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1. 发明授权

EP1993074B1 Image evaluation system and charged particle beam microscope 有权
标题翻译：图像处理方法和显微镜
公开(公告)号：EP1993074B1
公开(公告)日：2013-11-06
申请号：EP08014779.6
申请日：2002-08-16
申请人： Hitachi Ltd.
发明人： Ishitani, Tohru , Sato, Mitsugu , Todokoro, Hideo , Otaka, Tadashi , Iizumi, Takashi , Takane, Atsushi
IPC分类号： G06T7/00 , H01J37/00 , H01J37/26 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823

2. 发明公开

EP1197985A2 Scanning charged-particle microscope 有权
标题翻译：光栅Ladungsträgerstrahlmikroskop
公开(公告)号：EP1197985A2
公开(公告)日：2002-04-17
申请号：EP01120621.6
申请日：2001-08-29
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Todokoro, Hideo , Sato, Mitsugu
IPC分类号： H01J37/09 , H01J37/28
CPC分类号： H01J37/28 , H01J37/09
摘要： In orer to supply a scanning charged-particle microscope that can achieve both the improvement of resolution and that of focal depth at the same time, a scanning charged-particle microscope is supplied which is characterized in that a passage aperture 12 for limiting the passage of the charged-particle optical beam 2 is located between the charged-particle source 1 and the scanning deflector 7, and in that a member 126 for limiting the passage of the charged-particle optical beam 2 is provided at least in the center of the passage aperture 12.
摘要翻译：为了提供能够同时实现分辨率和焦深提高的扫描带电粒子显微镜，提供扫描带电粒子显微镜，其特征在于用于限制通过的通道孔12 带电粒子光束2位于带电粒子源1和扫描偏转器7之间，并且用于限制带电粒子光束2通过的构件126至少设置在通道的中心孔12。

3. 发明公开

EP0241934A2 Ultrahigh-density recording system utilizing focused beam 失效
标题翻译： Aufzeichnungssystem ultraherher Dichte unter Benutzung von fokussiertenBündeln。
公开(公告)号：EP0241934A2
公开(公告)日：1987-10-21
申请号：EP87105673.5
申请日：1987-04-16
申请人： HITACHI, LTD.
发明人： Aida, Toshiyuki , Hosoki, Shigeyuki , Ishitani, Tohru , Hosaka, Sumio
IPC分类号： G11B9/00
CPC分类号： G11B9/00 , G11B9/10
摘要： The present invention relates to a recording system used to record information with an ion beam and read the recorded information with an electron beam, and the specification discloses an ultrahigh-density recording system utilizing a focused beam, comprising the steps of arranging a focused beam generating source (1) in opposition to a recording medium (8), and applying a focused ion beam from the focused beam generating source (1) to the recording medium (8) in accordance with digital information while varying the relative position of the recording medium and focused beam generating source, to thereby record information on the recording medium; and then applying a weak focused beam from the focused beam generating source to the recording medium while varying the relative position of the recording medium and focused beam generating source, to thereby vary the secondary electrons, fluorescent X-rays of an absorption current, which is generated in the recording medium, and reproduce the information.
摘要翻译：本发明涉及一种用于利用离子束记录信息并用电子束读取记录的信息的记录系统，并且该说明书公开了一种利用聚焦光束的超高密度记录系统，包括以下步骤：设置聚焦光束产生源（1），并且根据数字信息将聚焦光束发生源（1）的聚焦离子束施加到记录介质（8），同时改变记录介质的相对位置和聚焦光束产生源，从而将信息记录在记录介质上; 然后将聚焦光束产生源的弱聚焦光束施加到记录介质，同时改变记录介质和聚焦光束产生源的相对位置，从而改变二次电子，即吸收电流的荧光X射线在记录介质中产生并再现信息。

