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    • 1. 发明授权
    • Migration imaging members
    • 迁移成像成员
    • US5672451A
    • 1997-09-30
    • US630296
    • 1996-04-11
    • Man C. TamLiqin ChenEdward G. ZwartzDaniel BihonMarie-Eve Perron
    • Man C. TamLiqin ChenEdward G. ZwartzDaniel BihonMarie-Eve Perron
    • G03G17/10
    • G03G17/10
    • Disclosed is a migration imaging member which comprises (a) a substrate, (b) a conductive layer comprising indium tin oxide dispersed in a polymeric binder, (c) a siloxane film charge blocking layer comprising a hydrolysis reaction product of a silane of the formula ##STR1## wherein R.sub.1 is an alkylidene group, R.sub.2 and R.sub.3 are each, independent of the other, a hydrogen atom, an alkyl group, a phenyl group, or a poly(ethyleneamino) group, and R.sub.4, R.sub.5, and R.sub.6 are each, independent of the others, alkyl groups, said siloxane having reactive hydroxyl and ammonium groups attached to silicon atoms, and (d) a softenable layer comprising a softenable material and a photosensitive migration marking material. Optionally an antistatic layer comprising indium tin oxide dispersed in a polymeric binder is situated on the surface of the substrate spaced from the softenable layer.
    • 公开了一种迁移成像构件,其包括(a)基底,(b)包含分散在聚合物粘合剂中的氧化铟锡的导电层,(c)硅氧烷膜电荷阻挡层,其包含式 其中R 1是亚烷基,R 2和R 3各自独立地为氢原子,烷基,苯基或聚(亚乙基氨基),R 4,R 5和R 6各自为 独立于其它烷基,所述硅氧烷具有连接到硅原子的反应性羟基和铵基团,和(d)包含可软化材料和光敏迁移标记材料的可软化层。 任选地,包含分散在聚合物粘合剂中的氧化铟锡的抗静电层位于与可软化层间隔开的衬底的表面上。
    • 2. 发明授权
    • Migration imaging members
    • 迁移成像成员
    • US5563014A
    • 1996-10-08
    • US442227
    • 1995-05-15
    • Shadi L. MalhotraLiqin ChenMarie-Eve Perron
    • Shadi L. MalhotraLiqin ChenMarie-Eve Perron
    • G03G15/05B41M5/00G03G5/02G03G17/04G03G17/10G03G5/04
    • G03G17/04G03G17/10
    • Disclosed is a migration imaging member comprising (a) a substrate, (b) a softenable layer comprising a softenable material and a photosensitive migration marking material, and (c) a transparentizing agent which transparentizes migration marking material in contact therewith contained in at least one layer of the migration imaging member. Also disclosed is a process which comprises (1) providing a migration imaging member comprising (a) a substrate, (b) a softenable layer comprising a softenable material and a photosensitive migration marking material, and (c) a transparentizing agent which transparentizes migration marking material in contact therewith contained in at least one layer of the migration imaging member; (2) uniformly charging the imaging member; (3) subsequent to step (2), exposing the charged imaging member to activating radiation at a wavelength to which the migration marking material is sensitive; (4) subsequent to step (3), causing the softenable material to soften and enabling a first portion of the migration marking material to migrate through the softenable material toward the substrate in an imagewise pattern while a second portion of the migration marking material remains substantially unmigrated within the softenable layer, wherein subsequent to migration of the first portion of migration marking material, either (a) the first portion of migration marking material contacts the transparentizing agent and the second portion of migration marking material does not contact the transparentizing agent; or (b) the second portion of migration marking material contacts the transparentizing agent and the first portion of migration marking material does not contact the transparentizing agent.
    • 公开了一种迁移成像构件,其包括(a)基底,(b)包含可软化材料和光敏迁移标记材料的可软化层,以及(c)使与其接触的迁移标记材料透明化的透明剂包含在至少一个 迁移成像构件的层。 还公开了一种方法,其包括(1)提供迁移成像构件,其包括(a)基底,(b)包含可软化材料和光敏迁移标记材料的可软化层,和(c)使迁移标记透明化的透明剂 与其接触的材料包含在至少一层迁移成像构件中; (2)对成像构件均匀充电; (3)在步骤(2)之后,将所述带电成像构件暴露于所述迁移标记材料敏感的波长处的激活辐射; (4),在步骤(3)之后,使可软化材料软化,并使迁移标记材料的第一部分以成像图案向基材迁移,同时迁移标记材料的第二部分基本保持 在可软化层内不移动,其中在移动标记材料的第一部分迁移之后,(a)第一部分迁移标记材料接触透明剂,并且第二部分迁移标记材料不接触透明剂; 或(b)迁移标记材料的第二部分接触透明剂,并且迁移标记材料的第一部分不与透明剂接触。