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1. 发明授权

US6047116A Method for generating exposure data for lithographic apparatus 失效
标题翻译：用于生成光刻设备的曝光数据的方法
公开(公告)号：US6047116A
公开(公告)日：2000-04-04
申请号：US40343
申请日：1998-03-18
申请人： Eiji Murakami , Hitoshi Higurashi , Shigehiro Hara , Kiyomi Koyama , Takayuki Abe
发明人： Eiji Murakami , Hitoshi Higurashi , Shigehiro Hara , Kiyomi Koyama , Takayuki Abe
IPC分类号： G03F1/20 , G03F1/68 , H01J37/302 , H01L21/027 , G06F17/50
CPC分类号： H01J37/3026 , H01J2237/31764
摘要： In a method of generating from design data the exposure data necessary for a multistage-deflection charged beam exposure device that has a main deflector and a sub-deflector and forms a pattern, before a shape larger than the size of a minimum subfield area is divided during the generation of subfield exposure data, the process of dividing the shape into shapes equal to or smaller than the size of a subfield area and restructuring the shape is performed. Moreover, after the overlapping cell arrays in the design data are changed into a cell array structure preventing the cell arrays from overlapping, the resulting cell arrays are subjected to a hierarchical shape data operation process and a formatting process, including compression, subfield division, and frame division. This makes it possible to reduce the amount of data supplied without increasing the time required to converting the design data into exposure data supplied to the charged beam exposure device.
摘要翻译：在从设计数据生成的方法中，在具有主偏转器和副偏转器并形成图案的多级偏转带电束曝光装置所需的曝光数据在大于最小子场区域的尺寸的形状之前被划分在产生子场曝光数据期间，执行将形状分割成等于或小于子场区域的尺寸并重构形状的形状的处理。此外，在将设计数据中的重叠单元阵列改变为防止单元阵列重叠的单元阵列结构之后，对所得单元阵列进行分层形状数据操作处理和格式化处理，包括压缩，子场划分和框架划分。这使得可以减少提供的数据量，而不需要将设计数据转换成提供给带电束的曝光装置的曝光数据所需的时间。

2. 发明授权

US06566662B1 Charged beam exposure system 有权
标题翻译：充电束曝光系统
公开(公告)号：US06566662B1
公开(公告)日：2003-05-20
申请号：US09343508
申请日：1999-06-30
申请人： Eiji Murakami , Shigehiro Hara , Hitoshi Higurashi
发明人： Eiji Murakami , Shigehiro Hara , Hitoshi Higurashi
IPC分类号： H01J3700
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/304 , H01J2237/31766
摘要： A charged beam exposure system has a movable stage for supporting a specimen; a charged beam generator; a main deflector for deflecting the charged beam; a stage moving unit for moving the movable stage in a scanning direction; a pattern writing time calculation unit, and writing speed calculation unit and controller for performing pattern writing using the writing speed. For multi pass writing, a plurality of stripes cover one frame. The writing speed is obtained, for blocks which are partitioned into a fixed or arbitrary number of segments taking a pattern density within a frame (stripe) field.
摘要翻译：充电束曝光系统具有用于支撑样本的可移动台; 带电波束发生器; 用于偏转带电束的主偏转器; 平台移动单元，用于沿扫描方向移动可移动台; 模式写入时间计算单元，以及用于使用写入速度执行模式写入的写入速度计算单元和控制器。对于多遍写入，多个条纹覆盖一个帧。对于被划分为在帧（条带）字段内具有图案密度的固定或任意数量的片段的块，获得写入速度。

