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1. 发明授权

US5018280A Method and device for the operation of a workpiece-contacting probe head of the switching type 失效
标题翻译：用于操作切换式工件接触探头的方法和装置
公开(公告)号：US5018280A
公开(公告)日：1991-05-28
申请号：US555909
申请日：1990-07-20
申请人： Eckhard Enderle , Hans-Peter Aehnelt , Karl-Eugen Aubele , Michael Wirth
发明人： Eckhard Enderle , Hans-Peter Aehnelt , Karl-Eugen Aubele , Michael Wirth
IPC分类号： G01B21/20 , G01B11/00 , G01B21/00
CPC分类号： G01B11/007
摘要： To overcome friction in the mount of the switching-type probe head, a probe (5/6) displaceably mounted therein is transiently excited in oscillation for a predetermined time after each contacting process. The same piezoelectric element (17) as that which produces the initial work-contact signal in the probe head can additionally be used to stimulate the oscillations.
摘要翻译：为了克服开关型探头的安装中的摩擦，可移动地安装在其中的探针（5/6）在每次接触过程之后的振荡中瞬间激励预定的时间。与在探头中产生初始工作接触信号的压电元件相同的压电元件（17）可另外用于刺激振荡。

2. 发明申请

US20090040487A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US20090040487A1
公开(公告)日：2009-02-12
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

3. 发明申请

US20080174757A1 IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE 失效
标题翻译：投影曝光机成像装置
公开(公告)号：US20080174757A1
公开(公告)日：2008-07-24
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muhlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muhlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

4. 发明授权

US4769763A Control for coordinate measuring instruments 失效
标题翻译：坐标测量仪器的控制
公开(公告)号：US4769763A
公开(公告)日：1988-09-06
申请号：US874696
申请日：1986-06-16
申请人： Gerhard Trieb , Karl Schepperle , Karl-Eugen Aubele
发明人： Gerhard Trieb , Karl Schepperle , Karl-Eugen Aubele
IPC分类号： G01B21/04 , G01B21/20 , G01Q10/04 , G01Q70/00 , G05B19/401 , G01B7/28
CPC分类号： B82Y15/00 , G05B19/401 , G05B2219/37193 , G05B2219/50134
摘要： A "scanning" work-contact probe is deflectable with respect to a measuring-machine head which is driven by the three-coordinate drive system of the measuring machine. The arrangement is such that the probe continuously tracks (scans) a desired profile of a workpiece and, in doing so, measured probe increments (decrements) of deflection with respect to the head are so mathematically combined with head-position data that, in the further circumstance of holding path-velocity magnitude .vertline.V.sub.des. .vertline. of the measuring machine to a constant value, the orientation of the probe head with respect to the locally contacted slope of the workpiece can also be a constant.
摘要翻译： “扫描”工作接触探针相对于由测量机的三坐标驱动系统驱动的测量机头可偏转。该布置使得探头连续地跟踪（扫描）工件的期望轮廓，并且在这样做时，相对于头部的偏转的测量的探头增量（减量）如此数学地与头位置数据组合，在头位置数据中，使测量机的路径速度幅值| Vdes.|保持恒定值的另外的情况下，探针头相对于工件的局部接触斜率的方向也可以是常数。

5. 发明申请

US20110235005A1 POSITIONING METHOD FOR AN OPTICAL ARRANGEMENT OF A PROJECTION ILLUMINATION SYSTEM 有权
标题翻译：投影照明系统的光学布置定位方法
公开(公告)号：US20110235005A1
公开(公告)日：2011-09-29
申请号：US13050155
申请日：2011-03-17
申请人： Karl-Eugen Aubele , Erich Merz , Thorsten Rassel
发明人： Karl-Eugen Aubele , Erich Merz , Thorsten Rassel
IPC分类号： G03B21/14
CPC分类号： G02B27/62 , G03F7/70258 , G03F7/70525
摘要： The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.
摘要翻译：本公开涉及一种用于生产和/或调整投影照明系统的光学装置的方法，其中至少一个致动器用于通过移动光学元件来设置要操纵的至少一个光学元件的位置递增地以特定的增量大小。移动增量的增量大小被设置为光学元件距离期望位置的距离的函数，距离由距离值表示。如果距离值高于第一阈值，则设定基本上恒定的增量大小，而如果距离值低于第一阈值，则特定增量大小随着与期望位置的距离而减小。或者或另外，与特定增量尺寸和/或预先规定的增量尺寸变化率的预定偏差导致警告信号和/或停止运动。

6. 发明授权

US07710542B2 Imaging device in a projection exposure machine 失效
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US07710542B2
公开(公告)日：2010-05-04
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jürgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

7. 发明申请

US20090141258A1 Imaging Device in a Projection Exposure Machine 审中-公开
标题翻译：投影曝光机中的成像装置
公开(公告)号：US20090141258A1
公开(公告)日：2009-06-04
申请号：US12363065
申请日：2009-01-30
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54 , G02B15/14
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译：用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。线性驱动器具有至少一个移动元件，移动元件具有剪切部分和提升部分。剪切部分被布置成移动光学元件，并且提升部分被布置成移动剪切部分。线性驱动器具有支撑元件，该支撑元件在通过提升部分移动剪切部分的同时与光学元件接触并防止其移动。

8. 发明申请

US20080080070A1 METHOD AND A DEVICE FOR POSITIONING AN ELEMENT IN AN OPTICAL SYSTEM 有权
标题翻译：用于在光学系统中定位元件的方法和装置
公开(公告)号：US20080080070A1
公开(公告)日：2008-04-03
申请号：US11861851
申请日：2007-09-26
申请人： Karl-Eugen Aubele
发明人： Karl-Eugen Aubele
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G03F7/70258
摘要： The disclosure generally relates to methods, devices, systems and components configured to position an element in a lens assembly, such as a lens assembly for microlithography, in which the element to be positioned is moved from an actual position to a target position via at least one actuator, and in which at least the positioning movement of the actuator is superimposed with an oscillating movement.
摘要翻译：本公开总体上涉及被配置为将元件定位在透镜组件中的方法，装置，系统和部件，例如用于微光刻的透镜组件，其中要定位的元件至少经由至少一个实际位置移动到目标位置一个致动器，并且其中致动器的至少定位运动以振荡运动叠加。

9. 发明授权

US08514371B2 Imaging device in a projection exposure facility 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US08514371B2
公开(公告)日：2013-08-20
申请号：US13096112
申请日：2011-04-28
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

10. 发明申请

US20110181857A1 OPTICAL ASSEMBLY 有权
标题翻译：光学装置
公开(公告)号：US20110181857A1
公开(公告)日：2011-07-28
申请号：US13046170
申请日：2011-03-11
申请人： Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
发明人： Hermann Bieg , Karl-Eugen Aubele , Yim-Bun Patrick Kwan , Stefan Xalter , Martin Schmidt , Saverio Sanvido , Uy-Liem Nguyen
IPC分类号： G03B27/54
CPC分类号： G02B7/02 , G02B7/005 , G02B7/008 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/028 , G02B7/1827
摘要： An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.
摘要翻译：一种光学组件，其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部，其包括至少一个光学元件，特别是透镜，反射镜或孔，其中所述至少一个元件由至少一个操纵器影响的特征在于，所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中，并且提供操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。

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