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    • 1. 发明专利
    • OUTER LEAD PIN FOR SEMICONDUCTOR DEVICE
    • JPS63164349A
    • 1988-07-07
    • JP30850686
    • 1986-12-26
    • HITACHI LTDHITACHI VLSI ENG
    • KOIKE JUNICHITSUBOI TOSHIHIRO
    • H01L23/12H01L23/50H05K3/30H05K3/40
    • PURPOSE:To eliminate the need for the increase of the overall size of a package even when the number of signal pins augments by insulating a plurality of signal pins consisting of a conductor material and using the signal pins as one outer lead pin. CONSTITUTION:Two faced conductor sections 3, 3' are solidified by an insulator 4, and changed into one pin 2. The conductor sections 3 are constituted of a substance such as metal, and the pin 2 organized of the insulator 4 such as resin is acquired by disposing that two metal bars oppositely at a proper interval and disposed previously into a die such as a molding die, and by injecting the resin into the molding die. One conductor section 3 of the multiple pin 2 is connected to a wiring 13 for a substrate 12 for mounting by solder 14, and the other conductor section 3' of the multiple pin 2 is connected to a wiring 13' for the substrate 12 for mounting by solder 14'. Even when the number of the pins is doubled, only pins of the same number can be used, and the size of a package can be miniaturized, thus allowing high packaging density on mounting.
    • 2. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS61212050A
    • 1986-09-20
    • JP5231285
    • 1985-03-18
    • HITACHI VLSI ENGHITACHI LTD
    • SHOJI TAKASHIKOIKE JUNICHI
    • H01L21/60H01L23/485
    • PURPOSE:To enable to attain a highly reliable wire-bonding by a method wherein bonding pad groups, in each of which the bonding pads are formed at a slope in the directions of the inner end parts of the mutually corresponding leads, are respectively formed along each side of the pellet and the terminal bonding pad of each bonding pad group is formed in a configuration wider than the other bonding pads. CONSTITUTION:The bonding pads 5 of a pellet 2 are connected with the inner end parts of leads 3 corresponding to the bonding pads using wires 4. The bonding pads 5 are respectively formed on the pellet 2 in a square form and each of the square bonding pads 5 is formed at the prescribed slope in the direction of the inner end part of the mutually corresponding lead 3. The terminal bonding pad 5a of each of the bonding pad groups is formed wider in the rectangular direction to the inclining direction of the pads compared to the other bonding pads of the bonding pad group. By this way, an ultrasonic bonding can be attained with a sufficient margin.
    • 3. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS6224645A
    • 1987-02-02
    • JP16195785
    • 1985-07-24
    • HITACHI VLSI ENGHITACHI LTD
    • SHOJI TAKASHIKOIKE JUNICHI
    • H01L23/04H01L23/32H01L23/495H01L23/50H01L23/544H01R33/76
    • PURPOSE:To prevent the reverse insertion at the time of mounting a substrate by a method wherein recesses or projection sections that fit in the recess or projection sections formed on a mounting substrate to indicate the mounting direction are formed on a package. CONSTITUTION:A dummy lead 5a is attached on the one side of a package with a lead 5. The dummy lead 5a is horizontally extended from the one side of the package and bent in the middle section. In corresponding to the lead 5, a socket hole 10 is arranged on a socket 9 into which a semiconductor device 1 with such lead construction is to be mounted. A hole 10c for the dummy lead is opened on the socket hole line 10a on the a-line side, with larger number of holes than that of the b-line 10a only by one hole. Thus, when the semiconductor device 1 is to be mounted on the socket 9, the semiconductor device 1 must be mounted so that the lead side with a dummy lead 5a is placed on the side of the socket hole line 10a. By this method, it is made possible to easily recognize the accurate mounting direction and to prevent the reverse insertion at the time of mounting a substrate.
    • 6. 发明专利
    • SCREENING INSPECTION JIG
    • JPH0745675A
    • 1995-02-14
    • JP19100493
    • 1993-08-02
    • HITACHI LTDHITACHI COMPUTER ENG
    • ISOBE TERUOKOIKE JUNICHI
    • H01L21/66
    • PURPOSE:To provide a screening inspection technique by which screening inspections can be accurately accomplished without deforming the lead pins of semiconductor devices. CONSTITUTION:A screening inspection jig is provided with a jig substrate 3, multiple conductor patterns 4 arranged in corresponding to the lead pins 2 of a semiconductor device 1, conductor patterns 11 formed in corresponding to multiple contact pins 12 on the performance board of a desired screening inspection device, through conductors 13 which respectively connect the patterns 4 and 11 to each other, and a fixture 10 from which fixed terminals 10a are projected. The jig is also provided with pin indenters 8 and package indenters 7 respectively arranged corresponding to the outer end sections of the lead pins 2 and package 1a of the semiconductor device 1, guide holes in which positioning pins, etc., provided on the performance board P are put, fixed patterns 5 independent from the conductor patterns 4, solder 14 which joints the fixed terminals 10a of the fixture 10 to fixed patterns 5 on the jig substrate 3.
    • 8. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPS61152054A
    • 1986-07-10
    • JP27281884
    • 1984-12-26
    • HITACHI LTD
    • MURATA JUNKOIKE JUNICHIFUJITA MINORU
    • H01L27/00H01L21/768H01L21/8238H01L27/06H01L27/092
    • PURPOSE:To establish an ohmic contact without enhancing the concentration of impurities in N type and P type semiconductor regions by a method wherein a high-melting point metal silicide layer is formed between the semiconductor regions of two MISFET elements of different conductivity types in a complementary three-dimensional MISFET device. CONSTITUTION:On the primary surface of a substrate 1, element activation regions are formed, surrounded by a relatively thick SiO2 film serving as a field insulating layer, and N-channel MOSFETs are built in the element activation regions. In the diffusion layers of the source 3 and drain 4 of the N-channel MOSFETs, high-melting point metal silicide layers 5 are formed, respectively. The N-channel MOSFETs are isolated from P-channel MOSFETs by insulating films 8. The insulating films 8 also serve as gate insulating films for the P- channel MOSFETs and are locally provided with holes wherein ohmic contact is established between P-channel MOSFET drain regions 10 and N-channel MOSFET source regions 3 with the intermediary of the high-melting point meal silicide layers 5.