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1. 发明授权

US06517048B2 Isolation valves 有权
公开(公告)号：US06517048B2
公开(公告)日：2003-02-11
申请号：US09938761
申请日：2001-08-24
申请人： Gary C. Ettinger , John M. White
发明人： Gary C. Ettinger , John M. White
IPC分类号： F16K310
CPC分类号： F16K3/188
摘要： Isolation valves for selectively sealing a first region from a second region. A gate valve can include a housing which defines a channel between the first and second regions. The valve includes a gate, located in the housing, and displaceable between a stowed position and a deployed position. When the gate is in the stowed position, communication is permitted between the first and second regions. When the gate is in the deployed position, the gate spans the channel and can be controlled to isolate the first and second regions. The valves can be used, for example, in connection with systems for processing large glass substrates. The valves are particularly useful for isolating long rectangular openings, such as the openings in substrate processing chambers. Isolating processing chambers or load lock chambers from one another, for example, in a linear system, is facilitated.

2. 发明授权

US06308932B1 Isolation valves 有权
标题翻译：隔离阀
公开(公告)号：US06308932B1
公开(公告)日：2001-10-30
申请号：US09510724
申请日：2000-02-22
申请人： Gary C. Ettinger , John M. White
发明人： Gary C. Ettinger , John M. White
IPC分类号： F16K310
CPC分类号： F16K3/188
摘要： Isolation valves for selectively sealing a first region from a second region. A gate valve can include a housing which defines a channel between the first and second regions. The valve includes a gate, located in the housing, and displaceable between a stowed position and a deployed position. When the gate is in the stowed position, communication is permitted between the first and second regions. When the gate is in the deployed position, the gate spans the channel and can be controlled to isolate the first and second regions. The valves can be used, for example, in connection with systems for processing large glass substrates. The valves are particularly useful for isolating long rectangular openings, such as the openings in substrate processing chambers. Isolating processing chambers or load lock chambers from one another, for example, in a linear system, is facilitated.
摘要翻译：用于从第二区域选择性地密封第一区域的隔离阀。闸阀可以包括限定第一和第二区域之间的通道的壳体。阀包括位于壳体中的门，并可在收起位置和展开位置之间移动。当门处于收起位置时，允许在第一和第二区域之间进行通信。当门处于展开位置时，门跨越通道，并且可以被控制以隔离第一和第二区域。这些阀可以例如与用于处理大玻璃基板的系统结合使用。这些阀特别适用于隔离长矩形开口，例如衬底处理室中的开口。隔离处理室或负载锁定室彼此例如在线性系统中。

3. 发明授权

US6079693A Isolation valves 失效
公开(公告)号：US6079693A
公开(公告)日：2000-06-27
申请号：US82376
申请日：1998-05-20
申请人： Gary C. Ettinger , John M. White
发明人： Gary C. Ettinger , John M. White
IPC分类号： F16K3/18 , F16K51/02 , F16K3/10
CPC分类号： F16K3/188
摘要： Isolation valves for selectively sealing a first region from a second region. A gate valve can include a housing which defines a channel between the first and second regions. The valve includes a gate, located in the housing, and displaceable between a stowed position and a deployed position. When the gate is in the stowed position, communication is permitted between the first and second regions. When the gate is in the deployed position, the gate spans the channel and can be controlled to isolate the first and second regions. The valves can be used, for example, in connection with systems for processing large glass substrates. The valves are particularly useful for isolating long rectangular openings, such as the openings in substrate processing chambers. Isolating processing chambers or load lock chambers from one another, for example, in a linear system, is facilitated.

4. 发明授权

US10676817B2 Flip edge shadow frame 有权
公开(公告)号：US10676817B2
公开(公告)日：2020-06-09
申请号：US13569064
申请日：2012-08-07
申请人： Qunhua Wang , Soo Young Choi , Robin L. Tiner , John M. White , Gaku Furuta , Beom Soo Park
发明人： Qunhua Wang , Soo Young Choi , Robin L. Tiner , John M. White , Gaku Furuta , Beom Soo Park
IPC分类号： C23C16/04 , C23C16/458 , C23C14/04
摘要： Device for processing a substrate are described herein. An apparatus for controlling deposition on a substrate can include a chamber comprising a shadow frame support, a substrate support comprising a substrate supporting surface, a shadow frame with a shadow frame body including a first support surface, a second support surface opposite the first surface, and a detachable lip connected with the shadow frame body. The detachable lip can include a support connection, a first lip surface facing the substrate, a second lip surface opposite the first lip surface, a first edge positioned over the first support surface, and a second edge opposite the first edge to contact the substrate.

