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1. 发明申请

WO2008156743A1 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互联
公开(公告)号：WO2008156743A1
公开(公告)日：2008-12-24
申请号：PCT/US2008/007513
申请日：2008-06-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , SANTORI, Charles , FATTAL, David , WU, Wei , BICKNELL, Robert , WANG, Shih-Yuan , WILLIAMS, R. Stanly , STEWART, Duncan , QUITORIANO, Nathaniel
发明人： SANTORI, Charles , FATTAL, David , WU, Wei , BICKNELL, Robert , WANG, Shih-Yuan , WILLIAMS, R. Stanly , STEWART, Duncan , QUITORIANO, Nathaniel
IPC分类号： G02B6/32
CPC分类号： H04B10/803 , G02B6/4206 , G02B6/43
摘要： An optical interconnect (100, 200, 300, 400, 500, 645) has a plurality of optical sources (110, 360, 460, 560), a first lens (115, 225, 325, 425, 525, 625) configured to collimate optical beams (320, 350) from the plurality of optical sources (110, 360, 460. 560), a second lens (120, 230, 335, 435, 535, 640) configured to refocus the optical beams (320, 350), and a plurality of optical receivers (125, 365, 465, 565) configued to receive the refocused optical beams (320, 350) from the second lens (120, 230, 335, 435, 535, 640).
摘要翻译：光互连（100,200,300,400,500,655）具有多个光源（110,360,460,560），第一透镜（115,225,325,425,525,625）被配置为从多个光源（110,360,460,560）中校准光束（320,350）;被配置为重新聚焦光束（320,350）的第二透镜（120,230,335,435,535,640））和多个光接收器（125,365,465,565）被配置为从第二透镜（120,230,335,435,535,640）接收重新聚焦的光束（320,350）。

2. 发明申请

WO2009017771A2 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互连
公开(公告)号：WO2009017771A2
公开(公告)日：2009-02-05
申请号：PCT/US2008/009226
申请日：2008-07-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , FATTAL, David , BICKNELL, Robert , SANTORI, Charles , WU, Wei
发明人： FATTAL, David , BICKNELL, Robert , SANTORI, Charles , WU, Wei
IPC分类号： G02B6/36 , G02B6/38
CPC分类号： H04B10/803
摘要： An optical interconnect (100, 200, 300, 400, 445) includes a first circuit board (140, 260, 350, 405) having an optical source (110, 210, 240, 305, 440) and an optical receiver (125, 220, 235, 315, 441); and a second circuit board (145, 265, 355, 410) having data source (105, 205, 250) and an optical modulator (225, 230, 310, 425, 430, 435) optically coupled with the optical source (110, 210, 240, 305, 440) and optical receiver (125, 220, 235, 315, 441), wherein the optical modulator (225, 230, 310, 425, 430, 435) is configured to encode data from the data source (105, 205, 250) into an optical signal from the optical source (110, 210, 240, 305, 440). The optical receiver (125, 220, 235, 315, 441) is configured to receive the optical signal from the optical modulator (225, 230, 310, 425, 430, 435). A method of optical communication includes generating on a first circuit board (140, 260, 350, 405) an optical signal directed at a second circuit board (145, 265, 355, 410); modulating the optical signal with data at the second circuit board (145, 265, 355, 410); reflecting the optical signal to the first circuit board (140, 260, 350, 405); and demodulating the optical signal to receive the data at the first circuit board (140, 260, 350, 405).
摘要翻译：一种光学互连（100,200,300,400,445）包括具有光源（110,210,240,305,440）的第一电路板（140,260,350,405））和光接收器（125,220,235,315,441）; 以及具有数据源（105,205,250）和光学耦合于所述光源（110,115）的光调制器（225,230,310,425,430,435）的第二电路板（145,265,355,410），其中所述光调制器（225,230,310,425,430,435）被配置为对来自所述数据源的数据进行编码（ 105,205,250）转换成来自光源（110,210,240,305,440）的光信号。光接收器（125,220,235,315,441）被配置为从光调制器（225,230,310,425,430,435）接收光信号。一种光通信的方法包括在第一电路板（140,260,350,405）上产生指向第二电路板（145,265,355,410）的光信号; 用第二电路板（145,265,355,410）处的数据调制光信号; 将光信号反射到第一电路板（140,260,350,405）; 以及解调光信号以在第一电路板（140,260,350,405）处接收数据。