4. 发明公开

EP1993074A1 Image evaluation system and charged particle beam microscope 有权
标题翻译：图像评估系统和带电粒子束显微镜
公开(公告)号：EP1993074A1
公开(公告)日：2008-11-19
申请号：EP08014779.6
申请日：2002-08-16
申请人： Hitachi Ltd.
发明人： Ishitani, Tohru , Sato, Mitsugu , Todokoro, Hideo , Otaka, Tadashi , Iizumi, Takashi , Takane, Atsushi
IPC分类号： G06T7/00 , H01J37/00 , H01J37/26 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823
摘要： In an inspection device evaluation system or a charged particle beam microscope, a magnification error and a resolution evaluation value are calculated based on an image of a dimensional calibration specimen. Then, a measurement length error of the image is calculated based on the magnification error and the resolution evaluation value.
摘要翻译：在检查装置评估系统或带电粒子束显微镜中，基于尺寸校准样本的图像来计算放大率误差和分辨率评估值。然后，基于倍率误差和分辨率评估值来计算图像的测量长度误差。

5. 发明授权

EP1566766B1 Image evaluation method and microscope 有权
标题翻译：图像处理方法和显微镜
公开(公告)号：EP1566766B1
公开(公告)日：2008-10-15
申请号：EP05010530.3
申请日：2002-08-16
申请人： Hitachi Ltd.
发明人： Ishitani, Tohru , Sato, Mitsugu , Todokoro, Hideo , Otaka, Tadashi , Iizumi, Takashi , Takane, Atsushi
IPC分类号： G06T7/00 , H01J37/00 , H01J37/26 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823

6. 发明授权

EP0317952B1 Device having superlattice structure, and method of and apparatus for manufacturing the same 失效
标题翻译：具有用于其制造的超晶格结构和方法和装置的布置。
公开(公告)号：EP0317952B1
公开(公告)日：1994-03-16
申请号：EP88119409.6
申请日：1988-11-22
申请人： HITACHI, LTD.
发明人： Yamaguchi, Hiroshi , Saito, Keiya , Itoh, Fumikazu , Ishida, Koji , Sakano, Shinji E403 Hitachi-koyasudai-apartment , Tamura, Masao , Shukuri, Shoji , Ishitani, Tohru , Ichiguchi, Tsuneo A403 Hitachi-koyasudai-apartment
IPC分类号： H01L29/205 , H01L21/263 , H01L21/265 , H01L21/306 , H01L21/268 , H01L21/316
CPC分类号： H01J37/3056 , B82Y10/00 , H01J37/08 , H01L21/2633 , H01L21/26546 , H01L21/8221 , H01L21/8252 , H01L29/151 , Y10S148/046 , Y10S148/051 , Y10S148/084 , Y10S148/16 , Y10S438/962

7. 发明公开

EP0317952A2 Device having superlattice structure, and method of and apparatus for manufacturing the same 失效
标题翻译：具有用于其制造的超晶格结构和方法和装置的布置。
公开(公告)号：EP0317952A2
公开(公告)日：1989-05-31
申请号：EP88119409.6
申请日：1988-11-22
申请人： HITACHI, LTD.
发明人： Yamaguchi, Hiroshi , Saito, Keiya , Itoh, Fumikazu , Ishida, Koji , Sakano, Shinji E403 Hitachi-koyasudai-apartment , Tamura, Masao , Shukuri, Shoji , Ishitani, Tohru , Ichiguchi, Tsuneo A403 Hitachi-koyasudai-apartment
IPC分类号： H01L29/205 , H01L21/263 , H01L21/265 , H01L21/306 , H01L21/268 , H01L21/316
CPC分类号： H01J37/3056 , B82Y10/00 , H01J37/08 , H01L21/2633 , H01L21/26546 , H01L21/8221 , H01L21/8252 , H01L29/151 , Y10S148/046 , Y10S148/051 , Y10S148/084 , Y10S148/16 , Y10S438/962
摘要： An ion beam (113) focused into a diameter of at most 0.1 µm bombards substantially perpendicularly to the superlattice layers of a one-dimensional superlattice structure and is scanned rectilinearly in a direction of the superlattice layers so as to form at least two parallel grooves (108, 109, 110, 111) or at least two parallel impurity-implanted parts (2109) as potential barrier layers, whereby a device of two-dimensional superlattice structure can be manufactured. At least two parallel grooves (114, 115, 116, 117) or impurity-implanted parts are further formed orthogonally to the potential barrier layers of the two-dimensional superlattice structure, whereby a device of three-dimensional superlattice structure can be manufactured. In addition, deposition parts (2403, 2404, 2405) may well be provided by further depositing an insulator into the grooves (108, 109, 110, 111, 114, 115, 116, 117) which are formed by the scanning of the ion beam. Owing to these expedients, the portions of the two-dimensional and three-dimensional superlattice structures can be manufactured with ease and at high precision.
摘要翻译：平行于离子束（113）聚焦成直径为至多0.1微米基本上垂直轰击到一维超晶格结构的超晶格层，并在超晶格层的方向直线扫描，以便形成至少两个槽（108，109，110，111），或至少两个平行的杂质注入部件（2109）作为潜在的阻挡层，故可以制造二维超晶格结构的装置。的至少两个平行的凹槽（114，115，116，117）或杂质注入部分被进一步正交形成为二维超晶格结构，由此可以制造三维超晶格结构的装置的势垒层。此外，沉积份（2403 2404 2405）可能被进一步存入设置在绝缘体成它们由离子的扫描形成的槽（108，109，110，111，114，115，116，117）束。由于合成权宜之计，二维和三维超晶格结构的部分可以很容易地以高精度来制造。

