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1. 发明申请

WO2005102872A3 SUBSTRATE CONTAINER WITH FLUID-SEALING FLOW PASSAGEWAY 审中-公开
标题翻译：带流体密封流量的基座容器
公开(公告)号：WO2005102872A3
公开(公告)日：2006-12-21
申请号：PCT/US2005013261
申请日：2005-04-18
申请人： ENTEGRIS INC , TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
发明人： TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
IPC分类号： B65D85/30 , H01L21/00 , H01L21/673
CPC分类号： H01L21/67017 , H01L21/67126 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67769
摘要： A substrate container includes an enclosure and an access structure formed in the enclosure and providing fluid access through the enclosure to an interior of the substrate container. The access structure includes an opening and an inner surface. A grommet is situated against the inner surface of the access structure.
摘要翻译：基底容器包括外壳和形成在外壳中的进入结构，并且通过外壳提供流体进入到基底容器的内部。进入结构包括开口和内表面。索环位于接近结构的内表面上。

2. 发明申请

WO2005102870A3 WAFER CONTAINER DOOR WITH PARTICULATE COLLECTING STRUCTURE 审中-公开
标题翻译：具有颗粒收集结构的水箱门
公开(公告)号：WO2005102870A3
公开(公告)日：2007-03-15
申请号：PCT/US2005013162
申请日：2005-04-18
申请人： ENTEGRIS INC , TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
发明人： TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
IPC分类号： B65D45/16 , B65D85/00 , B65D85/30 , B65D85/48 , H01L21/673
CPC分类号： H01L21/67373 , H01L21/67393 , Y10S206/832
摘要： A substrate container (20) having an enclosure (22) with an access opening (26) for inserting and removing substrates into an interior the enclosure and a door chassis (40A) that is configured to selectively enclose the opening. The door chassis comprising a first wall having a peripheral wall extending therefrom. The substrate container includes a latch mechanism (50) that is operably coupled with the chassis, the latch mechanism configured to operably secure the chassis to the opening. The door of the substrate container include a textured particle capture region (75) wherein particles generated by the latch mechanism and elsewhere are captured by the particle capture region.
摘要翻译：一种具有外壳（22）的基板容器（20），其具有用于将基板插入和移除到外壳内部的进入开口（26），以及构造成选择性地封闭开口的门框（40A）。门底盘包括具有从其延伸的周壁的第一壁。基板容器包括与底盘可操作地联接的闩锁机构（50），所述闩锁机构构造成将底盘可操作地固定到开口。基板容器的门包括纹理粒子捕获区域（75），其中由所述闩锁机构和其他地方产生的颗粒被所述颗粒捕获区域捕获。

3. 发明申请

WO2005102871A2 WAFER CONTAINER WITH SEALABLE DOOR 审中-公开
标题翻译：带密封门的水箱
公开(公告)号：WO2005102871A2
公开(公告)日：2005-11-03
申请号：PCT/US2005013166
申请日：2005-04-18
申请人： ENTEGRIS INC , TIEBEN ANTHONY MATHIUS , LYSTAD JOHN
发明人： TIEBEN ANTHONY MATHIUS , LYSTAD JOHN
IPC分类号： B65D85/00 , B65D85/30 , H01L21/00 , H01L21/673
CPC分类号： H01L21/67376 , H01L21/67126
摘要： A wafer container including an enclosure portion with a door frame defining an opening for insertion and removal of wafers and a door fittable in the door frame to seal the enclosure portion. A continuous elastomeric seal extends around the door inward of the periphery. The seal is positioned on a sealing surface proximate the perimeter of the door and may be partially inset in a radial groove in the door. In cross-section, the elastomeric seal has an inset portion and a sealing head coupled by a bridging portion. The sealing head has a foot portion projecting from the bridging portion toward the sealing surface of the door, and a head portion extending in a direction generally opposite the foot relative to the bridging portion. The door frame has a seal engaging structure so that when the door is seated in the door frame, the bridging portion of the elastomeric seal contacts the seal engaging structure displacing the bridging portion axially toward the sealing surface and causing the head of the sealing head to rotate radially and contact the seal engaging structure. The displacement action also affirmatively sets the foot of the sealing head in contact with the sealing surface of the door.
摘要翻译：一种晶片容器，其包括具有限定用于插入和移除晶片的开口的门框的封闭部分和可装配在门框中以密封外壳部分的门。连续的弹性密封件围绕着门的周边延伸。密封件位于靠近门的周边的密封表面上，并且可以部分地插入门的径向凹槽中。在横截面中，弹性体密封件具有插入部分和通过桥接部分联接的密封头。密封头具有从桥接部分朝向门的密封表面突出的脚部，以及相对于桥接部分大致相对于脚的方向延伸的头部。门框具有密封接合结构，使得当门被安置在门框中时，弹性体密封件的桥接部分接触密封接合结构，使桥接部分轴向朝向密封表面移动，并使密封头的头部径向旋转并接触密封接合结构。位移动作还肯定地将密封头的脚部与门的密封面接触。

