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1. 发明申请

WO03021636B1 ELECTRONIC DEVICES AND METHODS OF MANUFACTURE 审中-公开
标题翻译：电子设备及其制造方法
公开(公告)号：WO03021636B1
公开(公告)日：2003-12-04
申请号：PCT/US0226780
申请日：2002-08-23
申请人： HONEYWELL INT INC , ENDISCH DENIS , LEVERT JOSEPH
发明人： ENDISCH DENIS , LEVERT JOSEPH
IPC分类号： H01L21/76 , H01L21/312 , H01L21/316 , H01L21/762 , H01L29/00
CPC分类号： H01L21/76224 , H01L21/02126 , H01L21/02282 , H01L21/3121 , H01L21/316 , H01L21/31612
摘要： An electronic device (110B) comprises a substrate (110B) with a trench (120B) having a lower (121B) portion and a top portion (122B). The lower portion (121B) of the trench (120B) is filled with a cured spin-on compound (130B), while the top portion (122B) is filled with a chemical vapor-deposited compound (140B). Preferably, the chemical vapor-deposited compound (140B) has a surface (141B) that is substantially coplanar with the surface (111B) of the substrate (110B).
摘要翻译：电子设备（110B）包括具有下部（121B）部分和顶部部分（122B）的沟槽（120B）的衬底（110B）。沟槽（120B）的下部（121B）填充有固化的旋涂化合物（130B），而顶部（122B）填充有化学气相沉积化合物（140B）。优选地，化学气相沉积化合物（140B）具有与基底（110B）的表面（111B）基本上共面的表面（141B）。

2. 发明申请

WO2005052989A3 DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS 审中-公开
标题翻译：用于NARROW GAP-FILL应用的电介质膜
公开(公告)号：WO2005052989A3
公开(公告)日：2005-10-06
申请号：PCT/US2004033035
申请日：2004-10-06
申请人： HONEYWELL INT INC , ENDISCH DENIS , LEUNG ROGER , XIE SONGYUAN , HACKER NIGEL , DENG YANPEI
发明人： ENDISCH DENIS , LEUNG ROGER , XIE SONGYUAN , HACKER NIGEL , DENG YANPEI
IPC分类号： H01L21/316 , C08L27/14 , C23F4/04 , H01L21/31
CPC分类号： H01L21/76837 , H01L21/316
摘要： A colloidal suspension of nanoparticles composed of a dense material dispersed in a solvent is used in forming a gap-filling dielectric material with low thermal shrinkage. The dielectric material is particularly useful for pre-metal dielectric and shallow trench isolation applications. According to the methods of forming a dielectric material, the colloidal suspension is deposited on a substrate and dried to form a porous intermediate layer. The intermediate layer is modified by infiltration with a liquid phase matrix material, such as a spin-on polymer, followed by curing, by infiltration with a gas phase matrix material, followed by curing, or by curing alone, to provide a gap-filling, thermally stable, etch resistant dielectric material.
摘要翻译：使用由分散在溶剂中的致密材料构成的纳米颗粒的胶体悬浮液来形成具有低热收缩率的间隙填充介电材料。电介质材料特别适用于预金属电介质和浅沟槽隔离应用。根据形成电介质材料的方法，将胶体悬浮液沉积在基底上并干燥以形成多孔中间层。通过用液相基质材料（例如旋涂聚合物）渗透，然后通过用气相基质材料渗透，随后固化，或通过单独固化来改性中间层，从而提供间隙填充，耐热稳定的，耐蚀刻的介电材料。

3. 发明申请

WO03063225A2 DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS 审中-公开
标题翻译：用于NARROW GAP-FILL应用的电介质膜
公开(公告)号：WO03063225A2
公开(公告)日：2003-07-31
申请号：PCT/US0201628
申请日：2002-01-18
申请人： HONEYWELL INT INC
发明人： LEUNG ROGER , HACKER NIGEL , XIE SONGYUAN , DENG YANPEI , ENDISCH DENIS
IPC分类号： H01L21/76 , H01L21/314 , H01L21/316 , H01L21/762 , H01L21/768 , H01L23/532
CPC分类号： H01L21/7682 , H01L21/02126 , H01L21/02129 , H01L21/022 , H01L21/02203 , H01L21/02282 , H01L21/02337 , H01L21/316 , H01L21/31695 , H01L21/76224 , H01L21/76837 , H01L23/5329 , H01L2221/1047 , H01L2924/0002 , H01L2924/09701 , H01L2924/00
摘要： A colloidal suspension of nanoparticles composed of a dense material dispersed in a solent is used in forming a gap-filling dielectric material with low thermal shrinkage. The dielectric material is particularly useful for pre-metal dielectric and shallow trench isolaiton applications. According to the mehtods of forming a dielectric material, the colloidal suspension is deposited on a substrate and dried to form a porous intermediate layer. The intermediate layer is modified bz infiltration with a liquid phase matrix material, such as a spin-on polymer, followed by curing, by infiltration with a gas phase matrix material, followd by curing, or by curing alone, to provide a gap-filling, thermally stable, etch resistant dielectric material.
摘要翻译：使用由分散在溶剂中的致密材料构成的纳米颗粒的胶体悬浮液来形成具有低热收缩率的间隙填充介电材料。介电材料特别适用于预金属电介质和浅沟槽隔离应用。根据形成介电材料的方法，将胶体悬浮液沉积在基底上并干燥以形成多孔中间层。中间层用诸如旋涂聚合物的液相基质材料进行改性，然后通过用气相基质材料渗透固化，或通过固化或单独固化来提供间隙填充，耐热稳定的，耐蚀刻的介电材料。

