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1. 发明申请

WO2004044025A8 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于光刻的抗反射涂层及其制备方法
公开(公告)号：WO2004044025A8
公开(公告)日：2004-10-07
申请号：PCT/US0336354
申请日：2003-11-12
申请人： HONEYWELL INT INC , BALDWIN TERESA , KENNEDY JOSEPH , IWAMOTO NANCY , NAKANO TADASHI , BEDWELL WILLIAM , STUCK JASON , SUEDEMEYER ARLENE , HEBERT MELLO , LI BO
发明人： BALDWIN TERESA , KENNEDY JOSEPH , IWAMOTO NANCY , NAKANO TADASHI , BEDWELL WILLIAM , STUCK JASON , SUEDEMEYER ARLENE , HEBERT MELLO , LI BO
IPC分类号： C08G20060101 , C08G77/02 , C08G77/14 , C08G77/18 , C08G77/22 , C08L83/06 , C09D183/06 , C09D183/08 , G03F7/075 , G03F7/09
CPC分类号： C08G77/14 , C08G77/22 , C09D183/06 , C09D183/08 , G03F7/0757 , G03F7/091
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种致密剂，至少一种封端剂，至少一种流平剂，至少一种催化剂，至少一种置换溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。合适的吸收化合物是吸收可用于光刻的波长（例如365nm，248nm，193nm和157nm）附近的吸收化合物。

2. 发明申请

WO2004044025A3 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于光刻胶的抗反射涂层及其制备方法
公开(公告)号：WO2004044025A3
公开(公告)日：2004-07-15
申请号：PCT/US0336354
申请日：2003-11-12
申请人： HONEYWELL INT INC , BALDWIN TERESA , KENNEDY JOSEPH , IWAMOTO NANCY , NAKANO TADASHI , BEDWELL WILLIAM , STUCK JASON , SUEDEMEYER ARLENE , HEBERT MELLO , LI BO
发明人： BALDWIN TERESA , KENNEDY JOSEPH , IWAMOTO NANCY , NAKANO TADASHI , BEDWELL WILLIAM , STUCK JASON , SUEDEMEYER ARLENE , HEBERT MELLO , LI BO
IPC分类号： C08G20060101 , C08G77/02 , C08G77/14 , C08G77/18 , C08G77/22 , C08L83/06 , C09D183/06 , C09D183/08 , G03F7/075 , G03F7/09
CPC分类号： C08G77/14 , C08G77/22 , C09D183/06 , C09D183/08 , G03F7/0757 , G03F7/091
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one densifying agent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种致密化剂，至少一种封端剂，至少一种流平剂，至少一种催化剂，至少一种置换溶剂，至少一种pH调节剂，和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。

3. 发明申请

WO03044078A9 ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于光刻胶的抗反射涂层及其制备方法
公开(公告)号：WO03044078A9
公开(公告)日：2004-01-08
申请号：PCT/US0236327
申请日：2002-11-12
申请人： HONEYWELL INT INC , BALDWIN TERESA , KENNEDY JOSEPH , IWAMOTO NANCY , NAKANO TADASHI , BEDWELL WILLIAM , STUCK JASON , HEBERT MELLO , SUEDMEYER ARLENE
发明人： BALDWIN TERESA , KENNEDY JOSEPH , IWAMOTO NANCY , NAKANO TADASHI , BEDWELL WILLIAM , STUCK JASON , HEBERT MELLO , SUEDMEYER ARLENE
IPC分类号： C08G77/04 , C09D183/04 , G03F7/09 , C08G77/08 , C08G77/18
CPC分类号： C08G77/04 , C09D183/04 , G03F7/091
摘要： Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
摘要翻译：用于紫外光刻的抗反射涂层材料包括至少一种吸收化合物和至少一种材料改性剂，例如至少一种致孔剂，至少一种高沸点溶剂，至少一种封端剂，至少一种流平剂，至少一种催化剂，至少一种替代溶剂，至少一种pH调节剂和/或其组合，其掺入无机基材料或无机组合物和/或化合物中。合适的吸收化合物是可以在光刻中使用的波长如365nm，248nm，193nm和157nm的那些吸收化合物。

