专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2006094100A2 RETICLE POD WITH ISOLATION SYSTEM 审中-公开
标题翻译：具有隔离系统的试剂盒
公开(公告)号：WO2006094100A2
公开(公告)日：2006-09-08
申请号：PCT/US2006/007370
申请日：2006-02-27
申请人： ENTEGRIS, INC. , GREGERSON, Barry , HALBMAIER, David , SUMNER, Stephen , WISEMAN, Brian , TIEBEN, Anthony, Mathius , STRIKE, Justin
发明人： GREGERSON, Barry , HALBMAIER, David , SUMNER, Stephen , WISEMAN, Brian , TIEBEN, Anthony, Mathius , STRIKE, Justin
IPC分类号： B65D85/00
CPC分类号： H01L21/67353 , G03F1/66 , G03F7/70741 , H01L21/67359 , H01L21/67369 , H01L21/67376 , H01L21/67386
摘要： The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.
摘要翻译：本发明提供了一种掩模版容器，其配备有容纳该掩模版并容纳在一次容器中的二次容器。次级容器被保持在具有冲击和隔振构件的主容器内，使得副容器在主容器内具有多个运动自由度。掩模版固定在次级容器内，使得从掩模版容器到掩模版的冲击和振动传播被大大衰减。

2. 发明申请

WO2006093939A3 SUBSTRATE CONTAINER WITH PRESSURE EQUALIZATION 审中-公开
公开(公告)号：WO2006093939A3
公开(公告)日：2006-09-08
申请号：PCT/US2006/007033
申请日：2006-02-27
申请人： ENTEGRIS, INC. , GREGERSON, Barry , HALBMAIER, David , SUMNER, Stephen , WISEMAN, Brian , TIEBEN, Anthony, Mathius , STRIKE, Justin
发明人： GREGERSON, Barry , HALBMAIER, David , SUMNER, Stephen , WISEMAN, Brian , TIEBEN, Anthony, Mathius , STRIKE, Justin
IPC分类号： B65G1/133
摘要： The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.

3. 发明申请

WO2004006012A3 A CARRIED FOR A RETICLE USED IN PHOTOLITHOGRAPHIC SEMICONDUCTOR 审中-公开
公开(公告)号：WO2004006012A3
公开(公告)日：2004-01-15
申请号：PCT/US2003/020071
申请日：2003-06-26
申请人： ENTEGRIS, INC. , WISEMAN, Brian , STRIKE, Justin
发明人： WISEMAN, Brian , STRIKE, Justin
IPC分类号： G03B27/62
摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticld positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.

4. 发明公开

EP1535112A2 RETICLE CARRIER 审中-公开
标题翻译：真空载体
公开(公告)号：EP1535112A2
公开(公告)日：2005-06-01
申请号：EP03742205.2
申请日：2003-06-26
申请人： Entegris, Inc.
发明人： WISEMAN, Brian , STRIKE, Justin
IPC分类号： G03B27/62
CPC分类号： G03F7/70741 , G03B21/62 , G03F1/66 , G03F7/70983
摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticld positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.
摘要翻译：一种用于光刻半导体处理中的掩模版的载体，具有基部和覆盖部。基座部分具有多个光罩支架和多个网格定位部件。盖部适于密封地与基部配合，并且具有内表面，该内表面具有多个间隔开的掩模版约束装置和从其向内突出的一对掩模版定位片。每个光罩定位翼片具有对角边缘部分，并且被定向为使得当罩盖部分与基部配合时，对角边缘部分促使搁置在光罩支架上的光罩与光罩约束件接合。

5. 发明公开

EP1858780A2 SUBSTRATE CONTAINER WITH PRESSURE EQUALIZATION 审中-公开
标题翻译：带压力补偿基底容器
公开(公告)号：EP1858780A2
公开(公告)日：2007-11-28
申请号：EP06736372.1
申请日：2006-02-27
申请人： ENTEGRIS, INC.
发明人： GREGERSON, Barry , HALBMAIER, David , SUMMER, Stephen , WISEMAN, Brian , TIEBEN, Anthony Mathius , STRIKE, Justin
IPC分类号： B65G1/133
CPC分类号： G03B27/58 , H01L21/67353 , H01L21/67376 , H01L21/67386 , H01L21/67393
摘要： The present invention is a pod for containing a particulate sensitive substrate and for providing pressure equalization between the exterior and an interior environment of the pod and for minimizing gaseous fluid flow inside adjacent to the particulate sensitive substrate. The pod comprises a primary pod, a diaphragm positioned in a cover, the diaphragm having a normal undeflected position, the diaphragm deflectable from the normal undeflected position. Preferably, the pod comprises a secondary pod disposed in the primary pod defining a second enclosure for containing the particulate sensitive substrate. The pod may comprise a filter attached to the pod and providing gaseous fluid communication between the exterior of the pod and the interior of the pod. The diaphragm is responsive to rapid pressure changes and the filter is responsive to slower pressure changes and allows the diaphragm to return to its normal undeflected position.

6. 发明公开

EP1853497A2 RETICLE POD WITH ISOLATION SYSTEM 审中-公开
标题翻译：屏蔽支架绝缘
公开(公告)号：EP1853497A2
公开(公告)日：2007-11-14
申请号：EP06736651.8
申请日：2006-02-27
申请人： ENTEGRIS, INC.
发明人： GREGERSON, Barry , HALBMAIER, David , SUMNER, Stephen , WISEMAN, Brian , TIEBEN, Anthony Mathius , STRIKE, Justin
IPC分类号： B65D85/00
CPC分类号： H01L21/67353 , G03F1/66 , G03F7/70741 , H01L21/67359 , H01L21/67369 , H01L21/67376 , H01L21/67386
摘要： The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式