会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明专利
    • MANUFACTURE OF FLEXIBLE DOUBLE-SIDED PRINTED CIRCUIT BOARD
    • JPH0287589A
    • 1990-03-28
    • JP23848988
    • 1988-09-22
    • FURUKAWA ELECTRIC CO LTD
    • KUMAZAWA KINYASEKI OSAMUSHIBUYA SEIJI
    • H05K3/06H05K3/00
    • PURPOSE:To provide a flexible double-sided printed circuit board having a large electric capacity without deteriorating adhesion or flexibility by bonding a metallic conductor foil on one side of a plastic film to provide a flexible single-sided printed circuit board, forming a metallic conductor film by a vapor deposition means on the side of the flexible single-sided printed circuit board having no metallic conductor film and further forming another metallic conductor film thereon by an electrochemical means. CONSTITUTION:A flexible single-sided printed circuit board 11 consists of a plastic film 12 and a metallic conductor foil 14 bonded to one side of the film 12 by means of an adhesive 13. On the other side of the plastic film 12, there is formed a metallic conductor film 15 having a thickness in the range of 0.1 to 0.5mum by means of a physical metal vapor deposition(PVD) means. For the PVD means, sputtering, ion plating, ion cluster beam, or the like is used. On the metallic conductor foil 15, there is formed a metallic conductor layer 16 having a thickness of 1 to 10mum by means of an electrochemical metal coating means. As a result, a flexible double-sided printed circuit board 17 is obtained. Power supplying or grounding circuit patterns 18 requiring a large current capacity are formed on the side that had the metallic conductor foil 14 while fine circuit patterns 19 associated with signals requiring a small current capacity are formed on the other side that had the metallic conductor layer 16.
    • 2. 发明专利
    • METAL-COATED PLASTIC FILM
    • JPH01195269A
    • 1989-08-07
    • JP1725388
    • 1988-01-29
    • FURUKAWA ELECTRIC CO LTD
    • KOMATSU MASAYAKUMAZAWA KINYAYAMANAKA NOBUMITSUSEKI OSAMU
    • C23C14/06C23C14/14C23C14/16C23C14/20
    • PURPOSE:To form a metallic film excellent in adhesive strength and oxidation resistance with high productivity by forming a thin metallic-film layer of the desired film thickness provided between the thin metallic-film layers formed by a sputtering method on the surface of a plastic film by a vacuum vapor deposition method. CONSTITUTION:A primary thin metallic-film layer 1 of Cu, etc., is directly formed on a plastic film 5 at least to 5Angstrom : film thickness, by a sputtering method. Subsequently, a thin metallic-film layer 2 of the desired film thickness is efficiently formed on the above primary thin metallic-film layer 1 by a vacuum vapor deposition method. Successively, a secondary thin metallic-film layer 3 of Cu, etc., of at least 50Angstrom film thickness is formed on the outermost surface of the above thin metallic-film layer 2 by a sputtering method. By this method, a metallic coating composed of a thin metallic-film 4 in which the adhesive strength of the thin metallic-film layer 2 to the plastic film 5 is improved by means of the above primary thin metallic-film layer 1 and also resistance to moisture and heat is improved by means of the above secondary thin metallic- film layer 3 can be formed.
    • 3. 发明专利
    • MANUFACTURE OF FLEXIBLE PRINTED SUBSTRATE
    • JPS6412596A
    • 1989-01-17
    • JP16841687
    • 1987-07-06
    • FURUKAWA ELECTRIC CO LTD
    • KUMAZAWA KINYAKOMATSU MASAYAYAMANAKA NOBUMITSU
    • H05K3/16
    • PURPOSE:To obtain a flexible substrate by a method wherein one or both surfaces of a plastic film are subjected to a low temperature plasma treatment in O2 or gas containing O2 and then a conductor thin film is formed by a sputtering method with a composite copper target containing 1-15wt.% of one of Ni, Cr, Ti, Al, Ag, Fe, Zn and Sn or alloy composed of two or more of them. CONSTITUTION:A plastic film such as a polyethylene terephthalate film is subjected to a low temperature plasma treatment in O2, CO2 or Ar or N2 containing O2 and the surface is subjected to a fine etching to clean and to form functional groups such as -CO, -COOH and -OH and the adhesiveness of the film surface is improved. Then a conductor thin film is formed by a sputtering method with a composite copper target containing 1-15wt.% of one of Ni, Cr, Ti, Al, Ag, Fe, Zn and Sn which are highly corrosion-resistant and form mixed crystal or eutectic easily or alloy composed of two or more of them, especially with a target thin film containing 5-10wt.% of Ni and Cr. With this constitution, a flexible substrate with excellent corrosion-resistant properties can be obtained without degrading other properties.