4. 发明申请

WO2005049681A3 ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF 审中-公开
标题翻译：用于通过薄膜和光刻机应用的抗反射涂层及其制备方法
公开(公告)号：WO2005049681A3
公开(公告)日：2006-04-20
申请号：PCT/US2004038517
申请日：2004-11-17
申请人： HONEYWELL INT INC , LI BO , KENNEDY JOSEPH , IWAMOTO NANCY , LU VICTOR , LEUNG ROGER , FRADKIN MARK A , HUSSEIN MAKAREM A , GOODNER MICHAEL D
发明人： LI BO , KENNEDY JOSEPH , IWAMOTO NANCY , LU VICTOR , LEUNG ROGER , FRADKIN MARK A , HUSSEIN MAKAREM A , GOODNER MICHAEL D
IPC分类号： G03C1/825 , C08G20060101 , C08L83/04 , C09D183/04 , C09D183/08 , G03C1/83 , G03F7/09
CPC分类号： C09D183/04 , C09D183/08 , G03F7/0751 , G03F7/0752 , G03F7/091
摘要： An absorbing composition is described herein that includes at least one inorganicbased compound, at least one absorbing compound, and at least one material modification agent. In addition, methods of making an absorbing composition are also described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) allowing the reaction mixture to form the absorbing composition at room temperature. Another method of making an absorbing composition includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, an acid/water mixture, and one or more solvents to form a reaction mixture; and b) heating the reaction mixture to form the absorbing composition. Yet another method of making an absorbing composition is described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) heating the reaction mixture to form an absorbing material, a coating or a film. In other methods of making an absorbing composition described herein, those methods include: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) allowing the reaction mixture to form an absorbing material, a coating or a film.
摘要翻译：本文描述的吸收组合物包括至少一种无机基化合物，至少一种吸收化合物和至少一种材料改性剂。此外，还描述了制备吸收组合物的方法，其包括：a）将至少一种无机基化合物，至少一种吸收化合物，至少一种材料改性剂，酸/水混合物和一种或多种溶剂形成反应混合物; 和b）使反应混合物在室温下形成吸收组合物。制备吸收组合物的另一种方法包括：a）将至少一种无机基化合物，至少一种吸收化合物，至少一种材料改性剂，酸/水混合物和一种或多种溶剂组合以形成反应混合物; 和b）加热反应混合物以形成吸收组合物。描述了制备吸收组合物的另一种方法，其包括：a）将至少一种无机基化合物，至少一种吸收化合物，至少一种材料改性剂和一种或多种溶剂组合以形成反应混合物，其中至少一种材料改性剂包含至少一种酸和水; 和b）加热反应混合物以形成吸收材料，涂层或膜。在制备本文所述的吸收组合物的其它方法中，这些方法包括：a）将至少一种无机基化合物，至少一种吸收化合物，至少一种材料改性剂和一种或多种溶剂组合以形成反应混合物，其中所述至少一种材料改性剂包含至少一种酸和水; 和b）使反应混合物形成吸收材料，涂层或膜。

