专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2002048264A VALVE AND ELECTRIC POWER PLANT USING THE SAME 失效
公开(公告)号：JP2002048264A
公开(公告)日：2002-02-15
申请号：JP2000237863
申请日：2000-08-07
申请人： HITACHI LTD
发明人： CHIKAZAKI MITSUO , MATSUSHITA SHIZUO , KUNIYA JIRO , KIYOTOKI YOSHIHISA , KATO TAKAHIKO , CHIBA YOSHITERU
IPC分类号： G21D1/00 , B23K20/00 , B23K103/04 , F01D17/10 , F01D25/00 , F16K25/00
摘要： PROBLEM TO BE SOLVED: To provide a valve of which the corrosion/erosion resistance of a sliding portion is improved, and also the manufacturing of which is easy, and moreover high resistivity against shear force is provided, and to provide an electric power plant using it. SOLUTION: This invention is related to the valve manufactured in the shape, jointed touchingly on the outside circumference of a circular protrusion or on the inside circumference of the ringed protrusion, of which the wear resistant member composed of the corrosion resistance/the wear resistant cobalt base alloy of which the eutectic carbide preferably in less than 30 μm or in less than 10 μm in granular diameter is distributed discontinuously, a nickel base alloy, or an iron base alloy is provided on the surface of the sliding portion by collectively forming eutectic carbide in the alloy having the eutectic carbide into a plurality of granulation or the plurality of massive substances on the surface of the sliding portion of the basic member portion constituted of carbon steel composed of ferrite and pearlite mainly, structural alloy steel, low alloy steel or stainless steel, and used as the water supply valve or the like for a nuclear or thermal power plant.

2. 发明专利

JPH06122933A HIGH DUCTILITY AL SINTERED PLASTIC FLUIDIZED ALLOY, ITS PRODUCTION AND ITS APPLICATION 失效
公开(公告)号：JPH06122933A
公开(公告)日：1994-05-06
申请号：JP27262692
申请日：1992-10-12
申请人： HITACHI LTD
发明人： KAMITSUMA YASUO , CHIKAZAKI MITSUO , NAKAJIMA SHOICHI , HIRAGA MAKOTO , NAKAMURA KEIICHI , IIZUKA TADASHI , INABA KOICHI , NAKAGAWA YUSAKU
IPC分类号： B22F3/00 , B22F5/00 , C22C21/02 , F04C18/02
摘要： PURPOSE:To produce an Al-Si sintered alloy having high strength and high ductility, to provide its manufacturing method and to provide its application. CONSTITUTION:This sintered alloy is the constituted of 1 to 45% Si, 0.1 to 20% IIIa group elements and 0.01 to 5% of at least one kind among IVa group and Va group elements, and the balance substantial Al and subjected to die forging. Furthermore, one or more kinds among 0.01 to 5% Cu, 0.01 to 5% Mg, =40kg/mm tensile strength at 150 deg.C and >=1.5 elongation percentage can be obtd.

3. 发明专利

JPH0625782A HIGH DUCTILITY ALUMINUM SINTERED ALLOY AND ITS MANUFACTURE AS WELL AS ITS APPLICATION 失效
公开(公告)号：JPH0625782A
公开(公告)日：1994-02-01
申请号：JP7964391
申请日：1991-04-12
申请人： HITACHI LTD , HITACHI POWDERED METALS
发明人： KAMITSUMA YASUO , NAKAGAWA YUSAKU , CHIKAZAKI MITSUO , IIZUKA TADASHI , INABA KOICHI , NAKAMURA KEIICHI , MITSUBE MASANORI , KAGAYA TAKESHI
IPC分类号： C22C21/00 , C22C1/04 , C22C21/02 , C22C30/00 , F02F3/00 , F04C18/02 , F16D65/12
摘要： PURPOSE:To provide an Al-Si sintered alloy having high strength and high ductility, to provide its manufacturing method and to provide its application. CONSTITUTION:This sintered alloy is constituted of 1 to 45% Si, 0.1 to 20% IIIa group elements and 0.01 to 5% of at least one kind among IVa group and Va group elements, and the balance substantial Al. Furthermore, one or more kinds among 0.01 to 5% Cu, 0.01 to 5% Mg, h2.0% Fe, =40kg/mm tensile strength at 150 deg.C and >=.5% elongation percentage can be obtd.

