of a crank shaft. The relative angular position of the two plates is controlled e.g. by an eccentric cam. On a diaphragm control wall member for restricting the stroke end of the reciprocation of each measuring diaphragm of said gas meter are formed two inclined diaphragm control surfaces with different angles of inclination. Further, on a lower casing of the gas meter is integrally die-cast a partition wall with triangular section flush with the top surface of the lower casing and defining a discharge-side valve chamber and a discharge passage.
摘要翻译：在隔膜式气量计中，一个可枢转地安装一对隔膜运动传递杆的曲柄板和可枢转地安装一对气门执行杆的另一个曲柄板围绕曲轴的中心轴可摆动地重叠。控制两个板的相对角位置。由偏心凸轮。在用于限制所述燃气表的每个测量膜片的往复运动行程末端的隔膜控制壁构件上形成两个具有不同倾斜角度的倾斜的膜片控制表面。此外，在燃气表的下壳体上一体地压铸具有与下壳体的上表面齐平的三角形截面的分隔壁，并且限定排出侧阀室和排出通道。

7. 发明申请

US20120031441A1 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD 审中-公开
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US20120031441A1
公开(公告)日：2012-02-09
申请号：US13277251
申请日：2011-10-20
申请人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
发明人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , B08B3/08 , B08B3/10
摘要： A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
摘要翻译：一种基板清洗装置，包括保持含有过氧化氢溶液和硫酸的混合物的处理罐，用于清洗浸在所述混合物中的基板; 所述循环管道在所述处理罐的初级侧之间延伸，所述处理罐的所述混合物被注入到所述处理罐中，所述处理罐的二次侧在所述处理罐的二次侧上从所述处理罐排出所述混合物，并且具有用于使所述混合物循环的泵 ; 设置在所述循环管道中的加热器，被配置为将所述混合物加热至预定温度; 化学注入管，被配置为在所述处理罐的初级侧和位于所述加热器的下游侧的次级侧之间的位置处将过氧化氢溶液注入到所述循环管道中; 以及设置在所述循环管道中的过滤器，其构造成去除所述混合物中的颗粒。

8. 发明申请

US20070095363A1 Substrate cleaning apparatus and substrate cleaning method 失效
标题翻译：基板清洗装置和基板清洗方法
公开(公告)号：US20070095363A1
公开(公告)日：2007-05-03
申请号：US11588393
申请日：2006-10-27
申请人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
发明人： Hiroshi Tomita , Hiroaki Yamada , Kunihiro Miyazaki , Hajime Onoda
IPC分类号： C23G1/00 , B08B7/04 , B08B3/00 , C03C23/00
CPC分类号： H01L21/67057 , B08B3/08 , B08B3/10
摘要： A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
摘要翻译：一种基板清洗装置，包括保持含有过氧化氢溶液和硫酸的混合物的处理罐，用于清洗浸在所述混合物中的基板; 所述循环管道在所述处理罐的初级侧之间延伸，所述处理罐的所述混合物被注入到所述处理罐中，所述处理罐的二次侧在所述处理罐的二次侧上从所述处理罐排出所述混合物，并且具有用于使所述混合物循环的泵 ; 设置在所述循环管道中的加热器，被配置为将所述混合物加热至预定温度; 化学注入管，被配置为在所述处理罐的初级侧和位于所述加热器的下游侧的次级侧之间的位置处将过氧化氢溶液注入到所述循环管道中; 以及设置在所述循环管道中的过滤器，其构造成去除所述混合物中的颗粒。

9. 发明申请

US20050155424A1 Diaphragm gas meter 失效
标题翻译：隔膜气表
公开(公告)号：US20050155424A1
公开(公告)日：2005-07-21
申请号：US11037839
申请日：2005-01-18
申请人： Hajime Onoda
发明人： Hajime Onoda
IPC分类号： G01F3/22 , G01F3/20
CPC分类号： G01F3/225
摘要： In a gas meter, a measuring diaphragm is provided inside a measuring chamber, the measuring diaphragm is caused to reciprocate according to a gas pressure of gas flowing from a gas inflow port to the measuring chamber, and the reciprocation of the measuring diaphragm is interlocked with a valve mechanism and an integrating mechanism via a wing shaft and a crank mechanism. Here, the measuring diaphragm is formed in an elliptical shape which is horizontally long in the width direction of the gas meter.
摘要翻译：在气量计中，在测量室内设置有测量膜片，使得测量膜片根据从气体流入口流到测量室的气体的气体压力而往复运动，并且测量膜片的往复运动与阀机构和通过翼轴和曲柄机构的积分机构。这里，测量膜形成为在气量计的宽度方向上水平长的椭圆形状。

10. 发明授权

US4265127A Low meter system provided with a pulse generator 失效
标题翻译：低电平仪系统配有脉冲发生器
公开(公告)号：US4265127A
公开(公告)日：1981-05-05
申请号：US44519
申请日：1979-06-01
申请人： Hajime Onoda
发明人： Hajime Onoda
IPC分类号： G01F1/06 , G01D5/245 , G01F1/075 , G01F15/06 , G01P3/481 , G01F1/58
CPC分类号： G01P3/4815 , G01F1/075
摘要： A flow meter comprises a fan wheel provided in a passage of a running fluid to be rotated thereby; a composite magnetic wire formed of a core and shell and fitted to the fan wheel; a pair of mutually facing permanent magnets arranged substantially in parallel above a plane through which the composite magnetic wire is rotated, with the poles of the opposite polarities set adjacent to each other; a magnetic core wound with a coil and disposed between the paired permanent magnets, and wherein, when the composite wire faces one of the paired permanent magnets, the alignment direction of the respective magnetic domains of the core of the composite magnetic wire is changed, and when the composite wire faces the other of the paired permanent magnets, the respective magnetic domains of the core of the composite magnetic wire regains the alignment direction before said change. Therefore, when the composite magnetic wire passes below the paired permanent magnets, pulses are generated in the coil; pulses thus generated are counted by a counter; a counted number of pulses is converted into a signal denoting a detected flow of a running fluid; and the converted signal is registered and indicated on a display device.
摘要翻译：流量计包括设置在待旋转的流动流体的通道中的风扇叶轮; 由芯和壳形成的并配合到风扇轮的复合磁线; 一对相互面对的永磁体，其基本平行地布置在复合磁线旋转的平面之上，相反极性的极彼此相邻设置; 卷绕在线圈上且配置在成对的永久磁铁之间的磁芯，其中，当复合线面对成对的永久磁铁之一时，复合磁铁芯的各个磁畴的取向方向改变，当复合导线面对成对的永久磁铁中的另一个时，复合磁线芯的相应磁畴在所述改变之前恢复对准方向。因此，当复合磁铁通过成对的永磁体下方时，在线圈中产生脉冲; 由此产生的脉冲由计数器计数; 将计数的脉冲数转换成表示运行流体的检测流量的信号; 并将转换的信号登记并显示在显示装置上。

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