3. 发明申请

WO2009011878A3 OPTICAL DEVICE INCLUDING WAVEGUIDE GRATING STRUCTURE 审中-公开
公开(公告)号：WO2009011878A3
公开(公告)日：2009-01-22
申请号：PCT/US2008/008715
申请日：2008-07-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. , WU, Wei , FATTAL, David , SANTORI, Charles , BICKNELL, Robert, N. , WANG, Shih-Yuan , WILLIAMS, R., Stanley , QUITORIANO, Nathaniel, J.
发明人： WU, Wei , FATTAL, David , SANTORI, Charles , BICKNELL, Robert, N. , WANG, Shih-Yuan , WILLIAMS, R., Stanley , QUITORIANO, Nathaniel, J.
IPC分类号： G02B6/34
摘要： Optical devices (100) including waveguide grating structures (102) are described. In accordance with one embodiment, an optical device (100) is provided comprising a horizontal waveguide grating structure (102) having at least one waveguiding layer (104) and at least one subwavelength periodic grating layer (106). The optical device (100) further comprises upper and lower cladding layers (108, 110) immediately adjoining respective upper and lower surfaces (209, 205) of the waveguide grating structure and having refractive indices lower than a lowest-index one of the waveguiding layers, incident radiation propagating (IN) through one of the upper and lower cladding layers (108, 110) toward the waveguide grating structure. The waveguide grating structure (102) is configured for peak reflection of the incident radiation at a peak reflection frequency. A cumulative thickness of the waveguiding layers (104) is less than one tenth of a free space wavelength of the incident radiation at the peak reflection frequency divided by an average refractive index of the waveguiding layers.

4. 发明申请

WO2009017610A1 FREE SPACE WDM SIGNAL DETECTOR 审中-公开
标题翻译：免费空间WDM信号检测器
公开(公告)号：WO2009017610A1
公开(公告)日：2009-02-05
申请号：PCT/US2008/008744
申请日：2008-07-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , BEAUSOLEIL, Raymond , WU, Wei , FATTAL, David , FIORENTINO, Marco
发明人： BEAUSOLEIL, Raymond , WU, Wei , FATTAL, David , FIORENTINO, Marco
IPC分类号： G02B6/28
CPC分类号： H04B10/1121
摘要： A system (100) can include a transmitter (114) that produces an optical signal (118) having a plurality of carrier frequencies and a receiver (116) separated from the transmitter (114) by free space through which the optical signal (118) propagates. The receiver (116) includes an array (200) of detectors of multiple types, with the types being capable of detecting light respectively having the carrier frequencies. A location of an incident area (220) where the optical signal (118) is incident on the detector array (200) generally depends on a misalignment of the receiver (116) relative to the transmitter (114) , but the detectors in the detector array (200) are arranged so that at least one detector of each of the types detects light from the optical signal (118) regardless of where the incident area (220) is on the detector array (200).
摘要翻译：系统（100）可以包括产生具有多个载波频率的光信号（118）的发射机（114）和与发射机（114）分离的自由空间的接收机（116），通过该自由空间，光信号（118）传播。接收器（116）包括多个类型的检测器的阵列（200），其类型能够检测分别具有载波频率的光。光信号（118）入射到检测器阵列（200）上的入射区域（220）的位置通常取决于接收器（116）相对于发射器（114）的未对准，但检测器中的检测器阵列（200）布置成使得每种类型的至少一个检测器检测来自光信号（118）的光，而不管入射面积（220）在检测器阵列（200）上的位置。

