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1. 发明专利

JP2014142291A Scanning probe microscope and observation method of sample using the same 有权
标题翻译：扫描探针显微镜及其使用观察方法
公开(公告)号：JP2014142291A
公开(公告)日：2014-08-07
申请号：JP2013011604
申请日：2013-01-25
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKADA TOSHIHIKO , BABA SHUICHI
IPC分类号： G01Q60/18 , G01Q30/14 , G01Q60/22
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , G01Q30/14
摘要： PROBLEM TO BE SOLVED: To increase, in applying a near-field scanning microscope to in-liquid measurement, the detection intensity of near-field light occurring between a measurement probe and an inspection object sample in liquid, so as to improve an SN ratio of a near-field light image and measurement reproducibility.SOLUTION: There is provided a scanning probe microscope comprising: a measurement probe that relatively scans on an inspection object sample; a laser beam irradiation system that irradiates the measurement probe with laser beams; a sample cell that transmits scattering light of near-field light occurring between the measurement probe and the inspection object sample due to the irradiation of the laser beams, and holds the inspection object sample; and a detection unit that detects the scattering light transmitted through the sample cell.
摘要翻译：要解决的问题：为了在将近场扫描显微镜应用于液体内测量中增加在液体中测量探针和检查对象样品之间发生的近场光的检测强度，以提高SN比的近场光图像和测量再现性。解决方案：提供了一种扫描探针显微镜，包括：相对于检查对象样品扫描的测量探针; 用激光束照射测量探头的激光束照射系统; 由于照射激光而发射在测量探针与检查对象样品之间的近场光的散射光的样品池，并保持检查对象样品; 以及检测单元，其检测透过所述样品池的散射光。

2. 发明专利

JP2014013160A Scanning probe microscope 审中-公开
标题翻译：扫描探针显微镜
公开(公告)号：JP2014013160A
公开(公告)日：2014-01-23
申请号：JP2012150066
申请日：2012-07-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TACHIZAKI TAKEHIRO , NAKADA TOSHIHIKO , WATANABE MASAHIRO
IPC分类号： G01Q60/22 , G01Q70/08
CPC分类号： G01Q60/18 , G01Q60/22 , G01Q70/10 , G01Q70/14
摘要： PROBLEM TO BE SOLVED: To provide a scanning probe microscope that improves excitation efficiency of plasmon so that excitation efficiency of near-field light is improved.SOLUTION: The scanning probe microscope includes: a cantilever that scans a probe to a measuring object; a light source that irradiates the cantilever with excitation light; a near-field light detection sensor that detects the near-field light generated from a tip of the probe by plasmon excited by the cantilever excitation light, and scattered from a surface of the measuring object; and a microstructure that guides the excitation light to an excitation point of the plasmon, in a part of the cantilever which the excitation light irradiates.
摘要翻译：要解决的问题：提供一种提高等离子体激发效率的扫描探针显微镜，从而提高近场光的激发效率。解决方案：扫描探针显微镜包括：将探针扫描到测量对象的悬臂; 用激发光照射悬臂的光源; 近场光检测传感器，其通过由悬臂激发光激发的等离子体激元检测从探针的尖端产生的近场光，并从测量对象的表面散射; 以及在激发光照射的悬臂的一部分中将激发光引导到等离子体激元的激发点的微结构。