4. 发明申请

WO2007038504A3 RETICLE POD 审中-公开
公开(公告)号：WO2007038504A3
公开(公告)日：2007-06-28
申请号：PCT/US2006037465
申请日：2006-09-27
申请人： ENTEGRIS INC , KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： B65D85/48
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.
摘要翻译：提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触，其与晶片或掩模版配合以提供扩散屏障，以抵抗沉淀在晶片或掩模版的表面上的颗粒。该容器包括具有平坦抛光表面的底座，该表面具有突起，晶片或标线贴在其上。突起具有几何形状，例如球体，其赋予与晶片或掩模版的最小接触，并且将晶片或掩模版悬挂在基座上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，但其尺寸设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上的可移动的分划板针可提供掩模版限制。双重安全壳实施例提供了进一步的隔离和保护。

5. 发明专利

JP2012177930A Reticle pod 有权
标题翻译： RETICLE POD
公开(公告)号：JP2012177930A
公开(公告)日：2012-09-13
申请号：JP2012104706
申请日：2012-05-01
申请人： Entegris Inc , インテグリス・インコーポレーテッド
发明人： STEVEN P KOLBOW , MCMULLEN KEVIN , TIEVEN ANTHONY M , MATTHEW KUSZ , CHRISTIAN ANDERSEN , HOWPING WONG , MICHAEL CISEWSKI , MICHAEL L JOHNSON , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： G03F1/66 , B65D85/86 , H01L21/027
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： PROBLEM TO BE SOLVED: To provide a container that provides support structure and environmental control means including minimal contact that cooperates with a wafer or reticle to provide a diffusion barrier, which mitigates fine particles placed on a face of the wafer or reticle.SOLUTION: The container includes a base having a flat polished surface with protrusions upon which the wafer or reticle rests. The protrusions have a geometry as a sphere that provides minimal contact with the wafer or reticle and suspend the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat polished surface of the base, and inhibits migration of fine particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on a top cover provide reticle restraint. Dual pod embodiment provides further isolation and protection.
摘要翻译：要解决的问题：提供一种提供支撑结构和环境控制装置的容器，其包括与晶片或掩模版配合的最小接触以提供扩散阻挡层，其减轻放置在晶片或掩模版的表面上的细颗粒。解决方案：容器包括具有平坦的抛光表面的基座，其上具有突起，晶片或掩模贴在该基底上。这些突起具有作为球体的几何形状，其提供与晶片或掩模版的最小接触并将晶片或掩模版悬挂在基底上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，并且抑制细颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上可移动的标线杆销可提供掩模版限制。双荚实施例提供进一步的隔离和保护。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2011181930A Method of purging wafer container 有权
标题翻译：冲洗容器的方法
公开(公告)号：JP2011181930A
公开(公告)日：2011-09-15
申请号：JP2011042017
申请日：2011-02-28
申请人： Entegris Inc , インテグリス・インコーポレーテッド
发明人： TIEBEN ANTHONY MATHIUS , LYSTAD JOHN , HALBMAIER DAVID L
IPC分类号： H01L21/673 , B65D81/20 , B65D85/30 , B65D85/86 , H01L21/00
CPC分类号： H01L21/67017 , H01L21/67126 , H01L21/67379 , H01L21/67389 , H01L21/67393 , H01L21/67769
摘要： PROBLEM TO BE SOLVED: To provide a method capable of easily purging the inside of a wafer container.
SOLUTION: The method includes: a step of coupling a purge gas source with grommets 124 and 125 formed of an elastic material providing channel communicating between the inside and the outside of the wafer container and a seating surface exposed outside the wafer container; and a step of leading a purge gas into the wafer container.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够容易地清洗晶片容器内部的方法。该方法包括：将吹扫气体源与由晶片容器的内部和外部之间连通的弹性材料形成的弹性材料形成的吹扫气体源和暴露在晶片容器外部的就座表面的步骤; 以及将清洗气体引入晶片容器的步骤。版权所有（C）2011，JPO＆INPIT