4. 发明专利

JPH05290880A 失效
公开(公告)号：JPH05290880A
公开(公告)日：1993-11-05
申请号：JP8721892
申请日：1992-04-08
申请人： SUMITOMO METAL IND , TOKYO ELECTRIC POWER CO , HITACHI LTD
发明人： ANRAKU TOSHIRO , KUDO TAKEO , OTSUKA NOBUO , MORI SADAO , MARUYAMA TADASHI , CHIKAZAKI MITSUO , CHIBA YOSHITERU , HATOU HISAMITSU
IPC分类号： H01M10/39
摘要： PURPOSE:To provide a material for the positive electrode container of a sodium-sulfur battery and the manufacturing method thereof with the improved corrosion resistance against high-temperature sulfur and sodium polysulfide. CONSTITUTION:(1) This is a material for the positive pole of a sodium-sulfur battery with excellent corrosion resistance which is characterized by having a chromized layer of not less than 25mum thick including as main body chrome carbide on the outermost surface of a base material of low alloy steel containing carbon steel having C of not more than 0.55wt.% or additionally including Mo of not more than 5wt.% and/or Cr of not more than 12wt.%. (2) This is the manufacturing method for a material for the positive electrode of a sodium-sulfur battery with excellent corrosion resistance which is characterized by forming a coating film layer including as a main body chrome carbide on the surface to which the chromizing treatment is applied at the temperature of 1000 to 1150 deg.C after carbonizing treatment is applied in advance to the foregoing composition and then the carbon concentration on the surface layer part is set to 0.7 to 1.5wt.%. Thereby, the corrosion of a positive electrode container may be prevented, so that the durability of the positive pole container is remarkably increased.

5. 发明专利

JPH04126922A ZRO2/CU-BASED COMBUSTOR MADE OF ZRO2/CU-BASED ALLOY 失效
公开(公告)号：JPH04126922A
公开(公告)日：1992-04-27
申请号：JP24748690
申请日：1990-09-19
申请人： HITACHI LTD
发明人： CHIKAZAKI MITSUO , KOJIMA YOSHIYUKI , NAKAJIMA SHOICHI , ARIKAWA HIDEYUKI , ONAKA NORIYUKI
IPC分类号： F23R3/42 , C23C28/00
摘要： PURPOSE:To obtain a Cu or Cu alloy-made combustor wall surface member with a long life and high reliability, by providing a metal or alloy layer having a low porosity, being dense and having favorable oxidation resistance, beneath a ZrO2-based ceramic surface layer. CONSTITUTION:A combustor has a ZrO2-based ceramic layer at a surface thereof and one or two metal or alloy layer beneath the ceramic layer. The metal or alloy layer is a dense layer with a porosity of 2% or below, and is superior in oxidation resistance to Cu or a Cu allay constituting a substrate. Where two metal or alloy layers are provided, a first layer contains Cu as a main constituent so that the difference in thermal expansion between the first layer and the substrate is kept small. The first layer is preferably made of a Cu alloy containing 6-20wt.% of Al or 2-12wt.% of Be either singly or in combination. A second layer may be the same as the first layer or may be an alloy layer which contains Co, Ni, Fe or an alloy thereof as a main constituent and which contains 5-15wt.% of Al or 15-35wt.% of Cr either singly or in combination.

