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1. 发明授权

US4885070A Method and apparatus for the application of materials 失效
标题翻译：材料应用的方法和装置
公开(公告)号：US4885070A
公开(公告)日：1989-12-05
申请号：US197040
申请日：1988-05-20
申请人： Gregor A. Campbell , Robert W. Conn , Dan M. Goebel , Rolf Adam , Hans Aichert , Hans Betz , Anton Dietrich , Gonde Dittmer , Klaus Hartig , Friedrich Hass , Rainer Ludwig , Max Mayr , Alfred Thelen
发明人： Gregor A. Campbell , Robert W. Conn , Dan M. Goebel , Rolf Adam , Hans Aichert , Hans Betz , Anton Dietrich , Gonde Dittmer , Klaus Hartig , Friedrich Hass , Rainer Ludwig , Max Mayr , Alfred Thelen
IPC分类号： C23C14/00 , C23C14/46 , H01J37/34
CPC分类号： C23C14/46 , C23C14/0036 , H01J37/3402
摘要： An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.
摘要翻译：公开了一种将材料施加到设置在真空室中的基板的装置。包含电子发射器的单独的发生器室通过处理室连接到真空室，使得具有可控横截面形状和大面积的等离子体由磁体形成并被引导到目标系统。通过施加可调节的负电压，正离子可以相对于目标加速。

2. 发明授权

US5108571A Process for coating a dielectric substrate with copper 失效
标题翻译：用铜包覆电介质基板的工艺
公开(公告)号：US5108571A
公开(公告)日：1992-04-28
申请号：US770772
申请日：1991-10-04
申请人： Rainer Ludwig , Rolf Adam , Anton Dietrich , Reiner Kukla
发明人： Rainer Ludwig , Rolf Adam , Anton Dietrich , Reiner Kukla
IPC分类号： C23C14/14 , C23C14/02 , C23C14/08 , C23C14/18 , C23C14/34 , C23C14/35 , H05K3/16 , H05K3/38
CPC分类号： H05K3/16 , C23C14/024 , C23C14/087 , C23C14/18 , C23C14/35 , H05K3/38
摘要： In a process for coating substrates 1, 35, for example aluminum ceramic plates 1 or polyimide films 35 with copper by means of a device including a direct current source 10 which is connected to a sputtering cathode 5, 30, 31 disposed in a process chamber 15, 15a, 32 which can be evacuated and this cathode electrically interacts with a copper target 3, 33, 34 which can be sputtered and the sputtered particles are deposited on the substrate 1, 35 whereby the argon gas can be introduced into the process chamber 15, 15a, 32 which can be evacuated, an oxygen inlet 20, 39 is provided in addition to the argon inlet 21, 40, whereby the supply of oxygen can be controlled via a valve 19, 43 inserted in the feed line 23, 39 and the amount of oxygen can be metered such that during a first process phase a copper oxide layer which functions as a bonding agent forms on the substrate 1, 35 and after adjusting the argon atmosphere in the process chamber 15, 15a, 32 pure copper is deposited as an electrically conductive layer.
摘要翻译：在通过包括连接到设置在处理室中的溅射阴极5,30,31的直流电源10的装置来涂覆基板1，35，例如铝陶瓷板1或具有铜的聚酰亚胺膜35的工艺中 15，15a，32，其可以被抽真空，并且该阴极与可以溅射的铜靶3,33,34电相互作用，并且溅射的颗粒沉积在衬底1,35上，由此氩气可以被引入到处理室除了氩入口21,40之外，还可以提供可以抽真空的氧气入口20,39，从而可以通过插入进料管线23,39中的阀19,43来控制供氧。并且可以计量氧气的量，使得在第一处理阶段期间，在基板1,35上形成用作粘合剂的氧化铜层，并且在调节处理室15,15a，32纯铜中的氩气氛之后，作为选民保存导电层。

