专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060030064A1 Method and apparatus for addressing thickness variations of a trench floor formed in a semiconductor substrate 有权
标题翻译：用于解决在半导体衬底中形成的沟槽底板的厚度变化的方法和装置
公开(公告)号：US20060030064A1
公开(公告)日：2006-02-09
申请号：US11031423
申请日：2005-01-07
申请人： Erwan Roy , Patricia Coupanec , Theodore Lundquist , William Thompson , Mark Thompson , Lokesh Johri
发明人： Erwan Roy , Patricia Coupanec , Theodore Lundquist , William Thompson , Mark Thompson , Lokesh Johri
IPC分类号： H01L21/00
CPC分类号： H01L22/12
摘要： A method for utilizing interference fringe patterns generated when milling a trench through a semiconductor substrate by a method such as FIB milling, to determine and optimize the thickness uniformity of the trench bottom. The interference fringes may be mapped and the mapping used to direct the FIB milling to those regions which are thicker to correct observed non-uniformities in the trench floor thickness by varying the pixel dwell time across the milled area. The interference fringe mapping may be used to develop computerized contour lines to automate the pixel dwell time variations as described above, for correcting non-uniformities in the trench floor thickness. The method may be applied to applications other than trench formation for backside editing, such as monitoring progress in forming a milled object.
摘要翻译：一种利用通过诸如FIB铣削的方法在通过半导体衬底铣削沟槽时产生的干涉条纹图案的方法，以确定和优化沟槽底部的厚度均匀性。可以映射干涉条纹，并且映射用于将FIB铣削引导到那些较厚的区域，以通过改变铣削区域上的像素停留时间来修正沟槽底板厚度中观察到的不均匀性。如上所述，干涉条纹映射可用于开发计算机化轮廓线以自动化像素驻留时间变化，以校正沟槽底板厚度中的不均匀性。该方法可以应用于除了用于背面编辑的沟槽形成之外的应用，例如监测形成铣削对象的进展情况。

2. 发明申请

US20060261043A1 Apparatus and method for circuit operation definition 有权
公开(公告)号：US20060261043A1
公开(公告)日：2006-11-23
申请号：US11363787
申请日：2006-02-27
申请人： Martin Betz , Lokesh Johri , Rajesh Jain , Theodore Lundquist , Tamal Basu , Saurabh Gupta , Jagadish Narayana Gade
发明人： Martin Betz , Lokesh Johri , Rajesh Jain , Theodore Lundquist , Tamal Basu , Saurabh Gupta , Jagadish Narayana Gade
IPC分类号： H01H33/14
CPC分类号： G06F17/5068
摘要： A method and apparatus for defining a circuit operation, such as a charged particle beam operation to perform a circuit edit and define a probe point. Circuit operation definition is performed in a front-end environment with access to integrated circuit computer aided design tools providing logic level and layout level information concerning the integrated circuit. The front-end environment incorporates circuit operation optimization methods to identify optimal locations for a circuit operation. A back-end environment, such as a charged particle tool computing platform, is adapted to receive one or more files, which may include a truncated layout file with circuit operation location information, for use in further defining a circuit operation and/or performing the circuit operation.

3. 发明申请

US20060043312A1 Enhanced scanning control of charged particle beam systems 有权
标题翻译：增强扫描控制带电粒子束系统
公开(公告)号：US20060043312A1
公开(公告)日：2006-03-02
申请号：US10931321
申请日：2004-08-31
申请人： James Siebert , Lokesh Johri , Dennis McCarty , Simon Voong , Madhumita Sengupta , Hui Wang
发明人： James Siebert , Lokesh Johri , Dennis McCarty , Simon Voong , Madhumita Sengupta , Hui Wang
IPC分类号： H01J37/147
CPC分类号： H01J37/3023 , H01J2237/30483 , H01J2237/31737 , H01J2237/31749
摘要： A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam generation unit, such as a focused ion beam (FIB) column, which emits a charged particle beam onto the DUT. Also included is a scan controller arrangement implementing a finite state machine to control the application of the charged particle beam onto the DUT according to a plurality of scanning control parameters. The scanning control parameters may describe one or more scan regions that are rectangular in shape. Further, the parameters may describe one or more scan regions describing other shapes by way of a bit-map. Similarly, a method for controlling the scanning of a charged particle beam that involves obtaining a set of scanning control parameters, and then directing the charged particle beam as specified by the scanning control parameters by way of a finite state machine, is disclosed.
摘要翻译：一种能够成像并可能编辑被测器件（DUT）的带电粒子束系统和扫描控制方法。带电粒子束系统包含带电粒子束产生单元，例如聚焦离子束（FIB）柱，其将带电粒子束发射到DUT上。还包括扫描控制器装置，其实现有限状态机以根据多个扫描控制参数来控制将带电粒子束应用到DUT上。扫描控制参数可以描述形状为矩形的一个或多个扫描区域。此外，参数可以描述通过位图描述其它形状的一个或多个扫描区域。类似地，公开了一种用于控制带电粒子束的扫描的方法，该方法包括获得一组扫描控制参数，然后通过有限状态机指定由扫描控制参数指定的带电粒子束。

