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1. 发明申请

US20120033214A1 Micro-optical Electromagnetic Radiation Diffraction Grating and Method for Manufacture 审中-公开
$Micro-optical Electromagnetic Radiation Diffraction Grating and Method for Manufacture$
标题翻译：微光电磁辐射衍射光栅及其制造方法
公开(公告)号：US20120033214A1
公开(公告)日：2012-02-09
申请号：US13207540
申请日：2011-08-11
申请人： Fabian Zimmer , Alexander Wolter , Harald Schenk
发明人： Fabian Zimmer , Alexander Wolter , Harald Schenk
IPC分类号： G01J3/45 , C23F1/02 , B05D3/02 , B05D3/06 , G02B5/18 , B05D5/06
CPC分类号： G02B5/1847 , G02B5/1861 , G02B26/0808
摘要： The invention relates to electromagnetic radiation microoptical diffraction gratings and to a method suitable for the manufacture thereof. The diffraction gratings in accordance with the invention can be used as microspectrometers in the form of scanning microgratings. The microgratings are provided with a surface structure and are able to be manufactured cost effectively and in high volumes. The surface structure is formed at a surface of a substrate and is formed from linear structural elements arranged substantially equidistantly and aligned substantially parallel to one another. At least part of the surface of the substrate and of the structural elements is coated with at least one further layer which forms a uniform sinusoidal surface contoured in a wave-shape (sinusoidal) manner and having alternating arranged wave peaks and wave troughs. A reflective layer can additionally be applied to increase the intensity of reflected radiation.
摘要翻译：本发明涉及电磁辐射微光衍射光栅及其制造方法。根据本发明的衍射光栅可以用作扫描微光学形式的微光谱仪。微型研磨机具有表面结构，并且能够以高成本且高成本地制造。表面结构形成在基板的表面，并且由基本上等距地布置并基本上彼此平行排列的线性结构元件形成。衬底表面和结构元件的至少一部分涂覆有至少一个另外的层，其形成具有波形（正弦）方式并且具有交替布置的波峰和波谷的均匀正弦曲面。另外可以应用反射层以增加反射辐射的强度。

2. 发明授权

US10591651B2 Micro-optical electromagnetic radiation diffraction grating and method for manufacture 有权
$Micro-optical electromagnetic radiation diffraction grating and method for manufacture$
公开(公告)号：US10591651B2
公开(公告)日：2020-03-17
申请号：US13207540
申请日：2011-08-11
申请人： Fabian Zimmer , Alexander Wolter , Harald Schenk
发明人： Fabian Zimmer , Alexander Wolter , Harald Schenk
IPC分类号： G02B5/18 , G02B26/08
摘要： The invention relates to electromagnetic radiation microoptical diffraction gratings and to a method suitable for the manufacture thereof. The diffraction gratings in accordance with the invention can be used as microspectrometers in the form of scanning microgratings. The microgratings are provided with a surface structure and are able to be manufactured cost effectively and in high volumes. The surface structure is formed at a surface of a substrate and is formed from linear structural elements arranged substantially equidistantly and aligned substantially parallel to one another. At least part of the surface of the substrate and of the structural elements is coated with at least one further layer which forms a uniform sinusoidal surface contoured in a wave-shape (sinusoidal) manner and having alternating arranged wave peaks and wave troughs. A reflective layer can additionally be applied to increase the intensity of reflected radiation.