3. 发明授权

US06319642B1 Electron beam exposure apparatus 有权
标题翻译：电子束曝光装置
公开(公告)号：US06319642B1
公开(公告)日：2001-11-20
申请号：US09275186
申请日：1999-03-23
申请人： Shigehiro Hara , Eiji Murakami , Hitoshi Higurashi , Toshio Yamaguchi , Kazuto Matsuki , Souji Koikari , Shuichi Tamamushi , Kazuyuki Okuzono
发明人： Shigehiro Hara , Eiji Murakami , Hitoshi Higurashi , Toshio Yamaguchi , Kazuto Matsuki , Souji Koikari , Shuichi Tamamushi , Kazuyuki Okuzono
IPC分类号： G03F900
CPC分类号： G03F7/704 , H01J37/3026 , H01J2237/3175
摘要： A pattern lithography system for lithographing a pattern with reference to a pattern data by deflecting an electron beam includes a controller, an extracting unit, a dividing unit, and an expansion unit. The controller analyzes the pattern data and determines stripes of the pattern to be successively lithographed. The extracting unit extracts parts of the pattern data corresponding to stripes of the pattern in response to commands from the controller and sends the data to the dividing unit. The dividing unit divides the part of the pattern data into a plurality of sub-patterns. The sub-patterns are sized smaller than a minimum deflection range of the electron beam. The expanding unit expands the sub-patterns in accordance with a command from the controller to produce stripe data for driving a lithographing unit to lithograph the stripe. Stripes may have at least one sub-pattern in common such that multiple lithography is performed.
摘要翻译：通过偏转电子束来参考图案数据对图案进行光刻的图案光刻系统包括控制器，提取单元，分割单元和扩展单元。控制器分析图案数据，并确定要连续刻蚀的图案的条纹。提取单元响应于来自控制器的命令提取对应于图案条纹的图案数据的部分，并将数据发送到分割单元。分割单元将图案数据的一部分划分成多个子图案。子图案的尺寸小于电子束的最小偏转范围。扩展单元根据来自控制器的命令扩展子图案，以产生用于驱动光刻单元以对该条纹进行光刻的条带数据。条纹可以具有共同的至少一个子图案，使得执行多次光刻。

4. 发明授权

US06313476B1 Charged beam lithography system 有权
标题翻译：带电光束光刻系统
公开(公告)号：US06313476B1
公开(公告)日：2001-11-06
申请号：US09459648
申请日：1999-12-13
申请人： Mitsuko Shimizu , Takayuki Abe , Hirohito Anze , Susumu Oogi , Takashi Kamikubo , Eiji Murakami , Yoshiaki Hattori , Tomohiro Iijima , Hitoshi Higurashi , Kazuto Matsuki
发明人： Mitsuko Shimizu , Takayuki Abe , Hirohito Anze , Susumu Oogi , Takashi Kamikubo , Eiji Murakami , Yoshiaki Hattori , Tomohiro Iijima , Hitoshi Higurashi , Kazuto Matsuki
IPC分类号： A61N500
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged beam lithography system includes a charged particle gun for generating charged beams, a main deflecting system and a sub-deflecting system for deflecting the charged beams generated by the charged particle gun, and a control computer. The charged beam lithography system is designed to cause the surface of a substrate to be irradiated with the charged beams from the charged particle gun while continuously moving a stage, to write a desired pattern for each of stripes defined by the maximum deflection widths of the main deflecting system and the sub-deflecting system. The charged beam lithography system further comprises: a real time proximity effect correcting circuit for calculating an optimum dosage for each of the stripes by correcting the dosage of the electron beams in view of the influence of the proximity effect; and a cash memory for storing the optimum dosage data for at least two of the stripes. Thus, the charged beam lithography system is designed to shift a divided form of the whole written region using the stripes at each wiring number of times, by a predetermined distance from a predetermined reference position in a direction perpendicular to a stage continuous moving direction, while selectively extracting the optimum dosage data from the cash memory so as to correspond to each of written stripes at each writing number of times, to write patterns. During the writing operation, the optimum dosage data corresponding to the next region to be written are transferred from the real time proximity effect correcting circuit to the cash memory, and the real time proximity effect correcting circuit calculates optimum dosages for the stripes corresponding to regions to be written after next and thereafter.
摘要翻译：带电束光刻系统包括用于产生带电束的带电粒子枪，用于偏转由带电粒子枪产生的带电束的主偏转系统和副偏转系统以及控制计算机。带电光束光刻系统被设计成在连续移动平台的同时使来自带电粒子枪的带电束照射衬底的表面，以便为由主体的最大偏转宽度限定的条纹写入期望的图案偏转系统和副偏转系统。带电光束光刻系统还包括：实时邻近效应校正电路，用于通过根据邻近效应的影响校正电子束的剂量来计算每个条纹的最佳剂量; 以及用于存储至少两个条纹的最佳剂量数据的现金存储器。因此，带电光束光刻系统被设计成使用每个布线次数的条纹将整个写入区域的分割形式沿垂直于平台连续移动方向的预定基准位置移动预定距离，同时从现金存储器中选择性地提取最佳剂量数据，以便在每次写入次数时对应于每个写入条带，以写入模式。在写入操作期间，对应于要写入的下一区域的最佳剂量数据从实时邻近效应校正电路传送到现金存储器，并且实时邻近效应校正电路针对与区域对应的条纹计算最佳剂量写在下一个和之后。