3. 发明专利

JP2012220191A Scanning probe microscope and measurement method using the same 有权
标题翻译：扫描探针显微镜和使用它的测量方法
公开(公告)号：JP2012220191A
公开(公告)日：2012-11-12
申请号：JP2011082396
申请日：2011-04-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TACHIZAKI TAKEHIRO , NAKADA TOSHIHIKO , WATANABE MASAHIRO
IPC分类号： G01Q60/18
CPC分类号： G01Q60/18 , B82Y15/00 , B82Y20/00 , B82Y35/00 , G01N21/554 , G01Q60/22 , G01Q70/12
摘要： PROBLEM TO BE SOLVED: To provide a measurement method of a scanning probe microscope for measuring a shape and optical characteristics of a sample using near field light without reducing a signal-to-noise ratio in a plasmon propagation beam SPM.SOLUTION: The measurement method of a scanning probe microscope for observing a shape and optical characteristics of a sample by exciting near field light, scanning a relative position between the near field light and the sample, and detecting scattered light of the near field light on the sample, comprises: modulating the near field light; periodically varying a relative position between the near field light and the sample; and selectively extracting interference signals generated by a modulation frequency applied to the near field light, and a frequency varying the relative position between the near field light and the sample.
摘要翻译：要解决的问题：提供一种用于使用近场光测量样品的形状和光学特性而不降低等离子体激元传播光束SPM中的信噪比的扫描探针显微镜的测量方法。解决方案：扫描探针显微镜的测量方法，用于通过激发近场光来观察样品的形状和光学特性，扫描近场光和样品之间的相对位置，并检测近场的散射光样品上的光，包括：调制近场光; 周期性地改变近场光和样品之间的相对位置; 并且选择性地提取由施加到近场光的调制频率产生的干扰信号，以及改变近场光和样本之间的相对位置的频率。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2012047607A Internal flaw detection method and device for the same 审中-公开
标题翻译：内部FLAW检测方法及其装置
公开(公告)号：JP2012047607A
公开(公告)日：2012-03-08
申请号：JP2010190253
申请日：2010-08-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKADA TOSHIHIKO , MATSUI TETSUYA , TACHIZAKI TAKEHIRO , YOSHIMURA KAZUSHI , WATANABE MASAHIRO
IPC分类号： G01N29/06
CPC分类号： G01N29/221 , G01N29/04 , G01N29/043 , G01N29/0654 , G01N29/2418
摘要： PROBLEM TO BE SOLVED: To provide an internal flaw detection method for exciting ultrasonic waves to a sample without contact and without damaging the sample, and detecting the ultrasonic waves from a flaw inside the sample without contact, with high sensitivity, and without being affected by the surface of the sample; and a device for the same.SOLUTION: Ultrasonic waves are emitted from a ultrasonic transmission part toward a sample to detect the ultrasonic waves reflected from the sample as an interference signal by an image-formation type common optical path interferometer. An ultrasonic signal is obtained from the interference signal to detect a flaw inside the sample from the ultrasonic signal.
摘要翻译：要解决的问题：提供一种用于在不接触的情况下向样品激发超声波而不损坏样品的内部探伤方法，并且以高灵敏度和高灵敏度检测来自样品内部的缺陷的超声波而不接触受样品表面的影响; 和相同的设备。解决方案：超声波从超声波发送部分发射到样品，以通过图像形成型公共光路干涉仪检测从样品反射的超声波作为干扰信号。从干扰信号获得超声波信号，以从超声波信号中检测样品内的缺陷。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2010197347A Pattern inspection device and pattern inspection method of substrate surface 有权
标题翻译：基板表面图案检测装置及图案检测方法
公开(公告)号：JP2010197347A
公开(公告)日：2010-09-09
申请号：JP2009045707
申请日：2009-02-27
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： WATANABE MASAHIRO , NAKADA TOSHIHIKO , YOSHITAKE YASUHIRO , SASAZAWA HIDEAKI , YOSHIDA MINORU
IPC分类号： G01N21/956 , G01B11/30 , G01N21/27 , G01Q60/18 , G11B5/84
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , G01N21/95607 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a pattern inspection device of a substrate surface capable of speedily inspecting substrate which includes a pattern below a resolution limit of light. SOLUTION: The pattern inspection device of the substrate surface includes a near-field light head 101 having a fine repeated pattern, a θ drive part 311 for scanning relatively the near-field light head 101 and a substrate 900 to be inspected, a clearance holding mechanism for keeping constant a clearance between the near-field light head 101 and the substrate 900 to be inspected, a light source 110 for irradiating the near-field light head 101 with light, a detection system 201 for detecting scattered light intensity generated by an interaction between the fine repeated pattern on the near-field light head 101 and a fine repeated pattern on the substrate 900 to be inspected, and a signal processing part 321 for inspecting the fine pattern on the substrate 900 to be inspected based on an output from the detection system 201. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够快速检查基板的基板表面的图案检查装置，该基板包括低于分辨率极限的图案。解决方案：基板表面的图案检查装置包括具有精细重复图案的近场光头101，用于相对于近场光头101扫描的θ驱动部311和待检查的基板900，用于保持近场光头101和要检查的基板900之间的间隙恒定的间隙保持机构，用于对近场光头101照射光的光源110，用于检测散射光强度的检测系统201 通过近场光头101上的精细重复图案与要检查的基板900上的精细重复图案之间的相互作用产生的信号处理部321，用于检查基板900上的精细图案以进行检查，信号处理部321基于来自检测系统201的输出。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2008256672A Scanning probe microscope and method of observing sample using the same 有权