3. 发明授权

US5262032A Sputtering apparatus with rotating target and target cooling 失效
标题翻译：具有旋转目标和目标冷却的溅射装置
公开(公告)号：US5262032A
公开(公告)日：1993-11-16
申请号：US918142
申请日：1992-07-23
申请人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
发明人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3405
摘要： A sputtering apparatus is presented, especially one with a magnetron cathode and rotating target (1), and target cooling performed by a liquid coolant, preferably water, in which provision is made for the cooling to be concentrated on the area or areas of the rotating target (1) which are exposed to the heat produced by the plasma (12), and the magnets (28, 29, 30, 31) of the magnet assembly (23) form at least one cooling passage (34, 35).
摘要翻译：提出了一种溅射装置，特别是具有磁控管阴极和旋转靶（1）的溅射装置，并且由液体冷却剂（优选水）进行目标冷却，其中提供用于使冷却集中在旋转的区域或区域上暴露于由等离子体（12）产生的热的靶（1）和磁体组件（23）的磁体（28,29,30,31）形成至少一个冷却通道（34,35）。

4. 发明授权

US5090984A Method for producing glass of high transmission in the visible spectral range and low solar energy transmission 失效
标题翻译：在可见光谱范围和低太阳能传输中生产高透射率玻璃的方法
公开(公告)号：US5090984A
公开(公告)日：1992-02-25
申请号：US516810
申请日：1990-04-30
申请人： Joachim Szczyrbowski , Stefan Rogels , Anton Dietrich , Klaus Hartig
发明人： Joachim Szczyrbowski , Stefan Rogels , Anton Dietrich , Klaus Hartig
IPC分类号： C03C17/245 , C03C17/34 , C23C14/08
CPC分类号： C23C14/08 , C03C17/2453 , C03C17/3417
摘要： In a method for the production of sheets of mineral glass with high transmission in the visible spectral range and with low solar energy transmission, a coating is sputtered onto the sheet in a coating chamber by cathode sputtering with a target of an alloy of 65% tin and 35% nickel in an atmosphere with an oxygen content. The sheet and coating are then heated at 640.degree. C. and then bent in the heated state, thus producing an especially stable and electrically conductive combination.
摘要翻译：在可见光谱范围内和低太阳能透射率下生产具有高透射率的矿物玻璃片的方法中，通过阴极溅射将涂层溅射到涂覆室中的片材上，其目的为65％锡合金靶和含氧量大气的35％的镍。然后将片和涂层在640℃下加热，然后在加热状态下弯曲，从而产生特别稳定且导电的组合。

5. 发明授权

US4830876A Process for producing contact strips on substrates, especially on glazing 失效
标题翻译：在基材上生产接触条的方法，特别是在玻璃上
公开(公告)号：US4830876A
公开(公告)日：1989-05-16
申请号：US881712
申请日：1986-07-03
申请人： Anton Dietrich , Klaus Hartig , Hans-Christian Schaefer , Joachim Szczyrbowski
发明人： Anton Dietrich , Klaus Hartig , Hans-Christian Schaefer , Joachim Szczyrbowski
IPC分类号： C03C17/36 , C03C27/12 , H05B3/84 , H05B3/86
CPC分类号： B32B17/10761 , B32B17/10036 , B32B17/10174 , C03C17/36 , C03C17/3613 , C03C17/3644 , C03C17/3655 , C03C17/3673 , C03C17/3681 , H05B3/84 , H05B3/86 , H05B2203/013 , H05B2203/016 , Y10T428/12597 , Y10T428/12611 , Y10T428/24802 , Y10T428/24917 , Y10T428/24926
摘要： Process for the production of contact strips on substrates, especially on plates of mineral glass. These substrates are provided with an electrically conductive surface coating which is coated on the side facing away from the substrate with at least one surface layer of a dielectric material. For the production of the contact strips, a noble metal suspension in a liquid is deposited according to the invention on the surface layer in the pattern of the contact strips. Then the substrate with the pack of layers is exposed to a heat treatment at at least 100.degree. C. until a lowered total resistance occurs through the conductive surface coating between the contact strips.
摘要翻译：在基材上，特别是矿物玻璃板上生产接触条的方法。这些基板设置有导电表面涂层，其涂覆在背离基板的一侧上，并具有至少一个电介质材料的表面层。为了生产接触条，根据本发明，将液体中的贵金属悬浮液以接触条的图案沉积在表面层上。然后将具有一层层的衬底暴露于至少100℃的热处理，直到通过接触片之间的导电表面涂层发生降低的总电阻。

