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1. 发明专利

JPS56118465A THIN FILMMFORMING COATING LIQUID COMPOSITION AND ITS COATING METHOD 失效
公开(公告)号：JPS56118465A
公开(公告)日：1981-09-17
申请号：JP2173380
申请日：1980-02-25
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： SHIYOUJI FUSAJI , NAKATANI MITSUO , WATANABE TAKESHI , AZUMA KAZUFUMI , SUDOU RIYOUICHI , YOKONO ATARU , ISOGAI TOKIO , SATOU TOUNOBU
IPC分类号： B05D7/24 , C09D183/04
摘要： PURPOSE:To obtain a thin film-forming coating liquid composition which is excellent in workability, safety, wholesomeness, and uniform thin film-forming capability by dissolving a ladder-type organosilicone polymer with a specific viscosity in a specific solvent. CONSTITUTION:A thin film-forming coating liquid composition which is obtained by dissolving a ladder-type organosilicone polymer with phenyl groups, having an intrinsic viscosity of 1.1-3.0 (1% benzene solution at 30 deg.C), e.g., polyphenylsilsesquioxane, poly (methyl-substituted phenylsilsesquioxane), poly (naphthylsilsesquioxane), etc. in a solvent whose main component is composed of compounds of formulas I and II (where R is an aromatic group, cycloalkane ring, or heterocyclic ring and n is 3-5), e.g., 2-phenoxytetrahydropyran, 2-phenoxytetrahydrofuran, etc. The composition is applicable in the formation of oriented film for liquid crystal display device, heat-resistance and insulating film for electronic parts, etc., by spinner method or printing method.

2. 发明专利

JPS56129261A THIN FILM-FORMING COATING LIQUID COMPOSITION 失效
公开(公告)号：JPS56129261A
公开(公告)日：1981-10-09
申请号：JP3273580
申请日：1980-03-17
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： NAKATANI MITSUO , SHIYOUJI FUSAJI , WATANABE TAKESHI , SUDOU RIYOUICHI , YOKONO ATARU , ISOGAI TOKIO , MATSUYAMA HARUHIKO , AZUMA KAZUFUMI
IPC分类号： C08L83/00 , C03C17/30 , C08L83/04 , C09D183/04
摘要： PURPOSE:To provide the titled compsn. which produces a good coating film which has a uniform thickness and is pinhole-free, and is suitable for use in the production of an insulating coating film, an oriented film, etc., by adding a specified amount of dimethylpolysiloxane to a soln. consisting of a ladder type organosilicon polymer and a solvent. CONSTITUTION:0.01-10wt% Dimethylpolysiloxane (C) is blended with a soln. consisting of 0.5-20wt% ladder type organosilicon polymer (A) having phenyl group [e.g. a polyphenylsilsesquioxane having a relative viscosity (in 1wt% benzene soln. at 30 deg.C) of 1.1-3.0] and 99.5-80wt% solvent (B) having a b.p. of not lower than 180 deg.C. By the blending of dimethylpolysiloxane, a coating film which is pinhole-free and has a uniform thickness, can be obtd. when the compsn is coated on the surfaces of glass, SiOx and metal oxides by printing method.

3. 发明公开

EP1267392A4 ELECTRON BEAM LITHOGRAPHY DEVICE AND DRAWING METHOD USING ELECTRON BEAMS 有权
标题翻译： ELEKRONENSTRAHLLITHOGRAPHIEEINRICHTUNG UND ZEICHENVERFAHREN MIT ELEKTRONENSTRAHLEN
公开(公告)号：EP1267392A4
公开(公告)日：2009-05-06
申请号：EP00909767
申请日：2000-03-21
申请人： HITACHI LTD
发明人： WATANABE TAKESHI
IPC分类号： H01J37/302 , H01L21/027 , G03F7/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/3175 , H01J2237/31764
摘要： Conventional electron beam lithography devices have a problem that when size-dependent exposure energy correction is applied to an isolated fine pattern, a region of high exposure area ratio suffers excessive exposure to light. An electron beam lithography device and a drawing method using electron beams, wherein drawing dimensional accuracy is high even in the case of fine pattern drawing where regions different in exposure area ratio coexist. The arrangement is such that adjustment is made so that line-width dependent correction, which is a correction corresponding to front scatter diameter, matches exposure area ratio-dependent correction, which is a correction corresponding to rear scatter coefficient, while size-dependent correction using the front scatter diameter α as the reference size is taken into rear scatter coefficient θ to provide effective rear scatter coefficient θ* to correct exposure energy using the effective rear scatter coefficient θ* and exposure area ratio R.
摘要翻译：常规电子束光刻设备具有这样的问题，即，当依赖于尺寸的曝光能量校正被应用于隔离的精细图案时，高曝光面积比的区域遭受过度曝光。一种使用电子束的电子束光刻装置和绘图方法，其中即使在曝光面积比不同的区域共存的精细图案绘制的情况下，绘制尺寸精度也高。该配置是这样调整的，使得作为与前散射直径对应的校正的线宽相关校正与使用作为与后散射系数相对应的校正的曝光面积比相关校正一致，而使用尺寸相关校正将作为参考尺寸的前散射直径α作为后散射系数θ，以使用有效后散射系数θ*和曝光面积比R来提供有效的后散射系数θ*以校正曝光能量。

