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1. 发明申请

WO2007038504A3 RETICLE POD 审中-公开
公开(公告)号：WO2007038504A3
公开(公告)日：2007-06-28
申请号：PCT/US2006037465
申请日：2006-09-27
申请人： ENTEGRIS INC , KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： B65D85/48
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection.
摘要翻译：提供支撑结构和环境控制装置的容器包括例如与其中包含的晶片或掩模版的最小接触，其与晶片或掩模版配合以提供扩散屏障，以抵抗沉淀在晶片或掩模版的表面上的颗粒。该容器包括具有平坦抛光表面的底座，该表面具有突起，晶片或标线贴在其上。突起具有几何形状，例如球体，其赋予与晶片或掩模版的最小接触，并且将晶片或掩模版悬挂在基座上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，但其尺寸设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上的可移动的分划板针可提供掩模版限制。双重安全壳实施例提供了进一步的隔离和保护。

2. 发明专利

JP2012177930A Reticle pod 有权
标题翻译： RETICLE POD
公开(公告)号：JP2012177930A
公开(公告)日：2012-09-13
申请号：JP2012104706
申请日：2012-05-01
申请人： Entegris Inc , インテグリス・インコーポレーテッド
发明人： STEVEN P KOLBOW , MCMULLEN KEVIN , TIEVEN ANTHONY M , MATTHEW KUSZ , CHRISTIAN ANDERSEN , HOWPING WONG , MICHAEL CISEWSKI , MICHAEL L JOHNSON , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： G03F1/66 , B65D85/86 , H01L21/027
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： PROBLEM TO BE SOLVED: To provide a container that provides support structure and environmental control means including minimal contact that cooperates with a wafer or reticle to provide a diffusion barrier, which mitigates fine particles placed on a face of the wafer or reticle.SOLUTION: The container includes a base having a flat polished surface with protrusions upon which the wafer or reticle rests. The protrusions have a geometry as a sphere that provides minimal contact with the wafer or reticle and suspend the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat polished surface of the base, and inhibits migration of fine particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on a top cover provide reticle restraint. Dual pod embodiment provides further isolation and protection.
摘要翻译：要解决的问题：提供一种提供支撑结构和环境控制装置的容器，其包括与晶片或掩模版配合的最小接触以提供扩散阻挡层，其减轻放置在晶片或掩模版的表面上的细颗粒。解决方案：容器包括具有平坦的抛光表面的基座，其上具有突起，晶片或掩模贴在该基底上。这些突起具有作为球体的几何形状，其提供与晶片或掩模版的最小接触并将晶片或掩模版悬挂在基底上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，并且抑制细颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上可移动的标线杆销可提供掩模版限制。双荚实施例提供进一步的隔离和保护。版权所有（C）2012，JPO＆INPIT

3. 发明专利

SG165407A1 RETICLE POD 未知
公开(公告)号：SG165407A1
公开(公告)日：2010-10-28
申请号：SG2010068617
申请日：2006-09-27
申请人： ENTEGRIS INC
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
摘要： A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint.Dual containment pod embodiment provides further isolation and protection.

4. 发明专利

SG10201400835QA Reticle Pod 未知
公开(公告)号：SG10201400835QA
公开(公告)日：2014-07-30
申请号：SG10201400835Q
申请日：2006-09-27
申请人： ENTEGRIS INC
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

5. 发明公开

EP1928764A4 RETICLE POD 有权转让
标题翻译：光罩
公开(公告)号：EP1928764A4
公开(公告)日：2010-08-04
申请号：EP06815463
申请日：2006-09-27
申请人： ENTEGRIS INC
发明人： KOLBOW STEVEN P , MCMULLEN KEVIN , TIEBEN ANTHONY M , KUSZ MATTHEW , ANDERSEN CHRISTIAN , WANG HUAPING , CISEWSKI MICHAEL , JOHNSON MICHAEL L , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： H01L21/67
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386

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