3. 发明申请

US20090097087A1 MICROMECHANICAL SENSOR- OR ACTUATOR COMPONENT AND METHOD FOR THE PRODUCTION OF MICROMECHANICAL SENSOR- OR ACTUATOR COMPONENTS 审中-公开
标题翻译：微生物传感器或致动器部件及生产微机械传感器或致动器部件的方法
公开(公告)号：US20090097087A1
公开(公告)日：2009-04-16
申请号：US12251784
申请日：2008-10-15
申请人： Alexander Wolter , Thilo Sander , Harald Schenk
发明人： Alexander Wolter , Thilo Sander , Harald Schenk
IPC分类号： G02B26/00 , H01L21/50
CPC分类号： B81B7/0067 , B81B2203/0384 , Y10T29/49
摘要： The invention relates to a micromechanical sensor- or actuator component with an optical function and to a production method. A substrate thereby has electrodes and electrical contactings, an optical, electrically actuated element which can be deflected relative to the substrate. A transparent cover is likewise present. The object of the invention is to produce a micromechanical sensor- or actuator component with an optical function and a method for the production of such components with which to reduce or even avoid reflections which might impair the function of the micromechanical sensor- or actuator component. According to the invention, the optical main axis of the cover is thereby orientated non-perpendicular to the surface of the substrate.
摘要翻译：本发明涉及具有光学功能和生产方法的微机械传感器或致动器部件。因此，基板具有电极和电接触，光学电驱动元件可相对于基板偏转。透明盖同样存在。本发明的目的是制造具有光学功能的微机械传感器或致动器部件，以及用于生产这样的部件的方法，以减少甚至避免可能损害微机械传感器或致动器部件的功能的反射。根据本发明，盖的光学主轴由此定向成与基板的表面非垂直。

4. 发明授权

US07940439B2 Method for generating a micromechanical structure 有权
标题翻译：用于产生微机械结构的方法
公开(公告)号：US07940439B2
公开(公告)日：2011-05-10
申请号：US12058835
申请日：2008-03-31
申请人： Denis Jung , Christian Drabe , Thilo Sandner , Harald Schenk , Thomas Klose , Alexander Wolter
发明人： Denis Jung , Christian Drabe , Thilo Sandner , Harald Schenk , Thomas Klose , Alexander Wolter
IPC分类号： G02B26/08 , H01L21/46
CPC分类号： B81C1/00103 , B81B2203/0384 , B81B2203/04
摘要： In a method for manufacturing a micromechanical structure, first a two-dimensional structure is formed in a substrate. The two-dimensional structure is deflected from the substrate plane by action of force and fixed in the deflected state.
摘要翻译：在微机械结构的制造方法中，首先在基板上形成二维结构。二维结构通过力的作用从基板平面偏转并在偏转状态下固定。

5. 发明授权

US07932788B2 Oscillating, deflectable micromechanical element and method for use thereof 有权
标题翻译：摆动，可偏转微机械元件及其使用方法
公开(公告)号：US07932788B2
公开(公告)日：2011-04-26
申请号：US12298101
申请日：2006-04-24
申请人： Harald Schenk , Alexander Wolter , Thilo Sandner , Christian Drabe , Thomas Klose
发明人： Harald Schenk , Alexander Wolter , Thilo Sandner , Christian Drabe , Thomas Klose
IPC分类号： H03B5/18 , H01L27/14
CPC分类号： B81B3/0078 , B81B2201/042 , B81B2203/0109
摘要： The invention relates to micromechanical elements deflectable in an oscillating manner and to a method for the operation of such elements. In this respect, it is the object of the invention to be able to operate the micromechanical elements in a stable and simple manner on the oscillating deflection while taking account of the respective mechanical resonant frequency. A least one spring element is present on elements in accordance with the invention with which it is held. It is deflected between two reversal points using an electrical AC voltage. The one or more spring element(s) has/have non-linear spring characteristics so that a changed mechanical resonant frequency results in dependence on the respective deflection.
摘要翻译：本发明涉及以振荡方式可偏转的微机械元件以及用于操作这些元件的方法。在这方面，本发明的目的是能够以稳定和简单的方式在考虑到相应的机械共振频率的情况下在振荡偏转上操作微机械元件。在根据本发明的元件上存在至少一个弹簧元件，其被保持在其上。它使用电气交流电压在两个反转点之间偏转。一个或多个弹簧元件具有/具有非线性弹簧特性，使得改变的机械共振频率导致依赖于相应的偏转。

