会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • Enhanced scanning control of charged particle beam systems
    • 增强扫描控制带电粒子束系统
    • US20060043312A1
    • 2006-03-02
    • US10931321
    • 2004-08-31
    • James SiebertLokesh JohriDennis McCartySimon VoongMadhumita SenguptaHui Wang
    • James SiebertLokesh JohriDennis McCartySimon VoongMadhumita SenguptaHui Wang
    • H01J37/147
    • H01J37/3023H01J2237/30483H01J2237/31737H01J2237/31749
    • A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam generation unit, such as a focused ion beam (FIB) column, which emits a charged particle beam onto the DUT. Also included is a scan controller arrangement implementing a finite state machine to control the application of the charged particle beam onto the DUT according to a plurality of scanning control parameters. The scanning control parameters may describe one or more scan regions that are rectangular in shape. Further, the parameters may describe one or more scan regions describing other shapes by way of a bit-map. Similarly, a method for controlling the scanning of a charged particle beam that involves obtaining a set of scanning control parameters, and then directing the charged particle beam as specified by the scanning control parameters by way of a finite state machine, is disclosed.
    • 一种能够成像并可能编辑被测器件(DUT)的带电粒子束系统和扫描控制方法。 带电粒子束系统包含带电粒子束产生单元,例如聚焦离子束(FIB)柱,其将带电粒子束发射到DUT上。 还包括扫描控制器装置,其实现有限状态机以根据多个扫描控制参数来控制将带电粒子束应用到DUT上。 扫描控制参数可以描述形状为矩形的一个或多个扫描区域。 此外,参数可以描述通过位图描述其它形状的一个或多个扫描区域。 类似地,公开了一种用于控制带电粒子束的扫描的方法,该方法包括获得一组扫描控制参数,然后通过有限状态机指定由扫描控制参数指定的带电粒子束。
    • 2. 发明授权
    • Enhanced scanning control of charged particle beam systems
    • 增强扫描控制带电粒子束系统
    • US07230240B2
    • 2007-06-12
    • US10931321
    • 2004-08-31
    • James SiebertLokesh JohriDennis McCartySimon VoongMadhumita SenguptaHui Wang
    • James SiebertLokesh JohriDennis McCartySimon VoongMadhumita SenguptaHui Wang
    • H01J37/147H01J37/256
    • H01J37/3023H01J2237/30483H01J2237/31737H01J2237/31749
    • A charged particle beam system and scanning control method capable of imaging, and possibly editing, a device under test (DUT). The charged particle beam system contains a charged particle beam generation unit, such as a focused ion beam (FIB) column, which emits a charged particle beam onto the DUT. Also included is a scan controller arrangement implementing a finite state machine to control the application of the charged particle beam onto the DUT according to a plurality of scanning control parameters. The scanning control parameters may describe one or more scan regions that are rectangular in shape. Further, the parameters may describe one or more scan regions describing other shapes by way of a bit-map. Similarly, a method for controlling the scanning of a charged particle beam that involves obtaining a set of scanning control parameters, and then directing the charged particle beam as specified by the scanning control parameters by way of a finite state machine, is disclosed.
    • 一种能够成像并可能编辑被测器件(DUT)的带电粒子束系统和扫描控制方法。 带电粒子束系统包含带电粒子束产生单元,例如聚焦离子束(FIB)柱,其将带电粒子束发射到DUT上。 还包括扫描控制器装置,其实现有限状态机以根据多个扫描控制参数来控制将带电粒子束应用到DUT上。 扫描控制参数可以描述形状为矩形的一个或多个扫描区域。 此外,参数可以描述通过位图描述其它形状的一个或多个扫描区域。 类似地,公开了一种用于控制带电粒子束的扫描的方法,该方法包括获得一组扫描控制参数,然后通过有限状态机指定由扫描控制参数指定的带电粒子束。
    • 10. 发明授权
    • Vacuum chuck
    • 真空吸盘
    • US09558985B2
    • 2017-01-31
    • US14389192
    • 2012-03-28
    • Jian WangYinuo JinYong ShaoHui Wang
    • Jian WangYinuo JinYong ShaoHui Wang
    • B23B31/30H01L21/683B25B11/00
    • H01L21/6838B23B31/307B25B11/005H01L2221/683Y10T279/11
    • A vacuum chuck is disclosed for holding and positioning wafers more stably and securely. The vacuum chuck includes a supporting assembly having a receiving groove and at least one first vacuum aperture defined in the receiving groove. A seal unit includes a seal ring bulging to form a vacuum trough. The seal ring is fixed in the receiving groove of the supporting assembly and has at least one second vacuum aperture communicating with the first vacuum aperture. A chuck connector fastened with the supporting assembly has at least one vacuum port and at least one vacuum orifice communicating with the vacuum port. At least one vacuum hose connects the first vacuum aperture, the second vacuum aperture with the vacuum orifice and the vacuum port of the chuck connector for evacuating the air of the vacuum trough to hold and position the wafer on the seal ring and the supporting assembly.
    • 公开了用于更稳定和可靠地保持和定位晶片的真空卡盘。 真空吸盘包括支撑组件,其具有容纳凹槽和限定在容纳凹槽中的至少一个第一真空孔。 密封单元包括凸起形成真空槽的密封环。 密封环固定在支撑组件的接收槽中,并且具有与第一真空孔连通的至少一个第二真空孔。 紧固有支撑组件的卡盘连接器具有至少一个真空口和至少一个与真空口连通的真空孔。 至少一个真空软管将第一真空孔,第二真空孔与真空孔连接,并且夹持连接器的真空端口用于抽空真空槽的空气,以将晶片保持并定位在密封环和支撑组件上。