4. 发明申请

WO2004078814A3 FLUORINATED POLYMERS, METHODS OF PRODUCTION AND USES IN FERROELECTRIC DEVICES THEREOF 审中-公开
标题翻译：氟化聚合物，其生产方法及其在其电磁设备中的用途
公开(公告)号：WO2004078814A3
公开(公告)日：2004-11-04
申请号：PCT/US2004006680
申请日：2004-03-04
申请人： HONEYWELL INT INC , IWAMOTO NANCY , BEDWELL WILLIAM , NALEWAJEK DAVID , CURRAN SEAN , WILLIAMS THOMAS JR , ENDISCH DENIS , LEVY ALAN , SWAN ELLEN
发明人： IWAMOTO NANCY , BEDWELL WILLIAM , NALEWAJEK DAVID , CURRAN SEAN , WILLIAMS THOMAS JR , ENDISCH DENIS , LEVY ALAN , SWAN ELLEN
IPC分类号： C08F2/00 , C08F14/18 , C08G20060101 , C08K5/17
CPC分类号： C08F14/18 , C08K5/02 , C09D127/12 , C08F2/14 , C08F2/46 , C08F2/22
摘要： Fluorinated polymers having ferroelectric properties are described herein that include: a) at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; and b) at least one adhesion promoter. Fluorinated polymer coating compositions having ferroelectric properties are also described herein that include: a) at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) at least one adhesion promoter; and c) at least one solvent. Methods of producing a fluorinated polymer having ferroelectric properties are described herein that include: a) providing at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) providing at least one adhesion promoter; c) polymerizing the at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof to produce the fluorinated polymer; and d) incorporating the at least one adhesion promoter with the fluorinated polymer. Methods of producing a fluorinated polymer coating composition having ferroelectric properties are also described herein that include: a) providing at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof; b) providing at least one adhesion promoter; c) providing at least one solvent; d) polymerizing the at least one fluorine-based monomer precursor, at least one fluorine-based polymer or a combination thereof to produce the fluorinated polymer; and e) incorporating the at least one adhesion promoter and the solvent with the fluorinated polymer.

5. 发明申请

WO2004077529A2 EDGE BEAD REMOVAL FOR SPIN-ON MATERIALS CONTAINING LOW VOLATILITY SOLVENTS USING CARBON DIOXIDE CLEANING 审中-公开
标题翻译：使用二氧化碳清洗液包含低挥发性溶剂的旋转材料的边缘珠去除
公开(公告)号：WO2004077529A2
公开(公告)日：2004-09-10
申请号：PCT/US2004006146
申请日：2004-02-26
申请人： HONEYWELL INT INC , ENDISCH DENIS
发明人： ENDISCH DENIS
IPC分类号： H01L21/027 , B08B7/00 , G03F7/16 , H01L21/00 , H01L21/304 , H01L21/311 , H01L21/312 , H01L21/316 , H01L
CPC分类号： H01L21/6708 , B08B7/0092 , G03F7/168 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3105 , H01L21/31111 , H01L21/3122 , H01L21/316
摘要： Methods are provided for removing edge beads from spin-on films. A spin-on film is removed from a region of a surface of a spin-coated substrate adjacent to an edge of the surface by spinning the spin-coated substrate, expanding a fluid through a nozzle to form a cryogenic aerosol stream against the spin-on film in the region as the substrate spins. In another aspect of the invention, a film is formed on a surface of a substrate by dispensing a liquid composition onto the surface, spinning the substrate to distribute the liquid composition to form a substantially uniform film on the surface, expanding a fluid through a nozzle to form a cryogenic aerosol stream, and directing the cryogenic aerosol stream against the film in a region of the surface adjacent to an edge of the surface as the substrate spins. The film may include an alkoxysilane and a low volatility solvent. The fluid may consists essentially of liquid carbon dioxide. A spin-on film containing low volatility solvents does not grow back into the region from which the film was removed, the edge bead removal process time can be reduced to less than about 10 seconds, and the volume of waste solvent is reduced.
摘要翻译：提供了用于从旋涂膜上去除边缘珠的方法。通过纺丝旋涂基材，旋转旋转涂布基材的邻近表面边缘的表面的区域，将旋涂膜除去，使流体膨胀通过喷嘴，形成针对旋转涂层的低温气溶胶流，在该区域的膜上作为底物旋转。在本发明的另一方面，通过将液体组合物分配到表面上，在基材的表面上形成膜，旋转基材以分散液体组合物以在表面上形成基本上均匀的膜，使流体通过喷嘴以形成低温气溶胶流，并且当衬底旋转时，将低温气溶胶流引向邻近表面边缘的表面的区域中的膜。该膜可以包括烷氧基硅烷和低挥发性溶剂。流体可以基本上由液体二氧化碳组成。含有低挥发性溶剂的旋涂薄膜不会生长回去除膜的区域，边缘珠去除处理时间可以减少到小于约10秒，并且废溶剂的体积减小。

