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    • 1. 发明专利
    • Film-forming method using plasma in liquid, and film-forming apparatus using plasma in liquid
    • 在液体中使用等离子体的成膜方法和使用液体中的等离子体的成膜装置
    • JP2008308730A
    • 2008-12-25
    • JP2007157727
    • 2007-06-14
    • Ehime UnivToyota Industries Corp国立大学法人愛媛大学株式会社豊田自動織機
    • OKUDA SHINYASHIMO TOSHIHISAMURASE KIMITOSHITOYODA HIROMICHINOMURA NOBUFUKU
    • C23C16/505
    • PROBLEM TO BE SOLVED: To provide a film-forming method using plasma in a liquid, which can form a film on the surface of a substrate by using not only a solid but also a liquid as raw materials.
      SOLUTION: With this film-forming method, decomposed components of a first raw material and a second raw material are deposited on the surface of the substrate 4 through an arrangement step of arranging a supply source 1 made from a solid including the second raw material and the substrate 4 so that both face to each other in a liquid L including the first raw material; a space-forming step of forming a vapor phase space G which continuously connects the supply source 1 with the substrate 4; the second raw material supply step of supplying the second raw material into the liquid L and/or the vapor phase space G by melting and/or vaporizing the supply source 1; and a plasma-generating step of generating plasma made from the first raw material or plasma made from the first raw material and the second raw material in the vapor phase space G.
      COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种在液体中使用等离子体的成膜方法,其可以通过不仅使用固体而且使用液体作为原料,而在基材的表面上形成膜。 解决方案:通过这种成膜方法,通过将由包含第二原料和第二原料的固体制成的供给源1配置在基板4的表面上,沉积第一原料和第二原料的分解成分 原料和基材4,使得两者彼此面对包括第一原料的液体L; 形成将供给源1与基板4连续地连接的气相空间G的空间形成工序; 第二原料供给步骤,通过使供给源1熔化和/或蒸发而将第二原料供给到液体L和/或气相空间G中; 以及在气相空间G中由第一原料和第二原料制成的第一原料或等离子体制造等离子体产生步骤。(C)2009,JPO&INPIT
    • 8. 发明专利
    • Low friction compound film deposition method, and low friction sliding member
    • 低摩擦化合物膜沉积方法和低摩擦滑动构件
    • JP2007217766A
    • 2007-08-30
    • JP2006041304
    • 2006-02-17
    • Osaka Shinku Kogyo KkToyota Industries Corp大阪真空工業株式会社株式会社豊田自動織機
    • BABA TAKAAKISHIMO TOSHIHISAMURASE KIMITOSHIADACHI NAOSUKEHORI MINORUMURAMATSU KOHEI
    • C23C14/06
    • PROBLEM TO BE SOLVED: To provide a film deposition method of a low friction compound film having low friction coefficient and excellent seizure resistance.
      SOLUTION: In the film deposition method of the low friction compound film for manufacturing a sliding component for a compressor, a sputtering apparatus is used, which comprises a film deposition furnace, a target fixing means 10 in which a carbon target 11 consisting of at least carbon, sulfide targets 12, 14 consisting of sulfide, and a metal target 13 containing metal atoms are arrayed in a ring in the film deposition furnace, a base material holding means 20 which holds base materials (A, B), and continuously changes the targets 11-14 facing the base materials by moving the base materials, and a power supply device which is connected to at least the target fixing means 10 to discharge the targets 11-14. The targets 11-14 are discharged by operating the power supply device, the base materials are moved by the base material holding means 10, and amorphous carbon, atoms constituting the sulfide and metal atoms are successively deposited on the surface of the base material microscopically and periodically.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供具有低摩擦系数和优异的耐发泡性的低摩擦化合物膜的膜沉积方法。 解决方案:在用于制造用于压缩机的滑动部件的低摩擦化合物膜的薄膜沉积方法中,使用溅射装置,其包括成膜炉,靶固定装置10,其中包括碳靶11 至少含有硫化物的硫化物靶12,14以及含有金属原子的金属靶13在成膜炉中排列成环,保持基材(A,B)的基材保持机构20和 通过移动基底材料来连续地改变面向基材的目标11-14,以及连接到至少目标固定装置10以排出靶11-14的电源装置。 目标11-14通过操作电源装置而被排出,基材由基体保持装置10移动,构成硫化物和金属原子的无定形碳,原子依次沉积在基底材料的表面上,微观地和 定期。 版权所有(C)2007,JPO&INPIT
    • 9. 发明专利
    • Method for coating aluminium based substrate and coated material of aluminium based substrate
    • 基于铝的基体和基于铝的基材的涂覆材料的方法
    • JP2005305395A
    • 2005-11-04
    • JP2004130146
    • 2004-04-26
    • Toyota Industries Corp株式会社豊田自動織機
    • OKUDA NOBUKOMURASE KIMITOSHISHIMO TOSHIHISA
    • B05D3/10B05D7/14B32B15/08C23C22/56C23C22/78
    • PROBLEM TO BE SOLVED: To provide a method for coating an aluminium based substrate and a coated material of the aluminium based substrate which can realize the improvement of adhesion between the substrate and a resin coating film without using environment load substances such as chromium(VI).
      SOLUTION: In the method for coating the surface of the aluminium based substrate, which comprises a chemical treatment process chemically treating the surface of the aluminium based substrate consisting of an aluminium substrate and an aluminium alloy substrate, and a coating process for coating the chemically treated surface of the aluminium based substrate, the chemical treatment is, for example, carried out in such a away that the substrate is immersed into a chemically treating solution adjusted by pure water so as to become 16 wt% H
      2 SO
      4 (purity 98%), 16 wt% hydrogen peroxide water (purity 34%) and 4 wt% CuSO
      4 -H
      2 O.
      COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种涂覆铝基基板和铝基基板的涂层材料的方法,其可以实现基板和树脂涂膜之间的粘附性的改善,而不使用环境负荷物质如铬 (VI)。 解决方案:在用于涂覆铝基基材的表面的方法中,其包括对由铝基板和铝合金基板组成的铝基基板的表面进行化学处理的化学处理工艺,以及涂覆涂布方法 例如,铝基基板的经化学处理的表面进行化学处理,使得将基板浸入由纯水调节的化学处理溶液中,使其成为16重量%H 2 SB (纯度98%),16%(重量)过氧化氢水(纯度34%)和4%(重量)CuSO 4 SBH-2 SBB / SB> 0。 版权所有(C)2006,JPO&NCIPI