5. 发明申请

WO2004037877A9 ORGANOSILOXANES 审中-公开
标题翻译：有机硅氧烷
公开(公告)号：WO2004037877A9
公开(公告)日：2004-11-11
申请号：PCT/US0317658
申请日：2003-06-03
申请人： HONEYWELL INT INC , BEDWELL WILLIAM , HACKER NIGEL , LEUNG ROGER , IWAMOTO NANCY , NEDBAL JAN , XIE SONGYUAN , MORO LORENZA , MUKHERJEE SHYAMA
发明人： BEDWELL WILLIAM , HACKER NIGEL , LEUNG ROGER , IWAMOTO NANCY , NEDBAL JAN , XIE SONGYUAN , MORO LORENZA , MUKHERJEE SHYAMA
IPC分类号： C08G77/12 , C09D183/04 , G03F7/075 , H01L21/312 , H01L21/768 , C08G
CPC分类号： C08G77/12 , C09D183/04 , G03F7/0751 , H01L21/02126 , H01L21/02211 , H01L21/02282 , H01L21/3122 , H01L21/76807 , H01L21/76829 , H01L2924/12044
摘要： The present invention provides an organosiloxane comprising at least 80 weight percent of Formula I: [Y0.01-1.0SiO1.5-2]a[Z 0.01-1.0SiO1.5-2 ]b[H0.01-1.0SiO1.5-2]c where Y is aryl; Z is alkenyl; a is from 15 percent to 70 percent of Formula I; b is from 2 percent to 50 percent of Formula I; and c is from 20 percent to 80 percent of Formula I.The present organosiloxane may be used as ceramic binder, high temperature encapsulant, and fiber matrix binder. The present composition is also useful as an adhesion promoter in that it exhibits good adhesive properties when coupled with other materials in non-microelectronic or microelectronic applications. Preferably, the present compositions are used in microelectronic applications as etch stops, hardmasks, and dielectrics.
摘要翻译：本发明提供了包含至少80重量％的式I的有机硅氧烷：[Y 0.01-1.0 SiO 1.5-2] a [Z 0.01-1.0SiO 1.5-2] b [H 0.01-1.0 SiO 1.5 -2] c其中Y是芳基; Z是链烯基; a为式I的15％至70％; b为式I的2％至50％; 并且c为式I的20％至80％。本发明的有机硅氧烷可以用作陶瓷粘合剂，高温包封剂和纤维基质粘合剂。本发明组合物还可用作粘合促进剂，因为它在非微电子或微电子应用中与其它材料结合时表现出良好的粘合性能。优选地，本发明组合物用作微电子应用中的蚀刻停止层，硬掩模和电介质。

6. 发明申请

WO2004037877A3 ORGANOSILOXANES 审中-公开
标题翻译：有机硅氧烷
公开(公告)号：WO2004037877A3
公开(公告)日：2005-01-13
申请号：PCT/US0317658
申请日：2003-06-03
申请人： HONEYWELL INT INC , BEDWELL WILLIAM , HACKER NIGEL , LEUNG ROGER , IWAMOTO NANCY , NEDBAL JAN , XIE SONGYUAN , MORO LORENZA , MUKHERJEE SHYAMA
发明人： BEDWELL WILLIAM , HACKER NIGEL , LEUNG ROGER , IWAMOTO NANCY , NEDBAL JAN , XIE SONGYUAN , MORO LORENZA , MUKHERJEE SHYAMA
IPC分类号： C08G77/12 , C09D183/04 , G03F7/075 , H01L21/312 , H01L21/768 , B05D3/02 , B05D3/06 , C08G77/20 , C23C16/00 , H01L21/31
CPC分类号： C08G77/12 , C09D183/04 , G03F7/0751 , H01L21/02126 , H01L21/02211 , H01L21/02282 , H01L21/3122 , H01L21/76807 , H01L21/76829 , H01L2924/12044
摘要： The present invention provides an organosiloxane comprising at least 80 weight percent of Formula I: [Y0.01-1.0SiO1.5-2]a[Z 0.01-1.0SiO1.5-2 ]b[H0.01-1.0SiO1.5-2]c where Y is aryl; Z is alkenyl; a is from 15 percent to 70 percent of Formula (I); b is from 2 percent to 50 percent of Formula (I); and c is from 20 percent to 80 percent of Formula (I).The present organosiloxane may be used as ceramic binder, high temperature encapsulant, and fiber matrix binder. The present composition is also useful as an adhesion promoter in that it exhibits good adhesive properties when coupled with other materials in non-microelectronic or microelectronic applications. Preferably, the present compositions are used in microelectronic applications as etch stops, hardmasks, and dielectrics.
摘要翻译：本发明提供了包含至少80重量％的式I的有机硅氧烷：[Y0.01-1.0SiO1.5-2] a [Z 0.01-1.0SiO1.5-2] b [H0.01-1.0SiO1.5 -2] c其中Y是芳基; Z是烯基; a为式（I）的15％至70％; b为式（I）的2％至50％; 和c为式（I）的20％至80％。本发明的有机硅氧烷可用作陶瓷粘合剂，高温密封剂和纤维基质粘合剂。本发明的组合物也可用作粘合促进剂，因为当与非微电子或微电子应用中的其它材料结合时，其具有良好的粘合性能。优选地，本发明的组合物用作微电子应用中的蚀刻停止，硬掩模和电介质。