5. 发明申请

WO2008048595A2 LITHOGRAPHY ALIGNMENT SYSTEM AND METHOD USING NDSE-BASED FEEDBACK CONTROL 审中-公开
标题翻译： LITHOGRAPHY对准系统和使用基于NDSE的反馈控制的方法
公开(公告)号：WO2008048595A2
公开(公告)日：2008-04-24
申请号：PCT/US2007/022067
申请日：2007-10-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , PARK, Inkyu , WU, Wei , GAO, Jun , PICCIOTTO, Carl
发明人： PARK, Inkyu , WU, Wei , GAO, Jun , PICCIOTTO, Carl
IPC分类号： G03F9/00
CPC分类号： G03F9/7038 , G03F9/7088 , G03F9/7092 , G03F9/7096
摘要： A contact lithography alignment system (500) and methods (100, 200, 400) use nanoscale displacement sensing and estimation (nDSE) 300, 300' to maintain an alignment and compensate for a disturbance of one or more objects (510) during contact lithography. A method (100) of maintaining an alignment includes establishing (110) an initial alignment of one or more objects and employing (120, 200) nDSE-based feedback control of relative positions of one or more of the objects to maintain the alignment during contact lithography. A method (400) of disturbance compensation includes acquiring (410) a first image, acquiring (210, 420) a second image, estimating (220, 430) an alignment error using (120, 200) nDSE applied to the first and second images, and adjusting (230, 440) a relative position to reduce the alignment error. The contact lithography system (500) includes an optical sensor (520), a feedback processor (530, 600) providing nDSE and a position controller (540) that adjusts relative positions of one or more objects to reduce an alignment error determined using the nDSE.
摘要翻译：接触光刻对准系统（500）和方法（100,200,400）使用纳米尺度位移感测和估计（nDSE）300,300'来保持对准并补偿接触光刻期间的一个或多个物体（510）的干扰。保持对准的方法（100）包括建立（110）一个或多个对象的初始对准，并采用（120,200）基于nDSE的反馈控制，以反映一个或多个对象的相对位置以保持接触期间的对准光刻。干扰补偿的方法（400）包括获取（410）第一图像，获取（210,420）第二图像，使用应用于所述第一和第二图像的（120,200）nDSE估计（220,430）对准误差，并调整（230,440）相对位置以减小对准误差。接触光刻系统（500）包括光学传感器（520），提供nDSE的反馈处理器（530,600）和调整一个或多个物体的相对位置以减少使用nDSE确定的对准误差的位置控制器（540）。

6. 发明申请

WO2007058909A2 METHOD OF CONTROLLING NANOWIRE GROWTH AND DEVICE WITH CONTROLLED-GROWTH NANOWIRE 审中-公开
标题翻译：控制生长的纳米生长方法和装置
公开(公告)号：WO2007058909A2
公开(公告)日：2007-05-24
申请号：PCT/US2006/043688
申请日：2006-11-08
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , KAMINS, Theodore I, , SHARMA, Shashank , WILLIAMS, R Stanley,
发明人： WU, Wei , KAMINS, Theodore I, , SHARMA, Shashank , WILLIAMS, R Stanley,
IPC分类号： H01L23/532 , H01L21/768 , B82B3/00
CPC分类号： H01L21/76879 , H01L21/28525 , H01L23/53276 , H01L2221/1094 , H01L2924/0002 , H01L2924/00
摘要： Nanowire (260, 360) growth in situ on a planar surface, which is one of a crystalline surface having any crystal orientation, a polycrystalline surface and a non-crystalline surface, is controlled by guiding (160) catalyzed growth from the planar surface in a nano-throughhole (224, 324) of a patterned layer (220, 320) formed on the planar surface, such that the nanowire (260, 360) grows in situ perpendicular to the planar surface. An electronic device (200, 300) includes first and second regions of electronic circuitry (280, 370, 380) vertically spaced by the patterned layer (220, 320). The nano-throughhole (224, 324) of the patterned layer (220, 320) extends perpendicularly between the regions. The first region (324, 376) has the planar surface. The device (200, 300) further includes a nanowire (260, 360) extending perpendicular from a catalyst location on the planar surface of the first region (374, 376) in the nano-throughhole (224, 324). The nanowire (260, 360) forms a component of a nano-scale circuit that connects the regions.
摘要翻译：通过从平坦表面引导（160）催化生长来控制在平坦表面上原位生长的纳米线（260,360），其是具有任何晶体取向，多晶表面和非结晶表面的晶体表面之一，形成在所述平面表面上的图案化层（220,320）的纳米通孔（224,324），使得所述纳米线（260,360）垂直于所述平面表面原位生长。电子设备（200,300）包括由图案化层（220,320）垂直间隔开的电子电路（280,370,380）的第一和第二区域。图案化层（220,320）的纳米通孔（224,324）在区域之间垂直延伸。第一区域（324,376）具有平坦表面。装置（200,300）还包括从纳米通孔（224,324）中的第一区域（374,386）的平坦表面上的催化剂位置垂直延伸的纳米线（260,360）。纳米线（260,360）形成连接这些区域的纳米级电路的部件。