7. 发明专利

SG165407A1 RETICLE POD 未知
公开(公告)号：SG165407A1
公开(公告)日：2010-10-28
申请号：SG2010068617
申请日：2006-09-27
申请人： ENTEGRIS INC
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint.Dual containment pod embodiment provides further isolation and protection.

8. 发明专利

SG10201400835QA Reticle Pod 未知
公开(公告)号：SG10201400835QA
公开(公告)日：2014-07-30
申请号：SG10201400835Q
申请日：2006-09-27
申请人： ENTEGRIS INC
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

9. 发明公开

EP2909110A4 RETICLE POD WITH COVER TO BASEPLATE ALIGNMENT SYSTEM 有权
标题翻译： MASKENHALTER MIT系统ZUR AUSRICHTUNG DER ABDECKUNG MIT DER GRUNDPLATTE
公开(公告)号：EP2909110A4
公开(公告)日：2016-08-24
申请号：EP13847167
申请日：2013-10-17
申请人： ENTEGRIS INC
发明人： LYSTAD JOHN , KOLBOW STEVEN P
IPC分类号： H01L21/673 , G03F1/66 , G03F7/20
CPC分类号： B65D85/48 , B65D25/10 , B65D25/14 , B65D43/02 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67373 , H01L21/67383 , H01L21/67386 , Y10T29/49895
摘要： An alignment system for aligning the cover and base of an inner pod of a reticle carrier. The cover and base can each be provided with hard planar surface seal zones on the bottom surface and the top surface, respectively. The cover of the inner pod may be provided with a through hole or a blind hole into which an alignment pin is disposed. The base is provided with a guide recess to receive the distal end of the alignment pin. The alignment pin operates to limit contact surface area between the cover and the base during that is in sliding contact, thus inhibiting particulate generation. Low particulate-generating materials, such as stainless steel or polyamide-imide, can also be utilized to further reduce particulate generation. Furthermore, the cover and base can each be unitary without need for fastening components thereto, thereby eliminating clamped surfaces that can entrap and subsequently shed particulates.
摘要翻译：对准系统，用于对准掩模载体的内部盒的盖和底座。盖子和底座可以分别在底面和顶面上设置硬平坦的表面密封区域。内部容器的盖可以设置有通孔或盲孔，对准销布置在该通孔或盲孔中。基座设置有用于接收对准销的远端的引导凹部。在滑动接触期间，对准销操作以限制盖和基座之间的接触表面积，从而抑制颗粒的产生。还可以使用低颗粒产生材料，例如不锈钢或聚酰胺 - 酰亚胺，以进一步减少颗粒产生。此外，盖和基座可以是单一的，而不需要紧固部件，从而消除夹带和随后脱落的颗粒的夹紧表面。

10. 发明公开

EP1928764A4 RETICLE POD 有权转让
标题翻译：光罩
公开(公告)号：EP1928764A4
公开(公告)日：2010-08-04
申请号：EP06815463
申请日：2006-09-27
申请人： ENTEGRIS INC
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： H01L21/67
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386

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