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1. 发明专利

JPS56118465A THIN FILMMFORMING COATING LIQUID COMPOSITION AND ITS COATING METHOD 失效
公开(公告)号：JPS56118465A
公开(公告)日：1981-09-17
申请号：JP2173380
申请日：1980-02-25
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： SHIYOUJI FUSAJI , NAKATANI MITSUO , WATANABE TAKESHI , AZUMA KAZUFUMI , SUDOU RIYOUICHI , YOKONO ATARU , ISOGAI TOKIO , SATOU TOUNOBU
IPC分类号： B05D7/24 , C09D183/04
摘要： PURPOSE:To obtain a thin film-forming coating liquid composition which is excellent in workability, safety, wholesomeness, and uniform thin film-forming capability by dissolving a ladder-type organosilicone polymer with a specific viscosity in a specific solvent. CONSTITUTION:A thin film-forming coating liquid composition which is obtained by dissolving a ladder-type organosilicone polymer with phenyl groups, having an intrinsic viscosity of 1.1-3.0 (1% benzene solution at 30 deg.C), e.g., polyphenylsilsesquioxane, poly (methyl-substituted phenylsilsesquioxane), poly (naphthylsilsesquioxane), etc. in a solvent whose main component is composed of compounds of formulas I and II (where R is an aromatic group, cycloalkane ring, or heterocyclic ring and n is 3-5), e.g., 2-phenoxytetrahydropyran, 2-phenoxytetrahydrofuran, etc. The composition is applicable in the formation of oriented film for liquid crystal display device, heat-resistance and insulating film for electronic parts, etc., by spinner method or printing method.

2. 发明专利

JPS57168943A COATING LIQUID FOR THIN FILM FORMATION 失效
公开(公告)号：JPS57168943A
公开(公告)日：1982-10-18
申请号：JP5440981
申请日：1981-04-13
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： ATSUSHI FUSAJI , AZUMA KAZUFUMI , YOKONO ATARU , SATOU TOUNOBU
IPC分类号： C08L79/08 , C08G73/00 , C08G73/10 , C08G77/00 , C08G77/42 , C08G77/48 , H01L21/312 , H01L21/768 , H01L23/29 , H01L23/31 , H01L23/522
摘要： PURPOSE:To provide the titled liquid which comprises a polymer prepared from a diamine and a tetracarboxylic acid dianhydride, a polyamide acid, and an organic polar solvent, thereby foaming a thin film of uniform thickness and free from peeling and whitening. CONSTITUTION:The titled coating liquid comprises (1) a polymer prepared from 1-20mol% diaminosiloxane of formulaI, a diamine containing 99-80% aromatic diamine, and a tetracarboxylic acid dianhydride of formula II, (2) a polyamide acid mainly consisting of a repeating unit of formula III (wherein R1 is a divalent hydrocarbon group; R2 and R3 are each a monovalent hydrocarbon group; R4 is 4C or higher tetravalent group: Ar is a divalent aromatic residue; m is 1-3; n is an integer) and (3) a mixed solvent of easily water-soluble organic polar solvent and difficultly water-soluble organic polar solvent or a difficultly water-soluble organic polar solvent. This coating liquid is used for a surface protecting film of semiconductors or insulating film for multilayered wiring circuits.

3. 发明专利

JPS6025742A COMPOSITE BODY 失效
公开(公告)号：JPS6025742A
公开(公告)日：1985-02-08
申请号：JP13465183
申请日：1983-07-22
申请人： HITACHI CHEMICAL CO LTD
发明人： YAMAZAKI MITSUO , SATOU TOUNOBU , MAKINO DAISUKE
IPC分类号： B32B9/00 , B32B15/08 , B32B15/088 , H05K1/03 , H05K1/05

4. 发明专利

JPS5896654A PHOTOSENSITIVE SILICON RESIN COMPOSITION 失效
公开(公告)号：JPS5896654A
公开(公告)日：1983-06-08
申请号：JP19485181
申请日：1981-12-02
申请人： HITACHI CHEMICAL CO LTD
发明人： UCHIMURA SHIYUNICHIROU , SATOU TOUNOBU , MAKINO DAISUKE , KOIBUCHI SHIGERU
IPC分类号： C08K5/28 , C08K5/43 , C08L83/00 , C08L83/04 , C08L83/06 , G03F7/004
摘要： PURPOSE:To obtain novel titled composition with high heat resistance after photochemical reaction, useful for printing plate making, resists for forming the circuits of electronic parts, etc., comprising a (terminal hydroxy) polyladder siloxane and an aromatic (sulfonyl)azide compound. CONSTITUTION:The objective composition comprising (A) a polyladder siloxane of formulaI[R1 and R2 are each monovalent (substituted) hydrocarbon; n is a positive integer]and/or a terminal hydroxypolyladder siloxane of formula II[R3 and R4 are monovalent (substituted) hydrocarbon; m is an integer]and (B) an aromatic azide compound (e.g. of formula III, or IV) and/or an aromatic sulfonylazide compound (e.g. of formula V, or VI). For the application, the above composition is usually dissolved in a solvent such as bonzene, acetone, etc.

