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1. 发明申请

US20130090560A1 ULTRASOUND IMAGE RECONSTRUCTION METHOD, DEVICE THEREFOR, AND ULTRASOUND DIAGNOSTIC DEVICE 审中-公开
标题翻译：超声图像重建方法，其设备及其超声诊断装置
公开(公告)号：US20130090560A1
公开(公告)日：2013-04-11
申请号：US13703961
申请日：2011-05-18
申请人： Go Kotaki , Atsushi Miyamoto , Kenji Nakahira
发明人： Go Kotaki , Atsushi Miyamoto , Kenji Nakahira
IPC分类号： A61B8/08 , A61B8/00 , A61B8/14
CPC分类号： A61B8/5246 , A61B8/14 , A61B8/461 , A61B8/462 , A61B8/5207 , A61B8/54 , G06T3/4053 , G06T2207/10016 , G06T2207/10132 , G06T2207/30004
摘要： In order to acquire high resolution ultrasound images while maintaining an appropriate frame rate in ultrasound diagnostic devices, the disclosed method generates high resolution ultrasound images by performing image reconstruction on the basis of multiple ultrasound frame images captured along a time series and the magnitudes of positional shifts, or forms high resolution ultrasound images by performing image reconstruction on the basis of multiple ultrasound frame images acquired by controlling the ultrasound probe and varying scan orientation or scan focal length frame by frame.
摘要翻译：为了在超声诊断装置中保持适当的帧速率获取高分辨率超声图像，所公开的方法通过基于沿着时间序列捕获的多个超声帧图像和位置偏移的大小执行图像重建来生成高分辨率超声图像，或者通过基于通过控制超声波探头并逐帧改变扫描方向或扫描焦距获取的多个超声帧图像执行图像重建来形成高分辨率超声图像。

2. 发明申请

US20130010100A1 IMAGE GENERATING METHOD AND DEVICE USING SCANNING CHARGED PARTICLE MICROSCOPE, SAMPLE OBSERVATION METHOD, AND OBSERVING DEVICE 审中-公开
标题翻译：使用扫描充电颗粒显微镜，样品观察方法和观察装置的图像生成方法和装置
公开(公告)号：US20130010100A1
公开(公告)日：2013-01-10
申请号：US13522557
申请日：2011-03-04
申请人： Go Kotaki , Atsushi Miyamoto , Kenji Nakahira , Takashi Hiroi
发明人： Go Kotaki , Atsushi Miyamoto , Kenji Nakahira , Takashi Hiroi
IPC分类号： H04N7/18
CPC分类号： G01B15/04 , H01J37/28 , H01J2237/221 , H01J2237/226 , H01J2237/24578 , H01J2237/2811 , H01J2237/2817 , H01L22/12
摘要： In a process of acquiring an image of semiconductor patterns by using a scanning electron microscope (SEM), this invention provides an image generating method and device that allows a high-resolution SEM image to be produced while suppressing damages caused by SEM imaging to a sample as a result of irradiation of an electron beam. A plurality of areas having similarly shaped patterns (similar areas) are extracted from a low-resolution SEM image which has been imaged while suppressing the irradiation energy of electron beam. From the image data of the extracted areas a single high resolution image of the patterns is generated by image restoration processing. Further, the method of this invention also uses design data in determining the similar areas and the SEM imaging position and imaging range for performing the image restoration processing.
摘要翻译：在通过扫描电子显微镜（SEM）获得半导体图案的图像的过程中，本发明提供一种图像生成方法和装置，其能够在抑制由SEM成像引起的样本的同时产生高分辨率的SEM图像作为电子束照射的结果。已经在抑制电子束的照射能量的同时成像的低分辨率SEM图像中提取具有相似形状的图案（类似区域）的多个区域。根据提取区域的图像数据，通过图像恢复处理生成图案的单个高分辨率图像。此外，本发明的方法还使用设计数据来确定用于执行图像恢复处理的相似区域和SEM成像位置和成像范围。