5. 发明授权

US09068262B2 Tightly fitted ceramic insulator on large area electrode 有权
标题翻译：在大面积电极上紧密配合陶瓷绝缘子
公开(公告)号：US09068262B2
公开(公告)日：2015-06-30
申请号：US13110184
申请日：2011-05-18
申请人： Jozef Kudela , Jonghoon Baek , John M. White , Robin Tiner , Suhail Anwar , Gaku Furuta
发明人： Jozef Kudela , Jonghoon Baek , John M. White , Robin Tiner , Suhail Anwar , Gaku Furuta
IPC分类号： C23C16/455 , C23C16/509 , H01J37/32
CPC分类号： B05B1/185 , C23C16/45565 , C23C16/509 , C23C16/5096 , H01J37/3244 , H01J37/32532 , H01J37/32623 , H01J37/32651 , Y10T137/6851
摘要： Embodiments of the invention generally include shield frame assembly for use with a showerhead assembly, and a showerhead assembly having a shield frame assembly that includes an insulator that tightly fits around the perimeter of a showerhead in a vacuum processing chamber. In one embodiment, a showerhead assembly includes a gas distribution plate and a multi-piece frame assembly that circumscribes a perimeter edge of the gas distribution plate. The multi-piece frame assembly allows for expansion of the gas distribution plate without creating gaps which may lead to arcing. In other embodiments, the insulator is positioned to be have the electric fields concentrated at the perimeter of the gas distribution plate located therein, thereby reducing arcing potential.
摘要翻译：本发明的实施例通常包括用于喷头组件的屏蔽框架组件和具有屏蔽框架组件的喷头组件，所述屏蔽框架组件包括紧密配合在真空处理室中的喷头周边周围的绝缘体。在一个实施例中，喷头组件包括气体分配板和环绕气体分布板的周边边缘的多片框架组件。多件式框架组件允许气体分配板的膨胀而不产生可能导致电弧的间隙。在其它实施例中，绝缘体被定位成具有集中在位于其中的气体分配板的周边的电场，从而减少电弧电势。

6. 发明授权

US08674844B2 Detecting plasma chamber malfunction 有权
标题翻译：检测等离子体室故障
公开(公告)号：US08674844B2
公开(公告)日：2014-03-18
申请号：US12661699
申请日：2010-03-19
申请人： Beom Soo Park , Hong Soon Kim , Soo Young Choi , James Hoffman , Suhail Anwar , John M. White
发明人： Beom Soo Park , Hong Soon Kim , Soo Young Choi , James Hoffman , Suhail Anwar , John M. White
IPC分类号： G08B21/00
CPC分类号： H01J37/32183 , H01J37/32935 , H01J37/3299
摘要： Malfunction of a component within an RF-powered plasma chamber is detected by observing an operating condition of the plasma chamber and detecting when the operating condition deviates from a previously observed range bounded by lower and upper limits. The lower and upper limits are determined by observing the minimum and maximum values of that operating condition during the processing of workpieces throughout one or more plasma chamber cleaning cycles immediately preceding the most recent cleaning of the plasma chamber.
摘要翻译：通过观察等离子体室的操作状态并检测何时操作条件偏离由下限和上限限定的先前观察范围，来检测RF供电的等离子体室内部件的故障。通过在紧邻等离子体室的最近清洁之前的一个或多个等离子体室清洁循环期间观察工件处理期间该操作条件的最小值和最大值来确定下限和上限。

7. 发明申请

US20130140009A1 ROBUST OUTLET PLUMBING FOR HIGH POWER FLOW REMOTE PLASMA SOURCE 审中-公开
公开(公告)号：US20130140009A1
公开(公告)日：2013-06-06
申请号：US13722637
申请日：2012-12-20
申请人： John M. White , Soo Young Choi , Beom Soo Park , Gaku Furuta , Young Jin Choi , Robin L. Tiner
发明人： John M. White , Soo Young Choi , Beom Soo Park , Gaku Furuta , Young Jin Choi , Robin L. Tiner
IPC分类号： F28D7/00
CPC分类号： F28D7/00 , C23C16/4405 , F28D2021/0078 , F28F9/26
摘要： The present invention generally includes a coupling between components. When igniting a plasma remote from a processing chamber, the reactive gas ions may travel to the processing chamber through numerous components. The reactive gas ions may be quite hot and cause the various components to become very hot and thus, the seals between apparatus components may fail. Therefore, it may be beneficial to cool any metallic components through which the reactive gas ions may travel. However, at the interface between the cooled metallic component and a ceramic component, the ceramic component may experience a temperature gradient sufficient to crack the ceramic material due to the heat of the reactive gas ions and the coolness of the metallic component. Therefore, extending a flange of the metallic component into the ceramic component may lessen the temperature gradient at the interface and reduce cracking of the ceramic component.

