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1. 发明授权

US5429070A High density plasma deposition and etching apparatus 失效
标题翻译：高密度等离子体沉积和蚀刻装置
公开(公告)号：US5429070A
公开(公告)日：1995-07-04
申请号：US979574
申请日：1992-11-20
申请人： Gregor A. Campbell , Robert W. Conn , Dan Katz , N. William Parker , Alexis de Chambrier
发明人： Gregor A. Campbell , Robert W. Conn , Dan Katz , N. William Parker , Alexis de Chambrier
IPC分类号： C23C16/50 , C23C16/513 , H01J37/32 , H01L21/00
CPC分类号： H01J37/3244 , C23C16/513 , H01J37/321 , H01J37/3211 , H01J37/32688
摘要： Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. The plasma source may include a sapphire or alumina source tube for use with plasmas containing fluorine. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the axis of the plasma source and the substrate process chamber. Preferably a first current is provided through the inner coil and a second current in a direction opposite to the direction of the first current is provided through the outer coil. The inner and outer coils are wrapped with a thin sheet of conducting material to shield the coils from RF signal generated by the plasma source. The result is to advantageously shape the magnetic field in the process chamber to achieve extremely uniform processing, particularly when a unique diamond shaped pattern of gas feed lines is used wherein the diamond is arranged to be approximately tangent at four places to the outer circumference of the workpiece being processed in the apparatus.
摘要翻译：提供了等离子体沉积或蚀刻装置，其包括位于衬底处理室上方并且与衬底处理室轴向关系的等离子体源。等离子体源可以包括与含氟的等离子体一起使用的蓝宝石或氧化铝源管。围绕等离子体源的是内部磁性线圈和外部磁性线圈，其布置在与等离子体源和衬底处理室的轴线垂直的同一平面中。优选地，通过内部线圈提供第一电流，并且通过外部线圈提供沿与第一电流的方向相反的方向的第二电流。内部和外部线圈用一薄层导电材料包裹，以将线圈屏蔽由等离子体源产生的RF信号。结果是有利地在处理室中形成磁场，以实现非常均匀的处理，特别是当使用气体馈送线的独特的菱形图案时，其中金刚石布置成在四个位置处大致相切于外围的工件在设备中被处理。

2. 发明授权

US5421891A High density plasma deposition and etching apparatus 失效
标题翻译：高密度等离子体沉积和蚀刻装置
公开(公告)号：US5421891A
公开(公告)日：1995-06-06
申请号：US964149
申请日：1992-10-19
申请人： Gregor A. Campbell , Robert W. Conn , Dan Katz , N. William Parker , David I. C. Pearson
发明人： Gregor A. Campbell , Robert W. Conn , Dan Katz , N. William Parker , David I. C. Pearson
IPC分类号： C23C16/513 , H01J37/32 , H05H1/46 , C23C16/50
CPC分类号： H01J37/3244 , C23C16/513 , H01J37/321 , H01J37/3211 , H01J37/3222 , H01J37/3266 , H01J37/32688 , H05H1/46
摘要： Plasma deposition or etching apparatus is provided which comprises a plasma source located above and in axial relationship to a substrate process chamber. Surrounding the plasma source are an inner magnetic coil and an outer magnetic coil arranged in the same plane perpendicular to the axis of the plasma source and the substrate process chamber. Preferably, a first current is provided through the inner coil and a second current in a direction opposite to the direction of the first current is provided through the outer coil. The result is to advantageously shape the magnetic field in the process chamber to achieve extremely uniform processing, particularly when a unique diamond shaped pattern of gas feed lines is used wherein the diamond is arranged to be approximately tangent at four places to the outer circumference of the workpiece being processed in the apparatus.
摘要翻译：提供了等离子体沉积或蚀刻装置，其包括位于衬底处理室上方并且与衬底处理室轴向关系的等离子体源。围绕等离子体源的是内部磁性线圈和外部磁性线圈，其布置在与等离子体源和衬底处理室的轴线垂直的同一平面中。优选地，通过内部线圈提供第一电流，并且通过外部线圈提供沿与第一电流的方向相反的方向的第二电流。结果是有利地在处理室中形成磁场，以实现非常均匀的处理，特别是当使用气体馈送线的独特的菱形图案时，其中金刚石布置成在四个位置处大致相切于外围的工件在设备中被处理。