4. 发明专利

JP2010176401A System and method for managing lot 有权
标题翻译：用于管理大量的系统和方法
公开(公告)号：JP2010176401A
公开(公告)日：2010-08-12
申请号：JP2009018440
申请日：2009-01-29
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： OISHI SATOSHI , NAGAI SADAAKI , ISHIKAWA HIROMI , ARAKAWA KENICHI , WATANABE TAKESHI , NIIMURA YONEMITSU , WATANABE MASAHIRO , YOSHIZAWA TAKASHI
IPC分类号： G05B19/418 , G06Q50/00 , G06Q50/04
CPC分类号： Y02P90/30
摘要： PROBLEM TO BE SOLVED: To intelligibly display information in lot management. SOLUTION: A lot management system A for managing the lot of a component includes: a lot management device 1 having a processing part 100, a storage part 110 and a display part 123; and a move ticket issuing device 2 and a move ticket issuing device 3 for reading information related with the issue date and collection date of a move ticket 200, and for transmitting the information to an information processor. The processing part 100 manages lot information 111 related with the issue date and collection date of the move ticket 200 received from the move ticket issuing device 2 and the move ticket issuing device 3, and display the issue date and collection date of the move ticket stored in the storage part 110 at a display part 123 as a diaphragm on a coordinate plane with one axis as time and the other axis as an axis related with the number of components remaining in the lot. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：在批次管理中智能显示信息。解决方案：用于管理组件批次的大量管理系统A包括：具有处理部分100，存储部分110和显示部分123的批次管理设备1; 以及用于读取与移动票证200的发行日期和收集日期有关的信息的移动票发行装置2和移动票发行装置3，并且用于将信息发送到信息处理器。处理部100管理与从移动票发行装置2和移动票发行装置3接收到的移动票券200的发行日期和收集日期有关的批量信息111，并且显示存储的移动票据的发行日期和收集日期在显示部分123的存储部分110中，作为在作为时间的一个轴的坐标平面上的光阑，而另一个轴作为与批次中剩余的分量的数量相关的轴的光阑。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2003288774A Recording and reproducing device with warning indicator, and warning indicating method 审中-公开
标题翻译：具有警告指示器的记录和再现装置，以及警告指示方法
公开(公告)号：JP2003288774A
公开(公告)日：2003-10-10
申请号：JP2002090180
申请日：2002-03-28
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： WATANABE TAKESHI , NAKAMOTO TOSHIO , YAMAZOE YASUO
IPC分类号： H04N5/7826 , G11B33/10
摘要： PROBLEM TO BE SOLVED: To easily discriminate normal and abnormal operations indicated on a display by improving the visibility for the warning indication of an recording and reproducing device and by changing the light emission.
SOLUTION: The warning indicator is composed of a display 7 to show the operation of a recording and reproducing device, a state detector 4 to detect the operation states, a normal operation state storing memory 6, and a state indication signal generator 5a. The indicator 7 consists of a letter and character display 1, and a backlight 2 which uses a light source of a plurality of LEDs. When an abnormal operation is detected by comparing the information 10 from the state detector 4 and the normal operation state storing memory, the backlight 2 emits light in another color to indicate that the recording and reproducing device is in an abnormal operation.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：通过提高记录和再现装置的警告指示的可视性以及通过改变发光来容易地识别显示器上指示的正常和异常操作。
解决方案：警告指示器由显示记录和再现装置的操作的显示器7，检测操作状态的状态检测器4，存储器6的正常操作状态和状态指示信号发生器5a 。指示器7由字母和字符显示器1以及使用多个LED的光源的背光源2组成。当通过比较来自状态检测器4的信息10和正常操作状态存储存储器检测到异常操作时，背光2发出另一种颜色的光，以指示记录和再现设备处于异常操作。版权所有（C）2004，JPO

6. 发明专利

JP2000331917A EXPOSURE MASK AND EXPOSURE APPARATUS OF ELECTRON BEAM 失效
公开(公告)号：JP2000331917A
公开(公告)日：2000-11-30
申请号：JP14113899
申请日：1999-05-21
申请人： HITACHI LTD
发明人： WATANABE TAKESHI , USUI KENICHI , TAWA SUSUMU
IPC分类号： H01J37/305 , G03F1/20 , G03F7/20 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To prevent deformation of a full exposure fine-line pattern by mechanically fastening a silicon mask chip to a holder base body through using a metallic presser structure. SOLUTION: In a configuration of a combining exposure mask of a silicon mask chip with a holder, the silicon mask chip, in whose structure a single- crystal silicon supporting body 3 is joined to a single-crystal silicon thin layer 2 via a silicon oxide film 4, is fastened mechanically to a holder base body 22 by using a metallic presser structure 10. Furthermore, by forming on the surface of the single-crystal silicon thin layer 2 a metallic conductive film 7, is secured via the conductive film 7 and the presser structure 10 the electrical connection of the holder base body 22 with the single-crystal silicon thin layer 2, whereon an electron beam 20 is projected. Thereby, deformation of a full exposure fine-line pattern can be prevented which is generated in the conventional bonding methods.

