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1. 发明授权

US07548387B2 Optical imaging device 有权
标题翻译：光学成像装置
公开(公告)号：US07548387B2
公开(公告)日：2009-06-16
申请号：US11278850
申请日：2006-04-06
申请人： Thorsten Rassel , Erich Merz , Martin Mahlmann
发明人： Thorsten Rassel , Erich Merz , Martin Mahlmann
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , F16C32/0603 , F16C32/0692 , F16C33/72 , G02B7/02 , G03F7/70266 , G03F7/70816
摘要： An optical imaging device (1a) has at least one optical element (2) which is provided with an outer frame (1), an inner ring (4) in which the optical element (2) is mounted, and a manipulator instrument having at least one actuator. Contactless linkage of the inner ring (4) to the outer frame (1) is provided in at least one degree of freedom by means of a support (5) arranged between the inner ring (4) and the outer frame (1). The manipulator instrument has at least one actuator (8), the setting forces and/or bearing forces of which act contactlessly on the inner ring (4), for mounting and/or positioning and/or manipulating the inner ring (4) relative to the outer frame (1).
摘要翻译：光学成像装置（1a）具有至少一个光学元件（2），该光学元件设置有外框架（1），安装有光学元件（2）的内圈（4）至少一个执行器。通过设置在内环（4）和外框架（1）之间的支撑件（5），内环（4）与外框架（1）的非接触连接以至少一个自由度提供。操纵器具有至少一个致动器（8），其设定力和/或承载力在内圈（4）上非接触地作用，用于相对于内环（4）的安装和/或定位和/或操纵内环（4）外框架（1）。

2. 发明申请

US20090040487A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US20090040487A1
公开(公告)日：2009-02-12
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

3. 发明申请

US20080174757A1 IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE 失效
标题翻译：投影曝光机成像装置
公开(公告)号：US20080174757A1
公开(公告)日：2008-07-24
申请号：US11936768
申请日：2007-11-07
申请人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muhlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schongart , Markus Neumaier , Barbel Trossbach , Ulrich Weber , Michael Muhlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

4. 发明授权

US06388823B1 Optical system, especially a projection light facility for microlithography 有权
标题翻译：光学系统，特别是用于微光刻的投影光设备
公开(公告)号：US06388823B1
公开(公告)日：2002-05-14
申请号：US09486017
申请日：2000-07-22
申请人： Erwin Gaber , Christian Wagner , Hubert Holderer , Michael Gerhard , Erich Merz , Jochen Becker , Arie Cornelis Scheiberlich
发明人： Erwin Gaber , Christian Wagner , Hubert Holderer , Michael Gerhard , Erich Merz , Jochen Becker , Arie Cornelis Scheiberlich
IPC分类号： G02B702
CPC分类号： G03F7/70825 , G02B7/023 , G02B7/028 , G02B27/0068 , G03F7/70241 , G03F7/70358 , G03F7/70783
摘要： An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.
摘要翻译：光学系统，特别是用于微光刻的投影曝光装置，具有狭缝形的图像场或不是旋转对称的照明，具有光学元件，特别是布置在安装件（2）中的透镜或反射镜，，以及致动器（3），其至少大致垂直于光轴接合在光学元件（1）上。致动器（3）在光学元件（1）上产生不是旋转对称的并且与径向偏离的力或力矩，用于产生基本上没有厚度变化的弯曲。

5. 发明授权

US06307688B1 Optical system, in particular projection-illumination unit used in microlithography 有权
标题翻译：光学系统，特别是用于微光刻的投影曝光单元
公开(公告)号：US06307688B1
公开(公告)日：2001-10-23
申请号：US09444815
申请日：1999-11-22
申请人： Erich Merz , Jochen Becker
发明人： Erich Merz , Jochen Becker
IPC分类号： G02B702
CPC分类号： G03F7/70941 , G02B7/008 , G02B7/023 , G02B7/028 , G02B7/1827 , G03F7/70241 , G03F7/70258 , G03F7/70825 , G03F7/70891
摘要： An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and actuators 8a, 8b and 9a, 9b. A plurality of actuators 8a, 8b and 9a, 9b act on the deformable inner ring 2 via a radial force-displacement transmission 12, 13 in order to generate tensile and/or compressive forces.
摘要翻译：特别是用于微光刻中的投影曝光单元，特别是狭缝形视场或非旋转对称照明的光学系统具有光学元件1，特别是透镜或反射镜，其被布置在安装件7或内圈2以及致动器8a，8b和9a，9b。多个致动器8a，8b和9a，9b经由径向力位移变速器12,13作用在可变形的内环2上，以产生拉伸和/或压缩力。