5. 发明授权

US08188449B2 Charged particle beam drawing method and apparatus 有权
标题翻译：带电粒子束的绘制方法和装置
公开(公告)号：US08188449B2
公开(公告)日：2012-05-29
申请号：US12816773
申请日：2010-06-16
申请人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
发明人： Hayato Shibata , Hitoshi Higurashi , Akihito Anpo , Jun Yashima , Shigehiro Hara , Susumu Oogi
IPC分类号： G21K5/10 , G06F19/00
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam drawing apparatus for drawing patterns corresponding to figures in a drawing data, has a portion for dividing a drawing area on the workpiece into block frames, a portion for combining at least a first block frame and a second block frame into a virtual block frame, and a portion for transferring a data of the virtual block frame from an input data dividing module to a common memory of a first converter and a second converter. The first converter converts a data of a first figure included in the first block frame into a first drawing apparatus internal format data. The second converter converts a data of a second figure included in the second block frame into a second drawing apparatus internal format data. The first figure and the second figure are included in a cell extending over the first block frame and the second block frame.
摘要翻译：用于绘制与绘图数据中的图形对应的图案的带电粒子束描绘装置具有用于将工件上的绘图区域划分成块框架的部分，用于将至少第一块框架和第二块框架组合成虚拟的部分以及用于将虚拟块帧的数据从输入数据划分模块传送到第一转换器和第二转换器的公共存储器的部分。第一转换器将包括在第一块帧中的第一图形的数据转换成第一绘图装置内部格式数据。第二转换器将包括在第二块帧中的第二图形的数据转换为第二绘图装置内部格式数据。第一图和第二图被包括在延伸超过第一块帧和第二块帧的单元中。

6. 发明申请

US20080046787A1 WRITING ERROR VERIFICATION METHOD OF PATTERN WRITING APPARATUS AND GENERATION APPARATUS OF WRITING ERROR VERIFICATION DATA FOR PATTERN WRITING APPARATUS 有权
标题翻译：模式书写装置的书写错误验证方法和写入错误验证数据的生成装置
公开(公告)号：US20080046787A1
公开(公告)日：2008-02-21
申请号：US11838542
申请日：2007-08-14
申请人： Akihito ANPO , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito ANPO , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F11/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/302 , H01J2237/30416 , H01J2237/30455 , H01J2237/30472
摘要： A generation apparatus of writing error verification data for a pattern writing apparatus includes a data extraction part configured to extract, from layout data including a figure pattern to be written, part of the layout data required for an operation of a function having a writing error occurred after starting writing by the pattern writing apparatus which performs writing on a target workpiece based on the layout data, and a verification data generation part configured to perform a merge process based on extracted part of the layout data, and to generate writing error verification data, for which the merge process has been performed, for verifying the writing error of the pattern writing apparatus.
摘要翻译：一种用于写入模式写入装置的错误验证数据的生成装置包括数据提取部件，被配置为从包括要写入的图形模式的布局数据中提取出现写入错误的功能的操作所需的布局数据的一部分在通过基于布局数据对目标工件执行写入的图案写入装置开始写入之后，以及验证数据生成部，被配置为基于提取的布局数据的一部分执行合并处理，并且生成写入错误验证数据，对其进行了合并处理，以验证图案写入装置的写入错误。

7. 发明授权

US08280632B2 Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus 有权
标题翻译：用于检查重叠图形的装置和方法，以及带电粒子束写入装置
公开(公告)号：US08280632B2
公开(公告)日：2012-10-02
申请号：US12392507
申请日：2009-02-25
申请人： Shinji Sakamoto , Shigehiro Hara , Hitoshi Higurashi
发明人： Shinji Sakamoto , Shigehiro Hara , Hitoshi Higurashi
IPC分类号： G06F19/00 , G06F17/50 , G21G5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/2817
摘要： An apparatus for inspecting overlapping figures includes a chip overlap inspection unit configured to input a data file on each chip of a plurality of chips arranged in a writing pattern, and inspect an existence of an overlap between a plurality of chips, based on arrangement data on each region of the plurality of chips, a setting unit configured to set, with respect to the plurality of chips, a plurality of hierarchies and a plurality of cell regions of each of the plurality of hierarchies, an extraction unit configured to extract, with respect to a plurality of chips where the overlap occurs, a cell region where the overlap is located, from a higher hierarchy level to a lower hierarchy level in order, a figure overlap judging unit configured to judge an existence of an overlap between a figure in the cell region extracted and a figure in the other cell region extracted, and an output unit configured to output data on a plurality of figures overlapping.
摘要翻译：用于检查重叠图形的装置包括：芯片重叠检查单元，被配置为输入以写入模式布置的多个芯片的每个芯片上的数据文件，并且基于关于多个芯片的布置数据检查多个芯片之间的重叠的存在所述多个芯片的每个区域，设置单元，被配置为相对于所述多个芯片设置所述多个层次中的每一个的多个层次和多个单元区域;提取单元，被配置为：涉及重叠发生的多个芯片，重叠位置的单元区域，从较高层次到次级的顺序;图形重叠判断单元，被配置为判断存在重叠的图形之间的重叠提取单元区域并提取另一个单元区域中的图形，以及输出单元，被配置为输出重叠的多个图形上的数据。