7. 发明专利

JPH1031229A ACTIVE MATRIX LIQUID CRYSTAL DISPLAY DEVICE AND ITS DRIVE METHOD 失效
公开(公告)号：JPH1031229A
公开(公告)日：1998-02-03
申请号：JP18468996
申请日：1996-07-15
申请人： HITACHI LTD
发明人： WATANABE TAKESHI , WAKAGI MASATOSHI , ANDO MASAHIKO , MINEMURA TETSUO
IPC分类号： G02F1/136 , G02F1/133 , G02F1/1343 , G02F1/1368 , G09F9/30
摘要： PROBLEM TO BE SOLVED: To provide an active matrix liquid crystal display device with a high numerical aperture and high picture quality without causing a vertical smear display fault by forming an electric field applied to a liquid crystal with a potential difference between two pixel electrodes connected to two adjacent switching transistor elements connected to the same signal electrode line. SOLUTION: A electric field to be applied to the liquid crystal is formed by the potential difference between two pixel electrodes 5, 6 connected to two adjacent switching transistor elements 11', 11" connected to the same signal electrode line 4. This voltage application is performed so that voltage signals inputted from two adjacent switching transistor elements 11', 11" connected to the same signal electrode line 4 to respective pixel electrodes are made AC voltages that positive/negative are inverted between the pixel electrodes 5, 6 adjacent in the direction of the signal electrode line using a fixed positive bias potential as a reference for off level potential of a gate voltage applied to a scan electrode line.

8. 发明专利

JPH09199699A THIN FILM IMAGE SENSOR 失效
公开(公告)号：JPH09199699A
公开(公告)日：1997-07-31
申请号：JP414096
申请日：1996-01-12
申请人： HITACHI LTD
发明人： ANDO MASAHIKO , WATANABE TAKESHI , WAKAGI MASATOSHI , HIYAMA IKUO , MINEMURA TETSUO
IPC分类号： H01L27/14 , H01L27/146 , H04N5/32
摘要： PROBLEM TO BE SOLVED: To obtain an image sensor for measuring X-ray images with a high efficiency, no crosstalk between picture elements, and a high mass producibility. SOLUTION: An optical fiber plate 11 is used as a substrate and a photoconductor according to a thin-film transistor and a PIN diode and a scintillation fluorescent body 22 are arranged oppositely on different surfaces of the optical fiber plate 11. The photoconductor is arranged so that a Player 217 where light enters is located at the side of the optical fiber plate 11 and a transparent electrode at the side of the P layer 217 and the drain electrode of the thin-film transistor are formed in one piece on a same plane by a same material and process as a drain electrode 12 in one piece with the P-layer-side transparent electrode. X rays 21 through a subject are applied to the scintillation fluorescent body 22 and are converted to a long wavelength light 23, the long wavelength light 23 is applied to the P layer 217 of a photoconductor via the optical fiber plate 11, thus generating photo current at the photoconductor. The photo current is measured by an externally mounted ammeter.

9. 发明专利

JPH0822960A PLASMA FILM FORMING EQUIPMENT AND FORMING METHOD 失效
公开(公告)号：JPH0822960A
公开(公告)日：1996-01-23
申请号：JP15692894
申请日：1994-07-08
申请人： HITACHI LTD
发明人： WATANABE TAKESHI , KETSUSAKO MITSUNORI , MAEDA KUNIHIRO
IPC分类号： H01L21/205 , H01L31/04
摘要： PURPOSE:To restrain the bending of a flexible board in the width direction, and improve the uniformity of film formation, by generating plasma discharge in a closed space constituted by closing both end surfaces of a cylindrical body formed by bending the flexible board, and growing a film on the inner surface of the cylindrical body. CONSTITUTION:A flexible board 1 wound around a roll 2 is made to pass slits 4 or the like via a guide roll 2, and wound up by a winding-up roll 12 via a guide roll 11. In each layer forming chamber, the flexible board 1 is wound with a disk body via a guide roll 12, and an almost cylindrical body 13 is formed. The cylindrical body 13 is made to pass the slit via a roll guide 14, and sent out to an adjacent chamber. A center electrode 15 is formed in the cylindrical body 13, and generates plasma in a gap part 16 between the electrode 15 and the cylindrical body 13 of the flexible board 1. Decomposition film formation gas is introduced into the gap part 16. From the viewpoint of uniformity, it is desirable for the decomposition film formation gas to be discharged from the center electrode 15 in the direction of the cylindrical body 13 of the flexible board 1.

10. 发明专利

JPH065768B2 失效
公开(公告)号：JPH065768B2
公开(公告)日：1994-01-19
申请号：JP30020387
申请日：1987-11-30
申请人： HITACHI LTD
发明人： AZUMA KAZUFUMI , WATANABE TAKESHI , TANAKA MASAHIRO , NAKATANI MITSUO
IPC分类号： H01L31/04 , H01L21/205

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