会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Migration imaging members
    • 迁移成像成员
    • US5672451A
    • 1997-09-30
    • US630296
    • 1996-04-11
    • Man C. TamLiqin ChenEdward G. ZwartzDaniel BihonMarie-Eve Perron
    • Man C. TamLiqin ChenEdward G. ZwartzDaniel BihonMarie-Eve Perron
    • G03G17/10
    • G03G17/10
    • Disclosed is a migration imaging member which comprises (a) a substrate, (b) a conductive layer comprising indium tin oxide dispersed in a polymeric binder, (c) a siloxane film charge blocking layer comprising a hydrolysis reaction product of a silane of the formula ##STR1## wherein R.sub.1 is an alkylidene group, R.sub.2 and R.sub.3 are each, independent of the other, a hydrogen atom, an alkyl group, a phenyl group, or a poly(ethyleneamino) group, and R.sub.4, R.sub.5, and R.sub.6 are each, independent of the others, alkyl groups, said siloxane having reactive hydroxyl and ammonium groups attached to silicon atoms, and (d) a softenable layer comprising a softenable material and a photosensitive migration marking material. Optionally an antistatic layer comprising indium tin oxide dispersed in a polymeric binder is situated on the surface of the substrate spaced from the softenable layer.
    • 公开了一种迁移成像构件,其包括(a)基底,(b)包含分散在聚合物粘合剂中的氧化铟锡的导电层,(c)硅氧烷膜电荷阻挡层,其包含式 其中R 1是亚烷基,R 2和R 3各自独立地为氢原子,烷基,苯基或聚(亚乙基氨基),R 4,R 5和R 6各自为 独立于其它烷基,所述硅氧烷具有连接到硅原子的反应性羟基和铵基团,和(d)包含可软化材料和光敏迁移标记材料的可软化层。 任选地,包含分散在聚合物粘合剂中的氧化铟锡的抗静电层位于与可软化层间隔开的衬底的表面上。
    • 5. 发明授权
    • Migration imaging process
    • 移植成像过程
    • US06180297B2
    • 2001-01-30
    • US08432291
    • 1995-05-01
    • Man C. TamEdward G. Zwartz
    • Man C. TamEdward G. Zwartz
    • G03G1710
    • G03G17/10
    • Disclosed is a process which comprises (a) providing a migration imaging member comprising (1) a substrate, (2) an infrared or red light radiation sensitive layer comprising a pigment predominantly sensitive to infrared or red light radiation, and (3) a softenable layer comprising a softenable material, a charge transport material, and a photosensitive migration marking material predominantly sensitive to radiation at a wavelength other than that to which the infrared or red light sensitive pigment is predominantly sensitive; (b) uniformly charging the imaging member; (c) subsequent to step (b), uniformly exposing the charged imaging member to a source of activating radiation with a wavelength to which the migration marking material is sensitive, wherein a filter comprising the infrared or red light radiation sensitive pigment is situated between the radiation source and the imaging member; (d) subsequent to step (b), exposing the imaging member to infrared or red light radiation at a wavelength to which the infrared or red light radiation sensitive pigment is sensitive in an imagewise pattern, thereby forming an electrostatic latent image on the imaging member; and (e) subsequent to steps (c) and (d), causing the softenable material to soften, thereby enabling the migration marking material to migrate through the softenable material toward the substrate in an imagewise pattern.
    • 公开了一种方法,其包括(a)提供迁移成像构件,其包括(1)基底,(2)包含主要对红外或红光辐射敏感的颜料的红外或红光辐射敏感层,和(3)可软化 层,其包含可软化材料,电荷传输材料和主要对红外或红色光敏颜料主要敏感的波长以外的波长的辐射敏感的光敏迁移标记材料; (b)对成像构件均匀充电; (c)在步骤(b)之后,将所充电的成像构件均匀地暴露于迁移标记材料敏感的波长的激活辐射源,其中包含红外或红光辐射敏感颜料的滤光器位于 辐射源和成像构件; (d)在步骤(b)之后,以成像图案将成像构件暴露于红外或红光敏感颜料敏感的波长处的红外或红光辐射,从而在成像构件上形成静电潜像 ; 和(e)步骤(c)和(d)之后,使可软化材料软化,从而使迁移标记材料能够以可成形图案向基材迁移通过可软化材料。