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1. 发明授权

US06563907B1 Radiation source with shaped emission 有权
标题翻译：辐射源与成型发射
公开(公告)号：US06563907B1
公开(公告)日：2003-05-13
申请号：US10005600
申请日：2001-12-07
申请人： Glenn D. Kubiak , William C. Sweatt
发明人： Glenn D. Kubiak , William C. Sweatt
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70083 , H05H2240/00
摘要： Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera.
摘要翻译：使用诸如放电源的辐射源（如放电源）配置有一些预定形状的诸如电弧或狭缝的毛细管区域，可以显着提高输送到光刻晶片的磁通量，同时保持高效率。该光源特别适用于采用环形相机的光刻系统。本发明允许将对光罩进行临界照明的冷凝器从五个或更多个反射元件简化为总共三个或四个反射元件，从而提高冷凝器效率。它最大限度地提高了焊剂的流动，保持了高的耦合效率。该架构将EUV辐射从放电源耦合到环形光刻照相机中。

2. 发明授权

US06285737B1 Condenser for extreme-UV lithography with discharge source 失效
标题翻译：用于具有放电源的极紫外光刻的冷凝器
公开(公告)号：US06285737B1
公开(公告)日：2001-09-04
申请号：US09489163
申请日：2000-01-21
申请人： William C. Sweatt , Glenn D. Kubiak
发明人： William C. Sweatt , Glenn D. Kubiak
IPC分类号： G02B508
CPC分类号： B82Y10/00 , G02B17/00 , G02B19/0023 , G02B19/0047 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983
摘要： Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.
摘要翻译：用于投影光刻中的环形相机的冷凝器系统采用准放射入射收集器反射镜，其被诸如钌的合适的反射金属涂覆以收集来自放电源的辐射，以最小化污染物积聚对收集反射镜的影响。

3. 发明授权

US06396068B1 Illumination system having a plurality of movable sources 有权
标题翻译：具有多个可移动源的照明系统
公开(公告)号：US06396068B1
公开(公告)日：2002-05-28
申请号：US09678419
申请日：2000-10-02
申请人： William C. Sweatt , Glenn D. Kubiak
发明人： William C. Sweatt , Glenn D. Kubiak
IPC分类号： G01J100
CPC分类号： G21K5/04
摘要： An illumination system includes several discharge sources that are multiplexed together to reduce the amount of debris generated. The system includes: (a) a first electromagnetic radiation source array that includes a plurality of first activatable radiation source elements that are positioned on a first movable carriage; (b) a second electromagnetic radiation source array that includes a plurality of second activatable radiation source elements that are positioned on a second movable carriage; (c) means for directing electromagnetic radiation from the first electromagnetic radiation source array and electromagnetic radiation from the second electromagnetic radiation source array toward a common optical path; (d) means for synchronizing (i) the movements of the first movable carriage and of the second movable carriage and (ii) the activation of the first electromagnetic radiation source array and of the second electromagnetic radiation source array to provide an essentially continuous illumination of electromagnetic radiation along the common optical path.
摘要翻译：照明系统包括多个放电源，其被多路复用在一起以减少产生的碎屑的量。该系统包括：（a）第一电磁辐射源阵列，其包括定位在第一可移动滑架上的多个第一可激活的辐射源元件; （b）第二电磁辐射源阵列，其包括定位在第二可移动滑架上的多个第二可激活的辐射源元件; （c）用于将来自第一电磁辐射源阵列的电磁辐射和来自第二电磁辐射源阵列的电磁辐射引向公共光路的装置; （d）用于同步（i）第一可移动滑架和第二可移动滑架的运动的装置，以及（ii）第一电磁辐射源阵列和第二电磁辐射源阵列的激活，以提供基本上连续的照明沿着公共光路的电磁辐射。