8. 发明授权

US08207514B2 Charged particle beam drawing apparatus and proximity effect correction method thereof 有权
标题翻译：带电粒子束绘图装置及其接近效应校正方法
公开(公告)号：US08207514B2
公开(公告)日：2012-06-26
申请号：US12882713
申请日：2010-09-15
申请人： Shigehiro Hara , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
发明人： Shigehiro Hara , Shuichi Tamamushi , Takashi Kamikubo , Hitoshi Higurashi , Shinji Sakamoto , Yusuke Sakai , Yoshihiro Okamoto , Akihito Anpo
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/304 , H01J2237/31769 , H01J2237/31776
摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.
摘要翻译：带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量在每个网格中每个代表人物的面积的基础上。如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积，代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

9. 发明授权

US07504645B2 Method of forming pattern writing data by using charged particle beam 有权
标题翻译：使用带电粒子束形成图案写入数据的方法
公开(公告)号：US07504645B2
公开(公告)日：2009-03-17
申请号：US11678703
申请日：2007-02-26
申请人： Akihito Anpo , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F19/00 , G03F1/00
CPC分类号： H01J37/3174 , H01J37/3026 , H01J2237/31764 , H01J2237/31776
摘要： A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes inputting the layout data including a pattern ranging over a plurality of deflection regions, generating a partial pattern which can be deflected in a self region in the ranging pattern for each of the plurality of deflection regions on the basis of the input layout data, and converting layout data including a partial pattern for each of the deflection regions into charged particle beam pattern writing data to output the charged particle beam pattern writing data.
摘要翻译：一种形成图案写入数据的方法，通过使带电粒子束在电荷粒子束的偏转的同时通过使用带电粒子束从电路的布局数据写入预定图案，包括输入包括在多个偏转区域上范围的图案的布局数据，基于输入布局数据，可以在多个偏转区域中的每一个的测距图案中的自区域中偏转的图案，以及将包括每个偏转区域的部分图案的布局数据转换为带电粒子束图案写入数据输出带电粒子束图案写入数据。

10. 发明申请

US20080221816A1 DATA VERIFICATION METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM WITH PROGRAM 有权
标题翻译：数据验证方法，充电颗粒光束写入装置和计算机可读存储介质与程序
公开(公告)号：US20080221816A1
公开(公告)日：2008-09-11
申请号：US12042712
申请日：2008-03-05
申请人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito Anpo , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F19/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3023
摘要： A charged particle beam writing apparatus includes an input unit configured to input writing data for writing a plurality of cell patterns including at least one cell pattern in which an identifier is added to each of data defining the at least one cell pattern extending over at least two small regions in a plurality of small regions obtained by virtually dividing a writing region, an extraction unit configured to extract the at least one cell pattern to which the identifier is added from the plurality of cell patterns, an output unit configured to output an error result when only one cell pattern is extracted, and a writing unit configured to write the plurality of cell patterns by irradiating a target workpiece with a charged particle beam, based on the writing data for which the error result is not output.
摘要翻译：带电粒子束写入装置包括：输入单元，被配置为输入写入数据，用于写入多个单元图形，所述多个单元图案包括至少一个单元图案，其中标识符被添加到每个定义至少一个单元图案的数据中，通过虚拟地划分写入区域而获得的多个小区域中的小区域;提取单元，被配置为从多个单元图案中提取添加有标识符的至少一个单元图案;输出单元，被配置为输出错误结果当仅提取一个单元图案时，以及写入单元，其被配置为基于未输出错误结果的写入数据，通过用带电粒子束照射目标工件来写入多个单元图案。

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