专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08658002B2 System for sputtering and method thereof 有权
标题翻译：溅射系统及其方法
公开(公告)号：US08658002B2
公开(公告)日：2014-02-25
申请号：US12911569
申请日：2010-10-25
申请人： Eu-Gene Kang , Won-Hyouk Jang
发明人： Eu-Gene Kang , Won-Hyouk Jang
IPC分类号： C23C14/34
CPC分类号： C23C14/34 , C23C14/545 , H01J37/32963 , H01J37/3299 , H01J37/34
摘要： A sputtering method includes receiving etch time information for a first substrate detected in a dry etching process, calculating a deposition time for a second substrate from the etch time information for the first substrate, and executing sputtering for the second substrate based the calculated deposition time. The thickness of the thin film deposited on the substrate in the sputter device may be uniformly maintained by using etch end point information detected in an end point detection (EPD) device. A sputtering system comprises a sputter device for executing a sputtering process for depositing a thin film on a substrate by a sputtering method, an EPD device for generating EPD information including etch time information for the substrate for a calculation of a deposition time during which the thin film is deposited, and a controller for calculating a deposition time by using the EPD information, and for controlling the sputter device based on the calculated deposition time.
摘要翻译：溅射方法包括接收在干蚀刻工艺中检测到的第一衬底的蚀刻时间信息，根据第一衬底的蚀刻时间信息计算第二衬底的沉积时间，以及基于计算的沉积时间执行第二衬底的溅射。可以通过使用在端点检测（EPD）装置中检测到的蚀刻终点信息，均匀地保持沉积在溅射装置中的基板上的薄膜的厚度。溅射系统包括用于执行用于通过溅射法在衬底上沉积薄膜的溅射工艺的溅射装置，用于产生EPD信息的EPD装置，包括用于计算沉积时间的衬底的蚀刻时间信息，以及用于通过使用EPD信息计算沉积时间的控制器，以及基于计算出的沉积时间来控制溅射装置。

2. 发明申请

US20110272275A1 System for Sputtering and Method Thereof 有权
标题翻译：溅射系统及其方法
公开(公告)号：US20110272275A1
公开(公告)日：2011-11-10
申请号：US12911569
申请日：2010-10-25
申请人： Eu-Gene Kang , Won-Hyouk Jang
发明人： Eu-Gene Kang , Won-Hyouk Jang
IPC分类号： C23C14/34
CPC分类号： C23C14/34 , C23C14/545 , H01J37/32963 , H01J37/3299 , H01J37/34
摘要： A sputtering method includes receiving etch time information for a first substrate detected in a dry etching process, calculating a deposition time for a second substrate from the etch time information for the first substrate, and executing sputtering for the second substrate based the calculated deposition time. The thickness of the thin film deposited on the substrate in the sputter device may be uniformly maintained by using etch end point information detected in an end point detection (EPD) device. A sputtering system comprises a sputter device for executing a sputtering process for depositing a thin film on a substrate by a sputtering method, an EPD device for generating EPD information including etch time information for the substrate for a calculation of a deposition time during which the thin film is deposited, and a controller for calculating a deposition time by using the EPD information, and for controlling the sputter device based on the calculated deposition time.
摘要翻译：溅射方法包括接收在干蚀刻工艺中检测到的第一衬底的蚀刻时间信息，根据第一衬底的蚀刻时间信息计算第二衬底的沉积时间，以及基于计算的沉积时间执行第二衬底的溅射。可以通过使用在端点检测（EPD）装置中检测到的蚀刻终点信息，均匀地保持沉积在溅射装置中的基板上的薄膜的厚度。溅射系统包括用于执行用于通过溅射法在衬底上沉积薄膜的溅射工艺的溅射装置，用于产生EPD信息的EPD装置，包括用于计算沉积时间的衬底的蚀刻时间信息，以及用于通过使用EPD信息计算沉积时间的控制器，以及基于计算出的沉积时间来控制溅射装置。

3. 发明授权

US08899174B2 Device and method for fabricating display device 有权
标题翻译：显示装置制造装置及方法
公开(公告)号：US08899174B2
公开(公告)日：2014-12-02
申请号：US12896496
申请日：2010-10-01
申请人： Won-Hyouk Jang , Eu-Gene Kang , Joo-Hwa Lee , Min-Jeong Hwang
发明人： Won-Hyouk Jang , Eu-Gene Kang , Joo-Hwa Lee , Min-Jeong Hwang
IPC分类号： C23C16/52 , C23C16/448 , C23C16/44 , C23C16/00 , B05C11/00
CPC分类号： C23C16/00 , B05C11/00 , C23C16/44 , C23C16/448 , C23C16/52
摘要： A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.
摘要翻译：一种用于制造显示装置的装置包括沉积源; 沉积厚度计算器，用于计算沉积在衬底上的沉积材料的沉积厚度; 以及控制器，用于通过比较用参考厚度计算的沉积厚度来控制加热沉积源的加热器的功率。控制器对于要沉积薄膜的每个衬底至少一次控制加热器的功率，或者在沉积材料沉积时以规则的间隔控制加热器的功率。包含在用于测量沉积速度的石英晶体传感器中的测量噪声的影响可以被最小化，并且可以减少有机发光材料的沉积厚度的分布，从而提高沉积工艺的产量并产生高质量的显示装置。