4. 发明授权

US4330360A Molecular beam deposition technique using gaseous sources of group V elements 失效
标题翻译：使用V族元素气源的分子束沉积技术
公开(公告)号：US4330360A
公开(公告)日：1982-05-18
申请号：US170548
申请日：1980-07-21
申请人： Glenn D. Kubiak , Morton B. Panish
发明人： Glenn D. Kubiak , Morton B. Panish
IPC分类号： C30B23/02 , C30B23/06 , C30B25/02 , H01L21/203
CPC分类号： C30B23/02 , C30B23/066 , C30B25/02 , C30B29/40 , H01L21/02392 , H01L21/02395 , H01L21/02543 , H01L21/02546 , H01L21/0262 , H01L21/02631 , H01L21/02658 , Y10S148/065 , Y10S148/169
摘要： The invention is a method and apparatus for growing group III-V semiconductor layers by molecular beam deposition in which a gaseous source is used to form a molecular beam comprising M.sub.2 or M.sub.4 molecules, where M is a group V element. Arsine and phosphine may be decomposed in a high temperature leak-source to provide As.sub.2 and P.sub.2 molecular beams for molecular beam epitaxy of group III-V semiconductors such as GaAs and InP.
摘要翻译：本发明是通过分子束沉积生长III-V族半导体层的方法和装置，其中使用气态源形成包含M2或M4分子的分子束，其中M是V族元素。胂和膦可以在高温泄漏源中分解，以提供As2和P2分子束用于III-V族半导体如GaAs和InP的分子束外延。

5. 发明授权

US07239443B2 Condenser optic with sacrificial reflective surface 有权
标题翻译：冷凝器光学元件具有牺牲反射面
公开(公告)号：US07239443B2
公开(公告)日：2007-07-03
申请号：US11479340
申请日：2006-06-30
申请人： Daniel A. Tichenor , Glenn D. Kubiak , Sung Hun Lee
发明人： Daniel A. Tichenor , Glenn D. Kubiak , Sung Hun Lee
IPC分类号： F21V9/04 , F21V9/06 , G02B5/08 , G02B5/20
CPC分类号： G03F7/70958 , G03F7/70175 , Y10S359/90
摘要： Employing collector optics that has a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics is normally subject to erosion by debris from laser plasma source of radiation. The presence of an upper sacrificial reflective surface over the underlying reflective surface effectively increases the life of the optics while relaxing the constraints on the radiation source. Spatial and temporally varying reflectivity that results from the use of the sacrificial reflective surface can be accommodated by proper condenser design.
摘要翻译：使用具有牺牲反射表面的收集器光学器件可以显着延长收集器光学器件的使用寿命以及其中结合有收集器光学器件的冷凝器的整体性能。收集器光学器件通常受到来自激光等离子体辐射源的碎片的侵蚀。在下面的反射表面上存在上牺牲反射表面有效地增加了光学元件的寿命，同时放松了对辐射源的约束。通过使用牺牲反射表面产生的空间和时间变化的反射率可以通过适当的冷凝器设计来适应。

6. 发明授权

US6031598A Extreme ultraviolet lithography machine 有权
标题翻译：极紫外光刻机
公开(公告)号：US6031598A
公开(公告)日：2000-02-29
申请号：US161353
申请日：1998-09-25
申请人： Daniel A. Tichenor , Glenn D. Kubiak , Steven J. Haney , Donald W. Sweeney
发明人： Daniel A. Tichenor , Glenn D. Kubiak , Steven J. Haney , Donald W. Sweeney
IPC分类号： G03F7/20 , G03B27/54 , G03B27/74
CPC分类号： G03F7/70808 , B82Y10/00 , G03F7/70033 , G03F7/70058 , G03F7/70233 , G03F7/7025 , G03F7/70691 , G03F7/70841 , G03F7/709 , G03F7/70991
摘要： An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.
摘要翻译：用于制造在基板上形成的诸如晶体管的集成电路（IC）部件的极紫外光刻（EUVL）机器或系统。 EUVL机器使用经由光学装置引导的激光等离子体点源到由多镜系统反射到衬底或靶上的掩模或掩模版上。 EUVL机器在10-14nm波长的软x射线光子中工作。基本上，EUV机器包括抽真空的源室，通过传送管装置互连的抽真空的主或投影室，其中激光束被引导到等离子体发生器中，该等离子体发生器产生照明光束，该照明光束由来自光源室的光学器件通过连接管，投射到投影室中并且到达掩模版或掩模上，图案化的光束在安装在主或投影室中的投影光学器件（PO）盒中的光学器件反射到基板上。在EUVL机的一个实施例中，利用了九个光学部件，其中四个光学部件位于PO盒中。主或投影室包括用于PO箱的隔振器和用于衬底的隔振器安装件，其中主或投影室安装在支撑结构上并被隔离。