3. 发明授权

US08928210B2 System for attachment of an electrode into an inductively coupled plasma source 有权
公开(公告)号：US08928210B2
公开(公告)日：2015-01-06
申请号：US13307830
申请日：2011-11-30
申请人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
发明人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
IPC分类号： H01J1/02
摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.

4. 发明授权

US08759764B2 On-axis detector for charged particle beam system 有权
标题翻译：用于带电粒子束系统的轴上探测器
公开(公告)号：US08759764B2
公开(公告)日：2014-06-24
申请号：US13538851
申请日：2012-06-29
申请人： Anthony Graupera , N. William Parker , Mark W. Utlaut
发明人： Anthony Graupera , N. William Parker , Mark W. Utlaut
IPC分类号： H01J37/256
CPC分类号： H01J37/256 , H01J37/244 , H01J37/28 , H01J2237/2448
摘要： A split grid multi-channel secondary particle detector for a charged particle beam system includes a first grid segment and a second grid segment, each having independent bias voltages creating an electric field such that the on-axis secondary particles that are emitted from the target are directed to one of the grids. The bias voltages of the grids can be changed or reversed so that each grid can be used to detect the secondary particles and the multi-channel particle detector as a whole can extend its lifetime.
摘要翻译：用于带电粒子束系统的分裂网格多通道二次粒子检测器包括第一栅格区段和第二栅极区段，每个区段具有独立的偏置电压，从而产生电场，使得从靶发射的轴上二次颗粒为指向其中一个网格。网格的偏置电压可以改变或反转，以便每个网格可以用于检测次级粒子，并且多通道粒子检测器作为一个整体可以延长其寿命。

5. 发明授权

US07462848B2 Optics for generation of high current density patterned charged particle beams 失效
标题翻译：用于产生高电流密度图案化带电粒子束的光学
公开(公告)号：US07462848B2
公开(公告)日：2008-12-09
申请号：US10962049
申请日：2004-10-07
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： H01J1/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/043 , H01J2237/1534
摘要： A direct-write electron beam lithography system employing a patterned beam-defining aperture to enable the generation of high current-density shaped beams without the need for multiple beam-shaping apertures, lenses and deflectors is disclosed. Beam blanking is accomplished without the need for an intermediate crossover between the electron source and the wafer being patterned by means of a double-deflection blanker, which also facilitates proximity effect correction. A simple type of “moving lens” is utilized to eliminate off-axis aberrations in the shaped beam. A method for designing the patterned beam-defining aperture is also disclosed.
摘要翻译：公开了一种使用图案化的光束限定孔径以便能够产生高电流密度成形光束而不需要多个光束成形孔，透镜和偏转器的直写式电子束光刻系统。实现光束消隐，而不需要通过双偏转消隐器对电子源和晶片进行图案化之间的中间交叉，这也有助于邻近效应校正。使用简单类型的“移动透镜”来消除成形光束中的离轴像差。还公开了一种用于设计图案化光束限定孔的方法。