8. 发明公开

EP0161612A1 Ion microbeam apparatus 失效
标题翻译： Ionen-Mikrostrahl-Vorrichtung。
公开(公告)号：EP0161612A1
公开(公告)日：1985-11-21
申请号：EP85105506.1
申请日：1985-05-06
申请人： HITACHI, LTD.
发明人： Ishitani, Tohru , Todokoro, Hideo , Kawanami, Yoshimi , Tamura, Hifumi
IPC分类号： H01J37/04 , H01J37/10
CPC分类号： H01J37/304
摘要： An ion microbeam apparatus includes a power supply (14) for a lens (5a) for fine adjustment in addition to a power supply (9) for a lens (5b) for rough adjustment. The power supply (14) for the fine adjustment lens (5a) is supplied with a potential that controls the beam so that it assumes an optimum diameter, responsive to signals from an ion beam detector (12) and a beam deflector (8).
摘要翻译：离子微束装置除了用于用于粗调调整的透镜（5b）的电源（9）之外还包括用于微调的透镜用电源（14）。用于微调透镜（5a）的电源（14）被提供有响应于来自离子束检测器（12）和光束偏转器（8）的信号而控制光束使其呈现最佳直径的电位。

9. 发明公开

EP0091777A3 Liquid metal ion source 失效
标题翻译：液体金属离子源
公开(公告)号：EP0091777A3
公开(公告)日：1985-05-22
申请号：EP83301924
申请日：1983-04-06
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Tamura, Hifumi , Shimase, Akira
IPC分类号： H01J27/22
CPC分类号： H01J27/26
摘要： A liquid metal ion source according to the present invention has a needle electrode (1) whose fore end is disposed at a position speced from a reservoir (3') for holding a source material (2), and is provided with means (12,13,13') for freely varying the distance from the reservoir (3') to the fore end of the needle electrode (1). This distance can therefore be optimized to give more stable operation under a wider range of conditions.

10. 发明公开

EP0037455A3 Ion source 失效
标题翻译：离子源
公开(公告)号：EP0037455A3
公开(公告)日：1982-08-04
申请号：EP81100861
申请日：1981-02-06
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Todokoro, Hideo , Tamura, Hifumi
IPC分类号： H01J27/26
CPC分类号： H01J27/26
摘要： An EHD ion source according to this invention has an extractor (4) and a control electrode (11). The extractor (4) is disposed below a tip (2) and functions to apply an electric field to a substance (3) to-be-ionized wetting a pointed end of the tip (2), so as to derive ions from the pointed tip end. The control electrode (11) is disposed in the vicinity of the pointed end of the tip (2) and functions to apply an electric field to the substance (3) to-be-ionized in its molten state so as to supply the pointed tip end with the substance (3) to-be-ionized in a suitable amount. As a result, a great ion current (5) which is substantially proportional to an extracting voltage (6) can be derived from the pointed tip end.

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