7. 发明申请

WO2006036433A2 IMPRINT LITHOGRAPHY APPARATUS AND METHOD EMPLOYING AN EFFECTIVE PRESSURE 审中-公开
标题翻译：描绘使用有效压力的光刻设备和方法
公开(公告)号：WO2006036433A2
公开(公告)日：2006-04-06
申请号：PCT/US2005/030880
申请日：2005-08-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , TONG, William M, , GAO, Jun , PICCIOTTO, Carl E,
发明人： WU, Wei , TONG, William M, , GAO, Jun , PICCIOTTO, Carl E,
IPC分类号： G03F7/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint apparatus (100, 100', 200, 220) and method 300 employ an effective pressure P eff in imprint lithography. The imprint apparatus (100, 100', 200, 220) includes a compressible chamber (111) that encloses an imprint mold (120, 228a) having a mold pattern (122) and a sample (130, 228b) to be imprinted (300). The chamber (111) is compressed (330, 340, 350) to imprint (360) the mold pattern (122) on the sample (130, 228b). The mold (120, 228a) is pressed (350) against the sample (130, 228b) with the effective pressure P eff . The effective pressure P eff is controlled by a selected ratio A cavity /A contact of a cavity area A cavity of the chamber (111) to a contact area A contact between the mold (120, 228a) and the sample (130, 228b).
摘要翻译：压印装置（100,100'，200,220）和方法300在压印光刻中使用有效压力P eff。压印装置（100,100'，200,220）包括可压缩室（111），其包围具有模具图案（122）和待压印的样本（130,228b）的压印模具（120,228a））。腔室（111）被压缩（330,340,350）以将模具图案（122）压印（360）在样本（130,228b）上。将模具（120,228a）以有效压力P eff按压（350）在样品（130,228b）上。有效压力P eff由空腔区域A cavity的选定比例A cavity / A sub contact控制，（111）向模具（120,228a）和样品（130,228b）之间的接触区域接触。

8. 发明申请

WO2009002419A1 OPTICAL INTERCONNECT 审中-公开
标题翻译：光学互联
公开(公告)号：WO2009002419A1
公开(公告)日：2008-12-31
申请号：PCT/US2008/007554
申请日：2008-06-16
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WANG, Shih-yuan , SIGALAS, Mihail , WU, Wei
发明人： WANG, Shih-yuan , SIGALAS, Mihail , WU, Wei
IPC分类号： G02B6/36
CPC分类号： H04B10/803
摘要： An optical interconnect (100. 300, 400, 500, 600) has a plurality of optical data sources (125, 130, 135, 525, 530, 535), a plutality of optical data receivers (155, 160, 165, 555, 560, 565), a diffractive optical element (186, 320, 440, 670) configured to diffract an optical beam (176, 335, 435, 650) from at least one alignment optical source (170, 360, 460, 625) to at leats one sensor (370, 375, 470, 475, 640, 645), and an aligning element configured to align optical beams (120, 345, 445, 570, 650) from the optical data sources (125, 130, 135, 525, 530, 535) to said optical data receivers (155, 160, 165, 555, 560, 565), according to readings from the sensor (370, 375, 470, 475, 640, 645).
摘要翻译：光学互连（100,300,400,500,600）具有多个光学数据源（125,130,135,525,530,535），光学数据接收器（155,160,165,555，被配置为将光束（176,335,435,650）从至少一个对准光源（170,360,460,625）衍射到在一个传感器（370,375,470,475,640,645）上的对准元件被配置成使光束（120,345,445,570,650）与光学数据源（125,130,135,650）对准，根据来自传感器（370,375,470,475,640,645）的读数，将所述光学数据接收器（155,160,165,555,560,556）分配给所述光学数据接收器（155,160,165,555,560,556）。

