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JP2007217766A Low friction compound film deposition method, and low friction sliding member 审中-公开
标题翻译：低摩擦化合物膜沉积方法和低摩擦滑动构件
公开(公告)号：JP2007217766A
公开(公告)日：2007-08-30
申请号：JP2006041304
申请日：2006-02-17
申请人： Osaka Shinku Kogyo Kk , Toyota Industries Corp , 大阪真空工業株式会社 , 株式会社豊田自動織機
发明人： BABA TAKAAKI , SHIMO TOSHIHISA , MURASE KIMITOSHI , ADACHI NAOSUKE , HORI MINORU , MURAMATSU KOHEI
IPC分类号： C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a film deposition method of a low friction compound film having low friction coefficient and excellent seizure resistance.
SOLUTION: In the film deposition method of the low friction compound film for manufacturing a sliding component for a compressor, a sputtering apparatus is used, which comprises a film deposition furnace, a target fixing means 10 in which a carbon target 11 consisting of at least carbon, sulfide targets 12, 14 consisting of sulfide, and a metal target 13 containing metal atoms are arrayed in a ring in the film deposition furnace, a base material holding means 20 which holds base materials (A, B), and continuously changes the targets 11-14 facing the base materials by moving the base materials, and a power supply device which is connected to at least the target fixing means 10 to discharge the targets 11-14. The targets 11-14 are discharged by operating the power supply device, the base materials are moved by the base material holding means 10, and amorphous carbon, atoms constituting the sulfide and metal atoms are successively deposited on the surface of the base material microscopically and periodically.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有低摩擦系数和优异的耐发泡性的低摩擦化合物膜的膜沉积方法。解决方案：在用于制造用于压缩机的滑动部件的低摩擦化合物膜的薄膜沉积方法中，使用溅射装置，其包括成膜炉，靶固定装置10，其中包括碳靶11 至少含有硫化物的硫化物靶12,14以及含有金属原子的金属靶13在成膜炉中排列成环，保持基材（A，B）的基材保持机构20和通过移动基底材料来连续地改变面向基材的目标11-14，以及连接到至少目标固定装置10以排出靶11-14的电源装置。目标11-14通过操作电源装置而被排出，基材由基体保持装置10移动，构成硫化物和金属原子的无定形碳，原子依次沉积在基底材料的表面上，微观地和定期。版权所有（C）2007，JPO＆INPIT

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