6. 发明授权

US07435956B2 Apparatus and method for inspection and testing of flat panel display substrates 有权
标题翻译：平板显示器基板检查和测试的装置和方法
公开(公告)号：US07435956B2
公开(公告)日：2008-10-14
申请号：US11225376
申请日：2005-09-12
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： H01J37/28 , H01J37/147
CPC分类号： H01J37/256 , H01J9/42 , H01J37/09 , H01J37/147 , H01J37/244 , H01J2237/0492 , H01J2237/1501 , H01J2237/162 , H01J2237/188 , H01J2237/24475 , H01J2237/2448 , H01J2237/2594 , H01J2237/2817
摘要： A charged particle optical system for testing, imaging or inspecting substrates comprises: a charged particle optical assembly configured to produce a line of charged particle beams equally spaced along a main scan axis, each beam being deflectable through a large angle along the main scan axis; and linear detector optics aligned along the main scan axis. The detector optics includes a linear secondary electron detector, a field free tube, voltage contrast plates and a linear backscattered electron detector. The large beam deflection is achieved using an electrostatic deflector for which the exit aperture is larger than the entrance aperture. One embodiment of the deflector includes: two parallel plates with chamfered inner surfaces disposed perpendicularly to the main scan axis; and a multiplicity of electrodes positioned peripherally in the gap between the plates, the electrodes being configured to maintain a uniform electric field transverse to the main scan axis.
摘要翻译：用于测试，成像或检查基板的带电粒子光学系统包括：带电粒子光学组件，被配置为产生沿主扫描轴等距间隔的带电粒子束线，每个束可沿主扫描轴线以大角度偏转; 以及沿主扫描轴对准的线性检测器光学元件。检测器光学器件包括线性二次电子检测器，无磁场管，电压对比板和线性背散射电子检测器。使用静电偏转器实现大的光束偏转，出射孔大于入射孔。偏转器的一个实施例包括：具有与主扫描轴垂直设置的倒角内表面的两个平行板; 以及多个电极位于板之间的间隙周边，电极被配置为保持横向于主扫描轴的均匀电场。

7. 发明授权

US06977375B2 Multi-beam multi-column electron beam inspection system 失效
标题翻译：多光束多列电子束检测系统
公开(公告)号：US06977375B2
公开(公告)日：2005-12-20
申请号：US09789180
申请日：2001-02-19
申请人： Edward M. Yin , Alan D. Brodie , N. William Parker , Frank Ching-Feng Tsai
发明人： Edward M. Yin , Alan D. Brodie , N. William Parker , Frank Ching-Feng Tsai
IPC分类号： G01Q20/02 , G01Q30/02 , G21K1/087 , G21K5/10 , H01J37/28 , G01N23/00 , G21K7/00
CPC分类号： G21K1/087 , G21K5/10 , H01J37/28 , H01J2237/2817
摘要： A multi-column electron beam inspection system is disclosed herein. The system is designed for electron beam inspection of semiconductor wafers with throughput high enough for in-line use. The system includes field emission electron sources, electrostatic electron optical columns, a wafer stage with six degrees of freedom of movement, and image storage and processing systems capable of handling multiple simultaneous image data streams. Each electron optical column is enhanced with an electron gun with redundant field emission sources, a voltage contrast plate to allow voltage contrast imaging of wafers, and an electron optical design for high efficiency secondary electron collection.
摘要翻译：本文公开了一种多列电子束检查系统。该系统设计用于半导体晶圆的电子束检查，其生产量足够高以便在线使用。该系统包括场发射电子源，静电电子光柱，具有六个自由度的晶片台，以及能够处理多个同时图像数据流的图像存储和处理系统。每个电子光学柱由具有冗余场致发射源的电子枪，用于允许晶片电压对比成像的电压对照板和用于高效二次电子收集的电子光学设计而增强。

