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1. 发明专利

JP2010115805A Image forming apparatus 审中-公开
标题翻译：图像形成装置
公开(公告)号：JP2010115805A
公开(公告)日：2010-05-27
申请号：JP2008289101
申请日：2008-11-11
申请人： Ebara Corp , Murata Machinery Ltd , Okutekku:Kk , 村田機械株式会社 , 株式会社オクテック , 株式会社荏原製作所
发明人： MURAKAMI TAKESHI , SOFUGAWA TAKUJI , OKUMURA KATSUYA , SOJO YOSHIHIRO
IPC分类号： B41J2/385 , G03G15/05
摘要： PROBLEM TO BE SOLVED: To provide an image forming apparatus which can carry out thick-film printing at a higher speed and with high accuracy. SOLUTION: The image forming apparatus 1 includes: a supply device 10 which supplies fine particles 100; an imaging device 20 which forms a thick-film image by hitting and adhering the fine particles 100 to a surface of an imaging object 40 after electrically charging and emitting the fine particles 100, focusing and deflecting a flow of the flying fine particles 100; and a fixing device 30 which fixes the thick-film image formed on the imaging object 40. The imaging device 20 includes a blade 200 which electrically charges the fine particles 100, a pair of supply electrode 210 and an anode electrode 230 which emit the charged fine particles 100, a suppressor electrode 220 which permits or prohibits emission of the fine particles 100, a focus electrode 240 which focuses the flow of the emitted fine particles 100 by an electric field, a deflecting electrode 250 which deflects a direction of the flow of the focused fine particles 100, and a target electrode 260 which adheres the fine particles 100 to the imaging object 40 by impacting. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够以更高的速度和高精度进行厚膜印刷的图像形成装置。解决方案：图像形成装置1包括：供给装置10，其供给微粒100; 成像装置20，其在充电和发射微粒100之后，将微粒100击打并粘附到成像对象40的表面上，形成厚膜图像，聚焦和偏转飞行微粒100的流动; 以及固定装置30，其固定形成在成像对象物40上的厚膜图像。成像装置20包括对微粒100进行电荷的刀片200，一对供给电极210和发射带电的阳极电极230 微粒100，允许或禁止发射微粒100的抑制电极220，通过电场聚焦发射的细颗粒100的流动的聚焦电极240，偏转电极250，其偏转方向聚焦细颗粒100和通过冲击将微粒100粘附到成像对象40的目标电极260。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2011192654A Sample surface inspection method and inspection device 有权
标题翻译：样品表面检查方法和检验装置
公开(公告)号：JP2011192654A
公开(公告)日：2011-09-29
申请号：JP2011108943
申请日：2011-05-16
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMICHI SHINJI , NAITO YOSHIHIKO , SOFUGAWA TAKUJI , TERAO KENJI , HATAKEYAMA MASAKI , OKUMURA KATSUYA
IPC分类号： H01J37/21 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/66
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a method and device where highly accurate sample surface inspection can be carried out. SOLUTION: In the method to inspect a sample surface, an electron beam type sample surface inspecting device is used. In the method to inspect the sample surface by emitting electron beams generated from an electron gun of the sample surface inspecting device to the sample surface and by focusing secondary electrons generated from the sample surface toward an electron-detecting face of a detector, a focusing condition of the secondary electrons on the detecting face of the detector is controlled so that potential of the sample surface varies according to the amount of the electron beams emitted on the sample surface. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供可以进行高精度的样品表面检查的方法和装置。
解决方案：在检查样品表面的方法中，使用电子束型样品表面检查装置。在通过将从样品表面检查装置的电子枪产生的电子束发射到样品表面并通过将从样品表面产生的二次电子聚焦到检测器的电子检测面的方法来检查样品表面，聚焦条件控制检测器的检测面上的二次电子，使得样品表面的电位根据在样品表面上发射的电子束的量而变化。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010123929A Extreme ultraviolet light source apparatus 审中-公开
标题翻译：极光超光源光源装置
公开(公告)号：JP2010123929A
公开(公告)日：2010-06-03
申请号：JP2009242869
申请日：2009-10-21
申请人： Ebara Corp , Gigaphoton Inc , Topcon Corp , ギガフォトン株式会社 , 株式会社トプコン , 株式会社荏原製作所
发明人： NAGAI SHINJI , ISHIHARA TAKANOBU , KAKIZAKI KOJI , SOFUGAWA TAKUJI , MURAKAMI TAKESHI , INOUE MASAHIRO
IPC分类号： H01L21/027
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source apparatus that can collect debris influencing an optical element etc., in a chamber with simple constitution and obtain an EUV optical output having desired intensity.
SOLUTION: The extreme ultraviolet light source apparatus comprises: target supply units (a molten Sn tank 5 and a nozzle 6) supplying droplets 7 as a target into a vacuum chamber 1; an EUV light collector mirror Lb outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light Lb emitted from the droplets 7 being ionized as a plasma by irradiation with CO2 laser light La at a plasma luminescence point P1 in the vacuum chamber 1; and an ion debris removal unit 10 at least a portion of which is located in an obscuration region E including the plasma luminescence point P1.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在具有简单结构的室中收集影响光学元件等的碎片的极紫外光源装置，并获得具有期望强度的EUV光输出。解决方案：极紫外光源装置包括：向真空室1供给作为目标的液滴7的目标供给单元（熔融Sn罐5和喷嘴6）通过在真空室1中的等离子体发光点P1处通过用CO 2激光La照射，通过反射从液滴7发射的远紫外光Lb作为等离子体离子化而输出极紫外光的EUV聚光镜Lb; 以及离子碎片去除单元10，其至少一部分位于包括等离子体发光点P1的遮蔽区域E中。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2009235922A Turbo vacuum pump 有权
标题翻译：涡轮真空泵
公开(公告)号：JP2009235922A
公开(公告)日：2009-10-15
申请号：JP2008079535
申请日：2008-03-26
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KAWASAKI HIROYUKI , SOFUGAWA TAKUJI
IPC分类号： F04D19/04