3. 发明授权

US09082585B2 Defect observation method and device using SEM 有权
标题翻译：缺陷观察方法和装置采用SEM
公开(公告)号：US09082585B2
公开(公告)日：2015-07-14
申请号：US13143345
申请日：2009-11-27
申请人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
发明人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
IPC分类号： H04N7/18 , H01J37/22 , G06T7/00 , H01J37/26 , H01J37/28 , H01L21/66
CPC分类号： H01J37/222 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01L22/12
摘要： An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.
摘要翻译：搜索能够在低放大倍率领域中获取的高倍率参考图像的成像区域，而不将舞台从低倍率下的缺陷区域成像的位置移动，并且如果搜索成功，则获取成像区域本身的图像并获取高倍率参考图像。如果搜索不成功，则将成像方案切换到从与缺陷区相邻的芯片获取高倍率参考图像的方案。

4. 发明申请

US20110285839A1 DEFECT OBSERVATION METHOD AND DEVICE USING SEM 有权
标题翻译：缺陷观察方法和使用SEM的设备
公开(公告)号：US20110285839A1
公开(公告)日：2011-11-24
申请号：US13143345
申请日：2009-11-27
申请人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
发明人： Go Kotaki , Atsushi Miyamoto , Ryo Nakagaki , Takehiro Hirai
IPC分类号： H04N7/18
CPC分类号： H01J37/222 , G06T7/001 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2817 , H01L22/12
摘要： An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.
摘要翻译：搜索能够在低放大倍率领域中获取的高倍率参考图像的成像区域，而不将舞台从低倍率下的缺陷区域成像的位置移动，并且如果搜索成功，则获取成像区域本身的图像并获取高倍率参考图像。如果搜索不成功，则将成像方案切换到从与缺陷区相邻的芯片获取高倍率参考图像的方案。

5. 发明授权

US09343264B2 Scanning electron microscope device and pattern dimension measuring method using same 有权
标题翻译：扫描电子显微镜装置及其图案尺寸测量方法
公开(公告)号：US09343264B2
公开(公告)日：2016-05-17
申请号：US13379042
申请日：2010-07-01
申请人： Go Kotaki , Atsushi Miyamoto , Ryoichi Matsuoka
发明人： Go Kotaki , Atsushi Miyamoto , Ryoichi Matsuoka
IPC分类号： G06K9/00 , G01N23/00 , G21K7/00 , H01J37/28 , H04N5/232 , H01J37/22 , H01L21/66
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H04N5/23238 , H01L2924/00
摘要： In a panoramic image construction technology a wide-range imaging area (EP) of semiconductor patterns is divided into a plurality of imaging areas (SEP), and joined a group of images, which are obtained by imaging the SEPs using an SEM, through image processing. Although a pattern serving as a key to joining is not contained in an overlap area between some of the SEPs, all the images can be joined in some cases is noted so that: although the number of patterns serving as keys to joining is small, SEPs whose images are all joined can be determined; or even if such SEPs cannot be determined, SEPs satisfying user's request items as many as possible can be determined. The cases are extracted by optimizing an SEP arrangement, whereby the number of cases in which SEPs whose images are all joined can be determined is increased.
摘要翻译：在全景图像构造技术中，半导体图案的宽范围成像区域（EP）被分成多个成像区域（SEP），并且通过图像将通过使用SEM对SEP进行成像而获得的一组图像处理。虽然作为加入键的图案不包含在一些SEP之间的重叠区域中，但是在某些情况下可以连接所有图像，使得：尽管用作加入键的图案数量少，但是SEP 可以确定其图像全部连接; 或者即使不能确定这样的SEP，也可以确定尽可能多地满足用户请求项目的SEP。通过优化SEP布置来提取情况，从而可以确定其中图像全部被连接的SEP的情况的数量。