8. 发明申请

US20130126331A1 Guided Wave Applicator with Non-Gaseous Dielectric for Plasma Chamber 有权
标题翻译：用于等离子室的非气体介质的导波涂敷器
公开(公告)号：US20130126331A1
公开(公告)日：2013-05-23
申请号：US13360652
申请日：2012-01-27
申请人： Jozef Kudela , Tsutomu Tanaka , Carl A. Sorensen , Suhail Anwar , John M. White
发明人： Jozef Kudela , Tsutomu Tanaka , Carl A. Sorensen , Suhail Anwar , John M. White
IPC分类号： H01P3/16 , H05H1/46 , H01L21/02
CPC分类号： H01P3/16 , H01J37/32229 , H01L21/02 , H01L21/02104 , H05H1/46 , H05H2001/4622
摘要： A guided wave applicator comprising two electrically conductive waveguide walls and a waveguide dielectric. The volume of the waveguide dielectric is composed of non-gaseous dielectric material and is positioned between the two waveguide walls. The waveguide dielectric includes first and second longitudinal ends and includes first, second, third and fourth sides extending longitudinally between the two longitudinal ends. The first waveguide wall is positioned so that it covers the first side of the waveguide dielectric, and the second waveguide wall is positioned so that it covers the second side of the waveguide dielectric. In operation, electrical power can be supplied to one or both longitudinal ends of the waveguide dielectric, whereby the power can be coupled to a plasma through the exposed sides of the waveguide dielectric.
摘要翻译：导波装置，其包括两个导电波导壁和波导电介质。波导介质的体积由非气体电介质材料构成，并且位于两个波导壁之间。波导电介质包括第一和第二纵向端部，并且包括在两个纵向端部之间纵向延伸的第一，第二，第三和第四侧面。第一波导壁被定位成使得其覆盖波导电介质的第一侧，并且第二波导壁被定位成使得其覆盖波导电介质的第二侧。在操作中，可以向波导介质的一个或两个纵向端提供电力，由此可以通过波导电介质的暴露侧将功率耦合到等离子体。

9. 发明授权

US08438990B2 Multi-electrode PECVD source 有权
标题翻译：多电极PECVD源
公开(公告)号：US08438990B2
公开(公告)日：2013-05-14
申请号：US12353638
申请日：2009-01-14
申请人： Jozef Kudela , John M. White
发明人： Jozef Kudela , John M. White
IPC分类号： C23C16/00 , H01L21/00
CPC分类号： C23C16/5096 , C23C16/54 , H01J37/32091 , H01J37/32183 , H01J37/3244 , H01J37/32568 , H01J37/32752
摘要： Embodiments of the present invention generally relate to methods and apparatus for plasma generation in plasma processes. The methods and apparatus generally include a plurality of electrodes. The electrodes are connected to a RF power source, which powers the electrodes out of phase from one another. Adjacent electrodes are electrically isolated from one another by electrically insulating members disposed between and coupled to the electrodes. Processing gas may be delivered and/or withdrawn through the electrodes and/or the electrically insulating members. The substrate may remain electrically floating because the plasma may be capacitively coupled to it through a differential RF source drive.
摘要翻译：本发明的实施例一般涉及等离子体工艺中等离子体产生的方法和装置。所述方法和装置通常包括多个电极。电极连接到RF电源，该电源使电极彼此相位不相位。相邻的电极通过设置在电极之间并耦合到电极的电绝缘构件彼此电隔离。处理气体可以通过电极和/或电绝缘构件传送和/或抽出。由于等离子体可以通过差分RF源驱动电容耦合到其上，基板可能保持电浮置。

10. 发明授权

US08365682B2 Methods and apparatus for supporting substrates 有权
标题翻译：用于支撑基材的方法和装置
公开(公告)号：US08365682B2
公开(公告)日：2013-02-05
申请号：US11140777
申请日：2005-05-31
申请人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
发明人： Wendell T. Blonigan , Carl Sorensen , John M. White , Robin L. Tiner
IPC分类号： B65G49/07
CPC分类号： H01L21/67259 , H01L21/68742 , H01L21/68778
摘要： Substrate support methods and apparatus include vertically aligned lift pins that have bearing surfaces that engage friction plates and/or magnetic fields to maintain the vertical orientation of the lift pins during substrate lifting. In some embodiments, a magnetic field and/or weighting may alternatively or additionally be used to control the vertical orientation of the lift pins, limit the angle of the lift pins, and/or prevent the lift pins from unintentionally binding in a susceptor as the susceptor is raised and prevent the resulting uneven support of the substrate.
摘要翻译：衬底支撑方法和装置包括垂直对齐的提升销，其具有接合摩擦板和/或磁场的承载表面，以在衬垫提升期间保持提升销的垂直取向。在一些实施例中，可以替代地或另外地使用磁场和/或加权来控制提升销的垂直定向，限制提升销的角度和/或防止提升销在基座中无意地结合，因为感受器被升高并且防止由此产生的基板不均匀的支撑。

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