摘要： PROBLEM TO BE SOLVED: To provide a turbo vacuum pump capable of compressing gas from high vacuum to the atmospheric pressure, keeping a rotor rotating at high speed with high accuracy, and being inexpensively manufactured. SOLUTION: The turbo vacuum pump is equipped with a rotation shaft 1 extending over approximately the whole length of the pump, a discharge part 10 formed by alternately arranging rotor blades and stator blades in a casing 2, and a bearing motor part 50 having a motor 51 which gives rotation driving force to the rotation shaft 1 and bearings 53, 54, 55 for rotatably supporting the rotation shaft 1. In the turbo vacuum pump, a gas bearing 40 is used as a bearing which supports the rotation shaft 1 in a thrust direction. Spiral grooves 45 are formed on both surfaces of a stationary side section 41 of the gas bearing. The stationary side section 41 formed with the spiral grooves 45 is sandwiched between an upper rotating side section 42 fixed to the rotation shaft 1 and a lower rotating side section 43. A spacer 46 is provided between the lower rotating side section 43 and an end face 1e of the rotation shaft 1. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够将气体从高真空压缩至大气压力的涡轮真空泵，保持转子高速高精度地转动，并且成本低廉。解决方案：涡轮真空泵配备有在泵的整个长度上延伸的旋转轴1，通过在壳体2中交替地设置转子叶片和定子叶片而形成的排出部分10，以及轴承马达部分50 具有向旋转轴1提供旋转驱动力的马达51和用于可旋转地支撑旋转轴1的轴承53,54,55。在涡轮真空泵中，气体轴承40用作支撑旋转轴1的轴承在推力方向。螺旋槽45形成在气体轴承的静止侧部41的两个表面上。形成有螺旋槽45的固定侧部41夹在固定在旋转轴1上的上部旋转侧部42和下部旋转侧部43之间。在下部旋转侧部43和端面 1E的旋转轴1.版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2007048754A Inspection device with charged particle beam and device manufacturing method using inspection device 有权
标题翻译：具有充电颗粒光束的检查装置和使用检查装置的装置制造方法
公开(公告)号：JP2007048754A
公开(公告)日：2007-02-22
申请号：JP2006232088
申请日：2006-08-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , OWADA SHIN , NISHIFUJI MUTSUMI , HAMASHIMA MUNEKI , TAKAGI TORU
IPC分类号： H01J37/28 , G01N23/225 , H01J37/147 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide a flaw inspection method equipped with an enhanced throughput capable of precluding a crosstalk between a plurality of electron beams and leading the discharged secondary electrons efficiently to a detector. SOLUTION: The apparent angle on a specimen surface 1010 viewed from an objective lens is determined from the aperture angle and the magnification at the image surface 1005 of secondary electrons, and the receiving angle at the specimen surface is determined from the obtained apparent angle, the initial energy of the secondary electrons and the beam potential of the objective lens, followed by determining the yield of the secondary electrons on the basis of the obtained receiving angle, and on the basis of the resolution decided by the aperture angle, the spacing of irradiation with adjoining primary electron beams is separated to a distance or more which does not present a problem of crosstalk. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有能够排除多个电子束之间的串扰并且将放电的二次电子有效地引导到检测器的增强的吞吐量的缺陷检查方法。解决方案：从物镜观察的样品表面1010上的视角根据二次电子的图像表面1005的孔径角和倍率确定，并且从获得的表观上确定样品表面处的接收角度角度，二次电子的初始能量和物镜的光束电位，然后基于获得的接收角确定二次电子的产量，并且基于由孔径角决定的分辨率，相邻的一次电子束的照射间隔被分离到一定距离以上，这不会产生串扰的问题。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2005235777A Inspection apparatus and method by electron beam, and device manufacturing method using the inspection apparatus 审中-公开
标题翻译：电子束的检查装置和方法以及使用检查装置的装置制造方法
公开(公告)号：JP2005235777A
公开(公告)日：2005-09-02
申请号：JP2005061093
申请日：2005-03-04
申请人： Ebara Corp , Toshiba Corp , 株式会社東芝 , 株式会社荏原製作所
发明人： YAMAZAKI YUICHIRO , WATANABE KENJI , SOFUGAWA TAKUJI , NOMICHI SHINJI , SATAKE TORU , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , NAKASUJI MAMORU , HATAKEYAMA MASAKI , MURAKAMI TAKESHI , NAGAHAMA ICHIROTA , NAGAI TAKAMITSU , SUGIHARA KAZUYOSHI
IPC分类号： H01L21/66 , H01J37/29
摘要： PROBLEM TO BE SOLVED: To improve an inspection speed detecting a failure of a sample of a wafer, etc. SOLUTION: An inspection apparatus by an electron beam is one of a mapping projection type and comprises: a primary electron optical system for forming the electron beam emitted from en electron gun into a rectangle and irradiating onto a face of a sample to be inspected; a secondary electron optical system for converging secondary electrons emitted from the sample; a detection device for converting the converged secondary electrons into an optical image through a fluorescent plate to image them to a line sensor; and a control device for controlling charge moving time to transfer the line image which is imaged in a pixel string provided with the line sensor, cooperatively with the moving speed of a stage to move the sample. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提高检测晶片样品故障等的检查速度。解决方案：电子束检查装置是映射投影型之一，包括：一次电子用于将从电子枪发射的电子束形成矩形并照射到要检查的样品的面上的光学系统; 用于会聚从样品发射的二次电子的二次电子光学系统; 检测装置，用于通过荧光板将会聚的二次电子转换为光学图像，以将其成像到线传感器; 以及控制装置，用于控制电荷移动时间，以便与用于移动样本的载物台的移动速度协调地传送被成像在设置有线传感器的像素串中的线图像。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2004363085A Inspection apparatus by charged particle beam and method for manufacturing device using inspection apparatus 审中-公开
公开(公告)号：JP2004363085A
公开(公告)日：2004-12-24
申请号：JP2004031749
申请日：2004-02-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOMICHI SHINJI , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TANABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： G01B15/00 , G01N23/20 , G01N23/225 , H01J37/05 , H01J37/06 , H01J37/09 , H01J37/12 , H01J37/147 , H01J37/153 , H01J37/16 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01J37/29 , H01L21/66
CPC分类号： G01N23/225 , H01J37/05 , H01J37/28 , H01J2237/2441 , H01J2237/2446 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide a system for further increasing an inspection speed of an inspection apparatus in an SEM system, namely for increasing throughput. SOLUTION: The inspection apparatus for inspecting the surface of a substrate creates a crossover from electrons generated from an electron source 25-1, then, an image is formed with a desired magnification in the direction of a sample W, and the crossover is created. When the crossover is passed, an electron that becomes noise is removed from the crossover by an aperture, the crossover is set to have a desired magnification, an adjustment is made so that the crossover becomes a parallel electron beam, and a substrate is irradiated with light in a desired sectional shape. Electron rays are created so that irregularities in illumination in the electron rays is 10% or less. Electrons discharged from the sample W are detected by a detector 25-11. COPYRIGHT: (C)2005,JPO&NCIPI

