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    • 5. 发明授权
    • Lot signalling device
    • 批信号装置
    • US06426698B1
    • 2002-07-30
    • US09573949
    • 2000-05-19
    • Larry Edward FrisaClinton HarisMark Hiatt
    • Larry Edward FrisaClinton HarisMark Hiatt
    • G08B108
    • G08B21/0216G08B13/1427G08B21/0227
    • An apparatus related to a lot signalling device used to find misplaced lots. A remote control signalling device comprises a receiver section (5) for receiving an RF-command including a unique address of at least one of said plurality of remote control signalling devices (3) from a central control unit (1), an address memory (6) for storing the address of said remote control signalling device, an output section (7) for signalling an alarm upon receiving the RF-command, if said address included in the RF-command matches the stored address in said address memory (6). A method for processing items at different process stages comprises the steps of: transmitting RF-commands including a unique address of at least one of said plurality of remote control signalling devices by a central control unit (1), signalling an alarm by said remote control signalling device (3) upon reception of an RF-command from said central control unit (1).
    • 与用于发现错位的批次信号装置相关的装置。 遥控信令装置包括接收机部分(5),用于从中央控制单元(1)接收包括所述多个远程控制信令装置(3)中的至少一个的唯一地址的RF命令,地址存储器 6),用于存储所述遥控信令装置的地址;如果包括在所述RF指令中的所述地址与所述地址存储器(6)中存储的地址匹配,则用于在接收到所述RF命令时用于发出警报的输出部分(7) 。 一种用于在不同处理阶段处理物品的方法包括以下步骤:通过中央控制单元(1)发送包括至少一个所述多个远程控制信令装置的唯一地址的RF指令,通过所述遥控器 信令装置(3)在从所述中央控制单元(1)接收到RF命令时。
    • 10. 发明授权
    • Configuration and a method for reducing contamination with particles on a substrate in a process tool
    • 配置和减少处理工具中的基板上的颗粒污染的方法
    • US06881264B2
    • 2005-04-19
    • US10643820
    • 2003-08-19
    • Mark HiattKarl MautzRalf Schuster
    • Mark HiattKarl MautzRalf Schuster
    • H05K3/46H01L21/00B05C11/06B05C11/02
    • H01L21/6704
    • A process tool, preferably a spin coater, includes a set of at least three arms and an adjustable rinse nozzle. The arms lift a substrate, e.g. a semiconductor wafer, from a chuck inside the process chamber after having performed the corresponding manufacturing step, e.g. coating. The contact area between the arms and the substrate is as small as possible. The rinse nozzle dispenses a solvent liquid onto the backside of the substrate, thereby removing contaminating particles located at the area of contact between the vacuum channels of the chuck and the substrate. The set of arms rotates for a homogeneous cleaning. A gas flowing out of vacuum ports of the chuck prevents the vacuum ports from being obstructed with particles. While the substrate is being lifted, the chuck can also be cleaned by dispensing the solvent liquid onto the chuck.
    • 工艺工具,优选旋转涂布机,包括一组至少三个臂和可调整的冲洗喷嘴。 臂提起基底,例如 在执行相应的制造步骤之后,来自处理室内的卡盘的半导体晶片,例如, 涂层。 臂和基板之间的接触面积尽可能小。 冲洗喷嘴将溶剂液体分配到基板的背面,从而去除位于卡盘的真空通道与基板之间的接触区域的污染颗粒。 该组臂旋转以进行均匀清洁。 从卡盘的真空端口流出的气体防止真空口被颗粒堵塞。 当基板被提起时,也可以通过将溶剂液体分配到卡盘上来清洁卡盘。