4. 发明申请

US20110189380A1 DEVICE AND METHOD FOR FABRICATING DISPLAY DEVICE 有权
标题翻译：用于制造显示装置的装置和方法
公开(公告)号：US20110189380A1
公开(公告)日：2011-08-04
申请号：US12896496
申请日：2010-10-01
申请人： Won-Hyouk Jang , Eu-Gene Kang , Joo-Hwa Lee , Min-Jeong Hwang
发明人： Won-Hyouk Jang , Eu-Gene Kang , Joo-Hwa Lee , Min-Jeong Hwang
IPC分类号： C23C16/52 , C23C16/00
CPC分类号： C23C16/00 , B05C11/00 , C23C16/44 , C23C16/448 , C23C16/52
摘要： A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.
摘要翻译：一种用于制造显示装置的装置包括沉积源; 沉积厚度计算器，用于计算沉积在基底上的沉积材料的沉积厚度; 以及控制器，用于通过比较用参考厚度计算的沉积厚度来控制加热沉积源的加热器的功率。控制器对于要沉积薄膜的每个衬底至少一次控制加热器的功率，或者在沉积材料沉积时以规则的间隔控制加热器的功率。包含在用于测量沉积速度的石英晶体传感器中的测量噪声的影响可以被最小化，并且可以减少有机发光材料的沉积厚度的分布，从而提高沉积工艺的产量并产生高质量的显示装置。

5. 发明申请

US20120000986A1 CANISTER FOR DEPOSITION APPARATUS AND DEPOSITION APPARATUS USING SAME 审中-公开
标题翻译：用于沉积装置和沉积装置的装置
公开(公告)号：US20120000986A1
公开(公告)日：2012-01-05
申请号：US13009279
申请日：2011-01-19
申请人： Min-Jae JEONG , Ki-Yong Lee , Jong-Won Hong , Heung-Yeol Na , Eu-Gene Kang , Seok-Rak Chang , Jin-Wook Seo , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo Soo , Byoung-Keon Park , Dong-Hyun Lee , Kil-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Ivan Maidanchuk , Jae-Wan Jung
发明人： Min-Jae JEONG , Ki-Yong Lee , Jong-Won Hong , Heung-Yeol Na , Eu-Gene Kang , Seok-Rak Chang , Jin-Wook Seo , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo Soo , Byoung-Keon Park , Dong-Hyun Lee , Kil-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Ivan Maidanchuk , Jae-Wan Jung
IPC分类号： F24D5/00
CPC分类号： C23C16/4481 , C23C16/45525 , C23C16/52
摘要： A canister for a deposition apparatus and a deposition apparatus using the same, and more particularly, a canister for a deposition apparatus that can provide a uniform amount of source material contained in a reaction gas supplied into a deposition chamber and improve safety in the supply of the source material, and a deposition apparatus using the canister. The deposition apparatus includes a deposition chamber; a canister supplying a reaction gas into the deposition chamber; and a carrier gas supplier for supplying a carrier gas into the canister, in which the canister includes a main body, a heating unit heating the main body and a temperature measuring unit disposed under the main body.
摘要翻译：一种用于沉积设备的罐和使用其的沉积设备，更具体地，涉及一种用于沉积设备的罐，其可以提供均匀量的源材料，所述源材料包含在供应到沉积室中的反应气体中，并且提高了供应源材料和使用该罐的沉积装置。沉积设备包括沉积室; 向所述沉积室供应反应气体的罐; 以及载体气体供给器，用于将载气供应到罐中，其中罐包括主体，加热单元加热主体，温度测量单元设置在主体下方。