8. 发明专利

JP2014239050A 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法审中-公开
标题翻译：通过充电颗粒的检查装置和使用其的装置制造方法
公开(公告)号：JP2014239050A
公开(公告)日：2014-12-18
申请号：JP2014147706
申请日：2014-07-18
申请人：株式会社荏原製作所 , Ebara Corp
发明人： NOJI NOBUHARU , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： H01J37/20 , G01N23/225 , H01J37/29 , H01L21/66
摘要：【課題】試料表面の帯電量のむらを防止することができる検査装置を提供する。【解決手段】一次電子ビームを試料Wに照射していないときに、電極59.18と電荷検出器59.23とを切換スイッチ59.19を介して接続した状態で、該電極59.18の帯電量を電荷検出器59.23により検出し、その後、切換スイッチ59.19を切り換えて電極59.18と電圧発生器59.21とを接続して、帯電量の電荷を相殺するための電圧を電圧発生器59.21から発生して電極59.18に印加する。上記した処理は、検出系59.4のCCD59.16が画像の1走査分を補足した後の空き時間に実行される。【選択図】図59
摘要翻译：要解决的问题：提供一种能够防止产生样品表面的不一致充电量的检查装置。解决方案：当样品W未被一次电子束照射时，电极59.18的充电量由电荷检测器 59.23在电极59.18通过转换开关59.19与充电检测器59.23连接的状态下，转换开关59.19然后被切换，电极59.18与电压发生器59.21连接，以产生电压从电压发生器59.21取消充电量的电荷并将电压施加到电极59.18。在检测系统59.4的CCD 59.16补充一次扫描的图像之后的空闲时间期间执行上述处理。

