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1. 发明申请

US20080046787A1 WRITING ERROR VERIFICATION METHOD OF PATTERN WRITING APPARATUS AND GENERATION APPARATUS OF WRITING ERROR VERIFICATION DATA FOR PATTERN WRITING APPARATUS 有权
标题翻译：模式书写装置的书写错误验证方法和写入错误验证数据的生成装置
公开(公告)号：US20080046787A1
公开(公告)日：2008-02-21
申请号：US11838542
申请日：2007-08-14
申请人： Akihito ANPO , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito ANPO , Jun Kasahara , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F11/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , G03F1/78 , H01J37/302 , H01J2237/30416 , H01J2237/30455 , H01J2237/30472
摘要： A generation apparatus of writing error verification data for a pattern writing apparatus includes a data extraction part configured to extract, from layout data including a figure pattern to be written, part of the layout data required for an operation of a function having a writing error occurred after starting writing by the pattern writing apparatus which performs writing on a target workpiece based on the layout data, and a verification data generation part configured to perform a merge process based on extracted part of the layout data, and to generate writing error verification data, for which the merge process has been performed, for verifying the writing error of the pattern writing apparatus.
摘要翻译：一种用于写入模式写入装置的错误验证数据的生成装置包括数据提取部件，被配置为从包括要写入的图形模式的布局数据中提取出现写入错误的功能的操作所需的布局数据的一部分在通过基于布局数据对目标工件执行写入的图案写入装置开始写入之后，以及验证数据生成部，被配置为基于提取的布局数据的一部分执行合并处理，并且生成写入错误验证数据，对其进行了合并处理，以验证图案写入装置的写入错误。

2. 发明申请

US20070226675A1 METHOD OF FORMING PATTERN WRITING DATA BY USING CHARGED PARTICLE BEAM 有权
标题翻译：使用充电粒子形成图案数据的方法
公开(公告)号：US20070226675A1
公开(公告)日：2007-09-27
申请号：US11678703
申请日：2007-02-26
申请人： Akihito ANPO , Hitoshi Higurashi , Shigehiro Hara
发明人： Akihito ANPO , Hitoshi Higurashi , Shigehiro Hara
IPC分类号： G06F17/50 , G03B27/54 , G03F1/00
CPC分类号： H01J37/3174 , H01J37/3026 , H01J2237/31764 , H01J2237/31776
摘要： A method of forming pattern writing data to write a predetermined pattern from layout data of a circuit by using a charged particle beam while deflecting the charged particle beam, includes inputting the layout data including a pattern ranging over a plurality of deflection regions, generating a partial pattern which can be deflected in a self region in the ranging pattern for each of the plurality of deflection regions on the basis of the input layout data, and converting layout data including a partial pattern for each of the deflection regions into charged particle beam pattern writing data to output the charged particle beam pattern writing data.
摘要翻译：一种形成图案写入数据的方法，通过使带电粒子束在电荷粒子束的偏转的同时通过使用带电粒子束从电路的布局数据写入预定图案，包括输入包括在多个偏转区域上范围的图案的布局数据，基于输入布局数据，可以在多个偏转区域中的每一个的测距图案中的自区域中偏转的图案，以及将包括每个偏转区域的部分图案的布局数据转换为带电粒子束图案写入数据输出带电粒子束图案写入数据。

3. 发明申请

US20090057575A1 CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS AND CHARGED PARTICLE BEAM LITHOGRAPHY METHOD 有权
标题翻译：充电颗粒光束光刻装置和充电颗粒光束光刻方法
公开(公告)号：US20090057575A1
公开(公告)日：2009-03-05
申请号：US12204382
申请日：2008-09-04
申请人： Susumu OOGI , Hitoshi HIGURASHI , Akihito ANPO , Toshiro YAMAMOTO
发明人： Susumu OOGI , Hitoshi HIGURASHI , Akihito ANPO , Toshiro YAMAMOTO
IPC分类号： G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A charged particle beam lithography apparatus includes a first block area divider configured to divide a pattern forming area into a plurality of first block areas in order to make a number of shots when forming a pattern substantially equal; an area density calculator configured to calculate, using a plurality of small areas obtained by virtually dividing the pattern forming area into mesh areas of a predetermined size smaller than all of the first block areas, a pattern area density of each small area positioned therein for each of the first block areas; a second block area divider configured to re-divide the pattern forming area divided into the plurality of first block areas into a plurality of second block areas of a uniform size, which is larger than the small area; a corrected dose calculator configured to calculate, using the pattern area density of each small area, a proximity effect-corrected dose in each corresponding small area positioned inside the second block area for each of the second block areas; a beam dose calculator configured to calculate, using the proximity effect-corrected dose of each small area, a beam dose of a charged particle beam in each corresponding small area; and a pattern generator configured to form a predetermined pattern on a target object by irradiating a charged particle beam of the beam dose calculated for each of the small areas.
摘要翻译：带电粒子束光刻设备包括第一块区域分配器，其被配置为将图案形成区域划分成多个第一块区域，以便在形成基本相等的图案时进行多次拍摄; 区域密度计算器，被配置为使用通过将图案形成区域实际上划分为比所有第一块区域小的预定尺寸的网格区域而获得的多个小区域，计算每个小区域的每个小区域的图案区域密度的第一块区域; 第二块区域分配器，被配置为将划分为多个第一块区域的图案形成区域重新划分为大于所述小区域的均匀尺寸的多个第二块区域; 校正剂量计算器，被配置为使用每个小区域的图案区域密度来计算每个所述第二块区域中位于所述第二块区域内的每个对应小区域中的邻近效应校正剂量; 光束剂量计算器，被配置为使用每个小区域的邻近效应校正剂量来计算每个对应的小区域中的带电粒子束的束剂量; 以及图案生成器，被配置为通过照射针对每个小区域计算的光束剂量的带电粒子束来在目标物体上形成预定图案。