6. 发明申请

US20110199597A1 IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US20110199597A1
公开(公告)日：2011-08-18
申请号：US13096112
申请日：2011-04-28
申请人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Jurgen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schöngart , Markus Neumaier , Bärbel Trossbach , Ulrich Weber , Michael Mühlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/52
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

7. 发明授权

US07768721B2 Optical assembly, projection exposure apparatus and projection objective 有权
标题翻译：光学组件，投影曝光装置和投影物镜
公开(公告)号：US07768721B2
公开(公告)日：2010-08-03
申请号：US12143322
申请日：2008-06-20
申请人： Jochen Weber , Erich Merz , Ole Fluegge , Kai-Uwe Berroth , Cornelia Buehler , Markus Hauf
发明人： Jochen Weber , Erich Merz , Ole Fluegge , Kai-Uwe Berroth , Cornelia Buehler , Markus Hauf
IPC分类号： G02B7/02
CPC分类号： G03F7/70825
摘要： In some embodiments, the disclosure relates to an optical assembly that includes an optical element and a structure element. A gap runs between the optical element and the structure element. A sealing element may be present to seal the gap. At least one liquid layer may be arranged between the structure element and/or the optical element, and the sealing element so that a relative displacement of the sealing element with respect to the structure element and/or the optical element is possible in the direction of the layer plane.
摘要翻译：在一些实施例中，本公开涉及一种包括光学元件和结构元件的光学组件。间隙在光学元件和结构元件之间延伸。可以存在密封元件以密封间隙。至少一个液体层可以布置在结构元件和/或光学元件和密封元件之间，使得密封元件相对于结构元件和/或光学元件的相对位移可以在层平面。

8. 发明申请

US20060164619A1 Imaging device in a projection exposure machine 有权
标题翻译：投影曝光机中的成像装置
公开(公告)号：US20060164619A1
公开(公告)日：2006-07-27
申请号：US11316160
申请日：2005-12-21
申请人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Stephan Back , Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Schwaer , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70258
摘要： An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.
摘要翻译：用于微光刻的投影曝光机中的成像装置包括至少一个光学元件和至少一个操纵器，用于操纵光学元件的位置的线性驱动器。所述线性驱动器具有至少一个移动元件，所述移动元件具有剪切部分和提升部分。所述剪切部分被布置成移动光学元件，并且所述提升部分被布置成移动所述剪切部分。所述线性驱动器具有支撑元件，该支撑元件在剪切部分被提升部分移动的同时与光学元件接触并防止其移动。

9. 发明授权

US08810934B2 Positioning method for an optical arrangement of a projection illumination system 有权
标题翻译：投影照明系统的光学布置的定位方法
公开(公告)号：US08810934B2
公开(公告)日：2014-08-19
申请号：US13050155
申请日：2011-03-17
申请人： Karl-Eugen Aubele , Erich Merz , Thorsten Rassel
发明人： Karl-Eugen Aubele , Erich Merz , Thorsten Rassel
IPC分类号： G02B7/02 , G03B27/54 , G03B27/32
CPC分类号： G02B27/62 , G03F7/70258 , G03F7/70525
摘要： The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.
摘要翻译：本公开涉及一种用于生产和/或调整投影照明系统的光学装置的方法，其中至少一个致动器用于通过移动光学元件来设置要操纵的至少一个光学元件的位置递增地以特定的增量大小。移动增量的增量大小被设置为光学元件距离期望位置的距离的函数，距离由距离值表示。如果距离值高于第一阈值，则设定基本上恒定的增量大小，而如果距离值低于第一阈值，则特定增量大小随着与期望位置的距离而减小。或者或另外，与特定增量尺寸和/或预先规定的增量尺寸变化率的预定偏差导致警告信号和/或停止运动。

10. 发明授权

US07961294B2 Imaging device in a projection exposure facility 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US07961294B2
公开(公告)日：2011-06-14
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42 , G03B27/52 , G03B7/02
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

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