7. 发明授权

US07081992B2 Condenser optic with sacrificial reflective surface 有权
标题翻译：冷凝器光学元件具有牺牲反射面
公开(公告)号：US07081992B2
公开(公告)日：2006-07-25
申请号：US10760118
申请日：2004-01-16
申请人： Daniel A. Tichenor , Glenn D. Kubiak , Sang Hun Lee
发明人： Daniel A. Tichenor , Glenn D. Kubiak , Sang Hun Lee
IPC分类号： F21V9/04 , F21V9/06 , G02B5/08 , G02B5/20
CPC分类号： G03F7/70958 , G03F7/70175 , Y10S359/90
摘要： Employing collector optics that have a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics are normally subject to erosion by debris from laser plasma source of radiation. The presence of an upper sacrificial reflective surface over the underlying reflective surface effectively increases the life of the optics while relaxing the constraints on the radiation source. Spatial and temporally varying reflectivity that results from the use of the sacrificial reflective surface can be accommodated by proper condenser design.
摘要翻译：使用具有牺牲反射表面的收集器光学器件可以显着延长收集器光学器件的使用寿命以及其中结合有集光器的冷凝器的整体性能。收集器光学器件通常受到来自激光等离子体辐射源的碎片的侵蚀。在下面的反射表面上存在上牺牲反射表面有效地增加了光学元件的寿命，同时放松了对辐射源的约束。通过使用牺牲反射表面产生的空间和时间变化的反射率可以通过适当的冷凝器设计来适应。

8. 发明授权

US6011267A Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources 失效
标题翻译：用于激光等离子体极紫外（EUV）源的防腐喷嘴
公开(公告)号：US6011267A
公开(公告)日：2000-01-04
申请号：US32224
申请日：1998-02-27
申请人： Glenn D. Kubiak , Luis J. Bernardez, II
发明人： Glenn D. Kubiak , Luis J. Bernardez, II
IPC分类号： G03F7/20 , H01J49/16 , H01J27/00 , G01G4/00
CPC分类号： H01J49/16 , H05G2/006
摘要： A gas nozzle having an increased resistance to erosion from energetic plasma particles generated by laser plasma sources. By reducing the area of the plasma-facing portion of the nozzle below a critical dimension and fabricating the nozzle from a material that has a high EUV transmission as well as a low sputtering coefficient such as Be, C, or Si, it has been shown that a significant reduction in reflectance loss of nearby optical components can be achieved even after exposing the nozzle to at least 10.sup.7 Xe plasma pulses.
摘要翻译：一种气体喷嘴，具有增加的耐受激光等离子体源产生的能量等离子体粒子侵蚀的能力。通过将喷嘴的面向等离子体部分的面积减小到临界尺寸以下并且由具有高EUV透射率的材料以及诸如Be，C或Si的低溅射系数制造喷嘴，已经示出即使在将喷嘴暴露于至少107Xe等离子体脉冲之后，也可以实现附近光学部件的反射损失的显着降低。

9. 发明授权

US6007963A Method for extreme ultraviolet lithography 失效
公开(公告)号：US6007963A
公开(公告)日：1999-12-28
申请号：US877031
申请日：1997-06-17
申请人： T. E. Felter , Glenn D. Kubiak
发明人： T. E. Felter , Glenn D. Kubiak
IPC分类号： G03F7/004 , G03F7/09 , G03C1/492
CPC分类号： G03F7/094 , G03F7/0042 , Y10S430/148
摘要： A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

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