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    • 1. 发明申请
    • REDUCING BACK-REFLECTION IN LASER MICROMACHINING SYSTEMS
    • 减少激光微型系统中的反射
    • WO2012082930A2
    • 2012-06-21
    • PCT/US2011/064959
    • 2011-12-14
    • ELECTRO SCIENTIFIC INDUSTRIES, INC.LI, GuangyuALPAY, Mehmet E.
    • LI, GuangyuALPAY, Mehmet E.
    • B23K26/00B23K26/42H01S3/02
    • B23K26/066H01S3/0064
    • Systems and methods reduce or prevent back-reflections in a laser processing system. A system includes a laser source to generate an incident laser beam, a laser beam output to direct the incident laser beam toward a work surface along a beam path, and a spatial filter. The system further includes a beam expander to expand a diameter of the incident laser beam received through the spatial filter, and a scan lens to focus the expanded incident laser beam at a target location on a work surface. A reflected laser beam from the work surface returns through the scan lens to the beam expander, which reduces a diameter of the reflected beam and increases a divergence angle of the reflected laser beam. The spatial filter blocks a portion of the diverging reflected laser beam from passing through the aperture and returning to the laser beam output.
    • 系统和方法减少或防止激光加工系统中的反射。 一种系统包括用于产生入射激光束的激光源,将入射激光束沿着光束路径引向工作表面的激光束输出和空间滤光器。 该系统还包括扩束器,以扩大通过空间滤波器接收的入射激光束的直径;以及扫描透镜,以将扩大的入射激光束聚焦在工作表面上的目标位置。 来自工作表面的反射激光束通过扫描透镜返回到光束扩展器,这减小了反射光束的直径并增加了反射激光束的发散角。 空间滤波器阻挡发散反射激光束的一部分通过孔并返回到激光束输出。