6. 发明授权

US5264099A Method for producing an opaque substrate 失效
标题翻译：不透明基材的制造方法
公开(公告)号：US5264099A
公开(公告)日：1993-11-23
申请号：US664790
申请日：1991-03-05
申请人： Joachim Szczyrbowski , Anton Dietrich , Albert Kastner , Klaus Hartig
发明人： Joachim Szczyrbowski , Anton Dietrich , Albert Kastner , Klaus Hartig
IPC分类号： C03C17/34 , C03C17/36 , C23C14/06 , C23C14/08 , G02B1/10 , C23C14/34
CPC分类号： C03C17/3615 , C03C17/3423 , C03C17/3435 , C03C17/36 , C03C17/3642 , C03C17/366 , C23C14/0641 , C23C14/08 , G02B1/10 , C03C2217/23 , C03C2218/154
摘要： A transparent substrate, such as glass, having a solar control coating consisting of a CrN layer between two SnO, layers. The solar control coating is arranged on the back side of the substrate which will face away from an observer when in place. A sub-oxidic alloy, such as NiCrO is then applied to the solar control coating.
摘要翻译：具有由两个SnO层之间的CrN层组成的太阳能控制涂层的透明基板，例如玻璃。太阳能控制涂层布置在基板的背面，当其就位时将远离观察者。然后将诸如NiCrO的亚氧化合金施加到太阳能控制涂层。

7. 发明授权

US4863756A Method and equipment for coating substrates by means of a plasma discharge using a system of magnets to confine the plasma 失效
标题翻译：通过使用磁体系统的等离子体放电来涂覆基板以限制等离子体的方法和设备
公开(公告)号：US4863756A
公开(公告)日：1989-09-05
申请号：US15128
申请日：1987-02-02
申请人： Klaus Hartig , Anton Dietrich
发明人： Klaus Hartig , Anton Dietrich
IPC分类号： C23C14/12 , B05D3/14 , B05D7/24 , C23C16/503 , C23C16/54 , H01J37/32
CPC分类号： B05D1/62 , C23C16/503 , C23C16/545 , H01J37/32366 , H01J37/32623 , H01J37/3266 , H01J37/32761 , B05D3/14
摘要： Method for coating continuously moving substrates by the deposition of compounds from the gas phase by means of plasma discharge, produced by an electrode, with a chemical reaction, a system of magnets for the generation of a magnetic trap to constrict the plasma being disposed on one side of the substrate. The objective is to be accomplished by limiting the action of the plasma and the chemical reaction to the immediate vicinity of the system of magnets. For this purpose, the surface of the substrate to be coated is held at a distance "S.sub.1 " from the electrode, which is less than the dark-space distance that arises under the specified process conditions. Moreover, the magnetic trap is adjusted so that it passes through the substrate and is closed over the surface of the substrate to be coated and moreover in such a manner, that the constricted plasma is maintained on the surface of the substrate that is to be coated.
摘要翻译： PCT No.PCT / EP86 / 00332 Sec。 371日期1987年2月2日 102（e）1987年2月2日PCT PCT。1986年6月4日PCT公布。公开号WO86 / 07391 日期：1986年12月18日。通过借助等离子体放电由气相沉积化合物涂覆连续移动的基板的方法，由电极产生，具有化学反应，用于产生磁捕集器的磁体系统压缩设置在基板的一侧上的等离子体。目的是通过将等离子体和化学反应的作用限制在磁体系统附近来实现。为此，待涂覆的基板的表面与电极保持距离“S1”，该距离小于在指定工艺条件下产生的暗空间距离。此外，磁捕获器被调节使得其通过基底并且被封闭在待涂覆的基底的表面上，而且以这样的方式，缩小的等离子体保持在待涂覆的基底的表面上。