5. 发明专利

JPS5827722A PREPARATION OF POLYIMIDOAMIDE ACID SILOXANE, POLYIMIDE SILOXANE COPOLYMER AND/OR POLYIMIDE ISOINDOLOQUINAZOLINEDIONE SILOXANE COPOLYMER 失效
公开(公告)号：JPS5827722A
公开(公告)日：1983-02-18
申请号：JP12544381
申请日：1981-08-10
申请人： HITACHI CHEMICAL CO LTD
发明人： SATOU TOUNOBU , UCHIMURA SHIYUNICHIROU , MAKINO DAISUKE , MAEKAWA IWAO
IPC分类号： C08G73/00 , C08G73/06 , C08G73/10 , C08G77/00 , C08G77/42 , C08G77/48
摘要： PURPOSE:To obtain the titled copolymer having improved heat resistance, by reacting a specific diaminosiloxane with a diaminoamide and a diamine, an aromatic tetracarboxylic acid dianhydride, and reacting further an aromatic diisocyanate with the product of the first reaction. CONSTITUTION:(A) A diaminosiloxane of formulaI(R is bifunctional hydrocarbon; R' is monofunctional hydrocarbon; m is an integer >=1) is reacted with (B) a diaminoamide of formula II (Y is SO2 or CO, and one amino group and the Y-NH2 group are at the o-position to each other), (C) a diamine, e.g. 4,4'-diaminodiphenyl ether, and (D) pyromellitic acid dianhydride, and the reaction product is then reacted with (E) an aromatic diisocyanate in an amount of almost equivalent to the acid anhydride group in the reaction product at 50-100 deg.C while removing the liberated and generated CO2 from the reaction system to afford the aimed copolymer. The amount of the component (D) is 1.5-2.0mol based on one mole components (A) and (B) and/or component (C).

6. 发明专利

JPS6035727A MANUFACTURE OF PATTERN 失效
公开(公告)号：JPS6035727A
公开(公告)日：1985-02-23
申请号：JP14464383
申请日：1983-08-08
申请人： HITACHI CHEMICAL CO LTD
发明人： UCHIMURA SHIYUNICHIROU , SATOU TOUNOBU , KOIBUCHI SHIGERU , MAKINO DAISUKE
IPC分类号： C08K5/28 , C08K5/36 , C08L83/00 , C08L83/04 , G03C5/00 , G03C7/10 , G03F7/038 , G03F7/075 , H01L21/027
摘要： PURPOSE:To obtain a pattern faithful to a resist pattern by coating a specified photosensitive silicone resin composition on a layer to be processed, forming a pattern by exposure and development, and carrying out dry etching with oxygen plasma. CONSTITUTION:A photosensitive silicone resin composition 3 consisting of ladder polysiloxane having optionally terminal hydroxy groups represented by formula I and/or II [where each of R1-4 is a univalent (substituted) hydrocarbon group, and each of m and n is a positive integer] and an aromatic (sulfonyl) azide compound is dissolved in an org. solvent. The composition 3 is coated on a layer 2 to be processed such as an insulating layer on a substrate 1, and it is dried, irradiated with light, and developed to form a patterned resist layer 3. The layer 3 is exposed to oxygen plasma to dry etch the part of the layer 2 not covered with the layer 3, and the layer 3 is removed. Dry etching is easily applied, and a fine circuit pattern can be formed.

7. 发明专利

JPS60260650A POLYIMIDE PRECURSOR COMPOSITION FOR PRINTING 失效
公开(公告)号：JPS60260650A
公开(公告)日：1985-12-23
申请号：JP11623584
申请日：1984-06-06
申请人： HITACHI CHEMICAL CO LTD
发明人： SATOU TOUNOBU , MAKINO DAISUKE
IPC分类号： G03F7/038 , C08L79/08 , C09D11/00
摘要： PURPOSE:The titled composition having excellent transparency and surface smoothness and a high accuracy of patterning when cured, obtained by incorporating benzylidenesorbitols into a solution of the precursor of a polyimide resin or a polyimide-silicone resin. CONSTITUTION:The titled composition prepared by incorporating one or more compounds selected from among monobenzylidenesorbitol, dibenzylidenesorbitol, and tribenzylidenesorbitol in an amount of 1-50pts.wt. based on 100pts.wt. precursor into a solution of the precursor of a polyimide resin and/or a polyimide-silicone resin (e.g. a reaction product of 4,4'-diaminodiphenyl ether with 3,3',4,4'-benzophenonetetracarboxylic dianhydride in a solvent). This composition has excellent transparency and surface smoothness and a high accuracy of patterning when cured.