4. 发明授权

US07711524B2 Estimating boundaries of Schmoo plots 有权
标题翻译：估计Schmoo地块的边界
公开(公告)号：US07711524B2
公开(公告)日：2010-05-04
申请号：US11311025
申请日：2005-12-19
申请人： Lokesh Johri , Kaushik Ghosh , Ben Rogel-Favila
发明人： Lokesh Johri , Kaushik Ghosh , Ben Rogel-Favila
IPC分类号： G06F15/00
CPC分类号： G01R31/31711 , G11C29/56008
摘要： A method and system generate a boundary of a Schmoo plot. In accord with the method, a plurality of seed points having a resolution that is less than or equal to ½ the acquisition resolution indicated by a smoothness of a representative Schmoo boundary are selected. A coarse boundary search is performed to identify a plurality of test points that are within an acquisition resolution of the boundary. The test points that comprise the coarse boundary are interpolated to produce a fine estimate of the boundary.
摘要翻译：一种方法和系统产生Schmoo图的边界。根据该方法，选择具有小于或等于由代表性Schmoo边界的平滑度指示的获取分辨率的1/2的分辨率的多个种子点。执行粗边界搜索以识别在边界的获取分辨率内的多个测试点。构成粗略边界的测试点进行内插，以产生边界的精细估计。

5. 发明申请

US20070156352A1 Estimating boundaries of schmoo plots 有权
标题翻译：估计schmoo地块的边界
公开(公告)号：US20070156352A1
公开(公告)日：2007-07-05
申请号：US11311025
申请日：2005-12-19
申请人： Lokesh Johri , Kaushik Ghosh , Ben Rogel-Favila
发明人： Lokesh Johri , Kaushik Ghosh , Ben Rogel-Favila
IPC分类号： G01B5/28
CPC分类号： G01R31/31711 , G11C29/56008
摘要： A method and system generate a boundary of a Schmoo plot, comprising selecting a plurality of seed points having a resolution that is less than or equal to ½ the acquisition resolution indicated by a smoothness of a representative Schmoo boundary, performing a coarse boundary search to identify a plurality of test points that are within an acquisition resolution of the boundary, and interpolating the test points that comprise the coarse boundary to produce a fine estimate of the boundary.
摘要翻译：一种方法和系统产生Schmoo图的边界，包括选择具有小于或等于由代表性Schmoo边界的平滑度指示的获取分辨率的1/2的分辨率的多个种子点，执行粗略边界搜索以识别在边界的获取分辨率内的多个测试点，以及内插包含粗略边界的测试点，以产生边界的精确估计。

6. 发明授权

US07230240B2 Enhanced scanning control of charged particle beam systems 有权
标题翻译：增强扫描控制带电粒子束系统
公开(公告)号：US07230240B2
公开(公告)日：2007-06-12
申请号：US10931321
申请日：2004-08-31
申请人： James Siebert , Lokesh Johri , Dennis McCarty , Simon Voong , Madhumita Sengupta , Hui Wang
发明人： James Siebert , Lokesh Johri , Dennis McCarty , Simon Voong , Madhumita Sengupta , Hui Wang
IPC分类号： H01J37/147 , H01J37/256
CPC分类号： H01J37/3023 , H01J2237/30483 , H01J2237/31737 , H01J2237/31749
摘要： A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam generation unit, such as a focused ion beam (FIB) column, which emits a charged particle beam onto the DUT. Also included is a scan controller arrangement implementing a finite state machine to control the application of the charged particle beam onto the DUT according to a plurality of scanning control parameters. The scanning control parameters may describe one or more scan regions that are rectangular in shape. Further, the parameters may describe one or more scan regions describing other shapes by way of a bit-map. Similarly, a method for controlling the scanning of a charged particle beam that involves obtaining a set of scanning control parameters, and then directing the charged particle beam as specified by the scanning control parameters by way of a finite state machine, is disclosed.
摘要翻译：一种能够成像并可能编辑被测器件（DUT）的带电粒子束系统和扫描控制方法。带电粒子束系统包含带电粒子束产生单元，例如聚焦离子束（FIB）柱，其将带电粒子束发射到DUT上。还包括扫描控制器装置，其实现有限状态机以根据多个扫描控制参数来控制将带电粒子束应用到DUT上。扫描控制参数可以描述形状为矩形的一个或多个扫描区域。此外，参数可以描述通过位图描述其它形状的一个或多个扫描区域。类似地，公开了一种用于控制带电粒子束的扫描的方法，该方法包括获得一组扫描控制参数，然后通过有限状态机指定由扫描控制参数指定的带电粒子束。