标题翻译：扫描探针显微镜及其使用方法观察样品
公开(公告)号：JP2008256672A
公开(公告)日：2008-10-23
申请号：JP2007322722
申请日：2007-12-14
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NAKADA TOSHIHIKO , WATANABE MASAHIRO , INOUE TAKASHI , HIDAKA KISHIFU , HIROOKA MASAYUKI
IPC分类号： G01Q60/22 , G01Q70/12
CPC分类号： G01Q60/18 , G01Q60/22
摘要： PROBLEM TO BE SOLVED: To solve the problems, wherein in a near-field scanning microscope that uses an aperture probe, the upper limit of the aperture formation is at most several tens of nms in practice, in a near-field scanning microscope that uses a scatter probe, the resolution ability is limited to at most several tens of nms, because of the external illuminating light serving as background noises, and moreover, the measurement reproducibility is markedly lower due to damages or abrasion of a probe. SOLUTION: Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility, while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability, by combining a nm-order cylindrical structure with nm-order microparticles, and repeatedly moving the probe toward the sample and away therefrom with a small contact force at individual measurement points on the sample. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题为了解决在使用孔径探针的近场扫描显微镜中，实际上在近场扫描中孔径形成的上限为几十nms的问题，使用散射探针的显微镜，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nms，此外，由于探针的损伤或磨损，测量再现性显着降低。解决方案：可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造等离子体增强近场探针而不损害探针和样品，具有通过将nm级圆柱形结构与nm级微粒组合，并将探针重复地移动到样品并在样品上的各个测量点处以较小的接触力将其远离，从而获得nm级光学分辨能力。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2005333150A Tft substrate and display device 有权
标题翻译： TFT基板和显示装置
公开(公告)号：JP2005333150A
公开(公告)日：2005-12-02
申请号：JP2005171796
申请日：2005-06-13
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： HONGO MIKIO , UTO YUKIO , NOMOTO MINEO , NAKADA TOSHIHIKO , HATANO MUTSUKO , YAMAGUCHI SHINYA , OKURA OSAMU
IPC分类号： G02F1/1362 , G02F1/1368 , H01L21/20 , H01L21/268 , H01L21/336 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To provide a display device having pixel transistors and driving transistors for driving the pixel transistors respectively formed on an identical substrate, adapted to raise mobilities in the active regions of the driving transistors and achieve speed-up thereof. SOLUTION: A polycrystalline silicon film 103 is formed on a major surface of a glass substrate 100 on which pixel transistors and driving transistors are to be formed, and continuously oscillated and rectangularly cross-sectioned laser light 105 is swept along a side of the relevant major surface on a peripheral edge along the relevant side. The polycrystalline silicon film 103, irradiated with the relevant laser light 105, transforms into crystal grains that extend in the sweep direction of the laser light while arrayed through grain boundaries 304, 304' in the direction that crosses the sweep direction, so that the crystal grains can be used as active regions of the driving transistors. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供一种具有像素晶体管和驱动晶体管的显示装置，用于驱动分别形成在相同基板上的像素晶体管，其适于提高驱动晶体管的有源区域中的迁移率并实现加速。解决方案：在玻璃基板100的主表面上形成多晶硅膜103，在该主表面上将形成像素晶体管和驱动晶体管，并且连续振荡并且矩形横截面的激光105沿着相关主面在相关边缘的边缘。用相关的激光105照射的多晶硅膜103沿着与扫描方向交叉的方向排列在晶界304,304'的同时沿着激光的扫掠方向转变成晶粒，从而晶体晶粒可以用作驱动晶体管的有源区。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2004264039A Scanning probe microscope, and compact disk/cross-sectional profile measuring method as well as semiconductor device manufacturing method 审中-公开
公开(公告)号：JP2004264039A
公开(公告)日：2004-09-24
申请号：JP2003022086
申请日：2003-01-30
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： BABA SHUICHI , NAKADA TOSHIHIKO , WATANABE MASAHIRO , ARAI TAKESHI
IPC分类号： G01B21/30 , G01Q10/02 , G01Q30/02 , G01Q30/06 , G01Q40/02 , G01Q60/18 , G01Q60/24 , G01Q60/38 , H01L21/66 , G01N13/10 , G01N13/14 , G01N13/16 , G12B21/08
CPC分类号： G01Q10/06 , G01Q10/065 , G01Q20/02 , G01Q20/04 , G01Q30/025 , G01Q30/06
摘要： PROBLEM TO BE SOLVED: To provide a scanning probe microscope that accurately specifies the measuring region of a sample having a minute pattern that cannot be observed easily by an optical microscope, is capable of alignment, and can correct measuring profile distortion caused by the variation of a probe shape or probe wear, based on the state of the probe shape and probe wear. SOLUTION: The scanning probe microscope comprises: a measuring region specification section 122 for specifying the measuring region of a sample 102, based on the image of the surface of the sample 102; a standard sample 114 whose shape is known; a probe state detection section 121 for detecting the state of a probe 103, based on the measuring result of the standard sample 114; and a measuring shape correction section 108 for correcting the measuring result of the surface of the sample 102, based on the state of the probe 103 detected by the probe state detection section 121. COPYRIGHT: (C)2004,JPO&NCIPI