9. 发明申请

WO2008048491A2 CONTACT LITHOGRAPHY APPARATUS, SYSTEM AND METHOD 审中-公开
标题翻译：联系人地平线设备，系统和方法
公开(公告)号：WO2008048491A2
公开(公告)日：2008-04-24
申请号：PCT/US2007/021813
申请日：2007-10-12
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , WU, Wei , WANG, Shih-Yuan , LI, Zhiyong , WALMSLEY, Robert
发明人： WU, Wei , WANG, Shih-Yuan , LI, Zhiyong , WALMSLEY, Robert
IPC分类号： G03F7/00 , G03F7/20
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/7035
摘要： A contact lithography system (100, 200) includes a patterning tool (110, 228a, 510) bearing a pattern (112); a substrate chuck (214) for chucking a substrate (130, 228b) to receive the pattern (112) from the patterning tool (110, 228a, 510); where the system (100, 200) deflects a portion of either the patterning tool (110, 228a, 510) or the substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and a stepper (260) for repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align the pattern (112) with an additional portion of the substrate (130, 228b) to also receive the pattern (112). A method of performing contact lithography comprising: deflecting a portion of either a patterning tool (110, 228a, 510) or a substrate (130, 228b) to bring the patterning tool (110, 228a, 510) and a portion of the substrate (130, 228b) into contact; and repositioning either or both of the patterning tool (110, 228a, 510) and substrate (130, 228b) to align a pattern (112) on the patterning tool (110, 228a, 510) with an additional portion of the substrate (130, 228b) to also receive the pattern (112).
摘要翻译：接触光刻系统（100,200）包括具有图案（112）的图案形成工具（110,228a，510）; 用于夹持基板（130,228b）以从所述图形化工具（110,228a，510）接收所述图案（112）的基板卡盘（214）; 其中所述系统（100,200）偏转所述图案形成工具（110,228a，510）或所述衬底（130,228b）的一部分以使所述图案形成工具（110,228a，510）和所述衬底的一部分 130，228b）接触; 以及用于重新定位所述图案形成工具（110,228a，510）和衬底（130,228b）中的一个或两个以使所述图案（112）与所述衬底（130,228b）的附加部分对准的步进器（260）接收图案（112）。一种执行接触光刻的方法，包括：使图案形成工具（110,228a，510）或衬底（130,228b）的一部分偏转以使图案形成工具（110,228a，510）和衬底的一部分 130，228b）接触; 以及重新定位图案形成工具（110,228a，510）和衬底（130,228b）中的一个或两个以使图案形成工具（110,228a，510）上的图案（112）与衬底的附加部分（130 ，228b）以也接收图案（112）。

10. 发明申请

WO2008016651A2 METHODS AND SYSTEMS FOR PERFORMING LITHOGRAPHY, METHODS FOR ALIGNING OBJECTS RELATIVE TO ONE ANOTHER, AND NANOIMPRINTING MOLDS HAVING NON-MARKING ALIGNMENT FEATURES 审中-公开
标题翻译：用于执行算术的方法和系统，与其他方法对准对象的方法，以及具有非标记对齐特征的纳米粒子
公开(公告)号：WO2008016651A2
公开(公告)日：2008-02-07
申请号：PCT/US2007/017195
申请日：2007-07-30
申请人： HEWLETT-PACKARD DEVELOPMENT COMPANY, L. P. , PICCIOTTO, Carl , GAO, Jun , WU, Wei , YU, Zhaoning
发明人： PICCIOTTO, Carl , GAO, Jun , WU, Wei , YU, Zhaoning
CPC分类号： G03F9/7092 , G03F9/7038 , G03F9/7042 , G03F9/7088
摘要： Methods of performing lithography include calculating a displacement vector (74) for a lithography tool (50) using an image (60) of a portion of the lithography tool (50) and a portion of a substrate (10) and an additional image (28) of a portion of an additional lithography tool (30) and a portion of the substrate (10). Methods of aligning objects include positioning a second object (30) proximate a first object (10) and acquiring a first image (38) illustrating a feature (32) on a surface of the second object (30) and a feature (18) on a surface of the first object (10). As additional object (50) is positioned proximate the first object (10), and an additional image (60) is acquired that illustrates a feature (52) on a surface of the additional object (50) and the feature (18) on the surface of the first object (10). The additional image (60) is compared with the first image (38). Imprint molds (30, 50) include at least one non-marking reference feature (32, 52) on animprinting surface of the imprint molds (30, 50).
摘要翻译：执行光刻的方法包括使用光刻工具（50）的一部分的图像（60）和基底（10）的一部分和附加图像（28）来计算光刻工具（50）的位移矢量（74））附加光刻工具（30）的一部分和基底（10）的一部分。对准对象的方法包括定位邻近第一物体（10）的第二物体（30）并且获取第二图像（38），该第一图像（38）示出在第二物体（30）的表面上的特征（32）第一物体（10）的表面。随着附加物体（50）被定位在第一物体（10）附近，并且获取附加图像（60），其示出了附加物体（50）的表面上的特征（52）和第一物体（10）的表面。将附加图像（60）与第一图像（38）进行比较。压印模具（30,50）包括在压印模具（30,50）的印模表面上的至少一个非标记参考特征（32,52）。

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