7. 发明申请

WO2004078814A3 FLUORINATED POLYMERS, METHODS OF PRODUCTION AND USES IN FERROELECTRIC DEVICES THEREOF 审中-公开
标题翻译：氟化聚合物，其生产方法及其在其电磁设备中的用途
公开(公告)号：WO2004078814A3
公开(公告)日：2004-11-04
申请号：PCT/US2004006680
申请日：2004-03-04
申请人： HONEYWELL INT INC , IWAMOTO NANCY , BEDWELL WILLIAM , NALEWAJEK DAVID , CURRAN SEAN , WILLIAMS THOMAS JR , ENDISCH DENIS , LEVY ALAN , SWAN ELLEN
发明人： IWAMOTO NANCY , BEDWELL WILLIAM , NALEWAJEK DAVID , CURRAN SEAN , WILLIAMS THOMAS JR , ENDISCH DENIS , LEVY ALAN , SWAN ELLEN
IPC分类号： C08F2/00 , C08F14/18 , C08G20060101 , C08K5/17
CPC分类号： C08F14/18 , C08K5/02 , C09D127/12 , C08F2/14 , C08F2/46 , C08F2/22
摘要： Fluorinated polymers having ferroelectric properties are described herein that include: a) at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; and b) at least one adhesion promoter. Fluorinated polymer coating compositions having ferroelectric properties are also described herein that include: a) at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) at least one adhesion promoter; and c) at least one solvent. Methods of producing a fluorinated polymer having ferroelectric properties are described herein that include: a) providing at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) providing at least one adhesion promoter; c) polymerizing the at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof to produce the fluorinated polymer; and d) incorporating the at least one adhesion promoter with the fluorinated polymer. Methods of producing a fluorinated polymer coating composition having ferroelectric properties are also described herein that include: a) providing at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) providing at least one adhesion promoter; c) providing at least one solvent; d) polymerizing the at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof to produce the fluorinated polymer; and e) incorporating the at least one adhesion promoter and the solvent with the fluorinated polymer.

8. 发明申请

WO2007084872A3 COMPOSITIONS COMPRISING AMMONIUM NITRATE DOUBLE SALTS 审中-公开
标题翻译：包含硝酸铵双重盐的组合物
公开(公告)号：WO2007084872A3
公开(公告)日：2007-10-25
申请号：PCT/US2007060534
申请日：2007-01-13
申请人： HONEYWELL INT INC , KWEEDER JAMES A , IWAMOTO NANCY
发明人： KWEEDER JAMES A , IWAMOTO NANCY
IPC分类号： C05C1/00 , C05C11/00 , C05G1/06
CPC分类号： C05B7/00 , C05C1/02 , C05D9/02 , C05C3/00 , C05C5/00 , C05C5/02 , C05C5/04
摘要： Preferred aspects of the present invention provide ammonium nitrate compositions comprising ammonium nitrate and at least a second compound, said second compound being present under conditions and in amounts effective to substantially reduce the detonation sensitivity of the composition and/or to otherwise improve a desired property of the composition. In certain embodiments, the second compound is selected from the group consisting of ammonium sulfate, ammonium phosphate, calcium nitrate, potassium nitrate, magnesium nitrate, ammonium molybdenate, ammonium hexaflouralsilicate, neodymium hydroxynitrate, and combinations of two or more of these. In preferred embodiments, at least a substantial portion of the ammonium nitrate in the composition is in the form of a double salt with one or more of said second compounds. In highly preferred embodiments, the present compositions consist essentially of one or more double salts of ammonium nitrate and a second compound as described herein.
摘要翻译：本发明的优选方面提供了包含硝酸铵和至少第二化合物的硝酸铵组合物，所述第二化合物以有效大大降低组合物的引爆敏感性和/或以其它方式改善所需性质的条件和数量存在组成。在某些实施方案中，第二化合物选自硫酸铵，磷酸铵，硝酸钙，硝酸钾，硝酸镁，钼酸铵，六氟硅酸铵，羟基硝酸钕，以及它们中的两种或更多种的组合。在优选的实施方案中，组合物中至少大部分的硝酸铵是与一种或多种所述第二种化合物的双重盐的形式。在非常优选的实施方案中，本发明组合物基本上由一种或多种硝酸铵的复盐和如本文所述的第二化合物组成。