9. 发明专利

JP2014138163A Electronic exposure apparatus 审中-公开
标题翻译：电子曝光装置
公开(公告)号：JP2014138163A
公开(公告)日：2014-07-28
申请号：JP2013007434
申请日：2013-01-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： MURAKAMI TAKESHI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide an electronic exposure apparatus which allows for drastic reduction in the time required for stage movement or stage establishment, while enhancing the throughput drastically.SOLUTION: An electronic exposure apparatus 1 includes: a surface pattern electron generation unit 2 for generating electrons in planar pattern; a surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation unit 2; and a mapping projection unit 9 for projection mapping the electrons generated from the surface pattern electron generation unit 2 to an imaging position on the exposed surface of an exposed member S. The mapping projection unit 9 is arranged in the vicinity of the surface pattern electron generation unit 2, and includes an electromagnetic lens 14 for generating magnetic field lines penetrating the surface pattern electron generation unit 2, and a magnetic field control unit 15 for making the electrons generated from the surface pattern electron generation unit 2 form an image a plurality of times by the magnetic field of the electromagnetic lens 14 alone, by controlling the strength of a magnetic field generated from the electromagnetic lens 14.
摘要翻译：要解决的问题：提供一种电子曝光装置，其能够大幅度减少舞台移动或舞台建立所需的时间，同时大幅提高吞吐量。电子曝光装置1包括：表面图案电子产生单元2，用于以平面图形生成电子; 用于控制从表面图案电子产生单元2产生的电子图案的表面图案控制单元3; 以及映射投影单元9，用于将从表面图案电子产生单元2产生的电子投射到暴露部件S的暴露表面上的成像位置。映射投影单元9布置在表面图案电子生成单元2，并且包括用于产生穿过表面图案电子产生单元2的磁场线的电磁透镜14和用于使从表面图案电子产生单元2产生的电子多次形成图像的磁场控制单元15 仅通过电磁透镜14的磁场，通过控制从电磁透镜14产生的磁场的强度。

10. 发明专利

JP2014120675A Electronic exposure device 审中-公开
标题翻译：电子曝光装置
公开(公告)号：JP2014120675A
公开(公告)日：2014-06-30
申请号：JP2012275970
申请日：2012-12-18
申请人： Ebara Corp , 株式会社荏原製作所
发明人： MURAKAMI TAKESHI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU
IPC分类号： H01L21/027 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide an electronic exposure device in which the time required for movement control of a stage can be reduced significantly, while enhancing the throughput significantly.SOLUTION: An electronic exposure device 1 includes a surface pattern electron generation part 2 for generating electrons in a planar pattern, a surface pattern control unit 3 for controlling the pattern of electrons generated from the surface pattern electron generation part 2, a stage 7 on which an exposed member is mounted, a stage movement control unit 8 for controlling movement of the stage 7, and a mapping projection unit 9 for projection mapping the electrons generated from the surface pattern electron generation part 2 to the imaging position on the exposed surface of an exposed member S. When performing electronic exposure to the exposed surface while moving the stage 7 continuously, the surface pattern control unit 3 changes the pattern of electrons generated from the surface pattern electron generation part 2 synchronously with the movement of the stage 7.
摘要翻译：要解决的问题：提供一种电子曝光装置，其中能够显着降低舞台的移动控制所需的时间，同时显着提高吞吐量。电子曝光装置1包括：表面图案电子产生部分2，用于产生平面图形中的电子，用于控制从表面图案电子产生部分2产生的电子图案的表面图案控制单元3，安装有暴露部件的台架7，用于控制表面图案电子产生部分2的移动的台架移动控制单元8 阶段7和映射投影单元9，用于将从表面图案电子产生部分2产生的电子投射到暴露部件S的暴露表面上的成像位置。当在移动台架7的同时执行电子暴露于暴露表面表面图案控制单元3连续地改变从表面图案生成的电子的图案电子产生部分2与舞台7的运动同步。

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