6. 发明申请

US20100224883A1 THIN FILM TRANSISTOR, METHOD OF FABRICATING THE SAME, AND ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE INCLUDING THE SAME 审中-公开
标题翻译：薄膜晶体管，其制造方法以及包括其的有机发光二极管显示装置
公开(公告)号：US20100224883A1
公开(公告)日：2010-09-09
申请号：US12714201
申请日：2010-02-26
申请人： Byoung-Keon PARK , Tae-Hoo Yang , Jin-Wook Seo , Ki-Yong Lee , Maxim Lisachenko , Bo-Kyung Choi , Dae-Woo Lee , Kil-Won Lee , Dong-Hyun Lee , Jong-Ryuk Park , Ji-Su Ahn , Yong-Dae Kim , Heung-Yeol Na , Min-Jae Jeong , Yun-Mo Chung , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Jae-Wan Jung , Sang-Yon Yoon
发明人： Byoung-Keon PARK , Tae-Hoo Yang , Jin-Wook Seo , Ki-Yong Lee , Maxim Lisachenko , Bo-Kyung Choi , Dae-Woo Lee , Kil-Won Lee , Dong-Hyun Lee , Jong-Ryuk Park , Ji-Su Ahn , Yong-Dae Kim , Heung-Yeol Na , Min-Jae Jeong , Yun-Mo Chung , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Jae-Wan Jung , Sang-Yon Yoon
IPC分类号： H01L33/16 , H01L29/786 , H01L21/336 , H01L21/20
CPC分类号： H01L29/6675 , H01L21/02422 , H01L21/02488 , H01L21/02532 , H01L21/02667 , H01L21/02672 , H01L27/1277 , H01L29/66757 , H01L29/66765 , H01L29/78696
摘要： A thin film transistor (TFT) and an organic light emitting diode (OLED) display device. The TFT and the OLED display device include a substrate, a buffer layer disposed on the substrate, a semiconductor layer disposed on the buffer layer, a gate electrode insulated from the semiconductor layer, a gate insulating layer insulating the semiconductor layer from the gate electrode, and source and drain electrodes insulated from the gate electrode and partially connected to the semiconductor layer, wherein the semiconductor layer is formed from a polycrystalline silicon layer crystallized by a metal catalyst and the metal catalyst is removed by gettering using an etchant. In addition, the OLED display device includes an insulating layer disposed on the entire surface of the substrate, a first electrode disposed on the insulating layer and electrically connected to one of the source and drain electrodes, an organic layer, and a second electrode.
摘要翻译：薄膜晶体管（TFT）和有机发光二极管（OLED）显示装置。 TFT和OLED显示装置包括基板，设置在基板上的缓冲层，设置在缓冲层上的半导体层，与半导体层绝缘的栅电极，将半导体层与栅电极绝缘的栅极绝缘层，以及与栅电极绝缘并且部分地连接到半导体层的源电极和漏电极，其中半导体层由通过金属催化剂结晶的多晶硅层形成，并且使用蚀刻剂通过吸气除去金属催化剂。此外，OLED显示装置包括设置在基板的整个表面上的绝缘层，设置在绝缘层上并电连接到源极和漏极之一的第一电极，有机层和第二电极。

7. 发明授权

US08882976B2 Magnetron unit moving apparatus for preventing magnetization and magnetron sputtering equipment having the same 有权
标题翻译：用于防止磁化的磁控管单元移动装置和具有该磁控管的磁控溅射设备
公开(公告)号：US08882976B2
公开(公告)日：2014-11-11
申请号：US12481166
申请日：2009-06-09
申请人： Yun-Mo Chung , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Heung-Yeol Na , Ki-Yong Lee
发明人： Yun-Mo Chung , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Heung-Yeol Na , Ki-Yong Lee
IPC分类号： C25B9/00 , C25B11/00 , C25B13/00 , C23C14/00 , H01J37/34 , C23C14/35 , C23C14/54
CPC分类号： C23C14/54 , C23C14/35 , H01J37/3408 , H01J37/3455
摘要： A magnetron unit moving apparatus for preventing magnetization and magnetron sputtering equipment having the same. The magnetron unit moving apparatus includes a magnetron unit disposed adjacent to a target, to generate a specific magnetic field, and a movement unit to space the magnetron unit and the target apart such that a strength of a magnetic field generated over the target is within a predetermined reference strength range. It is possible to space the target and the magnetron unit apart so as to prevent the target from being magnetized when a process is not performed.
摘要翻译：一种用于防止磁化的磁控管单元移动装置和具有该磁控管的移动装置。磁控管单元移动装置包括邻近目标设置的磁控管单元，以产生特定的磁场;以及移动单元，用于将磁控管单元和目标物间隔开，使得在目标上产生的磁场的强度在预定参考强度范围。可以将目标和磁控管单元分开，以便在不执行处理时防止目标被磁化。