9. 发明专利

JP2004012301A METHOD AND APPARATUS FOR DETECTING PATTERN DEFECT 审中-公开
公开(公告)号：JP2004012301A
公开(公告)日：2004-01-15
申请号：JP2002166456
申请日：2002-06-07
申请人： HITACHI LTD
发明人： YOSHIDA MINORU , UTO YUKIO , MAEDA SHUNJI , NAKADA TOSHIHIKO
IPC分类号： G01B11/30 , G01N21/956 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a pattern defect detecting method and a pattern defect detecting apparatus that enable accurate inspection by an optical system for achieving lighting without being affected by a change in the thickness of the thin film of a sample even if a single wavelength such as a laser is used for a light source. SOLUTION: The apparatus for detecting pattern defects comprises: a laser light source for irradiating a sample with illumination light; a coherence reduction optical system for reducing coherence in the laser; a means for detecting reflection light from a circuit pattern formed on a substrate from the upper position of the substrate; and a measurement section for obtaining a defective portion from an image-formed image. In this case, an irradiation angle is changed on the pupil of an objective lens, thus changing the irradiation angle to a sample surface, and hence reducing influence due to thin-film interference. COPYRIGHT: (C)2004,JPO

10. 发明专利

JP2003065966A Foreign matter inspecting method to film and apparatus therefor 审中-公开
标题翻译：外部事项检查方法及其设备
公开(公告)号：JP2003065966A
公开(公告)日：2003-03-05
申请号：JP2001259630
申请日：2001-08-29
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： ARAI TAKESHI , NAKADA TOSHIHIKO , YOSHITAKE YASUHIRO
IPC分类号： G01B11/08 , G01B11/28 , G01B11/30 , G01N21/892
摘要： PROBLEM TO BE SOLVED: To provide a foreign matter inspecting method to films which enables speedy and highly accurate inspection of a foreign matter from the film in which particles or the like are present, and an apparatus therefor.
SOLUTION: A detecting optical system of two systems of an oblique illumination and a vertical illumination is provided to a film-like object to be inspected where particles having different optical characteristics or the like are present. A gray level difference between the foreign matter and particles or the like present in the film is detected from an imaged image by selecting an irradiation angle and a wavelength of an illumination light. The foreign matter is discriminated on the basis of the difference, and moreover, a foreign matter type, a size and detected coordinate information of the foreign matter are outputted as the inspected result, whereby the quality control for products is improved.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供异物检查方法用于能够快速，高精度地检查来自存在颗粒等的膜的异物及其设备的膜。解决方案：在存在具有不同光学特性等的颗粒的情况下，将要检查的薄膜状物体提供两个倾斜照明和垂直照明系统的检测光学系统。通过选择照射角度和照明光的波长，从成像图像中检测异物和存在于胶片中的颗粒等之间的灰度差。根据差异来区分异物，并且输出异物类型，尺寸和检测到的异物的坐标信息作为检查结果，从而提高了产品的质量控制。

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