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    • 3. 发明公开
    • An apparatus for measuring electromagnetic field distribution using a focused electron beam
    • 装置,用于测量的电磁场的分布用聚焦电子束。
    • EP0595548A1
    • 1994-05-04
    • EP93308385.9
    • 1993-10-21
    • HITACHI, LTD.
    • Yajima, YusukeTakahashi, YoshioIchikawa, MasakazuHosoki, Shigeyuki
    • G01R31/305
    • G01R31/305
    • A disclosure is made on an apparatus for measuring an electromagnetic field distribution using a focused electron beam which can measure the electromagnetic field distribution in a specimen with a high resolution and a high reliability. The present apparatus comprises: a focused electron beam radiation system for irradiating a specimen with a focused electron beam; a specimen tilt mechanism for tilting a specimen by 180° with a tilt axis being perpendicular to the optical axis of the focused electron beam; an electron beam position detector for measuring the direction and the quantity of the deflection given to the focused electron beam when it is transmitted through the specimen; and a processing system for calculating the direction and the intensity of an electric field, and the direction and the intensity of a magnetic field separately at a point on the specimen through which the focused electron beam is transmitted from the data on the direction and the quantity of the deflection of the focused electron beam measured by the electron beam position detector before and after the turnover of the specimen by the specimen tilt mechanism. Owing to the present apparatus, an electric field and a magnetic field in a specimen can be separately observed independent of each other.
    • 甲公开用于使用聚焦的电子束能够测量试样中的电磁场分布以高分辨率和高可靠性的电磁场分布的测量装置上制成。 本装置包括:聚焦的电子束的辐射系统,用于照射与聚焦的电子束的检体; 试样倾斜机构用于倾斜180°与倾斜轴线垂直于聚焦电子束的光轴的试样; 用于测量的方向和提供给聚焦的电子束。当它是通过样品的反式mitted偏转的量的电子束位置检测器; 和用于计算方向和电场的强度,以及方向和磁场的分别在试样上的一个点的强度,通过该聚焦的电子束是从上方向和数量的数据的反式mitted的处理系统 的前和试样倾斜机构的营业额试样之后,由电子束位置检测器测量的聚焦电子束的偏转。 由于本装置中,在电场和试样中的磁场可以分别观测的独立海誓山盟。
    • 4. 发明公开
    • Scanning tunnel microscope
    • Rastertunnelmikroskop。
    • EP0461393A1
    • 1991-12-18
    • EP91107547.1
    • 1991-05-08
    • HITACHI, LTD.HITACHI CONSTRUCTION MACHINERY CO., LTD.
    • Hazaki, EiichiYamada, OsamuNakaizumi, YasushiHosoki, ShigeyukiHosaka, SumioHashimoto, Akira
    • G01N27/00H01J37/28
    • G01Q60/16G01Q30/02Y10S977/861
    • A scanning tunnel microscope comprising: a SEM stage (23) provided in a specimen chamber (3) of a SEM and having a mechanism (60-64) for moving in a two dimensional manner along a surface perpendicular to an electron beam (34); a specimen stage (25) provided on the SEM stage and provided with a mechanism (26-28) for holding a specimen (33) so that a surface of the specimen makes an angle of 45° with the electron beam and for moving the specimen in a two dimensional manner along the specimen surface; an STM scanning mechanism (41-57) provided on the SEM stage and provided with a probe (41) held perpendicularly to the specimen surface, an approaching mechanism (44-54) for making the probe approach to a position at a desired distance from the specimen surface, and a probe fine movement mechanism (53-56) for making the probe scan along the specimen surface; and a display unit (D1, D2) for displaying an image by the SEM together with an image of the probe on the basis of signal obtained from a secondary electron detector (4) provided in a specimen chamber (3) and for displaying an image by the STM on the basis of signals from said prove fine movement mechanism.
    • 一种扫描隧道显微镜,包括:设置在SEM的样本室(3)中的具有用于沿垂直于电子束(34)的表面以二维方式移动的机构(60-64)的SEM台(23) ; 设置在SEM台上的具有用于保持试样(33)的机构(26-28)的试样台(25),使得试样的表面与电子束成45°角,并移动试样 沿着试样表面以二维方式; 设置在SEM台上的STM扫描机构(41-57),并且设置有垂直于试样表面保持的探针(41),用于使探针接近到与试样表面垂直的位置的接近机构(44-54) 试样表面和用于使探针沿试样表面扫描的探针精细运动机构(53-56); 以及显示单元(D1,D2),用于基于从设置在样本室(3)中的二次电子检测器(4)获得的信号和用于显示图像的步骤,通过SEM与探针的图像一起显示图像 由STM根据来自所述证明机芯的信号。