8. 发明专利

JPS60108821A COMPOSITE BODY FOR BASE PLATE 失效
公开(公告)号：JPS60108821A
公开(公告)日：1985-06-14
申请号：JP21689083
申请日：1983-11-17
申请人： HITACHI CHEMICAL CO LTD
发明人： SATOU TOUNOBU , YAMAZAKI MITSUO , MAKINO DAISUKE
IPC分类号： G02F1/1337 , G02F1/133 , G02F1/1333
摘要： PURPOSE:To prevent the deterioration of a polyimide resin layer which contacts with a base plate owing to the base plate in the stage of a high-temp. treatment or the decrease in the layer thickness by providing a thin film layer of metallic oxide between the base plate and the polyimide resin layer. CONSTITUTION:A base plate is a glass base plate, ceramic base plate, etc. and a thin film layer of metallic oxide consisting essentially of, for example, SiO2 as a thin film consisting of the metallic oxide is obt. by adding water to an alcohol soln. consisting essentially of ethyl silicate to hydrolyze the same, coating the resultant alcohol soln. consisting essentially of oligomer on the base plate and drying the coating by heating. A layer consisting of a resin having an imide ring structure and the modified matter thereof is used as the polyimide resin layer. The polyimide resin layer is formed by coating an org. solvent soln. or the org. solvent soln. of the precursor on the base plate on which the thin film of the metallic oxide is formed and drying the coating by heating.

9. 发明专利

JPS5814117A SUBSTRATE FOR SANDWICHING LIQUID CRYSTAL 失效
公开(公告)号：JPS5814117A
公开(公告)日：1983-01-26
申请号：JP11190981
申请日：1981-07-16
申请人： HITACHI CHEMICAL CO LTD
发明人： UCHIMURA SHIYUNICHIROU , SATOU TOUNOBU , KOJIMA MITSUMASA , MAKINO DAISUKE
IPC分类号： G02F1/1337
摘要： PURPOSE:To obtain a film for homogeneous orientation which is highly adhesive and resistant to heat and is stable with time by using a polyhydradiimide siloxane type high polymer film. CONSTITUTION:Electrodes are provided on substrates, and the soln. of the siloxane bond-contg. polyhydrazide acid-amide acid obtd. by reaction of carboxylic anhydride such as pyromellitic anhydride, dihydrazide such as isophthatic dihydrazide, diamine such as p-phenylene diamine and diaminosiloxane such as 1,3- bis(amino propyl)-tetramethyl disiloxane is coated on said substrates and electrode and is heated to cause dehydration and ring closure of said siloxane bond- contg. polyhydrazide acid-amide acid, whereby the polyhydradiimide-siloxane type high polymer film is formed. It is preferable to use arom. compds. for the above-mentioned compds. in terms of heat resistance.

10. 发明专利

JPS60258259A LIGHT-SCREENING COMPOSITION 失效
公开(公告)号：JPS60258259A
公开(公告)日：1985-12-20
申请号：JP11414184
申请日：1984-06-04
申请人： HITACHI CHEMICAL CO LTD
发明人： SHIMAMURA YASUO , SATOU TOUNOBU , MAKINO DAISUKE
IPC分类号： C08K3/22 , C08L79/08
摘要： PURPOSE:A light-screening composition having improved adhesiveness, obtained by using a diaminosiloxane as one diamine component to give a precursor for a polyimide silicone resin, blending it with titanium dioxide powder. CONSTITUTION:(A) A solution of a precursor for a polyimide silicone resin obtained by dissolving diaminodiphenyl ether, etc. as a diamine component and preferably 0.2-20mol% based on the diamine component of a diaminosiloxane shown by the formula (R is bifunctional hydrocarbon; R' is monofunctional hydrocarbon; m is >=1) in a solvent(N-methyl-2-pyrrolidone), adding a tetracarboxylic acid dianhydride(pyromellitic dianhydride, etc.), followed by reacting them, is blended with (B) 20-600pts.wt. titanium dioxide powder preferably of anatase type based on 100pts.wt. of the precursor for the resin, to give the aimed composition. The prepared composition is heat-treated, to give a polyimide silicone resin.

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