6. 发明申请

US20090302960A1 Oscillating, deflectable micromechanical element and method for use thereof 有权
标题翻译：摆动，可偏转微机械元件及其使用方法
公开(公告)号：US20090302960A1
公开(公告)日：2009-12-10
申请号：US12298101
申请日：2006-04-24
申请人： Harald Schenk , Alexander Wolter , Thilo Sandner , Christian Drabe , Thomas Klose
发明人： Harald Schenk , Alexander Wolter , Thilo Sandner , Christian Drabe , Thomas Klose
IPC分类号： H03B5/30
CPC分类号： B81B3/0078 , B81B2201/042 , B81B2203/0109
摘要： The invention relates to micromechanical elements deflectable in an oscillating manner and to a method for the operation of such elements. In this respect, it is the object of the invention to be able to operate the micromechanical elements in a stable and simple manner on the oscillating deflection while taking account of the respective mechanical resonant frequency. A least one spring element is present on elements in accordance with the invention with which it is held. It is deflected between two reversal points using an electrical AC voltage. The one or more spring element(s) has/have non-linear spring characteristics so that a changed mechanical resonant frequency results in dependence on the respective deflection.
摘要翻译：本发明涉及以振荡方式可偏转的微机械元件以及用于操作这些元件的方法。在这方面，本发明的目的是能够以稳定和简单的方式在考虑到相应的机械共振频率的情况下在振荡偏转上操作微机械元件。在根据本发明的元件上存在至少一个弹簧元件，其被保持在其上。它使用电气交流电压在两个反转点之间偏转。一个或多个弹簧元件具有/具有非线性弹簧特性，使得改变的机械共振频率导致依赖于相应的偏转。

7. 发明申请

US20080022771A1 MICROMECHANICAL COMPONENT 审中-公开
标题翻译：微生物组分
公开(公告)号：US20080022771A1
公开(公告)日：2008-01-31
申请号：US11782355
申请日：2007-07-24
申请人： Alexander Wolter , Harald Schenk
发明人： Alexander Wolter , Harald Schenk
IPC分类号： G01P15/02
CPC分类号： B81B3/0086 , B81B2203/0109 , B81B2203/0136
摘要： The invention relates to micromechanical components whose operating stability is increased with respect to known solutions. It can be a matter of sensors or also actuators in which a deflectable element can be deflected in at least one dimension.It is the object of the invention to provide micromechanical components which achieve an increased operating stability, in particular with increased electrical voltages and other external disturbances. In components in accordance with the invention, a deflectable element having at least one spring is held at a frame part. The deflectable element is electrically separated from the frame part by grooves and an electrical insulation. An electrical voltage can be applied between the deflectable element and the frame part for the deflection. Path limitation elements are moreover present between regions which are at the same electrical voltage potential or where a negligible current flow occurs on a touching contacting of such regions.
摘要翻译：本发明涉及相对于已知解决方案而言其操作稳定性增加的微机械部件。它可以是传感器或者其中可偏转元件可以在至少一个维度上偏转的致动器。本发明的目的是提供实现增加的操作稳定性的微机械组件，特别是在增加的电压和其它外部干扰的情况下。在根据本发明的部件中，具有至少一个弹簧的可偏转元件保持在框架部分。可偏转元件通过凹槽和电绝缘体与框架部分电隔离。可以在可偏转元件和框架部件之间施加电压用于偏转。此外，路径限制元件存在于具有相同电压电位的区域之间或者在这些区域的触摸接触处发生可忽略的电流流动。

8. 发明授权

US06843568B2 Projection apparatus 有权
标题翻译：投影仪
公开(公告)号：US06843568B2
公开(公告)日：2005-01-18
申请号：US10818462
申请日：2004-04-05
申请人： Harald Schenk , Alexander Wolter , Markus Schwarzenberg
发明人： Harald Schenk , Alexander Wolter , Markus Schwarzenberg
IPC分类号： G02B26/10 , G02B27/18 , H04N5/74 , G03B21/00 , G02B26/08 , G03B21/28
CPC分类号： G02B27/18 , G02B26/101 , G02B26/105 , H04N5/7416
摘要： The present invention is based on the finding that the previous column and row representation in the scanning image projection has to be given up, in order to enable that the ratio between row and column frequency or vertical and horizontal deflection frequency is not critical and may be decreased. An inventive projection apparatus for projecting an image on an image field includes a deflection means for deflecting a light beam about a first deflection axis at a first deflection frequency and about a second deflection axis at a second deflection frequency different from the first, in order to move the light beam across the image field, as well as a modulation means for modulating an intensity of the light beam depending on the image to be projected. The first and second deflection frequencies differ by less than an order of magnitude.
摘要翻译：本发明基于以下发现：必须放弃扫描图像投影中的先前的列和行表示，以便使得行和列频率或垂直和水平偏转频率之间的比率不是关键的，并且可以是减少。用于在图像场上投影图像的本发明的投影装置包括偏转装置，用于以与第一偏转频率不同的第二偏转频率以第一偏转频率和约第二偏转轴偏转第一偏转轴的光束，将光束移动到图像场上，以及用于根据要投影的图像来调制光束的强度的调制装置。第一和第二偏转频率的差异小于一个数量级。