8. 发明授权

US5201926A Method for the production of coated glass with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation 失效
标题翻译：用于生产在可见光谱范围内具有高透射率并具有高反射率的热辐射的涂覆玻璃的方法
公开(公告)号：US5201926A
公开(公告)日：1993-04-13
申请号：US230681
申请日：1988-08-08
申请人： Joachim Szczyrbowski , Anton Dietrich , Klaus Hartig
发明人： Joachim Szczyrbowski , Anton Dietrich , Klaus Hartig
IPC分类号： B60J1/00 , C03C17/36
CPC分类号： C03C17/3618 , C03C17/36 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , B60J1/002
摘要： Method for making glazing with a high transmissivity in the visible spectral range and with a high reflectivity for thermal radiation as well as low surface resistance. On substrates of mineral glass a system of coatings is built up in the following order:Coating 1: oxide from the group, tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof,Coating 2: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 3: silver or a silver alloy with at least 50 weight-percent silver content,Coating 4: alloy of 80 weight-percent of nickel and 20 weight-percent of chromium,Coating 5: oxide from the group tin oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or mixtures thereof.Thereafter the substrate with the entire packet of coatings is heated to the softening temperature of the glass and bent to the final shape.
摘要翻译：在可见光谱范围内具有高透射率并具有高反射率的热辐射以及低表面电阻的方法。在矿物玻璃的基材上，按照以下顺序建立涂层体系：涂层1：氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合物，涂层1：氧化物，涂层2：合金80 镍的重量百分比和20重量％的铬，涂层3：银或银合金具有至少50重量％的银含量，涂层4：80重量％的镍和20重量％的铬的合金，涂层5：氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合物的氧化物。此后，将具有整个涂层的基底加热至玻璃的软化温度并弯曲成最终形状。

9. 发明授权

US4919778A Process for the production of curve glazing with a high transmittance in the visible spectral range and a high reflectance for thermal radiation 失效
标题翻译：用于生产在可见光谱范围内具有高透射率的曲线玻璃以及用于热辐射的高反射率的方法
公开(公告)号：US4919778A
公开(公告)日：1990-04-24
申请号：US356668
申请日：1989-05-19
申请人： Anton Dietrich , Klaus Hartig , Joachim Szczyrbowski
发明人： Anton Dietrich , Klaus Hartig , Joachim Szczyrbowski
IPC分类号： C03C17/36 , C03C27/12
CPC分类号： C03C17/3618 , C03C17/36 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C17/3689
摘要： A system of layers is built up on substrates of mineral glass in the following order: first layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide, or their mixed oxides; second layer: a metal from the group, tantalum, tungsten, nickel, iron; third layer: silver or a silver alloy containing at least 50 weight-percent of silver; fourth layer: a metal from the group, tantalum, tungsten, nickel, iron or their alloys; fifth layer: an oxide from the group, stannic oxide, silicon dioxide, aluminum oxide, tantalum oxide, zirconium oxide or their mixed oxides. After that, the substrate with all the coating layers is heated to the softening temperature of the glass in an oxidizing atmosphere and bent to the final shape.
摘要翻译：按照以下顺序在矿物玻璃的基板上建立层的系统：第一层：来自该组的氧化物，氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或其混合氧化物; 第二层：一组金属，钽，钨，镍，铁; 第三层：含有至少50重量％银的银或银合金; 第四层：一组金属，钽，钨，镍，铁或它们的合金; 第五层：来自该组的氧化物，氧化锡，二氧化硅，氧化铝，氧化钽，氧化锆或它们的混合氧化物。之后，将具有所有涂层的基板在氧化气氛中加热至玻璃的软化温度并弯曲成最终形状。

10. 发明授权

US5364518A Magnetron cathode for a rotating target 失效
标题翻译：用于旋转靶的磁控管阴极
公开(公告)号：US5364518A
公开(公告)日：1994-11-15
申请号：US976960
申请日：1992-11-13
申请人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
发明人： Klaus Hartig , Anton Dietrich , Joachim Szczyrbowski
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： H01J37/3455 , C23C14/3407 , H01J37/3405
摘要： Magnets are arranged inside a rotating tubular target to form a racetrack-shaped plasma having two straight stretches parallel to the target axis and two end stretches connecting the straight stretches. In order to achieve uniform target erosion, the magnets are arranged so that the plasma is wider and therefore less intense over the end stretches than it is over the straight stretches.
摘要翻译：磁体布置在旋转的管状靶内，以形成具有平行于目标轴线的两个直线段和连接直线段的两个端部延伸部的跑道形等离子体。为了实现均匀的目标侵蚀，磁体被布置成使得等离子体比在其直线延伸部分上更宽并且因此比端部延伸的强度更小。

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