7. 发明授权

US08990181B2 Method and system for transferring data between a host device and an external device 有权
标题翻译：用于在主机设备和外部设备之间传输数据的方法和系统
公开(公告)号：US08990181B2
公开(公告)日：2015-03-24
申请号：US12884154
申请日：2010-09-16
申请人： Lokesh Johri , Sasikala Divakaruni , Andrew Bartlett , Richard W. Holbrook
发明人： Lokesh Johri , Sasikala Divakaruni , Andrew Bartlett , Richard W. Holbrook
IPC分类号： G06F17/30
CPC分类号： G06F17/30091 , G06F17/30241
摘要： A method for transferring data between a host device and an external device is described. The external device has FAT32 file system. The method accepts parameters for an incoming data file from the host device. Further, the method allocates memory blocks for the incoming file data on the external device based on the parameters and indexes the allocated memory blocks on a memory index table to create a file footprint. The method reads the memory index table to identify the file footprint and receives the incoming file data from the host device.
摘要翻译：描述了在主机设备和外部设备之间传送数据的方法。外部设备具有FAT32文件系统。该方法接受来自主机设备的传入数据文件的参数。此外，该方法基于参数为外部设备上的传入文件数据分配内存块，并对存储器索引表上分配的存储块进行索引以创建文件占用。该方法读取内存索引表以识别文件占用空间，并从主机设备接收传入的文件数据。

8. 发明授权

US07530034B2 Apparatus and method for circuit operation definition 有权
标题翻译：电路操作定义的装置和方法
公开(公告)号：US07530034B2
公开(公告)日：2009-05-05
申请号：US11363787
申请日：2006-02-27
申请人： Martin Betz , Lokesh Johri , Rajesh Jain , Theodore R. Lundquist , Tamal Basu , Saurabh Gupta , Jagadish Narayana Gade
发明人： Martin Betz , Lokesh Johri , Rajesh Jain , Theodore R. Lundquist , Tamal Basu , Saurabh Gupta , Jagadish Narayana Gade
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A method and apparatus for defining a circuit operation, such as a charged particle beam operation to perform a circuit edit and define a probe point. Circuit operation definition is performed in a front-end environment with access to integrated circuit computer aided design tools providing logic level and layout level information concerning the integrated circuit. The front-end environment incorporates circuit operation optimization methods to identify optimal locations for a circuit operation. A back-end environment, such as a charged particle tool computing platform, is adapted to receive one or more files, which may include a truncated layout file with circuit operation location information, for use in further defining a circuit operation and/or performing the circuit operation.
摘要翻译：一种用于定义电路操作的方法和装置，例如带电粒子束操作以执行电路编辑并定义探测点。电路操作定义在前端环境中执行，可访问集成电路计算机辅助设计工具，提供有关集成电路的逻辑电平和布局级信息。前端环境包含电路操作优化方法，以确定电路操作的最佳位置。诸如带电粒子工具计算平台的后端环境适于接收一个或多个文件，其可以包括具有电路操作位置信息的截断的布局文件，以用于进一步定义电路操作和/或执行电路操作。

9. 发明授权

US07115426B2 Method and apparatus for addressing thickness variations of a trench floor formed in a semiconductor substrate 有权
公开(公告)号：US07115426B2
公开(公告)日：2006-10-03
申请号：US11031423
申请日：2005-01-07
申请人： Erwan Le Roy , Patricia Le Coupanec , Theodore R. Lundquist , William B. Thompson , Mark A. Thompson , Lokesh Johri
发明人： Erwan Le Roy , Patricia Le Coupanec , Theodore R. Lundquist , William B. Thompson , Mark A. Thompson , Lokesh Johri
IPC分类号： H01L21/66
CPC分类号： H01L22/12
摘要： A method for utilizing interference fringe patterns generated when milling a trench through a semiconductor substrate by a method such as FIB milling, to determine and optimize the thickness uniformity of the trench bottom. The interference fringes may be mapped and the mapping used to direct the FIB milling to those regions which are thicker to correct observed non-uniformities in the trench floor thickness by varying the pixel dwell time across the milled area. The interference fringe mapping may be used to develop computerized contour lines to automate the pixel dwell time variations as described above, for correcting non-uniformities in the trench floor thickness. The method may be applied to applications other than trench formation for backside editing, such as monitoring progress in forming a milled object.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式