6. 发明授权

US08357897B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US08357897B2
公开(公告)日：2013-01-22
申请号：US13146436
申请日：2010-01-26
申请人： Chie Shishido , Atsushi Miyamoto , Mayuka Iwasaki , Tomofumi Nishiura , Go Kotaki
发明人： Chie Shishido , Atsushi Miyamoto , Mayuka Iwasaki , Tomofumi Nishiura , Go Kotaki
IPC分类号： H01J37/26 , G01N23/00 , G06K9/00
CPC分类号： H01J37/3045 , G01B2210/56 , H01J37/244 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam device enabling prevention of degradation of reproducibility of measurement caused by an increase of the beam diameter attributed to an image shift and having a function of dealing with device-to-device variation. The charged particle beam device is used for measuring the dimensions of a pattern on a specimen using a line profile obtained by detecting secondary charged particles emitted from the specimen when the specimen is scanned with a primary charged particle beam converged on the specimen. A lookup table in which the position of image shift and the variation of the beam diameter are associated is prepared in advance by actual measurement or calculation and registered. When the dimensions are measured, image processing is carried out so as to correct the line profile for the variation of the beam diameter while the lookup table is referenced, and thereby the situation where the beam diameter is effectively equal is produced irrespective of the position of the image shift. Whit this, measurement by the charged particle beam excellent reproducibility can be carried out.
摘要翻译：一种带电粒子束装置，其能够防止由于图像偏移引起的光束直径的增加而导致的测量再现性的劣化，并且具有处理器件到器件变化的功能。带电粒子束装置用于通过使用聚集在样本上的初级带电粒子束扫描样本时检测从样本发射的二次带电粒子而获得的线轮廓来测量样品上的图案的尺寸。通过实际测量或计算预先准备其中图像偏移的位置和光束直径的变化相关联的查找表并注册。当测量尺寸时，执行图像处理，以便在参考查找表时校正用于变化光束直径的线轮廓，从而产生光束直径有效相等的情况，而与图像偏移。这样，可以进行通过带电粒子束测量的优异的再现性。

7. 发明申请

US20110181688A1 METHOD AND DEVICE FOR SYNTHESIZING PANORAMA IMAGE USING SCANNING CHARGED-PARTICLE MICROSCOPE 有权
标题翻译：使用扫描电荷粒子显微镜合成全景图像的方法和装置
公开(公告)号：US20110181688A1
公开(公告)日：2011-07-28
申请号：US13058226
申请日：2009-09-02
申请人： Atsushi Miyamoto , Go Kotaki , Ryoichi Matsuoka
发明人： Atsushi Miyamoto , Go Kotaki , Ryoichi Matsuoka
IPC分类号： H04N7/00
CPC分类号： G01B15/04 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/221 , H01J2237/24578 , H01J2237/24592 , H01J2237/2811 , H01J2237/2817
摘要： Provided is a panorama image synthesis technique using a scanning charged-particle microscope and capable of obtaining a panorama image synthesis that is robust against contamination and the imaging shift and distortion of an image in a wide-field imaging region (EP) for semiconductor fine patterns. The panorama image synthesis technique in the wide-field imaging region (EP) using the scanning charged-particle microscope is characterized in that the layout of each adjustment point, each local imaging region, and an imaging sequence comprising the imaging order of the each adjustment point are optimized and created as an imaging recipe.
摘要翻译：提供了一种使用扫描带电粒子显微镜的全景图像合成技术，其能够获得对于半导体精细图案的宽场成像区域（EP）中的污染和图像的成像偏移和变形的鲁棒性的全景图像合成。使用扫描带电粒子显微镜的宽场成像区域（EP）中的全景图像合成技术的特征在于，每个调整点，每个局部成像区域以及包括每个调整的成像顺序的成像序列的布局点被优化并创建为成像配方。

8. 发明申请

US20120104254A1 CHARGED PARTICLE BEAM DEVICE 有权
标题翻译：充电颗粒光束装置
公开(公告)号：US20120104254A1
公开(公告)日：2012-05-03
申请号：US13146436
申请日：2010-01-26
申请人： Chie Shishido , Atsushi Miyamoto , Mayuka Iwasaki , Tomofumi Nishiura , Go Kotaki
发明人： Chie Shishido , Atsushi Miyamoto , Mayuka Iwasaki , Tomofumi Nishiura , Go Kotaki
IPC分类号： H01J37/26
CPC分类号： H01J37/3045 , G01B2210/56 , H01J37/244 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam device enabling prevention of degradation of reproducibility of measurement caused by an increase of the beam diameter attributed to an image shift and having a function of dealing with device-to-device variation. The charged particle beam device is used for measuring the dimensions of a pattern on a specimen using a line profile obtained by detecting secondary charged particles emitted from the specimen when the specimen is scanned with a primary charged particle beam converged on the specimen. A lookup table in which the position of image shift and the variation of the beam diameter are associated is prepared in advance by actual measurement or calculation and registered. When the dimensions are measured, image processing is carried out so as to correct the line profile for the variation of the beam diameter while the lookup table is referenced, and thereby the situation where the beam diameter is effectively equal is produced irrespective of the position of the image shift. Whit this, measurement by the charged particle beam excellent reproducibility can be carried out.
摘要翻译：一种带电粒子束装置，其能够防止由于图像偏移引起的光束直径的增加而导致的测量再现性的劣化，并且具有处理器件到器件变化的功能。带电粒子束装置用于通过使用聚集在样本上的初级带电粒子束扫描样本时检测从样本发射的二次带电粒子而获得的线轮廓来测量样品上的图案的尺寸。通过实际测量或计算预先准备其中图像偏移的位置和光束直径的变化相关联的查找表并注册。当测量尺寸时，执行图像处理，以便在参考查找表时校正用于变化光束直径的线轮廓，从而产生光束直径有效相等的情况，而与图像偏移。这样，可以进行通过带电粒子束测量的优异的再现性。

