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1. 发明专利

JP2012177930A Reticle pod 有权
标题翻译： RETICLE POD
公开(公告)号：JP2012177930A
公开(公告)日：2012-09-13
申请号：JP2012104706
申请日：2012-05-01
申请人： Entegris Inc , インテグリス・インコーポレーテッド
发明人： STEVEN P KOLBOW , MCMULLEN KEVIN , TIEVEN ANTHONY M , MATTHEW KUSZ , CHRISTIAN ANDERSEN , HOWPING WONG , MICHAEL CISEWSKI , MICHAEL L JOHNSON , HALBMAIER DAVID L , LYSTAD JOHN
IPC分类号： G03F1/66 , B65D85/86 , H01L21/027
CPC分类号： B65D85/48 , G03F1/66 , H01L21/67353 , H01L21/67359 , H01L21/67383 , H01L21/67386
摘要： PROBLEM TO BE SOLVED: To provide a container that provides support structure and environmental control means including minimal contact that cooperates with a wafer or reticle to provide a diffusion barrier, which mitigates fine particles placed on a face of the wafer or reticle.SOLUTION: The container includes a base having a flat polished surface with protrusions upon which the wafer or reticle rests. The protrusions have a geometry as a sphere that provides minimal contact with the wafer or reticle and suspend the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat polished surface of the base, and inhibits migration of fine particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on a top cover provide reticle restraint. Dual pod embodiment provides further isolation and protection.
摘要翻译：要解决的问题：提供一种提供支撑结构和环境控制装置的容器，其包括与晶片或掩模版配合的最小接触以提供扩散阻挡层，其减轻放置在晶片或掩模版的表面上的细颗粒。解决方案：容器包括具有平坦的抛光表面的基座，其上具有突起，晶片或掩模贴在该基底上。这些突起具有作为球体的几何形状，其提供与晶片或掩模版的最小接触并将晶片或掩模版悬挂在基底上，从而在其间提供间隙。间隙将晶片或掩模版与基底的平坦抛光表面隔离，并且抑制细颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。扩散过滤器提供压力平衡，无需过滤介质。顶盖上可移动的标线杆销可提供掩模版限制。双荚实施例提供进一步的隔离和保护。版权所有（C）2012，JPO＆INPIT

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