9. 发明授权

US07951635B2 Method for the compensation of deviations occurring as a result of manufacture in the manufacture of micromechanical elements and their use 有权
标题翻译：用于补偿在微机械元件的制造中的制造产生的偏差及其用途的方法
公开(公告)号：US07951635B2
公开(公告)日：2011-05-31
申请号：US11850168
申请日：2007-09-05
申请人： Thomas Klose , Harald Schenk , Alexander Wolter
发明人： Thomas Klose , Harald Schenk , Alexander Wolter
IPC分类号： H01L21/00
CPC分类号： B81B3/0078 , B81B2201/042 , G02B26/0833
摘要： The invention relates to a method for the compensation of deviations occurring as a result of manufacture in the manufacture of micromechanical elements and their use which should be deflected at a resonant frequency. It is therefore the object of the invention to compensate deviations which occur due to manufacture and which have an influence on the resonant frequency of micromechanical elements in a simple and cost-effective manner. In accordance with the invention, a procedure is followed such that additional trenches and/or recesses are formed at the deflectable element simultaneously with the forming of the trenches by dry etching with which at least one spring element, a deflectable element and optionally also a frame element of micromechanical elements are formed. The trenches and recesses can thereby be formed under the same respective process parameters at the respective micromechanical element or at all micromechanical elements of a batch. A removal of material during etching, preferably dry etching, therefore takes place under the same etching conditions so that the respectively removed mass at trenches and/or recesses is influenced in the same manner by the etching process parameters.
摘要翻译：本发明涉及一种用于补偿在制造微机械元件时制造的偏差及其应以共振频率偏转的应用的补偿方法。因此，本发明的目的是以简单和成本有效的方式补偿由于制造而发生的偏差并且对微机械元件的谐振频率具有影响。根据本发明，遵循这样一个步骤，使得在可偏转元件上形成附加的沟槽和/或凹槽，同时通过干蚀刻形成沟槽，通过该干蚀刻，至少一个弹簧元件，可偏转元件和可选地还包括框架形成微机械元件元件。因此，可以在相应的微机械元件或批次的所有微机械元件的相同各自的工艺参数下形成沟槽和凹槽。因此，在相同的蚀刻条件下，在蚀刻期间去除材料，优选是干法蚀刻，以便通过蚀刻工艺参数以相同的方式影响在沟槽和/或凹槽处分别除去的物质。

10. 发明授权

US07847997B2 Projection apparatus for scanningly projection 有权
标题翻译：投影仪用于扫描投影
公开(公告)号：US07847997B2
公开(公告)日：2010-12-07
申请号：US12038112
申请日：2008-02-27
申请人： Thilo Sandner , Harald Schenk , Michael Scholles , Markus Schwarzenberg , Alexander Wolter
发明人： Thilo Sandner , Harald Schenk , Michael Scholles , Markus Schwarzenberg , Alexander Wolter
IPC分类号： G02B26/00
CPC分类号： G02B26/101 , H04N1/40037 , H04N9/3129 , H04N9/3155
摘要： A projection apparatus for scanningly projecting an image onto an image field by means of a radiation beam includes a modulator for modulating an intensity of the radiation beam such that the intensity of the radiation beam changes in a time interval during which a scan point to which the radiation beam is directed sweeps a pixel of the image field.
摘要翻译：用于通过辐射束将图像扫描地投影到图像场上的投影设备包括调制器，用于调制辐射束的强度，使得辐射束的强度在时间间隔内变化，在该时间间隔期间，辐射束被定向扫描图像场的像素。

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