9. 发明授权

US08767038B2 Method and device for synthesizing panorama image using scanning charged-particle microscope 有权
标题翻译：使用扫描带电粒子显微镜合成全景图像的方法和装置
公开(公告)号：US08767038B2
公开(公告)日：2014-07-01
申请号：US13058226
申请日：2009-09-02
申请人： Atsushi Miyamoto , Go Kotaki , Ryoichi Matsuoka
发明人： Atsushi Miyamoto , Go Kotaki , Ryoichi Matsuoka
IPC分类号： H04N7/00 , G01B15/04 , H01J37/22 , H01J37/21 , H01J37/28
CPC分类号： G01B15/04 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/21 , H01J2237/221 , H01J2237/24578 , H01J2237/24592 , H01J2237/2811 , H01J2237/2817
摘要： Provided is a panorama image synthesis technique using a scanning charged-particle microscope and capable of obtaining a panorama image synthesis that is robust against contamination and the imaging shift and distortion of an image in a wide-field imaging region (EP) for semiconductor fine patterns. The panorama image synthesis technique in the wide-field imaging region (EP) using the scanning charged-particle microscope is characterized in that the layout of each adjustment point, each local imaging region, and an imaging sequence comprising the imaging order of the each adjustment point are optimized and created as an imaging recipe.
摘要翻译：提供了一种使用扫描带电粒子显微镜的全景图像合成技术，其能够获得对于半导体精细图案的宽场成像区域（EP）中的污染和图像的成像偏移和变形的鲁棒性的全景图像合成。使用扫描带电粒子显微镜的宽场成像区域（EP）中的全景图像合成技术的特征在于，每个调整点，每个局部成像区域以及包括每个调整的成像顺序的成像序列的布局点被优化并创建为成像配方。

10. 发明申请

US20120098953A1 SCANNING ELECTRON MICROSCOPE DEVICE AND PATTERN DIMENSION MEASURING METHOD USING SAME 有权
标题翻译：扫描电子显微镜装置和图案尺寸测量方法
公开(公告)号：US20120098953A1
公开(公告)日：2012-04-26
申请号：US13379042
申请日：2010-07-01
申请人： Go Kotaki , Atsushi Miyamoto , Ryoichi Matsuoka
发明人： Go Kotaki , Atsushi Miyamoto , Ryoichi Matsuoka
IPC分类号： H04N7/18
CPC分类号： H01J37/28 , H01J37/222 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H04N5/23238 , H01L2924/00
摘要： In a panoramic image construction technology of dividing a wide-range imaging area (EP) of semiconductor patterns into a plurality of imaging areas (SEP), and joining a group of images, which are obtained by imaging the SEPs using an SEM, through image processing, a fact that although a pattern serving as a key to joining is not contained in an overlap area between some of the SEPs, all the images can be joined in some cases is noted so that: although the number of patterns serving as keys to joining is small, SEPs whose images are all joined can be determined; or even if such SEPs cannot be determined, SEPs satisfying user's request items as many as possible can be determined. The cases are extracted by optimizing an SEP arrangement, whereby the number of cases in which SEPs whose images are all joined can be determined is increased.
摘要翻译：在将半导体图案的宽范围成像区域（EP）分割为多个成像区域（SEP）的全景图像构造技术中，并且通过图像通过图像将通过使用SEM对SEP进行成像而获得的一组图像进行接合处理，虽然作为加入关键码的图案不包含在一些SEP之间的重叠区域中，但是在某些情况下可以连接所有图像，使得：尽管用作键的图案的数量连接小，可以确定其图像全部连接的SEP; 或者即使不能确定这样的SEP，也可以确定尽可能多地满足用户请求项目的SEP。通过优化SEP布置来提取情况，从而可以确定其中图像全部被连接的SEP的情况的数量。

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