9. 发明申请

WO2007137009A2 STATIONARY PHASE FOR A MICRO FLUID ANALYZER 审中-公开
标题翻译：微流体分析仪的静态相
公开(公告)号：WO2007137009A2
公开(公告)日：2007-11-29
申请号：PCT/US2007068760
申请日：2007-05-11
申请人： HONEYWELL INT INC , IWAMOTO NANCY , BONNE ULRICH
发明人： IWAMOTO NANCY , BONNE ULRICH
IPC分类号： B01J20/00
CPC分类号： B01J20/00 , B01J20/28 , B01J20/28007 , B01J20/28095 , B01J20/282 , B01J20/285 , B01J2220/54 , B82Y30/00 , G01N30/52 , G01N30/6095 , G01N2030/525
摘要： Selecting a stationary phase for a fluid analyzer using certain criteria to determine an appropriate material for use in, for instance, a micro fluid analyzer. High absorption of an analyte or sample, low water sorbency and high porosity or permeability of the material may be sought. A selected material may incorporate a toughening agent using a neutral leaving group. A selected material may have a capping agent to promote hydrophobicity. A selected material might be a hydrophobic polymer, such as possibly a fluoropolymer. The selection of a stationary phase may involve molecular modeling.
摘要翻译：使用某些标准选择用于流体分析仪的固定相，以确定用于例如微流体分析仪的适当材料。可以寻求分析物或样品的高吸收性，低吸水性和材料的高孔隙率或渗透性。选择的材料可以使用中性离去基团掺入增韧剂。选择的材料可以具有封端剂以促进疏水性。选择的材料可以是疏水性聚合物，例如可能是含氟聚合物。固定相的选择可能涉及分子建模。

10. 发明申请

WO2006093920A3 A NO-FRAGMENTATION MICRO MASS SPECTROMETER SYSTEM 审中-公开
标题翻译：无分散微量子光谱仪系统
公开(公告)号：WO2006093920A3
公开(公告)日：2008-01-03
申请号：PCT/US2006006975
申请日：2006-02-24
申请人： HONEYWELL INT INC , ULRICH BONNE , IWAMOTO NANCY
发明人： ULRICH BONNE , IWAMOTO NANCY
IPC分类号： H01J49/10 , B01D53/22 , B01D69/02 , C02F1/04 , E03B3/28
CPC分类号： H01J49/10
摘要： A system for effecting a soft or gentle ionization technique to avoid fragmentation of analyte molecules provided to a micro mass spectrometer for analysis. To ionize the analyte molecules, the system may be based on proton transfer reaction (PTR) for ionization, UV light to generate either positive or negative ions, or E-field ionization. For example, with PRT, there may be a water generator for providing H 2 Oan ion generator. H 3 O + may be provided by the generator to a charge transfer reactor that brings a stream of H 3 O + molecules together with analyte molecules. Then, H+ atoms may be transferred from the H 3 O+ molecules to the analyte molecules without breaking up or fragmenting the respective analyte molecules. The ionized molecules may be provided to a micro mass spectrometer for analysis .
摘要翻译：用于实现柔软或柔和的电离技术的系统，以避免提供给微质量分析仪的分析物分子碎片进行分析。为了电离分析物分子，该系统可以基于用于电离的质子转移反应（PTR），UV光产生正离子或负离子或E场电离。例如，使用PRT，可以存在用于提供H 2 O 2离子发生器的水发生器。发电机可以将H 3 O + O SUPER提供给电荷转移反应器，所述电荷转移反应器带来H 3 O + SUP>分子与分析物分子。然后，H +原子可以从H 3 O + O分子转移到分析物分子，而不破坏或破碎各自的分析物分子。可以将电离分子提供给微质谱仪用于分析。

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