4. 发明申请

US20100306721A1 WRITE ERROR VERIFICATION METHOD OF WRITING APPARATUS AND CREATION APPARATUS OF WRITE ERROR VERIFICATION DATA FOR WRITING APPARATUS 有权
标题翻译：写入设备的写入错误验证方法和写入错误验证数据的创建装置
公开(公告)号：US20100306721A1
公开(公告)日：2010-12-02
申请号：US12787907
申请日：2010-05-26
申请人： Akihito ANPO
发明人： Akihito ANPO
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/222 , H01J37/304 , H01J2237/24592 , H01J2237/2817 , H01J2237/31776 , H01J2237/31798
摘要： A write error verification method of a writing apparatus verifying a write error after a write operation being started in the writing apparatus to which layout data containing a figure pattern to be formed is input and which forms the figure pattern on a target object based on the layout data input, the write error verification method includes: if a write error occurs in a process between input of the layout data into the writing apparatus and inspection of the target object on which the figure pattern is formed, selecting a part of the layout data necessary for operation of a function that has caused the write error; extracting parts of the layout data corresponding to a selected part of the layout data for all of a plurality of portions of the target object if a pattern indicated by the selected part of the layout data is arranged at the plurality of portions of the target object; creating verification data by deleting at least one parts extracted for at least one portions other than a portion that has caused the write error from extracted parts of the layout data and by using remaining data; and reproducing the operation of the function that has caused the write error using the verification data to output a result of the reproducing.
摘要翻译：写入装置的写入错误验证方法，在写入装置中开始写入操作之后，写入错误验证方法，该写入装置输入包含要形成的图形图案的布局数据，并且基于布局在目标对象上形成图案数据输入时，写入错误验证方法包括：如果在写入设备的布局数据的输入和形成图形的目标对象的检查之间的过程中发生写入错误，则选择布局数据的一部分用于操作引起写入错误的功能; 如果由所述布局数据的所选部分指示的图案被布置在所述目标对象的所述多个部分，则提取对应于所述目标对象的多个部分的布局数据的选定部分的部分布局数据; 通过删除除了从所述布局数据的提取部分引起的写入错误的部分之外的至少一个部分提取的至少一个部分以及通过使用剩余数据来创建验证数据; 并且使用验证数据再现引起写入错误的功能的操作，以输出再现的结果。

5. 发明申请

US20110066272A1 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS THEREFOR 有权
标题翻译：充电颗粒光束写入方法及其装置
公开(公告)号：US20110066272A1
公开(公告)日：2011-03-17
申请号：US12874722
申请日：2010-09-02
申请人： Akihito ANPO
发明人： Akihito ANPO
IPC分类号： G06F19/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： A charged particle beam writing method includes inputting layout information of a plurality of chips on which pattern formation is to be achieved, setting, using the layout information, a plurality of writing groups each being composed of at least one of the plurality of chips and each having writing conditions differing from each other, setting, for each of the plurality of writing groups, a frame which encloses a whole of all chip regions in the each of the plurality of writing groups, virtually dividing the frame into a plurality of stripe regions in a predetermined direction, with respect to the each of the plurality of writing groups, setting, using the plurality of stripe regions of all the plurality of writing groups, an order of each of the plurality of stripe regions such that a reference position of the each of the plurality of stripe regions is located in order in the predetermined direction regardless of the plurality of writing groups, and writing a pattern in the each of the plurality of stripe regions onto a target workpiece according to the order which has been set, by using a charged particle beam.
摘要翻译：带电粒子束写入方法包括输入要在其上实现图案形成的多个芯片的布局信息，使用布局信息设置多个写入组，每个写入组由多个芯片中的至少一个和每个芯片组成具有彼此不同的写入条件，对于所述多个写入组中的每一个设置包围所述多个写入组中的每一个的所有芯片区域的整体的帧，将所述帧实际上划分为多个条带区域相对于所述多个写入组中的每个写入组的预定方向，使用所述多个写入组中的所述多个条带区域设置所述多个条带区域中的每一个的顺序，使得每个多个条带区域中的多个条带区域按照预定方向依次排列，而与多个写入组无关，并且在每个写入组中写入图案根据已经通过使用带电粒子束设置的顺序将多个条带区域放置在目标工件上。

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