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    • 5. 发明申请
    • METHODS FOR MAKING VERTICAL ELECTRICAL FEED THROUGH STRUCTURES
    • 通过结构制作垂直电气进给的方法
    • WO2005055369A2
    • 2005-06-16
    • PCT/US2004/039394
    • 2004-11-22
    • FORMFACTOR, INC.MATHIEU, Gaetan, L.KHANDROS, Igor, K.REYNOLDS, Carl, V.
    • MATHIEU, Gaetan, L.KHANDROS, Igor, K.REYNOLDS, Carl, V.
    • H01R
    • H05K3/42G01R1/06711G01R1/07307G01R3/00H05K3/308H05K2201/09836H05K2203/0338
    • Methods are provided for making vertical feed through electrical connection structures in a substrate or tile. The vertical feed throughs can be configured to make plated through holes usable for inserting and attaching connector probes. . Probes may be attached to the plated through holes or attachment wells to create resilient spring contacts to form a wafer probe card assembly. A twisted tube plated through hole structure is formed by supporting twisted sacrificial wires coated with the plating material in a substrate, and later etching away the wires. Vertical feed throughs can also be configured to make tiles attachable and detachable as a layer between other substrates. The vertical feed through paths are formed with one end of each feed through hole permanently encapsulating a first electrical contact, and a second end supporting another pluggable and unpluggable electrical probe contact. Decoupling capacitors can be further plugged into holes formed in close proximity to the vertical feed through holes to increase performance of the decoupling capacitor.
    • 提供了用于通过基底或瓦片中的电连接结构进行垂直馈送的方法。 垂直进料通道可以配置为制造可用于插入和连接连接器探头的电镀通孔。 。 探针可以附着到电镀通孔或连接孔,以产生弹性弹簧触点,以形成晶片探针卡组件。 通过将涂覆有电镀材料的扭转牺牲线支撑在基板中,并且随后蚀刻掉线来形成扭曲管镀通孔结构。 垂直进料通道也可以被配置成使得瓦片可附着和分离成其它基底之间的层。 垂直进料通道形成有每个进料通孔的一端,其永久地密封第一电接触,第二端支撑另一可插拔和可拔出的电探针接触。 去耦电容器可以进一步插入靠近垂直馈通孔形成的孔中,以提高去耦电容的性能。