6. 发明专利

JPH0147278B2 失效
公开(公告)号：JPH0147278B2
公开(公告)日：1989-10-13
申请号：JP3647782
申请日：1982-03-10
申请人： HITACHI LTD
发明人： OKAYAMA AKIRA , CHIKAZAKI MITSUO , OOTAKA KYOSHI
IPC分类号： B23K1/00 , B23K20/00 , B23K35/00 , C23C8/68

7. 发明专利

JPH0147277B2 失效
公开(公告)号：JPH0147277B2
公开(公告)日：1989-10-13
申请号：JP16710281
申请日：1981-10-21
申请人： HITACHI LTD
发明人： OKAYAMA AKIRA , CHIKAZAKI MITSUO , OOTAKA KYOSHI
IPC分类号： B32B15/01 , B23K1/00 , B23K20/00 , B23K20/14 , C23C8/68

8. 发明专利

JPS6484257A ELECTROPHOTOGRAPHIC SENSITIVE BODY AND ITS PRODUCTION 失效
公开(公告)号：JPS6484257A
公开(公告)日：1989-03-29
申请号：JP24071587
申请日：1987-09-28
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： SHIMAMURA YASUO , FUJIKURA MAKOTO , WAKAGI MASATOSHI , ISHIKAWA NORITOSHI , KONUMA SHIGEHARU , ONO TOSHIYUKI , TAMAHASHI KUNIHIRO , CHIKAZAKI MITSUO
IPC分类号： G03G5/08 , G03G5/043 , G03G5/082
摘要： PURPOSE:To prevent an electrophotographic sensitive body from generation of flow of picture image in a printed figure or character, etc., by laminating a surface layer having unevenness and comprising amorphous carbon contg. at least one of halogen and hydrogen on a photosensitive layer of a-Si:H photosensitive body. CONSTITUTION:Generation of flow of a picture image is prevented by retarding oxidation of surface of a photosensitive layer since the generation of flow of a picture image is considered to be caused by the increase of adsorbed water due to oxidation of surface of the photosensitive layer. For this purpose, a surface layer 302 comprising amorphous carbon film contg. at least one of halogen and hydrogen is formed on the photosensitive layer 101, and unevennesses are formed on the free surface 301 of the surface layer. Namely, after forming the photosensitive layer 101 by plasma CVD process, sputtering process, ion plating process, etc., feed gas contg. a halogen compd. is decomposed by high frequency glow discharge, wherein the pressure of the gas is reduced in the midway of the glow discharge. By this method, unevennesses are formed on the free surface of the surface layer simultaneously with the formation of the surface layer 302. Thus, generation of flow of a picture image in a printed figure or character, etc., is prevented.

9. 发明专利

JPS63197955A ELECTROPHOTOGRAPHIC SENSITIVE BODY 失效
公开(公告)号：JPS63197955A
公开(公告)日：1988-08-16
申请号：JP2825487
申请日：1987-02-12
申请人： HITACHI LTD
发明人： WAKAGI MASATOSHI , TAMAHASHI KUNIHIRO , ONO TOSHIYUKI , KONUMA SHIGEHARU , ISHIKAWA NORITOSHI , CHIKAZAKI MITSUO
IPC分类号： G03G5/08 , G03G5/082
摘要： PURPOSE:To enhance sensitivity to semiconductor laser beams, humidity resistance, and corona resistance by forming an a-SiGe:H layer on an a-Si:H layer and an a-Si:H.F layer on said a-SiGe:H layer. CONSTITUTION:The amorphous silicon layer containing C and H (a-SiC:H) 2, the amorphous silicon layer containing Ge and H (a-SiGe:H) 3, and the amorphous silicon layer containing H and/or F (a-Si:H:F) 4 are laminated on a conductive substrate 1, thus permitting long wavelength lights to be absorbed and production of SiO due to corona discharge to be avoided, accordingly, the obtained photosensitive body to be enhanced in sensitivity to long wavelength lights, and to form prints free from image flow even under high humidity.

10. 发明专利

JPS6328983B2 失效
公开(公告)号：JPS6328983B2
公开(公告)日：1988-06-10
申请号：JP14891179
申请日：1979-11-19
申请人： HITACHI LTD
发明人： KIZAWA KENICHI , SOENO HIROSHI , CHIKAZAKI MITSUO
IPC分类号： C23C4/08 , C23C10/50 , C23C10/58 , C23C14/02 , C23C14/06 , C23C14/14 , C23C14/16 , C23C14/34 , C23C28/02

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式