6. 发明专利

AU2002326737A1 Electronic devices and methods of manufacture 未知
公开(公告)号：AU2002326737A1
公开(公告)日：2003-03-18
申请号：AU2002326737
申请日：2002-08-23
申请人： HONEYWELL INT INC
发明人： ENDISCH DENIS , LEVERT JOSEPH
IPC分类号： H01L21/76 , H01L21/312 , H01L21/316 , H01L21/762 , H01L29/00
摘要： An electronic device comprises a substrate with a trench having a lower portion and a top portion. The lower portion of the trench is filled with a cured spin-on compound, while the top portion is filled with a chemical vapor-deposited compound. Preferably, the chemical vapor-deposited compound has a surface that is substantially coplanar with the surface of the substrate. Particularly preferred methods of fabricating such devices include a step in which a trench is formed in the substrate, and in which a first compound is deposited in the trench by spin-on deposition. The first compound is partially removed from the trench to a level below the surface of the substrate, and in a further step, a second compound is deposited onto the upper surface of the first compound by chemical vapor deposition.

7. 发明专利

CA2439812A1 DIELECTRIC FILMS FOR NARROW GAP-FILL APPLICATIONS 未知
公开(公告)号：CA2439812A1
公开(公告)日：2003-07-31
申请号：CA2439812
申请日：2002-01-18
申请人： HONEYWELL INT INC
发明人： LEUNG ROGER , HACKER NIGEL , XIE SONGYUAN , ENDISCH DENIS , DENG YANPEI
IPC分类号： H01L21/76 , H01L21/314 , H01L21/316 , H01L21/762 , H01L21/768 , H01L23/532
摘要： A colloidal suspension of nanoparticles composed of a dense material dispersed in a solent is used in forming a gap-filling dielectric material with low thermal shrinkage. The dielectric material is particularly useful for pre- metal dielectric and shallow trench isolaiton applications. According to the mehtods of forming a dielectric material, the colloidal suspension is deposited on a substrate and dried to form a porous intermediate layer. The intermediate layer is modified bz infiltration with a liquid phase matrix material, such as a spin-on polymer, followed by curing, by infiltration with a gas phase matrix material, followd by curing, or by curing alone, to provide a gap-filling, thermally stable, etch resistant dielectric material.

8. 发明专利

AU6672501A Edge bead removal for spin-on materials using carbon-dioxide cleaning 未知
公开(公告)号：AU6672501A
公开(公告)日：2001-12-17
申请号：AU6672501
申请日：2001-06-05
申请人： HONEYWELL INT INC
发明人： ENDISCH DENIS
IPC分类号： H01L21/027 , B08B7/00 , H01L21/304 , H01L21/311 , H01L21/312 , B08B3/02 , B05D1/02
摘要： Methods are provided for removing edge beads from spin-on films. A spin-on film is removed from a region of a surface of a spin-coated substrate adjacent to an edge of the surface by spinning the spin-coated substrate, expanding a fluid through a nozzle to form a cryogenic aerosol stream, and directing the cryogenic aerosol stream against the spin-on film in the region as the substrate spins. In another aspect of the invention, a film is formed on a surface of a substrate by dispensing a liquid composition onto the surface, spinning the substrate to distribute the liquid composition to form a substantially uniform film on the surface, expanding a fluid through a nozzle to form a cryogenic aerosol stream, and directing the cryogenic aerosol stream against the film in a region of the surface adjacent to an edge of the surface as the substrate spins. The film may include an alkoxysilane and a low volatility solvent. The fluid may consists essentially of liquid carbon dioxide. A spin-on film containing low volatility solvents does not grow back into the region from which the film was removed, the edge bead removal process time can be reduced to less than about 10 seconds, and the volume of waste solvent is reduced.

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