8. 发明申请

US20110100973A1 APPARATUS FOR THERMALLY PROCESSING SUBSTRATE 有权
标题翻译：用于热处理基板的装置
公开(公告)号：US20110100973A1
公开(公告)日：2011-05-05
申请号：US12713982
申请日：2010-02-26
申请人： Heung-Yeol NA , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Ki-Yong Lee , Jin-Wook Seo , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo So , Byoung-Keon Park , Dong-Hyun Lee , Kil-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Ivan Maidanchuk , Jae-Wan Jung
发明人： Heung-Yeol NA , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Ki-Yong Lee , Jin-Wook Seo , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo So , Byoung-Keon Park , Dong-Hyun Lee , Kil-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Ivan Maidanchuk , Jae-Wan Jung
IPC分类号： F27D11/02
CPC分类号： F27B17/0025 , H01L21/67109
摘要： An apparatus for thermally processing a plurality of substrates including a process chamber into which a boat having a plurality of substrates stacked thereon is loaded, and a heater chamber separate from the process chamber and having a plurality of heaters to apply heat to the process chamber. Here, the heaters are installed to correspond to all sides of the plurality of substrates. Therefore, it is possible to minimize a temperature distribution in the process chamber and uniformly supply heat to the entire region of the plurality of substrates.
摘要翻译：一种用于热加工多个基板的装置，包括处理室，其中堆叠有多个基板的船只装载在该处理室中;以及加热器室，与处理室分离并具有多个加热器以向处理室施加热量。这里，加热器安装成对应于多个基板的所有侧面。因此，可以使处理室中的温度分布最小化并且均匀地向多个基板的整个区域供给热量。

9. 发明申请

US20100006423A1 MAGNETIC FIELD GENERATION CONTROL UNIT AND MAGNETRON SPUTTERING APPARATUS AND METHOD USING THE SAME 审中-公开
标题翻译：磁场发生控制单元和磁控溅射装置及其使用方法
公开(公告)号：US20100006423A1
公开(公告)日：2010-01-14
申请号：US12481239
申请日：2009-06-09
申请人： Yun-Mo CHUNG , Ki-Yong Lee , Min-Jae Jeong , Heung-Yeol Na , Jong-Won Hong , Eu-Gene Kang
发明人： Yun-Mo CHUNG , Ki-Yong Lee , Min-Jae Jeong , Heung-Yeol Na , Jong-Won Hong , Eu-Gene Kang
IPC分类号： C23C14/35
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3458 , H01J37/3482
摘要： A magnetic field generation control unit and a magnetron sputtering apparatus and method using the magnetic field generation control circuit. The magnetic field generation control unit includes a magnetic field generator for providing a specific magnetic field to a target consisting of a metal material to be deposited on a substrate, and a magnetic field generator control module electrically connected with the magnetic field generator, receiving an electrical signal from outside, and selectively supplying a current capable of generating the magnetic field to the magnetic field generator. The target is prevented from being magnetized when a sputtering process is not performed, and the magnetic field is generated from the target when the process is performed. Consequently, it is possible to perform uniform deposition on the substrate.
摘要翻译：磁场发生控制单元和使用磁场发生控制电路的磁控管溅射装置和方法。磁场产生控制单元包括：磁场发生器，用于向由沉积在基板上的金属材料组成的靶提供特定的磁场;以及与该磁场发生器电连接的磁场发生器控制模块，信号，并且选择性地向磁场发生器提供能够产生磁场的电流。当不执行溅射处理时，防止目标被磁化，并且当执行处理时从目标产生磁场。因此，可以在基板上均匀地沉积。

10. 发明授权

US08373097B2 Apparatus for thermally processing substrate 有权
标题翻译：用于热处理衬底的装置
公开(公告)号：US08373097B2
公开(公告)日：2013-02-12
申请号：US12713982
申请日：2010-02-26
申请人： Heung-Yeol Na , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Ki-Yong Lee , Jin-Wook Seo , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo So , Byoung-Keon Park , Dong-Hyun Lee , Kil-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Ivan Maidanchuk , Jae-Wan Jung
发明人： Heung-Yeol Na , Min-Jae Jeong , Jong-Won Hong , Eu-Gene Kang , Seok-Rak Chang , Ki-Yong Lee , Jin-Wook Seo , Tae-Hoon Yang , Yun-Mo Chung , Byung-Soo So , Byoung-Keon Park , Dong-Hyun Lee , Kil-Won Lee , Won-Bong Baek , Jong-Ryuk Park , Bo-Kyung Choi , Ivan Maidanchuk , Jae-Wan Jung
IPC分类号： F27D11/00 , A21B1/00 , A21B1/22
CPC分类号： F27B17/0025 , H01L21/67109
摘要： An apparatus for thermally processing a plurality of substrates including a process chamber into which a boat having a plurality of substrates stacked thereon is loaded, and a heater chamber separate from the process chamber and having a plurality of heaters to apply heat to the process chamber. Here, the heaters are installed to correspond to all sides of the plurality of substrates. Therefore, it is possible to minimize a temperature distribution in the process chamber and uniformly supply heat to the entire region of the plurality of substrates.
摘要翻译：一种用于热加工多个基板的装置，包括处理室，其中堆叠有多个基板的船只装载在该处理室中;以及加热器室，与处理室分离并具有多个加热器以向处理室施加热量。这里，加热器安装成对应于多个基板的所有侧面。因此，可以使处理室中的温度分布最小化并且均匀地向多个基板的整个区域供给热量。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式