8. 发明授权

US06777675B2 Detector optics for electron beam inspection system 有权
标题翻译：电子束检测系统的检测器光学
公开(公告)号：US06777675B2
公开(公告)日：2004-08-17
申请号：US10126943
申请日：2002-04-18
申请人： N. William Parker , Edward M. Yin , Frank Ching-Feng Tsai
发明人： N. William Parker , Edward M. Yin , Frank Ching-Feng Tsai
IPC分类号： H01J37244
CPC分类号： H01J37/244 , H01J37/05 , H01J37/28 , H01J2237/057
摘要： An electron beam column incorporating an asymmetrical detector optics assembly provides improved secondary electron collection. The electron beam column comprises an electron gun, an accelerating region, scanning deflectors, focusing lenses, secondary electron detectors and an asymmetrical detector optics assembly. The detector optics assembly comprises a field-free tube, asymmetrical with respect to the electron optical axis; the asymmetry can be introduced by offsetting the field-free tube from the electron optical axis or by chamfering the end of the tube. In other embodiments the detector optics assembly comprises a field-free tube and a voltage contrast plate, either or both of which are asymmetrical with respect to the electron optical axis.
摘要翻译：包含不对称检测器光学组件的电子束柱提供改进的二次电子收集。电子束柱包括电子枪，加速区，扫描偏转器，聚焦透镜，二次电子检测器和不对称检测器光学组件。检测器光学组件包括相对于电子光轴不对称的无磁场管; 可以通过将无场磁管与电子光轴偏移或通过倒角管的端部来引入不对称性。在其他实施例中，检测器光学组件包括无磁场管和电压对比板，其中一个或两个对于电子光轴是不对称的。

9. 发明授权

US06316164B1 Proximity effect correction method through uniform removal of fraction of interior pixels 有权
$Proximity effect correction method through uniform removal of fraction of interior pixels$
标题翻译：通过均匀去除内部像素分数的近似效应校正方法
公开(公告)号：US06316164B1
公开(公告)日：2001-11-13
申请号：US09527062
申请日：2000-03-16
申请人： N. William Parker , Daniel L. Cavan , Alan D. Brodie , John H. McCoy
发明人： N. William Parker , Daniel L. Cavan , Alan D. Brodie , John H. McCoy
IPC分类号： G03C500
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31764 , H01J2237/31769 , Y10S430/143
摘要： A proximity effect correction method for electron beam lithography suitable for use in a raster scan system. The exposure pattern consists of shapes; these shapes are subdivided into edge pixels and interior pixels; the pattern is then modified by uniformly removing a fraction of the interior pixels. The method reduces the backscattered electron background dose, improving the contrast for shapes with fine features, particularly when they are in close proximity to large or densely packed shapes.
摘要翻译：适用于光栅扫描系统的电子束光刻的邻近效应校正方法。曝光图案由形状组成; 这些形状被细分为边缘像素和内部像素; 然后通过均匀地去除一部分内部像素来修改图案。该方法减少背散射电子背景剂量，改善具有精细特征的形状的对比度，特别是当它们紧邻大的或密集填充的形状时。

10. 发明授权

US08678049B2 Method and structure for prevention of incorrect fueling operations for diesel-powered vehicles 有权
标题翻译：用于防止柴油动力车辆不正确加油操作的方法和结构
公开(公告)号：US08678049B2
公开(公告)日：2014-03-25
申请号：US13153180
申请日：2011-06-03
申请人： Curtis Roys , N. William Parker
发明人： Curtis Roys , N. William Parker
IPC分类号： B65B1/30
CPC分类号： B67D7/344 , B60K15/0406 , B60K2015/0461 , B60K2015/0483
摘要： A method and structure are described for preventing the accidental introduction of gasoline into the fuel system of a diesel-powered vehicle. In a first preferred embodiment, a gasoline fuel nozzle is configured with a magnet, such as magnetic strips, and the entrance to a fill tube of a diesel-powered is configured with a magnetic field sensor ring. When an incorrect fueling operation, such as the introduction of gasoline into the fuel tank of the diesel-powered vehicle, is attempted the sensor ring alerts the operator visually and/or audibly before fueling starts, thereby preventing incorrect fueling. In alternative embodiments, sensing of an attempted incorrect fueling operation may require only the sensor ring.
摘要翻译：描述了一种用于防止汽油意外引入柴油动力车辆的燃料系统中的方法和结构。在第一优选实施例中，汽油燃料喷嘴配置有诸如磁条的磁体，并且柴油动力的填充管的入口配置有磁场传感器环。当尝试不正确的加油操作，例如将汽油引入柴油动力车辆的燃料箱时，传感器环在加油开始之前可视地和/或可听见地警告操作者，从而防止不正确的加油。在替代实施例中，对尝试不正确的加油操作的感测可能仅需要传感器环。

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